JP3048450B2 - Manufacturing method of flexible double-sided circuit wiring board - Google Patents

Manufacturing method of flexible double-sided circuit wiring board

Info

Publication number
JP3048450B2
JP3048450B2 JP3299921A JP29992191A JP3048450B2 JP 3048450 B2 JP3048450 B2 JP 3048450B2 JP 3299921 A JP3299921 A JP 3299921A JP 29992191 A JP29992191 A JP 29992191A JP 3048450 B2 JP3048450 B2 JP 3048450B2
Authority
JP
Japan
Prior art keywords
circuit wiring
hole
wiring pattern
wiring board
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3299921A
Other languages
Japanese (ja)
Other versions
JPH05110252A (en
Inventor
雅一 稲葉
篤 宮川
健 岩山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mektron KK
Original Assignee
Nippon Mektron KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mektron KK filed Critical Nippon Mektron KK
Priority to JP3299921A priority Critical patent/JP3048450B2/en
Publication of JPH05110252A publication Critical patent/JPH05110252A/en
Application granted granted Critical
Publication of JP3048450B2 publication Critical patent/JP3048450B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0393Flexible materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/281Applying non-metallic protective coatings by means of a preformed insulating foil
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4038Through-connections; Vertical interconnect access [VIA] connections

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、可撓性回路配線基板に
於いて、可撓性絶縁べ−ス材の両面に微細な回路配線パ
タ−ンを有すると共に、それら表裏の回路配線パタ−ン
に於ける所要部位を微細なブラインドスル−ホ−ル導通
部で相互に電気的に接合可能な可撓性両面回路配線基板
製造法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flexible circuit wiring board having fine circuit wiring patterns on both sides of a flexible insulating base material. Flexible double-sided circuit wiring board that can electrically connect required parts in the screen with fine blind through-hole conductive parts
A method for producing the same.

【0002】[0002]

【従来技術とその問題点】スル−ホ−ル導通部を有する
従来の可撓性両面回路配線基板は図4の構造を有する。
同図に於いて、ポリイミドフィルム等の可撓性絶縁べ−
ス材31の両面には銅箔等に対するフォトエッチング手
段で所要の回路配線パタ−ン32、33が形成され、そ
れら両面の回路配線パタ−ン32、33に於ける所要部
位に対しては可撓性絶縁べ−ス材31を含めてドリリン
グ等の手段で貫通形成したスル−ホ−ル用透孔34を設
け、この透孔34の内壁及び両回路配線パタ−ン32、
33の上面には無電解メッキを含むメッキ手段でスル−
ホ−ル導電層35を形成することにより、両回路配線パ
タ−ン32、33の所要部位に対する相互導通構造を形
成している。
2. Description of the Related Art A conventional flexible double-sided circuit board having a through-hole conducting portion has the structure shown in FIG.
In the figure, a flexible insulating base such as a polyimide film is used.
Required circuit wiring patterns 32, 33 are formed on both surfaces of the material 31 by photo-etching means for copper foil or the like, and required portions of the circuit wiring patterns 32, 33 on both surfaces are acceptable. A through hole 34 for through hole formed through means such as drilling including the flexible insulating base material 31 is provided, and an inner wall of the through hole 34 and both circuit wiring patterns 32,
The upper surface of the substrate 33 is plated with plating means including electroless plating.
By forming the hole conductive layer 35, a mutual conduction structure with respect to required portions of both circuit wiring patterns 32 and 33 is formed.

【0003】また、上記両回路配線パタ−ン32、33
の表面には上記スル−ホ−ル導通部等の必要な部分を除
いて接着剤36により表面保護フィルム37を被着形成
して表面保護層を形成することができる。このような表
面保護層はその使用条件等に応じて絶縁性樹脂や絶縁性
塗料等を用いた印刷手段など他の通常の被覆手段でも形
成することが可能である。
In addition, the circuit wiring patterns 32 and 33 are used.
A surface protective film 37 can be formed by applying an adhesive 36 on the surface except for the necessary portions such as the through-hole conducting portions and the like to form a surface protective layer. Such a surface protective layer can be formed by other ordinary coating means such as a printing means using an insulating resin or an insulating paint depending on the use conditions and the like.

