JP3178279B2 - Polyimide film with adhesive and laminate - Google Patents

Polyimide film with adhesive and laminate

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Publication number
JP3178279B2
JP3178279B2 JP28559794A JP28559794A JP3178279B2 JP 3178279 B2 JP3178279 B2 JP 3178279B2 JP 28559794 A JP28559794 A JP 28559794A JP 28559794 A JP28559794 A JP 28559794A JP 3178279 B2 JP3178279 B2 JP 3178279B2
Authority
JP
Japan
Prior art keywords
adhesive
polyimide film
thickness
polyimide
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP28559794A
Other languages
Japanese (ja)
Other versions
JPH08143827A (en
Inventor
浩 井上
誠一郎 高林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は、接着剤付きポリイミ
ドフィルムの製造方法の改良に関するものである。更に
詳しくは、他の導体と張り合わせることができ、接着剤
の硬化−エッチング後でも反りが小さく、種々の製造工
程での寸法精度も高く、他部品を実装する際の位置合わ
せが良好な接着剤付きポリイミドフィルムの製造方法、
及びさらに金属箔を積層する積層体の製造方法に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improved method for producing a polyimide film with an adhesive. More specifically, it can be bonded to other conductors, has low warpage even after curing and etching of the adhesive, has high dimensional accuracy in various manufacturing processes, and has good adhesion when mounting other components. Method for producing a polyimide film with an agent,
Further, the present invention relates to a method for producing a laminate in which metal foils are laminated.

【0002】[0002]

【従来の技術】従来、芳香族テトラカルボン酸成分と芳
香族ジアミン成分とからなる芳香族ポリイミドフィルム
の片面にエポキシ樹脂系、ポリアミド系、アクリル樹脂
系系等の接着剤を設けた接着性ポリイミドフィルムは、
優れた電気絶縁性、機械的強度、耐熱性、寸法安定性な
どを有しており、フレキシブルプリント配線銅張板やT
AB用などの製造に使用されている。
2. Description of the Related Art Conventionally, an adhesive polyimide film in which an epoxy resin-based, polyamide-based, or acrylic resin-based adhesive is provided on one surface of an aromatic polyimide film comprising an aromatic tetracarboxylic acid component and an aromatic diamine component. Is
It has excellent electrical insulation, mechanical strength, heat resistance, dimensional stability, etc.
It is used for production of AB and the like.

【0003】しかし、電子産業分野における高品質・高
精度の要望は近年ますます強くなってきており、接着剤
付きポリイミドフィルムについても製造工程での寸法精
度、他部品を実装する際の位置合わせの改善が必要にな
っている。このため、特公平4−6213号公報に記載
されているように寸法安定なポリイミドフィルムが提案
されている。
However, the demand for high quality and high precision in the field of the electronics industry has been increasingly strong in recent years, and the dimensional accuracy in the manufacturing process and the positioning for mounting other parts have also been required for polyimide films with an adhesive. Improvement is needed. For this reason, a dimensionally stable polyimide film has been proposed as described in Japanese Patent Publication No. 4-6213.

【0004】しかし、このポリイミドフィルムに接着剤
を設けた接着剤付きポリイミドフィルムを使用して金属
箔と張り合わせた後、金属箔をエッチィンで除くと接着
剤を内側にして反りが生じる場合があり、依然として接
着剤付きポリイミドフィルムにおける前記問題点は完全
には解決されていなかったのである。
However, after bonding the polyimide film with a metal foil using an adhesive-provided polyimide film provided with an adhesive, if the metal foil is removed by etching, warping may occur with the adhesive inside. Still, the above-mentioned problem in the polyimide film with the adhesive has not been completely solved.

【0005】[0005]

【発明が解決しようとする課題】この発明の目的は、製
造工程での寸法精度も高く、接着剤の硬化後も反りが小
さいので加工性が良好で他部品を実装する際の位置合わ
せが良好な接着剤付きポリイミドフィルム、およびその
積層体を提供することである。
SUMMARY OF THE INVENTION It is an object of the present invention to provide high dimensional accuracy in a manufacturing process and small warpage even after curing of an adhesive, so that workability is good and positioning when mounting other parts is good. It is to provide a polyimide film with an adhesive and a laminate thereof.

【0006】すなわち、この発明は、ポリマ−が芳香族
テトラカルボン酸成分と芳香族ジアミン成分とからなり
弾性率が400kg/mm2以上であって厚み5〜12
5μmのポリイミドフィルム及び、その片面に設けた厚
み4〜60μmの接着剤について、各々接触式測定法に
よって測定した厚みと各々の弾性率とを下記の式によっ
て関係付けた、Xが0.7以上であるとの条件を満足さ
せることを特徴とする接着剤付きポリイミドフィルムの
製造方法に関するものである。 X=(T12×E1)/(T22×E2×102) [但し、T1:ポリイミドフィルムの厚み(μm)、E
1:ポリイミドフィルムの弾性率(kg/mm2)、T
2:硬化後の接着剤の厚み(μm)、E2:硬化後の接
着剤の弾性率(kg/mm2)] 前記において、ポリイミドフィルムおよび接着剤の厚み
は接触式測定法により測定した値である。
That is, according to the present invention, the polymer comprises an aromatic tetracarboxylic acid component and an aromatic diamine component, has an elastic modulus of 400 kg / mm 2 or more and a thickness of 5 to 12 mm.
For a polyimide film of 5 μm and an adhesive having a thickness of 4 to 60 μm provided on one side thereof, the thickness measured by the contact measurement method and each elastic modulus were related by the following formula, where X was 0.7 or more. The present invention relates to a method for producing a polyimide film with an adhesive, characterized by satisfying the following condition. X = (T1 2 × E1) / (T2 2 × E2 × 10 2) [ where, T1: thickness of the polyimide film (μm), E
1: Elastic modulus (kg / mm 2 ) of polyimide film, T
2: thickness of cured adhesive (μm), E2: modulus of elasticity of cured adhesive (kg / mm 2 )] In the above, the thickness of the polyimide film and the adhesive is a value measured by a contact measurement method. is there.

【0007】また、この発明は、前記に記載の製造方法
による接着剤付きポリイミドフィルムの接着剤に、さら
に金属箔を積層することを特徴とする積層体の製造方法
に関するものである。
[0007] The present invention also relates to a method for producing a laminate, further comprising laminating a metal foil on the adhesive of the polyimide film with the adhesive according to the above-mentioned production method.

【0008】なお、上記のポリイミドフィルムおよび硬
化後の接着剤の弾性率(MD)は、ASTM−D−88
2に従って求めたものであり、硬化後の接着剤の弾性率
とは積層体とは別に、測定用に接着剤の両面に銅箔を重
ね合わせて硬化後銅箔をエッチングして除いたものにつ
いて求めた弾性率をいう。
[0008] The modulus of elasticity (MD) of the polyimide film and the cured adhesive is ASTM-D-88.
The elastic modulus of the cured adhesive is different from that of the laminate, and the copper foil is etched on the both sides of the adhesive for measurement and removed after curing. Refers to the determined elastic modulus.

