JP3049882B2 - Electroplated whetstone and method of manufacturing the same - Google Patents

Electroplated whetstone and method of manufacturing the same

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Publication number
JP3049882B2
JP3049882B2 JP3297490A JP29749091A JP3049882B2 JP 3049882 B2 JP3049882 B2 JP 3049882B2 JP 3297490 A JP3297490 A JP 3297490A JP 29749091 A JP29749091 A JP 29749091A JP 3049882 B2 JP3049882 B2 JP 3049882B2
Authority
JP
Japan
Prior art keywords
superabrasive grains
metal plating
superabrasive
plating phase
grains
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3297490A
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Japanese (ja)
Other versions
JPH05138537A (en
Inventor
直樹 下前
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
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Priority to JP3297490A priority Critical patent/JP3049882B2/en
Publication of JPH05138537A publication Critical patent/JPH05138537A/en
Application granted granted Critical
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、台金に超砥粒を金属め
っき相で固定した電着砥石およびその製造方法に係わ
り、特に、金属めっき相の表面にチップポケットを形成
し、切粉排出性を高めるための改良に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrodeposition whetstone in which superabrasive grains are fixed to a base metal with a metal plating phase and a method of manufacturing the same. It relates to the improvement for improving the discharge performance.

【0002】[0002]

【従来の技術】図4は、従来の電着砥石の一例を示す砥
粒層の断面拡大図である。図中符号1は各種形状の台金
であり、この台金1の砥粒層形成面1Aには、金属めっ
き相3を介して単層状に多数の超砥粒2が固着されてい
る。
2. Description of the Related Art FIG. 4 is an enlarged cross-sectional view of an abrasive layer showing an example of a conventional electrodeposition grindstone. In the figure, reference numeral 1 denotes a base metal having various shapes, and a large number of superabrasive grains 2 are fixed in a single layer via a metal plating phase 3 to an abrasive grain layer forming surface 1A of the base metal 1.

【0003】金属めっき相3を形成するには、電解めっ
き法または無電解めっき法が使用される。電解めっき法
による場合には、砥粒層形成面1Aを除いてマスキング
を施した台金1を電解めっき液内に浸漬し、砥粒層形成
面1Aの少なくとも一部を上向きかつ水平に配置する。
そして、この水平面に超砥粒2を撒き、台金1を電源陰
極に接続するとともに、前記水平面と対向配置された陽
極との間で通電し、金属めっき相3を析出させて超砥粒
2を固定する。
[0003] To form the metal plating phase 3, an electrolytic plating method or an electroless plating method is used. In the case of using the electrolytic plating method, the base metal 1 subjected to masking except for the abrasive grain layer forming surface 1A is immersed in an electrolytic plating solution, and at least a part of the abrasive grain layer forming surface 1A is arranged upward and horizontally. .
Then, the superabrasive grains 2 are scattered on the horizontal surface, the base metal 1 is connected to the power supply cathode, and a current is applied between the horizontal surface and the anode disposed opposite to the horizontal surface, so that the metal plating phase 3 is deposited and the superabrasive particles 2 are deposited. Is fixed.

【0004】この操作を、台金1を動かしながら砥粒層
形成面1Aの全周に亙って繰り返し、単層状の砥粒層を
均一に形成する。無電解めっきを使用する場合にも、め
っき液として無電解めっき液を使用し、陽極は使用しな
い点を除き、上記同様の操作を行なう。
[0004] This operation is repeated over the entire circumference of the abrasive grain layer forming surface 1A while moving the base metal 1 to uniformly form a single-layer abrasive grain layer. When using electroless plating, the same operation as described above is performed except that an electroless plating solution is used as a plating solution and an anode is not used.

【0005】なお、いずれの場合にも、金属めっき相3
の肉厚は通常、超砥粒2の平均粒径の30〜75%程度
に設定される。この肉厚が30%未満では十分な砥粒保
持力が得られず、超砥粒2が研削中に無駄に脱落して超
砥粒の使用効率が低下する。また75%より大では、金
属めっき相3からの超砥粒2の突出量が小さすぎ、被削
材への超砥粒2の食い込み量が不足して切れ味が著しく
低下するという問題が生じる。
[0005] In each case, the metal plating phase 3
Is usually set to about 30 to 75% of the average particle diameter of the superabrasive grains 2. If the wall thickness is less than 30%, sufficient abrasive grain holding power cannot be obtained, and the superabrasive grains 2 will fall off unnecessarily during grinding, thereby lowering the use efficiency of the superabrasive grains. If it is larger than 75%, the amount of protrusion of the superabrasive grains 2 from the metal plating phase 3 is too small, and there is a problem that the amount of the superabrasive grains 2 biting into a work material is insufficient and sharpness is significantly reduced.