【0004】上記の如き従来構造の可撓性両面回路配線
基板によれば、表裏の回路配線パタ−ン32、33を導
通させる為のスル−ホ−ル導電層35で形成される導通
部はそれら回路配線パタ−ンに於けるスル−ホ−ル用透
孔34より大きなランド部に形成される。従って、この
ようなスル−ホ−ル導通部の周辺部には密集度の高い回
路配線パタ−ンを形成することは困難となる。
According to the flexible double-sided circuit wiring board having the conventional structure as described above, the conductive portion formed by the through-hole conductive layer 35 for making the circuit wiring patterns 32, 33 on the front and back conductive is formed. The circuit wiring pattern is formed on a land portion larger than the through hole 34 for through hole. Therefore, it is difficult to form a highly dense circuit wiring pattern around such a through-hole conducting portion.

【0005】また、スル−ホ−ル導電層35は回路配線
パタ−ン32、33の表面にも形成されている為、それ
ら回路配線パタ−ン32、33の全体の厚さは相当厚い
ものとなるので、微細な回路配線パタ−ンを形成する場
合には支障となる。例えば、厚さ17.5μmの銅箔に
3〜6μmの厚さに化学銅メッキを施し、これに更に厚
さ10〜20μmの電解メッキを施してスル−ホ−ル導
電層35を形成するような場合には、回路配線パタ−ン
32、33の全体の厚さは30.5〜43.5μmとな
る。そこで、形成可能な回路配線パタ−ン幅を導体厚み
の2.5倍とすれば、その回路配線パタ−ン幅は76.
25〜108.75μm程度と大きくなるので、微細な
回路配線パタ−ンを高密度に形成することは困難とな
る。
Further, since the through-hole conductive layer 35 is also formed on the surface of the circuit wiring patterns 32 and 33, the overall thickness of the circuit wiring patterns 32 and 33 is considerably large. Therefore, it is difficult to form a fine circuit wiring pattern. For example, a copper foil having a thickness of 17.5 μm is subjected to chemical copper plating to a thickness of 3 to 6 μm, and further an electrolytic plating is applied to a thickness of 10 to 20 μm to form a through-hole conductive layer 35. In such a case, the total thickness of the circuit wiring patterns 32 and 33 is 30.5 to 43.5 μm. Therefore, if the width of the circuit wiring pattern that can be formed is set to 2.5 times the thickness of the conductor, the width of the circuit wiring pattern becomes 76.
Since it is as large as about 25 to 108.75 μm, it is difficult to form fine circuit wiring patterns at high density.

【0006】更に、スル−ホ−ル導電層35を形成する
為のメッキ処理工程に於けるメッキ液更新性等を加味し
た場合には、スル−ホ−ル用透孔34の穴径を大きくす
るのが好ましいが、これに応じてランドパタ−ンも大き
くなるので、ランドパタ−ン部を可及的に小さく形成し
て回路配線パタ−ンの形成密度を高めようとする際の妨
げとなる。
Further, when the plating solution renewability and the like in the plating process for forming the through-hole conductive layer 35 are taken into consideration, the hole diameter of the through-hole for through-hole 34 is increased. However, since the land pattern becomes large accordingly, it is difficult to increase the density of the circuit wiring pattern by forming the land pattern portion as small as possible.