【0009】この発明において用いられるポリイミドフ
ィルムは、芳香族テトラカルボン酸成分と芳香族ジアミ
ン成分とからなり弾性率が400kg/mm2 以上、好
ましくは410kg/mm2 以上、特に好ましくは42
0kg/mm2 以上であって、好ましくは耐薬品性が優
れているものである。弾性率が400kg/mm2 より
小さいと、寸法変化率が小さく(従って寸法精度が高く
て)かつ反りの小さいというこの発明の効果を奏する積
層体を得ることが困難になる。
The polyimide film used in the present invention comprises an aromatic tetracarboxylic acid component and an aromatic diamine component and has an elastic modulus of 400 kg / mm 2 or more, preferably 410 kg / mm 2 or more, and particularly preferably 42 kg / mm 2 or more.
It is 0 kg / mm 2 or more, and preferably has excellent chemical resistance. If the elastic modulus is less than 400 kg / mm 2 , it will be difficult to obtain a laminate exhibiting the effects of the present invention in which the dimensional change rate is small (therefore, the dimensional accuracy is high) and the warpage is small.

【0010】このようなポリイミドフィルムは、例え
ば、以下の方法によって好適に製造することができる。
すなわち、5〜125μmの厚みのポリイミドフィルム
を製造する場合には、有機極性溶媒中芳香族テトラカル
ボン酸類と芳香族ジアミン類とから得られる芳香族ポリ
アミック酸の溶液組成物を濾過および脱泡し、ホッパ
−、Tダイより金属ドラム、金属ベルトなどの基体上に
均一の厚さに流延し、熱風、赤外線等で60〜160℃
に加熱し溶剤を徐々に除去し自己支持性になるまで前乾
燥を行い、次に金属ドラムまたは金属ベルトより自己支
持性フィルムを剥離し、ついでイミド化するとともに溶
媒等の揮発成分を蒸発・除去してポリイミドフィルムを
製造することができる。
[0010] Such a polyimide film can be suitably produced, for example, by the following method.
That is, when producing a polyimide film having a thickness of 5 to 125 μm, a solution composition of an aromatic polyamic acid obtained from an aromatic tetracarboxylic acid and an aromatic diamine in an organic polar solvent is filtered and defoamed, It is cast to a uniform thickness on a substrate such as a metal drum or metal belt from a hopper or T-die, and is heated to 60 to 160 ° C by hot air or infrared rays.
And gradually remove the solvent and pre-dry until it becomes self-supporting, then peel off the self-supporting film from the metal drum or metal belt, then imidize and evaporate and remove volatile components such as solvent Thus, a polyimide film can be manufactured.

【0011】前記の芳香族テトラカルボン酸類は、好適
には、3,3' ,4,4' −ビフェニルテトラカルボン
酸またはその酸二無水物、あるいはその酸の炭素数1〜
5の低級アルコ−ルエステル化物、2,3,3' ,4'
−ビフェニルテトラカルボン酸またはその酸二無水物、
あるいはその酸の炭素数1〜5の低級アルコ−ルエステ
ル化物などのビフェニルテトラカルボン酸類を、好まし
くは全テトラカルボン酸成分に対して、50モル%以
上、特に60モル%以上含有する芳香族テトラカルボン
酸を好適に挙げることができる。特に、3,3' ,4,
' −ビフェニルテトラカルボン酸またはその酸二無水
物を50モル%以上、特に好ましくは60モル%以上含
有する芳香族テトラカルボンを用いると、最終的に得ら
れるポリイミドフィルムの弾性率、耐薬品性などの点に
おいて優れているので好適である。
[0011] Aromatic tetracarboxylic acids above, preferably, 3,3 ', 4,4' - biphenyltetracarboxylic acid or dianhydride, or the carbon number of the acid 1
Lower alcohol esterified product of 5, 2,3,3 ' , 4 '
-Biphenyltetracarboxylic acid or its acid dianhydride,
Alternatively, an aromatic tetracarboxylic acid containing a biphenyltetracarboxylic acid such as a lower alcohol ester having 1 to 5 carbon atoms, preferably 50 mol% or more, particularly 60 mol% or more, based on all tetracarboxylic acid components. Acids are preferred. In particular, 3,3 ' , 4,
When an aromatic tetracarboxylic acid containing 50 mol% or more, particularly preferably 60 mol% or more of 4' -biphenyltetracarboxylic acid or its acid dianhydride is used, the modulus of elasticity and chemical resistance of the polyimide film finally obtained are used. It is preferable because it is excellent in such points.

【0012】また、前記の芳香族テトラカルボン酸成分
として、ビフェニルテトラカルボン酸類の他にピロメリ
ット酸またはその酸二無水物、ベンゾフェノンテトラカ
ルボン酸またはその酸二無水物、ビス(3,4−ジカル
ボキシフェニル)メタンまたはその酸二無水物、2,2
−ビス(3,4−ジカルボキシフェニル)プロパンまた
はその酸二無水物、ビス(3,4−ジカルボキシフェニ
ル)スルホンまたはそれらのの酸二無水物など、あるい
はそれらの炭素数1〜5の低級アルコ−ルエステルを使
用することができる。
As the aromatic tetracarboxylic acid component, in addition to biphenyltetracarboxylic acids, pyromellitic acid or its acid dianhydride, benzophenonetetracarboxylic acid or its acid dianhydride, bis (3,4-dicarboxylic acid) (Carboxyphenyl) methane or its acid dianhydride, 2,2
-Bis (3,4-dicarboxyphenyl) propane or an acid dianhydride thereof, bis (3,4-dicarboxyphenyl) sulfone or an acid dianhydride thereof, or a lower thereof having 1 to 5 carbon atoms Alcohol esters can be used.

【0013】前記の芳香族ジアミン成分は、例えば、p
−またはm−フェニレンジアミン、3,5−ジアミノト
ルエン、2,5−ジアミノトルエンなどフェニレンジア
ミン類を、好ましくは全芳香族ジアミン成分に対して、
50モル%以上、特に60モル%以上、さらに好ましく
は70モル%以上含有する芳香族ジアミン成分を好適に
挙げることができる。特に、p−フェニレンジアミンを
60モル%以上、特に70モル%以上の含有率で含有す
る芳香族ジアミン成分を好適に挙げることができる。p
−フェニレンジアミンを50モル%以上含有する芳香族
ジアミンを用いると、最終的に得られるポリイミドフィ
ルムの耐熱性、弾性率などの点において優れているので
好適である。
The aromatic diamine component is, for example, p
-Or m-phenylenediamine, 3,5-diaminotoluene, phenylenediamines such as 2,5-diaminotoluene, preferably with respect to the wholly aromatic diamine component,
An aromatic diamine component containing at least 50 mol%, particularly at least 60 mol%, and more preferably at least 70 mol% can be suitably mentioned. In particular, an aromatic diamine component containing p-phenylenediamine at a content of 60 mol% or more, particularly 70 mol% or more, can be suitably mentioned. p
Use of an aromatic diamine containing phenylenediamine in an amount of 50 mol% or more is preferable because the polyimide film finally obtained is excellent in heat resistance, elastic modulus, and the like.