【0006】[0006]

【発明が解決しようとする課題】しかし、上記のような
電着砥石では、金属めっき相3の表面3Aが緻密かつ平
坦であるため、研削中に生じた切粉を、砥石の運動につ
れて研削部分から排出する効果(切粉排出性)が小さ
い。特に、超砥粒2が摩耗して金属めっき相3からの突
出量が小さくなると、超砥粒2が目詰まりして切れ味が
極端に低下して、研削抵抗が急激に増大し、その分、砥
石の使用寿命も短いという欠点があった。
However, in the electrodeposited grinding wheel as described above, since the surface 3A of the metal plating phase 3 is dense and flat, the chips generated during grinding are removed by the grinding portion as the grinding wheel moves. The effect of discharging from the swarf (chip dischargeability) is small. In particular, when the superabrasive grains 2 are worn and the protrusion amount from the metal plating phase 3 is reduced, the superabrasive grains 2 are clogged and sharpness is extremely reduced, and the grinding resistance is sharply increased. There was a drawback that the service life of the whetstone was short.

【0007】[0007]

【課題を解決するための手段】本発明は上記課題を解決
するためになされたもので、まず本発明に係わる電着砥
石は、台金の砥粒層形成面に超砥粒を金属めっき相を介
して単層状に固着させ、前記金属めっき相は、前記砥粒
層形成面と直交する方向から見た個々の超砥粒の周縁部
山形状に盛り上がって超砥粒の平均粒径の50〜90
%の平均肉厚を有して超砥粒を包み込み、かつ隣接しあ
う超砥粒の中間部分は凹部とされて、この凹部における
平均肉厚は、前記周縁部での平均肉厚よりも前記平均粒
径の30%以上小さいことを特徴としている。
Means for Solving the Problems The present invention has been made to solve the above problems. First, an electrodeposition grindstone according to the present invention comprises super-abrasive grains on a surface of a base metal on which an abrasive layer is formed. The metal plating phase is raised in a mountain shape at the periphery of each superabrasive grain viewed from a direction orthogonal to the abrasive grain layer forming surface, and the metal plating phase has an average grain size of the superabrasive grains. 50-90
% Of the super-abrasive grains wrapping the super-abrasive grains with an average thickness of about 0.1 %, and the middle part of the adjacent super-abrasive grains is formed as a concave portion. It is characterized by being at least 30% smaller than the average particle size than the thickness.

【0008】また、本発明の製造方法は、台金の砥粒層
形成面に多数の超砥粒を分散させるとともに、この砥粒
層形成面に、電解めっき法または無電解めっき法により
超砥粒の平均粒径の0.3〜20%の肉厚を有する下地
金属めっき相を形成して超砥粒を単層状に固着させ、さ
らにこの下地金属めっき相の表面および超砥粒の露出面
に表面触媒化処理を施した後、無電解めっき法を用いて
下地金属めっき相および超砥粒の表面に上地金属めっき
相を形成することを特徴としている。
Further, according to the manufacturing method of the present invention, a large number of superabrasive grains are dispersed on the surface of the base metal on which the abrasive layer is formed, and the superabrasive is formed on the surface of the abrasive layer by electroplating or electroless plating. Forming a base metal plating phase having a thickness of 0.3 to 20% of the average grain size of the grains to fix the superabrasive grains in a single layer, and furthermore, a surface of the base metal plating phase and an exposed surface of the superabrasive grains After subjecting the surface to a surface catalyzing treatment, a base metal plating phase and an upper metal plating phase are formed on the surface of the superabrasive grains using an electroless plating method.