【0007】[0007]

【発明の目的及び構成】そこで本発明は、相互導通手段
によって表裏の回路配線パタ−ンを導通させる構造を有
する可撓性両面回路配線基板を製作する場合、相互導通
部を形成した回路配線パタ−ンの形成密度を好適に高め
ると共に、従来の導通用スル−ホ−ルメッキ層による回
路配線パタ−ンの厚さが増すことに起因する微細な回路
配線パタ−ンの形成困難性の問題を解消して、両面に微
細な回路配線パタ−ンを高い密度で形成可能な可撓性両
面回路配線基板製造法を提供するものである。
SUMMARY OF THE INVENTION Accordingly, the present invention relates to a circuit wiring pattern formed with an interconnecting portion when manufacturing a flexible double-sided circuit wiring board having a structure in which front and back circuit wiring patterns are conducted by an interconnecting means. The problem of difficulty in forming a fine circuit wiring pattern due to an increase in the thickness of the circuit wiring pattern due to the conventional through-hole plating layer for conduction, as well as suitably increasing the formation density of the pattern. It is an object of the present invention to provide a method of manufacturing a flexible double-sided circuit wiring board capable of forming fine circuit wiring patterns on both sides at a high density.

【0008】[0008]

【0009】その為に本発明の可撓性両面回路配線基板
の製造法によれば、可撓性絶縁べ−ス材の一方面には所
要の回路配線パタ−ンを形成すると共に、その他方の面
には上記回路配線パタ−ンの所定位置に対応する部位に
孔を有するメタルマスクを形成し、上記回路配線パタ−
ン上に表面保護層を形成した後、上記メタルマスク側か
らエキシマレ−ザ−光を照射して上記孔から回路配線パ
タ−ンに達する導通用孔をアブレ−ション形成し、次に
上記メタルマスクを除去した後、上記導通用孔の底部と
内壁面及び上記可撓性絶縁べ−ス材の他方の面に導電層
を形成し、次いで上記導通用孔を含むその導電層に対し
て他の回路配線パタ−ンを形成する工程を採用すること
ができる。
Therefore, the flexible double-sided circuit wiring board of the present invention is provided.
According to the manufacturing method of (1), a required circuit wiring pattern is formed on one surface of the flexible insulating base material, and the other surface corresponds to a predetermined position of the circuit wiring pattern. Forming a metal mask having a hole at a portion thereof,
After a surface protection layer is formed on the metal mask, excimer laser light is irradiated from the metal mask side to form a conduction hole reaching the circuit wiring pattern from the hole, and then the metal mask is formed. After removing the conductive hole, a conductive layer is formed on the bottom and the inner wall surface of the conductive hole and the other surface of the flexible insulating base material, and then another conductive layer is formed on the conductive layer including the conductive hole. A step of forming a circuit wiring pattern can be employed.

【0010】[0010]

【実施例】図1は本発明の一実施例に従った可撓性両面
回路配線基板の概念的な要部断面構成図であり、また、
図2は同じくその断面斜視構成図を示す。両図に於い
て、1はポリイミドフィルム等の可撓性絶縁べ−ス材、
2はその可撓性絶縁べ−ス材の一方の面に形成した回路
配線パタ−ンであって、この実施例では幅50μmに形
成されている。そして、この回路配線パタ−ン2の表面
には接着剤5を用いてポリイミドフィルム等からなる保
護フィルム6を貼着して表面保護層7を形成してある。
FIG. 1 is a conceptual cross-sectional view of a principal part of a flexible double-sided circuit wiring board according to an embodiment of the present invention.
FIG. 2 shows a sectional perspective view of the same. In both figures, 1 is a flexible insulating base material such as a polyimide film,
Reference numeral 2 denotes a circuit wiring pattern formed on one surface of the flexible insulating base material, which is formed to have a width of 50 μm in this embodiment. A protective film 6 made of a polyimide film or the like is adhered to the surface of the circuit wiring pattern 2 using an adhesive 5 to form a surface protective layer 7.