【0014】また、前記芳香族ジアミン成分として、フ
ェニレンジアミン類の他に4,4'−ジアミノジフェニ
ルエ−テル、3,4' −ジアミノジフェニルエ−テル、
3,3' −ジアミノジフェニルエ−テルなどのジアミノ
ジフェニルエ−テル類、4,4' −ジアミノジフェニル
メタン、4,4' −ジアミノジフェニルプロパン、4,
' −ジアミノジフェニルスルホン、4,4' −ジアミ
ノジフェニルスルフィドなどを使用することができる。
Further, as the aromatic diamine component, in addition to 4,4-phenylenediamines '- diamino diphenyl ether - ether, 3,4' - diaminodiphenyl et - ether,
3,3 '- diaminodiphenyl et - diamino diphenyl ether, such as ether - ethers, 4,4' - diaminodiphenylmethane, 4,4 '- diaminodiphenyl propane, 4,
4 '- diamino diphenyl sulfone, 4,4' - can be used like diaminodiphenyl sulfide.

【0015】前記の芳香族ポリアミック酸は、前述のよ
うに芳香族テトラカルボン酸成分と芳香族ジアミン成分
とから10〜90℃程度の低温での重合で得られたポリ
イミド前駆体であると共に、下記の式で算出される対数
粘度(測定温度:30℃、濃度:0.5g/100ml
溶液、溶媒:N−メチル−2−ピロリドン)が0.1〜
7、特に0.2〜5程度であり、有機極性溶媒に約2〜
50重量%、特に5〜40重量%の濃度で均一に溶解し
ているポリマ−であることが好ましい。 対数粘度=自然対数(溶液粘度/溶媒粘度)/溶液の濃
The above-mentioned aromatic polyamic acid is a polyimide precursor obtained by polymerizing an aromatic tetracarboxylic acid component and an aromatic diamine component at a low temperature of about 10 to 90 ° C. as described above. Logarithmic viscosity (measuring temperature: 30 ° C., concentration: 0.5 g / 100 ml)
Solution, solvent: N-methyl-2-pyrrolidone)
7, especially about 0.2 to 5 and about 2 to about 2 in the organic polar solvent.
It is preferred that the polymer is uniformly dissolved at a concentration of 50% by weight, especially 5 to 40% by weight. Logarithmic viscosity = natural logarithm (solution viscosity / solvent viscosity) / concentration of solution

【0016】前記の有機極性溶媒は、前記の芳香族ポリ
アミック酸を均一に溶解することができるものであれば
よく、例えば、N,N−ジメチルホルムアミド、N,N
−ジエチルホルムアミド、N,N−ジエチルアセトアミ
ド、N,N−ジメチルメトキシアセトアミドなどのN,
N−ジ低級アルキルカルボキシルアミド類、N−メチル
−2−ピロリドン、ジメチルスルホキシド、ジエチルス
ルホキシド、ジメチルスルホン、ジエチルスルホン、ヘ
キサメチルスルホルアミドなどを挙げることができる。
The above-mentioned organic polar solvent may be any as long as it can uniformly dissolve the above-mentioned aromatic polyamic acid. For example, N, N-dimethylformamide, N, N
N, such as -diethylformamide, N, N-diethylacetamide, N, N-dimethylmethoxyacetamide
Examples thereof include N-di-lower alkylcarboxamides, N-methyl-2-pyrrolidone, dimethylsulfoxide, diethylsulfoxide, dimethylsulfone, diethylsulfone, and hexamethylsulfonamide.

【0017】この発明に用いられるポリイミドフィルム
は、例えば、前述の芳香族テトラカルボン酸成分と芳香
族ジアミン成分との略等モルを、有機極性溶媒中、約1
00℃以下の低い温度で重合して得られた高分子量の芳
香族ポリアミック酸が、有機極性溶媒に約2〜50重量
%の濃度で均一に溶解している芳香族ポリアミック酸溶
液を、製膜用ド−プ液として使用し約160℃以下の流
延温度で支持体面上に液状の薄膜を形成し、その薄膜を
支持体上で約150℃以下の乾燥温度で約0.1〜1時
間乾燥する溶液流延法などの製膜法で形成される好まし
くは厚み9〜200μmの自己支持性の固化フィルム
を、加熱してイミド化・溶媒除去して得られる。
In the polyimide film used in the present invention, for example, approximately equimolar amounts of the above-mentioned aromatic tetracarboxylic acid component and aromatic diamine component are dissolved in an organic polar solvent in about 1 mol.
An aromatic polyamic acid solution in which a high molecular weight aromatic polyamic acid obtained by polymerization at a low temperature of 00 ° C. or less is uniformly dissolved in an organic polar solvent at a concentration of about 2 to 50% by weight is formed into a film. A liquid thin film is formed on a support at a casting temperature of about 160 ° C. or less, and the thin film is dried on a support at a drying temperature of about 150 ° C. for about 0.1 to 1 hour. A self-supporting solidified film having a thickness of preferably 9 to 200 μm, which is formed by a film forming method such as a solution casting method for drying, is obtained by heating to imidize and remove the solvent.

【0018】また、この発明に用いられるポリイミドフ
ィルムは、前述の芳香族テトラカルボン酸成分と芳香族
ジアミン成分との略等モルを、前記溶媒中、約100℃
以下の低い温度で重合して得られた高分子量の芳香族ポ
リアミック酸溶液に、ピリジン、β−ピコリンなどの第
3級アミン化合物や無水酢酸のような化学変換剤などを
加えて均一に混合して得られた組成物を、製膜用ド−プ
液として使用して約150℃以下の流延温度で、支持体
面上にキャストして液状の薄膜を形成する製膜法によっ
て得られる好ましくは厚み9〜200μmの自己支持性
の固化フィルムを、加熱処理して得られる。ポリイミド
フィルムは厚み10〜125μmのものが好適に使用さ
れる。得られたポリイミドフィルムは必要であればさら
にプラズマ処理、コロナ処理によって処理してもよい。
The polyimide film used in the present invention is prepared by adding substantially equimolar amounts of the above-mentioned aromatic tetracarboxylic acid component and aromatic diamine component to the above-mentioned solvent at about 100 ° C.
A tertiary amine compound such as pyridine or β-picoline or a chemical conversion agent such as acetic anhydride is added to a high molecular weight aromatic polyamic acid solution obtained by polymerization at a low temperature as described below, and mixed uniformly. The composition obtained as above is preferably used as a film-forming dope solution and cast at a casting temperature of about 150 ° C. or less on a support surface to form a liquid thin film, preferably a film-forming method. A self-supporting solidified film having a thickness of 9 to 200 μm is obtained by heat treatment. A polyimide film having a thickness of 10 to 125 μm is preferably used. The obtained polyimide film may be further processed by plasma treatment or corona treatment if necessary.