【0009】[0009]

【作用】この電着砥石およびその製造方法によれば、
砥粒の周縁部で金属めっき相が山形状に盛り上がるのに
対し、これ以外の隣接する超砥粒の間の部分、すなわち
上記周縁部のさらに周りの部分は全体的に凹部される
ため、この部分がチップポケットとなって砥石の運動と
ともに切粉を研削部から排出し、高い切粉排出性が得ら
れる。したがって砥粒層が目詰まりしにくく、砥石の稼
動率および砥石寿命を延長することが可能である。
SUMMARY OF According to the electrodeposited grindstone and a manufacturing method thereof, Ultra
The metal plating phase rises in a mountain shape at the periphery of the abrasive grains
On the other hand, the portion between other adjacent superabrasives , that is,
Because it is a further portion generally concave around the periphery, this portion is discharged chips from the grinding unit with movement of the grindstone becomes a chip pocket, high cuttings discharge is obtained. Therefore, the abrasive layer is less likely to be clogged, and the operation rate of the grinding wheel and the life of the grinding wheel can be extended.

【0010】また、砥粒層形成面と直交する方向から見
た個々の超砥粒の周縁部において金属めっき相が盛り
上がり、超砥粒を山形状に包み込んでいるため、金属め
っき相の実質的な肉厚が小さくても砥粒保持力が大き
く、研削中の砥粒破砕および砥粒脱落が少ない。さら
に、超砥粒の研削に直接関与する刃先以外の部分は全て
上地金属めっき相に包まれているので、刃先で発生した
熱は、上地金属めっき相を通じて速やかに台金に逃さ
れ、乾式研削等に使用した場合にも超砥粒の過熱が防止
でき、冷却性が良好である。
Further, the metal plating phase raised in individual superabrasive periphery as viewed from a direction perpendicular to the abrasive layer formation surface, because it wraps superabrasive the mountain shape, substantially of metal plating phase Even if the initial wall thickness is small, the holding power of the abrasive grains is large, and the crushing and falling off of the abrasive grains during grinding are small. Furthermore, since all parts other than the cutting edge directly involved in the grinding of the superabrasive grains are wrapped in the upper metal plating phase, the heat generated at the cutting edge is quickly released to the base metal through the upper metal plating phase, Even when used for dry grinding and the like, overheating of superabrasive grains can be prevented, and cooling properties are good.

【0011】[0011]

【実施例】図1ないし図3は、本発明に係わる電着砥石
の製造方法を示し、図中符号1は台金、2は超砥粒であ
る。
1 to 3 show a method of manufacturing an electrodeposition grindstone according to the present invention, wherein reference numeral 1 denotes a base metal, and 2 denotes superabrasive grains.

【0012】この方法ではまず、図1に示すように、砥
粒層形成面1Aを除く部分にマスキングを施した台金1
をめっき槽内にセットし、砥粒層形成面1Aに多数の超
砥粒2を分散させる。そして、この面1Aに、前述した
従来法と同様に、電解めっき法または無電解めっき法に
より下地金属めっき相10を析出させて、超砥粒2を単
層状に仮固定する。
In this method, first, as shown in FIG. 1, a base metal 1 having a masked portion except for an abrasive grain layer forming surface 1A.
Is set in a plating bath, and a large number of superabrasive grains 2 are dispersed on the abrasive grain layer forming surface 1A. Then, the base metal plating phase 10 is deposited on the surface 1A by electrolytic plating or electroless plating in the same manner as in the above-described conventional method, and the superabrasive grains 2 are temporarily fixed in a single layer.

【0013】下地金属めっき相10の材質としては、N
i,Co,Cu,Znなどが使用可能で、その肉厚D1は超砥
粒2の平均粒径の0.3〜20%、より好ましくは5〜
10%とされる。本発明者らの実験によれば、肉厚D1
が0.3%より薄いと超砥粒2を仮固定することができ
ない。また、20%より厚いと後述するチップポケット
の形成が不十分になり、目詰まり防止効果が低下する。
The material of the base metal plating phase 10 is N
i, Co, Cu, Zn, etc. can be used, and the thickness D1 is 0.3 to 20% of the average grain size of the superabrasive grains 2, more preferably 5 to 5%.
10%. According to the experiments of the present inventors, the thickness D1
Is thinner than 0.3%, the superabrasive grains 2 cannot be temporarily fixed. On the other hand, if the thickness is more than 20%, the formation of a chip pocket described later becomes insufficient, and the effect of preventing clogging is reduced.