【0011】そして、回路配線パタ−ン2を形成した箇
所に於ける可撓性絶縁べ−ス材1の他の面からは、回路
配線パタ−ン2の幅と同等かそれより大きな径を有する
有底の導通用孔8をその回路配線パタ−ン2に達するよ
うに形成し、この導通用孔8の内壁面と底面及び可撓性
絶縁べ−ス材1の他の面には、上記回路配線パタ−ン2
と電気的に導通するように他の回路配線パタ−ン11を
形成し、有底の導通部により表裏の回路配線パタ−ン
2、11を導通化するように構成してある。この実施例
に於いて、導通用孔8の径は80μmに形成した。
From the other surface of the flexible insulating base material 1 at the place where the circuit wiring pattern 2 is formed, a diameter equal to or larger than the width of the circuit wiring pattern 2 is obtained. The conductive hole 8 having a bottom is formed so as to reach the circuit wiring pattern 2, and the inner wall surface and the bottom surface of the conductive hole 8 and the other surface of the flexible insulating base material 1 are provided. The above circuit wiring pattern 2
Another circuit wiring pattern 11 is formed so as to be electrically connected to the circuit wiring patterns 2 and 11 on the front and back sides by a conductive portion having a bottom. In this embodiment, the diameter of the conduction hole 8 was 80 μm.

【0012】図3の(1)〜(4)は上記可撓性両面回
路配線基板の製造工程図であって、同図(1)の如く、
先ず接着剤を有するもの或いは無接着剤型の可撓性両面
銅張積層板を用意し、その可撓性絶縁べ−ス材1の一方
の面には所要の回路配線パタ−ン2を形成すると共に、
その他方の面には回路配線パタ−ン2の位置する対応箇
所に上記回路配線パタ−ン2の幅と同等かそれより大き
な孔3を有するメタルマスク4を通常のフォトファブリ
ケ−ション法で形成する。そして、回路配線パタ−ン2
の表面には接着剤5を用いてポリイミドフィルム等の保
護フィルム6を貼着して表面保護層7を形成する。
FIGS. 3 (1) to 3 (4) are manufacturing process diagrams of the flexible double-sided circuit wiring board, as shown in FIG. 3 (1).
First, a flexible double-sided copper-clad laminate having an adhesive or a non-adhesive type is prepared, and a required circuit wiring pattern 2 is formed on one surface of the flexible insulating base material 1. Along with
On the other side, a metal mask 4 having a hole 3 equal to or larger than the width of the circuit wiring pattern 2 at a corresponding position where the circuit wiring pattern 2 is located is formed by a normal photofabrication method. Form. And a circuit wiring pattern 2
A protective film 6 such as a polyimide film is adhered to the surface of the substrate with an adhesive 5 to form a surface protective layer 7.

【0013】次に同図(2)の如く、メタルマスク4の
側からエキシマレ−ザ−光Aを照射してメタルマスク4
の孔3の部位から回路配線パタ−ン2に達する導通用孔
8をアブレ−ション形成する。
Next, as shown in FIG. 2B, excimer laser light A is irradiated from the side of the metal mask
A conduction hole 8 reaching the circuit wiring pattern 2 from the hole 3 is formed by abrasion.

【0014】そこで、同図(3)のように、先ずメタル
マスク4をエッチング除去し、次いで導通用孔8の底部
と内壁面及び可撓性絶縁べ−ス材1の他方の面に所要厚
みの導電層9を形成する。この導電層9の形成手段とし
ては、クロム又は銅のイオンビ−ムスッパタリング若し
くは蒸着手段とこれに続く電解銅メッキ手段か、又は化
学銅メッキ手段と電解銅メッキ手段を採用することがで
きる。そして、導通用孔8を含むその導電層9の表面に
は、電着レジストを被着形成後、露光及び現像処理を施
す手法等で、所要の回路配線パタ−ンに対応したレジス
ト層10を形成する。
Therefore, as shown in FIG. 3 (3), the metal mask 4 is first removed by etching, and then the bottom and inner wall surfaces of the conduction hole 8 and the other surface of the flexible insulating base material 1 are provided with a required thickness. Is formed. The conductive layer 9 can be formed by chromium or copper ion beam sputtering or vapor deposition, followed by electrolytic copper plating, or chemical copper plating and electrolytic copper plating. A resist layer 10 corresponding to a required circuit wiring pattern is formed on the surface of the conductive layer 9 including the conduction hole 8 by, for example, applying an electrodeposition resist and then performing exposure and development treatments. Form.