【0019】この発明において使用されるポリイミドフ
ィルムを製造するための前記の製膜用ド−プ液は、リン
含有化合物および微細の無機充填剤を配合したものが好
ましい。リン化合物としては特に制限はないが、例え
ば、モノステアリルリン酸エステル、モノカプロイルリ
ン酸エステル、モノオクチルリン酸エステル、モノラウ
リルリン酸エステル、モノミリスチルリン酸エステル、
ジオクチルリン酸エステル、ジステアリルリン酸エステ
ル等のリン酸エステルやこれらリン酸エステルのアミン
塩が好ましく、無機充填剤としては、コロイダルシリカ
が好ましい。これらの配合量は、芳香族ポリアミック酸
重合体100重量部に対してリン化合物が0.01〜1
重量部、微細の無機充填剤が0.02〜6重量であるこ
とが好ましい。
The above-mentioned dope solution for producing a polyimide film used in the present invention is preferably one containing a phosphorus-containing compound and a fine inorganic filler. Although there is no particular limitation on the phosphorus compound, for example, monostearyl phosphate, monocaproyl phosphate, monooctyl phosphate, monolauryl phosphate, monomyristyl phosphate,
Phosphate esters such as dioctyl phosphate and distearyl phosphate, and amine salts of these phosphates are preferable, and colloidal silica is preferable as the inorganic filler. The amount of these components is such that the phosphorus compound is 0.01 to 1 part by weight per 100 parts by weight of the aromatic polyamic acid polymer.
It is preferable that the amount by weight of the inorganic filler is 0.02 to 6 parts by weight.

【0020】この発明において使用される前記のポリイ
ミドフィルムは、自己支持性の固化フィルムを好適には
100〜400℃の温度で約0.2〜5時間加熱処理し
て、該フィルムを形成しているポリアミック酸を実質的
にアミド−酸結合の存在しないように、イミド化すると
ともに該フィルムから前記溶媒などの揮発成分を蒸発し
除去することによって製造することが好ましい。
The above-mentioned polyimide film used in the present invention is obtained by heat-treating a self-supporting solidified film preferably at a temperature of 100 to 400 ° C. for about 0.2 to 5 hours to form the film. Preferably, the polyamic acid is imidized so that substantially no amide-acid bond is present, and is produced by evaporating and removing volatile components such as the solvent from the film.

【0021】前記の加熱処理は約100〜170℃の比
較的低い温度で約1〜30分間第一次加熱処理し、次い
で170〜220℃の温度で約1〜30分間第二次加熱
処理して、そして220〜400℃の高温で約1〜30
分間第三次加熱処理するように段階的に行うことが好ま
しい。必要であれば400〜600℃の高い温度で第四
次高温加熱処理してもよい。また、250℃以上の連続
加熱処理においては、ピンテンタ−、クリップ、枠など
で行うことが好ましい。この高温加熱処理によって揮発
性成分の含有率を、フィルムの厚みが100μm以下の
場合は0.4%(重量%)以下、特に0.3%以下に、
フィルムの厚みが100μmより大きい場合でも1.1
%以下、特に0.9%以下にすることが好ましく、こう
することにより積層体にした場合の接着強度にバラツキ
がなく寸法精度・加工性の信頼性が高くなる。
The above heat treatment is carried out by a first heat treatment at a relatively low temperature of about 100 to 170 ° C. for about 1 to 30 minutes, and then by a second heat treatment at a temperature of 170 to 220 ° C. for about 1 to 30 minutes. And about 1-30 at high temperature of 220-400 ° C
It is preferable to carry out stepwise so as to perform the third heat treatment for minutes. If necessary, a fourth high-temperature heat treatment may be performed at a high temperature of 400 to 600 ° C. Further, in the continuous heat treatment at 250 ° C. or more, it is preferable to perform the heat treatment using a pin tenter, a clip, a frame, or the like. By this high-temperature heat treatment, the content of the volatile component is reduced to 0.4% (% by weight) or less, particularly 0.3% or less when the film thickness is 100 μm or less.
Even when the thickness of the film is larger than 100 μm, 1.1
% Or less, particularly preferably 0.9% or less, so that there is no variation in the adhesive strength of the laminated body, and the dimensional accuracy and workability are improved.

【0022】ポリイミドフィルム中の揮発性成分の含有
率は、次の計算式によって算出される。 揮発性成分(重量%)=〔(W0 −W)/W0 〕×10
0 W0 :空気中150℃×10分乾燥後の重量(試料:1
00×100mm2 ) W :空気中450℃×20分乾燥後の重量(試料:1
00×100mm2
The content of the volatile component in the polyimide film is calculated by the following formula. Volatile component (% by weight) = [(W 0 −W) / W 0 ] × 10
0 W 0 : weight after drying in air at 150 ° C. × 10 minutes (sample: 1
00 × 100 mm 2 ) W: Weight after drying in air at 450 ° C. × 20 minutes (sample: 1)
00 × 100mm 2 )

【0023】この発明の接着剤付きポリイミドフィルム
は、前記の弾性率が400kg/mm2以上である厚み
5〜125μmのポリイミドフィルムと、その片面に設
けた厚み4〜60μmの接着剤とからなり、下記式によ
って規定されるXが0.7以上、好ましくは0.7以上
4.1以下である接着剤付きポリイミドフィルムであ
る。 X=(T12×E1)/(T22×E2か×102) [但し、T1:ポリイミドフィルムの厚み(μm)、E
1:ポリイミドフィルムの弾性率(kg/mm2)、T
2:硬化後の接着剤の厚み(μm)、E2:硬化後の接
着剤の弾性率(kg/mm2)] 前記の式で規定されるXが0.7より小さいと、接着剤
付きポリイミドフィルムの反りが大きくなるので望まし
くない。
The polyimide film with an adhesive according to the present invention comprises a polyimide film having a thickness of 5 to 125 μm having an elastic modulus of 400 kg / mm 2 or more and an adhesive having a thickness of 4 to 60 μm provided on one surface thereof. A polyimide film with an adhesive, wherein X defined by the following formula is 0.7 or more, preferably 0.7 or more and 4.1 or less. X = (T1 2 × E1) / (T2 2 × E2 or × 10 2 ) [However, T1: thickness (μm) of polyimide film, E
1: Elastic modulus (kg / mm 2 ) of polyimide film, T
2: thickness of adhesive after curing (μm), E2: modulus of elasticity of adhesive after curing (kg / mm 2 )] If X defined by the above formula is smaller than 0.7, polyimide with adhesive Undesirably, the warpage of the film increases.

【0024】この発明の接着剤付きポリイミドフィルム
は、例えば前記ポリイミドフィルムに液状の接着剤を塗
布した後乾燥して、あるいは前記ポリイミドフィルムに
接着剤シ−トを積層して得られる。一般的にはこの接着
剤層を設けたポリイミドフィルムは、前記の接着剤の塗
布乾燥後あるいはポリイミドフィルムと接着剤シ−トと
の積層と同時に金属箔を接着剤面と張り合わせ、接着剤
を硬化して積層体を形成する。
The polyimide film with an adhesive of the present invention is obtained, for example, by applying a liquid adhesive to the polyimide film and then drying it, or by laminating an adhesive sheet on the polyimide film. In general, the polyimide film provided with the adhesive layer is bonded with a metal foil to the adhesive surface after application and drying of the adhesive or simultaneously with lamination of the polyimide film and the adhesive sheet, and the adhesive is cured. To form a laminate.