【0014】なお、隣接しあう超砥粒2同士の平均間隔
Wは、超砥粒2を台金1上に撒いて電着する方法を採っ
た場合、超砥粒2の平均粒径の0.7〜1.5倍程度の
範囲に収まる。
The average distance W between adjacent superabrasive grains 2 is set at 0 which is the average particle diameter of superabrasive grains 2 when the method of spraying superabrasive grains 2 on base metal 1 and performing electrodeposition is employed. 0.7 to 1.5 times.

【0015】次に、下地金属めっき相10の表面10A
および超砥粒2の露出面に、次工程の無電解めっきによ
り金属の析出を促進するための表面触媒化処理を施す。
これは、Au,Pt,Pd,Ag 等の貴金属触媒核を付与する
ための処理で、例えばPdCl2等のような前記貴金属の塩
溶液に、マスキングを施したままの台金1を浸漬し、水
洗する。その際の処理溶液の濃度、温度、処理時間など
の条件は、従来無電解めっきを行なっていた場合と同様
でよい。
Next, the surface 10A of the base metal plating phase 10
In addition, the exposed surface of superabrasive 2 is subjected to a surface catalyzing treatment for promoting metal deposition by electroless plating in the next step.
This is a treatment for providing a noble metal catalyst core such as Au, Pt, Pd, and Ag. The base metal 1 with the masking applied is immersed in a salt solution of the noble metal such as PdCl 2 , for example. Wash with water. At this time, the conditions such as the concentration of the processing solution, the temperature, and the processing time may be the same as those in the case where the electroless plating is conventionally performed.

【0016】次いで、この台金1をNi,Cu 等の無電解
めっき液に浸漬し、表面触媒化処理を施した下地金属め
っき相10および超砥粒2の表面に、上地金属めっき相
11を析出させる。すると、この上地金属めっき相11
は、各超砥粒2と下地金属めっき相10との間の凹面と
なる部分で相対的に成長速度が大きいため、図2に示す
ように、超砥粒2の周縁部において裾野がなだらかな山
形状に盛り上がって超砥粒2を包み込み、これに対して
各超砥粒2の中間の部分、すなわち上記周縁部のさらに
周りの部分には凹部11Aが形成される。
Next, the base metal 1 is immersed in an electroless plating solution such as Ni, Cu or the like, and the base metal plating phase 10 and the surface Is precipitated. Then, the upper metal plating phase 11
Since the growth rate is relatively high in the concave portion between each superabrasive grain 2 and the underlying metal plating phase 10, the bottom of the superabrasive grain 2 has a gentle skirt at the peripheral edge as shown in FIG. swells the mountain shape enveloping superabrasive 2, an intermediate portion of <br/> each superabrasive 2 contrast, i.e. more of the periphery
A concave portion 11A is formed in a surrounding portion .

【0017】個々の超砥粒2の周縁部において、上地金
属めっき相11と下地金属めっき相10を合わせた平均
肉厚D3は、超砥粒2の平均粒径の50〜90%、望ま
しくは60〜80%とされる。50%未満では十分な砥
粒保持力が得られず、90%より大では使用時に十分な
チップポケットの深さが確保できない。
In the peripheral portion of each superabrasive grain 2, the average thickness D3 of the upper metal plating phase 11 and the base metal plating phase 10 together is preferably 50 to 90% of the average grain size of the superabrasive grains 2. Is 60-80%. If it is less than 50%, sufficient abrasive holding power cannot be obtained, and if it is more than 90%, a sufficient depth of the tip pocket cannot be secured during use.

【0018】また、超砥粒2の中間部分(凹部11A)
において、上地金属めっき相11と下地金属めっき相1
0とを合わせた肉厚D2は、好ましくは平均粒径の10
%以上になる範囲において、前記周縁部での平均肉厚D
3よりも平均粒径の30以上小さく設定されている。周
縁部での平均肉厚D3より30%以上小さくないと十分
なチップポケット形成効果が得られない。また、肉厚D
2が平均粒径の10%未満になると、砥粒保持力が小さ
く、使用に堪えないおそれを有する。
Further, an intermediate portion of the superabrasive grains 2 (recess 11A)
, The upper metal plating phase 11 and the lower metal plating phase 1
0 and the thickness D2 is preferably 10% of the average particle size.
%, The average thickness D at the peripheral portion
The average particle size is set to be smaller than the average particle size by 30 or more. Unless it is smaller than the average thickness D3 at the peripheral portion by 30% or more, a sufficient chip pocket forming effect cannot be obtained. Also, the thickness D
If 2 is less than 10% of the average particle size, the abrasive grain holding power is small, and there is a possibility that it cannot be used.