【0015】次に、同図(4)の如く、レジスト層10
で被覆されずに露出している不要な導電層9の部分をエ
ッチング除去し、更にレジスト層10を剥離することに
よって、導通用孔8に形成された導電層部分で回路配線
パタ−ン2と電気的に接続された他の回路配線パタ−ン
11を形成することができ、これにより既述した構造の
可撓性両面回路配線基板が得られる。
Next, as shown in FIG.
Unnecessary portions of the conductive layer 9 which are not covered and exposed by etching are removed by etching, and the resist layer 10 is peeled off, so that the conductive layer portion formed in the conduction hole 8 and the circuit wiring pattern 2 Another electrically connected circuit wiring pattern 11 can be formed, thereby obtaining a flexible double-sided circuit wiring board having the structure described above.

【0016】[0016]

【発明の効果】本発明による可撓性両面回路配線基板
製造法によれば、可撓性絶縁べ−ス材の両面に形成した
回路配線パタ−ンを電気的に接続する為の導通部を設け
る場合に、その一方の回路配線パタ−ンには従来の如き
ランド部を形成する必要はないので、その一方の回路配
線パタ−ンを微細且つ高い密度で形成することが可能で
ある。
According to <br/> preparation of flexible double-sided circuit wiring board according to the present invention, the flexible insulating base - the circuit wiring pattern formed on both sides of the scan material - electrically connecting the down When a conductive portion is provided, it is not necessary to form a land portion on one of the circuit wiring patterns as in the related art, so that one of the circuit wiring patterns can be formed finely and with a high density. It is possible.

【0017】また、両面の回路配線パタ−ンの為の相互
導通部を形成する手段は、従来の如くスル−ホ−ル導電
層を形成する際に回路配線パタ−ンに更に被着させる手
法と異なるので、その一方の回路配線パタ−ンを本来の
薄い状態で微細に形成することができる。
The means for forming the interconnecting portion for the circuit wiring patterns on both sides is a method of further attaching the circuit wiring pattern when forming the through-hole conductive layer as in the conventional technique. Therefore, one of the circuit wiring patterns can be finely formed in an originally thin state.

【0018】そして、可撓性絶縁べ−ス材の他の面に形
成される他方の回路配線パタ−ンも同様に、電解銅メッ
キなどの手段で形成される従来のものより薄い導電層に
より形成可能であって、この他方の回路配線パタ−ンも
従来に比して微細に形成できることとなり、従って電子
部品を高密度に実装するような用途等にも好適に対応可
能な可撓性両面回路配線基板を提供できる。
Also, the other circuit wiring pattern formed on the other surface of the flexible insulating base material is similarly formed of a thinner conductive layer than the conventional one formed by means such as electrolytic copper plating. It can be formed, and the other circuit wiring pattern can be formed finer than before, so that it has a flexible double-sided surface suitable for use in mounting electronic components at high density. A circuit wiring board can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の一実施例に従って構成された可撓性
両面回路配線基板の概念的な要部断面構成図。
FIG. 1 is a conceptual cross-sectional configuration view of a principal part of a flexible double-sided circuit wiring board configured according to an embodiment of the present invention.

【図2】 図1の可撓性両面回路配線基板の概念的な断
面斜視構成図。
FIG. 2 is a conceptual cross-sectional perspective configuration diagram of the flexible double-sided circuit wiring board of FIG. 1;

【図3】 (1)から(4)は本発明の一実施例による
可撓性両面回路配線基板の製造工程図。
FIGS. 3 (1) to (4) are manufacturing process diagrams of a flexible double-sided circuit wiring board according to one embodiment of the present invention.