【0025】この発明の接着剤付きポリイミドフィルム
は前記の式で規定されるXを0.7以上とすることによ
って、硬化後の接着性ポリイミドフィルム、一般的には
金属箔を全面エッチングで除去しポリイミドフィルムと
接着剤(硬化)だけにしたフィルムの局率半径によって
評価される反りを小さくすることができるのである。す
なわち、この発明の接着剤付きポリイミドフィルムは硬
化後の平坦度を示す局率半径が好ましくは100mm以
上、特に好ましくは110mm以上であって平坦性が高
い、すなわち反りが小さい。
In the polyimide film with an adhesive of the present invention, by setting X defined by the above formula to 0.7 or more, the cured adhesive polyimide film, generally a metal foil, is removed by etching over the entire surface. The warpage evaluated by the local radius of the polyimide film and the film made of only the adhesive (cured) can be reduced. That is, the polyimide film with an adhesive of the present invention has a local radius indicating the flatness after curing of preferably 100 mm or more, particularly preferably 110 mm or more, and high flatness, that is, small warpage.

【0026】前記の局率半径はJIS規格C5012に
示された方法により、以下の計算式で算出された値であ
る。 局率半径=L2 /8h〔L:試料の長さ(mm)、h:
反りの高さ(mm)〕
The above-mentioned radius of locality is a value calculated by the method shown in JIS standard C5012 by the following formula. Locality radius = L 2 / 8h [L: length of sample (mm), h:
Warp height (mm)]

【0027】この発明において使用される接着剤として
は、エポキシ樹脂系、ポリアミド系、アクリル樹脂系、
ポリイミド系等の耐熱性の熱硬化性接着剤が挙げられ
る。接着剤は溶液タイプであってもよく、あるいはシ−
トタイプでもよい。接着剤は固化後の厚みが4〜60μ
mであることが好ましい。
The adhesive used in the present invention includes epoxy resin, polyamide, acrylic resin, and the like.
A heat-resistant thermosetting adhesive such as a polyimide-based adhesive may be used. The adhesive may be of a solution type, or
Type. The adhesive has a thickness of 4-60μ after solidification
m is preferable.

【0028】この発明の接着剤付きポリイミドフィルム
はポリイミドフィルム本来の耐熱性、機械的物性を保持
したままで接着性を有しており、硬化後の反りが少な
く、金属箔との積層体(通常は回路)は反りが従来の積
層体に比較して大幅に改善される。
The polyimide film with an adhesive of the present invention has an adhesive property while maintaining the original heat resistance and mechanical properties of the polyimide film, has less warpage after curing, and has a laminate with a metal foil (usually In the circuit, the warpage is greatly improved as compared with the conventional laminate.

【0029】この発明の積層体は、接着剤付きポリイミ
ドフィルムの接着剤面に金属を積層することによって得
ることができる。前記金属箔としては、電解銅箔、圧延
銅箔、42アロイなどの金属箔があげられる。
The laminate of the present invention can be obtained by laminating a metal on the adhesive surface of a polyimide film with an adhesive. Examples of the metal foil include metal foils such as electrolytic copper foil, rolled copper foil, and 42 alloy.

【0030】この発明の積層体は反りが小さく、寸法精
度が高く、高温の作業環境にさらされる用途に好適に使
用される。この発明の積層体は、例えば、FPC、TA
B等に好適に使用することができる。
The laminate of the present invention has a small warpage, high dimensional accuracy, and is suitably used for applications exposed to a high-temperature working environment. The laminate of the present invention is, for example, FPC, TA
B and the like can be suitably used.

【0031】[0031]

【実施例】以下にこの発明の実施例を示す。以下の記載
において部は重量部を示す。以下の各例において硬化接
着剤の厚みは、別に接着剤の両面に銅箔を重ね合わせて
硬化後銅箔をエッチングして除いた試料の厚みを、厚み
測定器〔小野測器製作所株式会社製、デジタルダイヤル
ゲ−ジ DG−751〕を用いて測定した。
Embodiments of the present invention will be described below. In the following description, “parts” indicates “parts by weight”. In each of the following examples, the thickness of the cured adhesive, the thickness of the sample removed by etching the copper foil after curing by laminating copper foil on both sides of the adhesive separately, a thickness measuring instrument (manufactured by Ono Sokki Seisakusho Co., Ltd. And a digital dial gauge DG-751].

【0032】参考例1 N,N−ジメチルアセトアミド2470部中に3,
' ,4,4' −ビフェニルテトラカルボン酸二無水物
294.33部とp−フェニレンジアミン108.14
部を加え約10時間反応させてポリアミック酸溶液を得
た。このポリアミック酸の対数粘度は2.66であり、
溶液の30℃での粘度は3100ポイズであった。
Reference Example 1 3,470 parts of N, N-dimethylacetamide
3 ', 4,4' - biphenyl tetracarboxylic acid and anhydrides 294.33 parts p- phenylenediamine 108.14
The resulting mixture was reacted for about 10 hours to obtain a polyamic acid solution. The logarithmic viscosity of this polyamic acid is 2.66,
The viscosity of the solution at 30 ° C. was 3100 poise.

【0033】参考例2 N−メチル−2−ピロリドン1980部中に3,3'
4,4' −ビフェニルテトラカルボン酸二無水物14
7.2部、ピロメリット酸二無水100.1部、p−フ
ェニレンジアミン75.7部、4,4' −ジアミノジフ
ェニルエ−テル60.6部を加え約6時間反応してポリ
アミック酸溶液を得た。このポリアミック酸の対数粘度
は2.51であり、溶液の30℃での粘度は2900ポ
イズであった。
Reference Example 2 N-methyl-2-pyrrolidone contained 1980 parts of 3,3 ' ,
4,4 '- biphenyltetracarboxylic acid dianhydride 14
7.2 parts, 100.1 parts of pyromellitic dianhydride, p- phenylenediamine 75.7 parts of 4,4 '- diaminodiphenyl et - polyamic acid solution by reacting approximately 6 hours was added 60.6 parts of ether a Obtained. The logarithmic viscosity of the polyamic acid was 2.51, and the viscosity of the solution at 30 ° C. was 2900 poise.

【0034】参考例3 N,N−ジメチルアセトアミド3037部中に3,
' ,4,4' −ビフェニルテトラカルボン酸二無水物
294.22部と4,4' −ジアミノジフェニルエ−テ
ル200.24部を加え室温で約10時間反応させてポ
リアミック酸溶液を得た。このポリアミック酸の対数粘
度は2.71であり、溶液の30℃での粘度は2600
ポイズであった。
Reference Example 3 In 3037 parts of N, N-dimethylacetamide,
3 ', 4,4' - biphenyltetracarboxylic acid dianhydride 294.22 parts of 4,4 '- diaminodiphenyl et - added 200.24 parts of ether is reacted at room temperature for about 10 hours to obtain a polyamic acid solution . The logarithmic viscosity of this polyamic acid is 2.71, and the viscosity at 30 ° C. of the solution is 2600.
Poise.