【0019】無電解めっきが終了したら、台金1をめっ
き槽から取り出して水洗し、マスキングを除去した後、
必要に応じて一般砥石等によるドレッシングを施し、図
3に示すように超砥粒2の頂点部分2Aの上地金属めっ
き相11を除去して使用に供する。
After the electroless plating is completed, the base metal 1 is taken out of the plating tank and washed with water to remove the masking.
If necessary, dressing with a general grindstone or the like is performed, and as shown in FIG. 3, the top metal plating phase 11 of the top portion 2A of the superabrasive grain 2 is removed before use.

【0020】上記の製造方法で得られる電着砥石によれ
ば、超砥粒2の周縁部で上地金属めっき相11が盛り上
がるのに対して、この周縁部を除いた上地金属めっき相
11の表面は相対的に凹み、隣接する超砥粒2の中間に
凹部11Aが形成されるから、これら凹部11Aがチッ
プポケットとして作用し、研削によって生じた切粉を砥
石の運動とともに排出し、切粉排出性を高めて砥粒層の
目詰まりが生じにくい。したがって、ドレッシングの回
数が少なくて済み、砥石寿命を延長することができる。
According to the electrodeposited whetstone obtained by the above-described manufacturing method , the upper metal plating phase 11 rises at the peripheral portion of the superabrasive grains 2.
On the other hand, the upper metal plating phase excluding this peripheral part
Since the surface of 11 is relatively concave and a concave portion 11A is formed in the middle of adjacent superabrasive grains 2, these concave portions 11A act as chip pockets and discharge chips generated by grinding together with the movement of the grindstone, The chip discharge property is enhanced, and clogging of the abrasive layer is less likely to occur. Therefore, the number of times of dressing can be reduced, and the life of the grinding wheel can be extended.

【0021】また、砥粒層形成面と直交する方向から見
た個々の超砥粒2の周縁部において上地金属めっき相1
1が盛り上がり、超砥粒2を包み込んでいるため、全体
としての金属めっき相(10+11)の肉厚が小さくて
も砥粒保持力が大きく、砥粒脱落が少ない。また、研削
時には超砥粒2の刃先2Aのみが露出し、それ以外の部
分は全て上地金属めっき相11に包まれているので、刃
先2Aで発生した熱は速やかに上地金属めっき相11を
通じて台金1に逃され、熱の放散性が良好である。した
がって、例えば乾式研削に使用した場合にも超砥粒2の
過熱が防止でき、より厳しい研削条件を採用することが
可能である。
Further, the upper metal plating phase 1 is formed at the peripheral portion of each superabrasive grain 2 as viewed from a direction orthogonal to the abrasive grain layer forming surface.
Since 1 rises and encloses superabrasive grains 2, even if the thickness of the metal plating phase (10 + 11) as a whole is small, the abrasive grain holding power is large and the abrasive grains are less likely to fall off. Also, during grinding, only the cutting edge 2A of the superabrasive grains 2 is exposed, and all other parts are wrapped in the upper metal plating phase 11, so that the heat generated at the cutting edge 2A is immediately consumed by the upper metal plating phase 11. Through the base 1 to dissipate heat. Therefore, for example, even when used for dry grinding, overheating of the superabrasive grains 2 can be prevented, and more severe grinding conditions can be adopted.

【0022】さらに、超砥粒2の表面にも表面触媒化処
理を施した後、無電解めっきを行なうので、上地金属め
っき相11と超砥粒2との単位面積当たりの接合強度が
電解めっき法で超砥粒を直接固定した場合よりも高く、
この点からも砥粒保持力の向上が図れる。
Furthermore, since the surface of the superabrasive grains 2 is also subjected to a surface catalyzing treatment, and then subjected to electroless plating, the bonding strength per unit area between the upper metal plating phase 11 and the superabrasive grains 2 is reduced. Higher than when super-abrasive grains are directly fixed by plating method,
Also from this point, the abrasive grain holding power can be improved.