【図4】 従来の可撓性両面回路配線基板の概念的な断
面斜視構成図。
FIG. 4 is a conceptual sectional perspective view of a conventional flexible double-sided circuit wiring board.

【符号の説明】[Explanation of symbols]

1 可撓性絶縁べ−ス材 2 回路配線パタ−ン 3 孔 4 メタルマスク 5 接着剤 6 保護フィルム 7 表面保護層 8 導通用孔 9 導電層 10 レジスト層 11 回路配線パタ−ン DESCRIPTION OF SYMBOLS 1 Flexible insulating base material 2 Circuit wiring pattern 3 Hole 4 Metal mask 5 Adhesive 6 Protective film 7 Surface protective layer 8 Conducting hole 9 Conductive layer 10 Resist layer 11 Circuit wiring pattern

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−214497(JP,A) 実開 平2−146871(JP,U) 特許2760093(JP,B2) 特許2911273(JP,B2) 特許3002307(JP,B2) (58)調査した分野(Int.Cl.7,DB名) H05K 1/11 H05K 3/40 ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-61-214497 (JP, A) JP-A-2-146871 (JP, U) Patent 2760093 (JP, B2) Patent 2911273 (JP, B2) Patent 3002307 (JP, B2) (58) Field surveyed (Int. Cl. 7 , DB name) H05K 1/11 H05K 3/40

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 可撓性絶縁べ−ス材の一方面には所要の
回路配線パタ−ンを形成すると共に、その他方の面には
上記回路配線パタ−ンの所定位置に対応する部位に孔を
有するメタルマスクを形成し、上記回路配線パタ−ン上
に表面保護層を形成した後、上記メタルマスク側からエ
キシマレ−ザ−光を照射して上記孔から回路配線パタ−
ンに達する導通用孔をアブレ−ション形成し、次に上記
メタルマスクを除去した後、上記導通用孔の底部と内壁
面及び上記可撓性絶縁べ−ス材の他方の面に導電層を形
成し、次いで上記導通用孔を含むその導電層に対して他
の回路配線パタ−ンを形成する工程を含む可撓性両面回
路配線基板の製造法。
1. A required circuit wiring pattern is formed on one surface of a flexible insulating base material, and a portion corresponding to a predetermined position of the circuit wiring pattern is formed on the other surface. After forming a metal mask having a hole and forming a surface protective layer on the circuit wiring pattern, excimer laser light is irradiated from the metal mask side to form a circuit wiring pattern through the hole.
After the conductive hole reaching the contact hole is formed, the metal mask is removed, and then a conductive layer is formed on the bottom and inner wall surfaces of the conductive hole and the other surface of the flexible insulating base material. Forming, and then forming another circuit wiring pattern on the conductive layer including the conductive hole.
JP3299921A 1991-10-19 1991-10-19 Manufacturing method of flexible double-sided circuit wiring board Expired - Fee Related JP3048450B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3299921A JP3048450B2 (en) 1991-10-19 1991-10-19 Manufacturing method of flexible double-sided circuit wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3299921A JP3048450B2 (en) 1991-10-19 1991-10-19 Manufacturing method of flexible double-sided circuit wiring board

Publications (2)

Publication Number Publication Date
JPH05110252A JPH05110252A (en) 1993-04-30
JP3048450B2 true JP3048450B2 (en) 2000-06-05

Family

ID=17878538

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3299921A Expired - Fee Related JP3048450B2 (en) 1991-10-19 1991-10-19 Manufacturing method of flexible double-sided circuit wiring board

Country Status (1)

Country Link
JP (1) JP3048450B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003218490A (en) * 2002-01-24 2003-07-31 Sharp Corp Printed wiring board and its manufacturing method

Also Published As

Publication number Publication date
JPH05110252A (en) 1993-04-30

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