【0035】参考例4 N,N−ジメチルアセトアミド2570部中に4,4'
−ジアミノジフェニルエ−テル200.24部を添加
後、ピロメリット酸二無水物218.12部を加え約6
時間反応させてポリアミック酸溶液を得た。このポリア
ミック酸の対数粘度は1.60であり、溶液の30℃で
の粘度は300ポイズであった。
Reference Example 4 4,4 'in 2570 parts of N, N-dimethylacetamide
After adding 200.24 parts of -diaminodiphenyl ether, add 218.12 parts of pyromellitic dianhydride and add about 6
The reaction was carried out for an hour to obtain a polyamic acid solution. The logarithmic viscosity of this polyamic acid was 1.60, and the viscosity at 30 ° C. of the solution was 300 poise.

【0036】実施例1 参考例1で調製したポリアミック酸重合体100部に対
して、モノステアリルリン酸エステルトリエタノ−ルア
ミン塩0.1部およびコロイダルシリカ(シリカの平均
粒子径75nm)0.5部(固形分換算)を加え、室温
(25℃)で6時間攪拌してポリアミック酸組成物を得
た。この組成物をステンレスベルト上に流延塗布し、1
20℃で10分間乾燥したのち、ステンレスベルト面よ
り剥がし自己支持性フィルムを得た。得られた自己支持
性フィルムをピンテンタ−で把持して150℃で5分間
加熱し、次いで200℃に昇温してその温度で7分間加
熱し、その温度で7分間熱処理し、さらに250℃に昇
温し、その温度で9分間加熱し、最後に450℃にまで
昇温し、その温度で7分間熱処理して、ポリマ−のイミ
ド化およびフィルムの乾燥を行って、厚み125μmの
ポリイミドフィルムを製造した。このポリイミドフィル
ムの引張弾性率は780kg/mm2 で、揮発性成分の
含有率(重量%)は0.7%であった。
Example 1 To 100 parts of the polyamic acid polymer prepared in Reference Example 1, 0.1 part of monostearyl phosphate triethanolamine salt and 0.5 part of colloidal silica (silica having an average particle diameter of 75 nm) were used. Then, the mixture was stirred at room temperature (25 ° C.) for 6 hours to obtain a polyamic acid composition. The composition was cast and applied on a stainless steel belt.
After drying at 20 ° C. for 10 minutes, the film was peeled off from the stainless steel belt surface to obtain a self-supporting film. The resulting self-supporting film is gripped with a pin tenter and heated at 150 ° C. for 5 minutes, then heated to 200 ° C., heated at that temperature for 7 minutes, heat-treated at that temperature for 7 minutes, and further heated to 250 ° C. The temperature was raised for 9 minutes, and finally the temperature was raised to 450 ° C., followed by a heat treatment at that temperature for 7 minutes to imidize the polymer and dry the film to obtain a polyimide film having a thickness of 125 μm. Manufactured. The tensile modulus of this polyimide film was 780 kg / mm 2 , and the content (% by weight) of volatile components was 0.7%.

【0037】このポリイミドフィルム(ベルト面)と電
解銅箔(35μm)との間に、シ−ト状のポリイミド系
接着剤(硬化後の厚み20μm、ポリイミドシロキサ
ン、フェノ−ルノボラック樹脂およびエポキシ樹脂の重
量比5:2:3からなる組成、硬化後の接着剤の引張弾
性率220kg/mm2 )を挟み、130℃でラミネ−
ト(ロ−ル使用)して3層体とした。この3層体を10
0℃で2時間、120℃で1時間、180℃で6時間加
熱して接着剤を硬化して積層体を作製した。この積層体
の接着強度(180度剥離強度、ASTM−D−903
による。)を表1に示す。また、この積層体の銅を塩化
第2鉄水溶液(濃度30重量%)で全面エッチングし
て、ポリイミドフィルムに接着剤が接着したものを得
た。この局率半径を測定した。
Between the polyimide film (belt surface) and the electrolytic copper foil (35 μm), a sheet-like polyimide adhesive (thickness after curing is 20 μm, weight of polyimide siloxane, phenol novolak resin and epoxy resin) A composition having a ratio of 5: 2: 3 and a tensile modulus of the cured adhesive of 220 kg / mm 2 ) were sandwiched between the laminates at 130 ° C.
(Using a roll) to form a three-layer body. This three-layer body is 10
The adhesive was cured by heating at 0 ° C. for 2 hours, 120 ° C. for 1 hour, and 180 ° C. for 6 hours to produce a laminate. The adhesive strength of this laminate (180 ° peel strength, ASTM-D-903
by. ) Are shown in Table 1. Further, the copper of the laminate was entirely etched with an aqueous ferric chloride solution (concentration: 30% by weight) to obtain a polyimide film having an adhesive bonded thereto. The radius of localization was measured.

【0038】また、前記のポリイミドフィルムをスリッ
トし、35mm幅のテ−プとし、その上に26mm幅の
テ−プ状のポリイミド系接着剤(厚み20μm、ポリイ
ミドシロキサン、フェノ−ルノボラック樹脂およびエポ
キシ樹脂の重量比5:2:3からなる組成、硬化後の接
着剤の引張弾性率220kg/mm2 )をポリイミドテ
−プ(ベルト面)の中央に120℃でラミネ−し、接着
剤付きポリイミドテ−プを作製した。この接着剤付きポ
リイミドテ−プにスプロケット穴やデバイスホ−ルをパ
ンチングで開け、銅箔(35μm)を130℃で張り合
わせ、接着剤を100℃で2時間、120℃で1時間、
180℃で6時間加熱して接着剤を硬化させた。続い
て、この銅張板のポリイミドテ−プの上にA、Bの2点
を刻印し、この間隔A、Bの長さを測定した。さらに、
常法に従いこの銅張板にパタ−ニングを行い、次にエッ
チング、水洗・乾燥工程を経た後、IL(インナ−リ−
ド)やOL(オウタ−リ−ド)等の回路を形成しTAB
用キャリアテ−プを作製した(工程中での最高操作温
度:90℃)。このTAB用キャリアテ−プにおいて上
記のA、B間の距離を測定した。
The polyimide film is slit into a tape having a width of 35 mm, and a 26 mm-width tape-shaped polyimide adhesive (thickness: 20 μm, polyimide siloxane, phenol novolak resin and epoxy resin) is formed thereon. Of a 5: 2: 3 weight ratio, and a cured adhesive having a tensile modulus of 220 kg / mm 2 ) was laminated at 120 ° C. at the center of the polyimide tape (belt surface) to obtain a polyimide tape with an adhesive. -A sample was prepared. A sprocket hole and a device hole are punched on the polyimide tape with the adhesive, and a copper foil (35 μm) is bonded at 130 ° C., and the adhesive is applied at 100 ° C. for 2 hours and at 120 ° C. for 1 hour.
The adhesive was cured by heating at 180 ° C. for 6 hours. Subsequently, two points A and B were marked on the polyimide tape of the copper clad board, and the lengths of the intervals A and B were measured. further,
This copper-clad plate is patterned according to a conventional method, then subjected to etching, washing and drying steps, and then to IL (inner lead).
Circuit) and OL (over lead) etc.
A carrier tape was prepared (maximum operating temperature during the process: 90 ° C.). In this TAB carrier tape, the distance between A and B was measured.