【0023】なお、本発明に使用する台金は、ホイール
型、カップ型、ブロック型、総型砥石用など、いかなる
形状のものでもよいし、超砥粒の平均砥粒等も限定され
ない。
The base metal used in the present invention may be of any shape, such as a wheel type, a cup type, a block type, and a full-type whetstone, and the average abrasive of superabrasives is not limited.

【0024】[0024]

【実験例】次に、実験例を挙げて本発明の効果を実証す
る。直径150mm、外周面幅6mmのホイール型台金
の外周面に、前述のように各種粒径のダイヤモンド砥粒
を電解めっき法を用いて下地金属めっき相で固着した。
[Experimental Example] Next, the effect of the present invention will be demonstrated with an experimental example. As described above, diamond abrasive grains of various particle diameters were fixed to the outer peripheral surface of a wheel-type base metal having a diameter of 150 mm and an outer peripheral surface width of 6 mm by a base metal plating phase using an electrolytic plating method.

【0025】次に、この台金を濃度200mg/l、温
度30℃の塩化パラジウム水溶液に浸漬し、その表面に
触媒化処理を施した。これを水洗した後、台金をNi無
電解めっき液に浸漬し、上地金属めっき相を形成した。
Next, this base metal was immersed in an aqueous solution of palladium chloride having a concentration of 200 mg / l and a temperature of 30 ° C., and the surface thereof was subjected to a catalytic treatment. After washing with water, the base metal was immersed in a Ni electroless plating solution to form an upper metal plating phase.

【0026】一方、比較例として、前記と全く同じ台金
に電解めっき法により各実施例と同じダイヤモンド砥粒
を固着してそれぞれ電着砥石を製造したもの(比較例
1,2−1,3−1,4−1)、および各実施例と製造
方法が同じであるがD2とD3の差が20%であるもの
(比較例2−2,3−2,4−2)を作成した。
On the other hand, as comparative examples, electrodeposited whetstones were manufactured by fixing the same diamond abrasive grains as in each example on the same base metal as above by electrolytic plating (Comparative Examples 1, 2-1, 3). -1, 4-1), and those having the same manufacturing method as in each example, but having a difference of 20% between D2 and D3 (Comparative Examples 2-2, 3-2, 4-2).

【0027】次いで、上記各砥石を平面研削盤にセット
し、FRP試験片の乾式研削試験を行なった。試験片と
しては長さ100mm×幅30mmのグラスファイバ複
合エポキシ樹脂を用い、切り込み量は超砥粒の平均粒径
に応じて変更した。送り速度は全て20m/分に統一し
た。
Next, each of the above grindstones was set on a surface grinder, and a dry grinding test was performed on the FRP test piece. A glass fiber composite epoxy resin having a length of 100 mm and a width of 30 mm was used as a test piece, and the cut amount was changed according to the average particle size of the superabrasive grains. The feed speed was all set to 20 m / min.

【0028】そして、研削抵抗が増して平面研削盤の主
軸駆動に要する電流量が10Aに達するまで上記研削を
繰り返し、本発明品および比較例の砥石による研削全長
の比を求めた。
Then, the above-mentioned grinding was repeated until the amount of current required for driving the spindle of the surface grinder reached 10 A due to an increase in grinding resistance, and the ratio of the total length of grinding by the grindstone of the present invention and the comparative example was determined.

【0029】各砥石の肉厚D1,D2,D3および研削
結果を表1に示す。D1〜D3は使用した超砥粒の平均
粒径に対する百分率で示した。また、「研削長比」とあ
るのは、各実施例による研削長と、その実施例に対応す
る各比較例による研削長との比を示している。
Table 1 shows the thicknesses D1, D2, D3 of each grinding wheel and the grinding results. D1 to D3 are shown as percentages with respect to the average particle size of the superabrasive particles used. The term “grinding length ratio” indicates the ratio between the grinding length according to each embodiment and the grinding length according to each comparative example corresponding to the embodiment.

【0030】[0030]

【表1】 [Table 1]

【0031】表1から明らかなように、本発明品では良
好な目詰まり防止効果が得られ、比較例に比して格段に
長い寿命を有していた。また、本発明の目詰まり防止効
果は特に超砥粒の粒径が大きい場合に顕著であり、それ
に対して比較例はいずれも目詰まりが激しかった。
As is clear from Table 1, the product of the present invention exhibited a good effect of preventing clogging, and had a much longer life than the comparative example. In addition, the effect of preventing clogging of the present invention is particularly remarkable when the particle size of the superabrasive grains is large, whereas all the comparative examples have severe clogging.

【0032】[0032]

【発明の効果】以上説明したように、本発明に係わる電
着砥石およびその製造方法によれば、超砥粒の周縁部を
除いた金属めっき相の表面凹部されるため、この部
分がチップポケットとなって砥石の運動とともに切粉を
研削部から排出し、高い切粉排出性が得られる。したが
って砥粒層が目詰まりしにくく、ドレッシング頻度を低
減して、砥石の稼動率および砥石寿命を延長することが
可能である。
As described above, according to the electrodeposition grindstone and the method for manufacturing the same according to the present invention, the peripheral portion of the superabrasive grain is formed.
Since the surface of excluding metal plating phase is a recess, this portion is discharged chips from the grinding unit with movement of the grindstone becomes a chip pocket, high cuttings discharge is obtained. Therefore, the abrasive layer is less likely to be clogged, the frequency of dressing can be reduced, and the operating rate of the grinding wheel and the life of the grinding wheel can be extended.

【0033】また、その一方で、砥粒層形成面と直交す
る方向から見た個々の超砥粒の周縁部において金属め
っき相が盛り上がり、山形状に超砥粒を包み込んでいる
ため、金属めっき相の実質的な肉厚が小さくても砥粒保
持力が大きく、研削中の砥粒脱落が少ない。さらに、超
砥粒の研削に直接関与する刃先以外の部分は全て上地金
属めっき相に包まれているので、刃先で発生した熱は、
上地金属めっき相を通じて速やかに台金に逃され、乾式
研削等に使用した場合にも超砥粒の過熱が生じにくいと
いう利点を有する。
On the other hand, at the periphery of each superabrasive grain as viewed from a direction perpendicular to the abrasive grain layer forming surface, the metal plating phase swells and envelops the superabrasive grains in a mountain shape. Even if the substantial thickness of the plating phase is small, the holding power of the abrasive grains is large, and the abrasive grains fall off during grinding. Furthermore, since all parts other than the cutting edge directly involved in the grinding of superabrasive grains are wrapped in the upper metal plating phase, the heat generated at the cutting edge is
This has the advantage that the superabrasive grains are less likely to be overheated even when used for dry grinding or the like, being quickly escaped to the base metal through the upper metal plating phase.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係わる電着砥石の製造方法を示す砥粒
層の断面拡大図である。
FIG. 1 is an enlarged cross-sectional view of an abrasive grain layer showing a method for producing an electrodeposition grindstone according to the present invention.

【図2】本発明に係わる電着砥石の製造方法を示す砥粒
層の断面拡大図である。
FIG. 2 is an enlarged cross-sectional view of an abrasive grain layer showing a method for manufacturing an electrodeposited whetstone according to the present invention.

【図3】本発明に係わる電着砥石の製造方法を示す砥粒
層の断面拡大図である。
FIG. 3 is an enlarged cross-sectional view of an abrasive grain layer, illustrating a method for manufacturing an electrodeposited whetstone according to the present invention.

【図4】従来の電着砥石の砥粒層の断面拡大図である。FIG. 4 is an enlarged cross-sectional view of an abrasive layer of a conventional electrodeposition grindstone.