【0039】以下の式を用いて寸法変化率を求めた。こ
の値が小さいほど寸法の変化が小さく寸法精度が良い。 寸法変化率=〔(L0 −L)/L0 〕×100(%) L0 :エッチング前のA、B間の長さ L :エッチング後のA、B間の長さ 結果をまとめて表1および表2に示す。
The dimensional change rate was determined using the following equation. The smaller this value is, the smaller the change in dimension is and the better the dimensional accuracy is. Dimensional change rate = [(L 0 −L) / L 0 ] × 100 (%) L 0 : length between A and B before etching L: length between A and B after etching 1 and Table 2.

【0040】実施例2 接着剤としてシ−ト状のポリイミド系接着剤(硬化後の
厚み20μm、ポリイミドシロキサン、フェノ−ルノボ
ラック樹脂およびエポキシ樹脂の組成、硬化後の接着剤
の引張弾性率160kg/mm2 )を用いた他は実施例
1と同様に実施した。結果をまとめて表1および表2に
示す。
Example 2 A sheet-like polyimide adhesive (thickness of 20 μm after curing, composition of polyimide siloxane, phenol-novolak resin and epoxy resin, and tensile modulus of elasticity of cured adhesive of 160 kg / mm as an adhesive) The procedure was performed in the same manner as in Example 1 except that 2 ) was used. The results are summarized in Tables 1 and 2.

【0041】実施例3 ポリイミドフィルムとして、ポリアミック酸組成物の流
延塗布量を少なくして自己支持性の固化フィルムの厚み
を変えて得た弾性率810kg/mm2 、揮発性成分含
有率0.2%、厚み75μmのポリイミドフィルムを用
い、接着剤として厚みを10μmに変えた接着剤を用い
た他は実施例1と同様に実施した。結果をまとめて表1
および表2に示す。
Example 3 As a polyimide film, an elastic modulus of 810 kg / mm 2 and a volatile component content of 0.1 obtained by changing the thickness of a self-supporting solidified film by reducing the amount of the polyamic acid composition applied by casting. Example 2 was carried out in the same manner as in Example 1 except that a polyimide film having a thickness of 2% and a thickness of 75 μm was used, and an adhesive whose thickness was changed to 10 μm was used as the adhesive. Table 1 summarizes the results
And Table 2.

【0042】実施例4 接着剤としてシ−ト状のポリイミド系接着剤(硬化後の
厚み20μm、ポリイミドシロキサン、フェノ−ルノボ
ラック樹脂およびエポキシ樹脂の組成、硬化後の接着剤
の引張弾性率160kg/mm2 )を用いた他は実施例
3と同様に実施した。結果をまとめて表1および表2に
示す。
Example 4 A sheet-like polyimide-based adhesive (thickness of 20 μm after curing, composition of polyimide siloxane, phenol novolak resin and epoxy resin, and tensile modulus of elasticity of cured adhesive of 160 kg / mm as an adhesive) The procedure was performed in the same manner as in Example 3 except that 2 ) was used. The results are summarized in Tables 1 and 2.

【0043】実施例5 ポリイミドフィルムとして、参考例2で調製したポリア
ミック酸溶液を用いた他は実施例1に記載の方法と同様
にして得た弾性率580kg/mm2 、揮発性成分含有
率0.9%、厚み125μmのポリイミドフィルムを用
い、接着剤として厚みを10μmに変えた接着剤を用い
た他は実施例1と同様に実施した。結果をまとめて表1
および表2に示す。
Example 5 An elastic modulus of 580 kg / mm 2 and a volatile component content of 0 obtained in the same manner as in Example 1 except that the polyamic acid solution prepared in Reference Example 2 was used as the polyimide film. Example 9 was carried out in the same manner as in Example 1 except that a 1.9% polyimide film having a thickness of 125 μm was used, and an adhesive whose thickness was changed to 10 μm was used as the adhesive. Table 1 summarizes the results
And Table 2.

【0044】実施例6 接着剤としてシ−ト状のポリイミド系接着剤(硬化後の
厚み20μm、ポリイミドシロキサン、フェノ−ルノボ
ラック樹脂およびエポキシ樹脂の組成、硬化後の接着剤
の引張弾性率160kg/mm2 )を用いた他は実施例
5と同様に実施した。結果をまとめて表1および表2に
示す。
Example 6 A sheet-like polyimide adhesive (thickness of 20 μm after curing, composition of polyimide siloxane, phenol novolak resin and epoxy resin, and tensile modulus of elasticity of cured adhesive 160 kg / mm after curing) was used as the adhesive. Except using 2 ), it carried out similarly to Example 5. The results are summarized in Tables 1 and 2.

【0045】実施例7 ポリイミドフィルムとして、ポリアミック酸組成物の流
延塗布量を少なくして自己支持性の固化フィルムの厚み
を変えて得た弾性率580kg/mm2 、揮発性成分含
有率0.3%、厚み75μmのポリイミドフィルムを用
い、接着剤として厚みを10μmに変えた接着剤を用い
た他は実施例6と同様に実施した。結果をまとめて表1
および表2に示す。
Example 7 As a polyimide film, an elastic modulus of 580 kg / mm 2 and a volatile component content of 0.1 obtained by changing the thickness of a self-supporting solidified film by reducing the amount of the polyamic acid composition applied by casting. Example 6 was carried out in the same manner as in Example 6, except that a polyimide film having a thickness of 3% and a thickness of 75 µm was used, and an adhesive whose thickness was changed to 10 µm was used as the adhesive. Table 1 summarizes the results
And Table 2.

【0046】比較例1 ポリイミドフィルムとして弾性率810kg/mm2
揮発性成分含有率0.2%、厚み75μmのポリイミド
フィルムを用いた他は実施例1と同様に実施した。結果
をまとめて表1および表2に示す。
Comparative Example 1 A polyimide film having an elastic modulus of 810 kg / mm 2 ,
The operation was performed in the same manner as in Example 1 except that a polyimide film having a volatile component content of 0.2% and a thickness of 75 μm was used. The results are summarized in Tables 1 and 2.

【0047】比較例2 ポリイミドフィルムとして、参考例3で調製したポリア
ミック酸溶液を用い、ポリアミック酸組成物の流延塗布
量を少なくして自己支持性の固化フィルムの厚みを変え
て得た弾性率380kg/mm2 、揮発性成分含有率
0.5%、厚み75μmのポリイミドフィルムを用い、
接着剤としてシ−ト状のポリイミド系接着剤(固化後の
厚み10μm、ポリイミドシロキサン、フェノ−ルノボ
ラック樹脂およびエポキシ樹脂の組成、硬化後の接着剤
の引張弾性率160kg/mm2 )を用いた他は実施例
1と同様に実施した。結果をまとめて表1および表2に
示す。
Comparative Example 2 Using the polyamic acid solution prepared in Reference Example 3 as a polyimide film, the modulus of elasticity obtained by changing the thickness of the self-supporting solidified film by reducing the amount of the polyamic acid composition applied by casting. Using a polyimide film of 380 kg / mm 2 , a volatile component content of 0.5%, and a thickness of 75 μm,
A sheet-like polyimide-based adhesive (thickness of 10 μm after solidification, composition of polyimide siloxane, phenol-novolak resin and epoxy resin, tensile modulus of elasticity of cured adhesive of 160 kg / mm 2 ) was used as the adhesive. Was carried out in the same manner as in Example 1. The results are summarized in Tables 1 and 2.

【0048】比較例3 ポリイミドフィルムとして、参考例4で調製したポリア
ミック酸溶液を用い、ポリアミック酸組成物の流延塗布
量を少なくして自己支持性の固化フィルムの厚みを変え
て得た弾性率310kg/mm2 、揮発性成分含有率
1.2%、厚み75μmのポリイミドフィルムを用い、
接着剤としてシ−ト状のポリイミド系接着剤(硬化後の
厚み20μm、ポリイミドシロキサン、フェノ−ルノボ
ラック樹脂およびエポキシ樹脂の組成、硬化後の接着剤
の引張弾性率80kg/mm2 )を用いた他は実施例1
と同様に実施した。結果をまとめて表1および表2に示
す。
Comparative Example 3 An elastic modulus obtained by using the polyamic acid solution prepared in Reference Example 4 as a polyimide film and changing the thickness of the self-supporting solidified film by reducing the amount of the polyamic acid composition applied by casting. Using a polyimide film of 310 kg / mm 2 , a volatile component content of 1.2%, and a thickness of 75 μm,
Other than using a sheet-like polyimide adhesive (thickness 20 μm after curing, composition of polyimide siloxane, phenol novolak resin and epoxy resin, tensile modulus of elasticity of the cured adhesive 80 kg / mm 2 ) as the adhesive Is Example 1
Was performed in the same manner as described above. The results are summarized in Tables 1 and 2.

【0049】[0049]

【表1】 [Table 1]

【0050】[0050]

【表2】 [Table 2]

【0051】[0051]

【発明の効果】この発明は以上説明したように構成され
ているので、以下に記載のような効果を奏する。
Since the present invention is configured as described above, the following effects can be obtained.

【0052】この発明の接着剤付きポリイミドフィルム
は製造工程での寸法精度が高く、接着剤の硬化後の反り
が小さい。このため、加工性が良好で他部品を実装する
際の位置合わせが良好である。
The polyimide film with an adhesive of the present invention has high dimensional accuracy in the manufacturing process and small warpage after curing of the adhesive. Therefore, the workability is good, and the positioning when mounting other components is good.

【0053】この接着剤付きポリイミドフィルムを用い
た金属箔との積層体は、接着強度が実用的な範囲で大き
く、種々の製造工程を経て他部品を実装する際の位置合
わせが良好である。
The laminate with the metal foil using the polyimide film with the adhesive has a large adhesive strength within a practical range, and has good alignment when mounting other parts through various manufacturing processes.

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ポリマ−が芳香族テトラカルボン酸成分
と芳香族ジアミン成分とからなり弾性率が400kg/
mm2以上であって厚み5〜125μmのポリイミドフ
ィルム及び、その片面に設けた厚み4〜60μmの接着
剤について、各々接触式測定法によって測定した厚みと
各々の弾性率とを下記の式によって関係付けた、Xが
0.7以上であるとの条件を満足させることを特徴とす
る接着剤付きポリイミドフィルムの製造方法。 X=(T12×E1)/(T22×E2×102) [但し、T1:ポリイミドフィルムの厚み(μm)、E
1:ポリイミドフィルムの弾性率(kg/mm2)、T
2:硬化後の接着剤の厚み(μm)、E2:硬化後の接
着剤の弾性率(kg/mm2)]
1. A polymer comprising an aromatic tetracarboxylic acid component and an aromatic diamine component and having an elastic modulus of 400 kg /
mm 2 or more at a and a polyimide film having a thickness of 5~125μm by, for adhesive thickness 4~60μm provided on one surface thereof, the relationship between each elastic modulus of each and the thickness measured by a contact type measuring method by the following formula A method for producing a polyimide film with an adhesive, characterized by satisfying the condition that X is 0.7 or more. X = (T1 2 × E1) / (T2 2 × E2 × 10 2) [ where, T1: thickness of the polyimide film (μm), E
1: Elastic modulus (kg / mm 2 ) of polyimide film, T
2: thickness of adhesive after curing (μm), E2: elastic modulus of adhesive after curing (kg / mm 2 )]
【請求項2】 接着剤の厚みが4〜20μmである請求
項1記載の接着剤付きポリイミドフィルムの製造方法。
2. The method for producing a polyimide film with an adhesive according to claim 1, wherein the thickness of the adhesive is 4 to 20 μm.
【請求項3】 ポリマ−が芳香族ジアミン成分としてp
−フェニレンジアミン50モル%以上および4,4−ジ
アミノジフェニルエ−テル50モル%以下からなるもの
である請求項1記載の接着剤付きポリイミドフィルムの
製造方法。
3. The polymer according to claim 1, wherein the aromatic diamine component is p.
2. The method for producing a polyimide film with an adhesive according to claim 1, comprising 50% by mole or more of phenylenediamine and 50% by mole or less of 4,4-diaminodiphenyl ether.
【請求項4】 Xが0.7以上4.1以下である請求項
1記載の接着剤付きポリイミドフィルムの製造方法。
4. The method for producing a polyimide film with an adhesive according to claim 1, wherein X is 0.7 or more and 4.1 or less.
【請求項5】 請求項1に記載の製造方法による接着剤
付きポリイミドフィルムの接着剤に、さらに金属箔を積
層することを特徴とする積層体の製造方法。
5. A method for producing a laminate, further comprising laminating a metal foil on the adhesive of the polyimide film with the adhesive according to the production method according to claim 1.
JP28559794A 1994-11-18 1994-11-18 Polyimide film with adhesive and laminate Expired - Lifetime JP3178279B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28559794A JP3178279B2 (en) 1994-11-18 1994-11-18 Polyimide film with adhesive and laminate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28559794A JP3178279B2 (en) 1994-11-18 1994-11-18 Polyimide film with adhesive and laminate

Publications (2)

Publication Number Publication Date
JPH08143827A JPH08143827A (en) 1996-06-04
JP3178279B2 true JP3178279B2 (en) 2001-06-18

Family

ID=17693609

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3178279B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100572646B1 (en) * 1998-07-17 2006-04-24 제이에스알 가부시끼가이샤 A Polyimide-type Composite and Electronic Elements Using the Same, and Aqueous Polyimide-type Dispersions
JP2001270035A (en) * 2000-03-28 2001-10-02 Ube Ind Ltd Flexible metal foil laminate
JPWO2005061227A1 (en) * 2003-12-24 2007-12-13 帝人株式会社 Laminate
JP5546571B2 (en) * 2012-03-29 2014-07-09 Jx日鉱日石金属株式会社 Copper foil, copper-clad laminate, flexible wiring board and three-dimensional molded body
KR20220156808A (en) * 2020-03-23 2022-11-28 도요보 가부시키가이샤 laminate

Also Published As

Publication number Publication date
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