【符号の説明】[Explanation of symbols]

1 台金 1A 砥粒層形成面 2 超砥粒 10 下地金属めっき相 11 上地金属めっき相 D1 下地金属めっき相の肉厚 D2 超砥粒同士の中間部での金属めっき相全体の肉厚 D3 超砥粒の周縁部での金属めっき相全体の肉厚 Reference Signs List 1 base metal 1A abrasive grain layer forming surface 2 superabrasive grains 10 base metal plating phase 11 top metal plating phase D1 thickness of base metal plating phase D2 thickness of entire metal plating phase in intermediate portion between superabrasive grains D3 Wall thickness of the entire metal plating phase at the periphery of the superabrasive

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) B24D 3/06 B24D 3/00 310 B24D 3/00 320 B24D 3/00 340 ──────────────────────────────────────────────────続 き Continued on the front page (58) Fields surveyed (Int. Cl. 7 , DB name) B24D 3/06 B24D 3/00 310 B24D 3/00 320 B24D 3/00 340

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 台金の砥粒層形成面に超砥粒を金属めっ
き相を介して単層状に固着させた電着砥石であって、前
記金属めっき相は、前記砥粒層形成面と直交する方向か
ら見た個々の超砥粒の周縁部で山形状に盛り上がって
砥粒の平均粒径の50〜90%の平均肉厚を有して超砥
粒を包み込み、かつ隣接しあう超砥粒の中間部分は凹部
とされて、この凹部における平均肉厚は、前記周縁部で
の平均肉厚より前記平均粒径の30%以上小さいことを
特徴とする電着砥石。
1. An electrodeposited whetstone comprising superabrasive grains fixed in a single layer via a metal plating phase to an abrasive grain layer forming surface of a base metal, wherein said metal plating phase is The superabrasives have an average wall thickness of 50 to 90% of the average particle diameter of the superabrasive grains by rising in a mountain shape at the peripheral portion of each superabrasive grain viewed from a direction orthogonal to the superabrasive grains.
The middle part of the superabrasive grains that wrap the grains and are adjacent to each other is concave
The electrodeposited whetstone is characterized in that the average thickness in the concave portion is smaller than the average thickness in the peripheral portion by 30% or more of the average particle size.
【請求項2】 台金の砥粒層形成面に多数の超砥粒を分
散させるとともに、この砥粒層形成面に、電解めっき法
または無電解めっき法により超砥粒の平均粒径の0.3
〜20%の肉厚を有する下地金属めっき相を形成して超
砥粒を単層状に固着させ、さらにこの下地金属めっき相
の表面および超砥粒の露出面に表面触媒化処理を施した
後、無電解めっき法を用いて下地金属めっき相および超
砥粒の表面に上地金属めっき相を形成することを特徴と
する電着砥石の製造方法。
2. A method for dispersing a large number of superabrasive grains on a surface of a base metal on which an abrasive grain layer is formed, and forming an average grain size of the superabrasive grains on the abrasive grain layer formed surface by electroplating or electroless plating. .3
After forming a base metal plating phase having a thickness of about 20%, the superabrasive grains are fixed in a single layer, and the surface of the base metal plating phase and the exposed surface of the superabrasive grains are subjected to a surface catalyzing treatment. A method for producing an electrodeposited grinding wheel, comprising forming an upper metal plating phase on the surface of a base metal plating phase and superabrasive grains using an electroless plating method.
JP3297490A 1991-11-13 1991-11-13 Electroplated whetstone and method of manufacturing the same Expired - Fee Related JP3049882B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3297490A JP3049882B2 (en) 1991-11-13 1991-11-13 Electroplated whetstone and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3297490A JP3049882B2 (en) 1991-11-13 1991-11-13 Electroplated whetstone and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH05138537A JPH05138537A (en) 1993-06-01
JP3049882B2 true JP3049882B2 (en) 2000-06-05

Family

ID=17847183

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3049882B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4508514B2 (en) * 2001-03-02 2010-07-21 旭ダイヤモンド工業株式会社 CMP conditioner and method of manufacturing the same
US7025054B2 (en) 2002-03-01 2006-04-11 Neomax Co., Ltd. Method of cutting rare-earth alloy
ATE428527T1 (en) * 2005-12-27 2009-05-15 Japan Fine Steel Co Ltd SOLID GRINDING WIRE
KR100806371B1 (en) * 2006-05-22 2008-02-27 재팬 파인 스틸 컴퍼니 리미티드 Fixed abrasive-grain wire
JP2008155362A (en) * 2006-12-01 2008-07-10 Shinshu Univ Electrodeposited diamond tool and manufacturing method for the same
TWI825565B (en) * 2022-01-24 2023-12-11 鑽面奈米科技股份有限公司 Polishing conditioner

Also Published As

Publication number Publication date
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