JP2818940B2 - 画像形成方法 - Google Patents

画像形成方法

Info

Publication number
JP2818940B2
JP2818940B2 JP63088863A JP8886388A JP2818940B2 JP 2818940 B2 JP2818940 B2 JP 2818940B2 JP 63088863 A JP63088863 A JP 63088863A JP 8886388 A JP8886388 A JP 8886388A JP 2818940 B2 JP2818940 B2 JP 2818940B2
Authority
JP
Japan
Prior art keywords
group
resin
carbon atoms
hydrogen atom
aqueous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63088863A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63271442A (ja
Inventor
ジョージ デンマー クリストファー
アーヴィング エドワード
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of JPS63271442A publication Critical patent/JPS63271442A/ja
Application granted granted Critical
Publication of JP2818940B2 publication Critical patent/JP2818940B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Materials For Photolithography (AREA)
JP63088863A 1987-04-11 1988-04-11 画像形成方法 Expired - Fee Related JP2818940B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8708747 1987-04-11
GB878708747A GB8708747D0 (en) 1987-04-11 1987-04-11 Formation of image

Publications (2)

Publication Number Publication Date
JPS63271442A JPS63271442A (ja) 1988-11-09
JP2818940B2 true JP2818940B2 (ja) 1998-10-30

Family

ID=10615697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63088863A Expired - Fee Related JP2818940B2 (ja) 1987-04-11 1988-04-11 画像形成方法

Country Status (8)

Country Link
US (1) US5002858A (https=)
JP (1) JP2818940B2 (https=)
BE (1) BE1002863A3 (https=)
CA (1) CA1333855C (https=)
DE (1) DE3811859C2 (https=)
FR (1) FR2613848A1 (https=)
GB (2) GB8708747D0 (https=)
NL (1) NL8800912A (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5286609A (en) * 1988-11-01 1994-02-15 Yamatoya & Co., Ltd. Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray
JP2544006B2 (ja) * 1990-06-14 1996-10-16 株式会社東芝 半導体装置の製造方法
US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films
CA2048164C (en) * 1990-08-02 1998-11-10 Kurt G. Olson Photoimageable electrodepositable photoresist composition
JP2847321B2 (ja) * 1990-08-14 1999-01-20 日本石油株式会社 ポジ型フォトレジスト組成物
US5314789A (en) * 1991-10-01 1994-05-24 Shipley Company Inc. Method of forming a relief image comprising amphoteric compositions
US5550004A (en) * 1992-05-06 1996-08-27 Ocg Microelectronic Materials, Inc. Chemically amplified radiation-sensitive composition
US5340687A (en) * 1992-05-06 1994-08-23 Ocg Microelectronic Materials, Inc. Chemically modified hydroxy styrene polymer resins and their use in photoactive resist compositions wherein the modifying agent is monomethylol phenol
US5384229A (en) * 1992-05-07 1995-01-24 Shipley Company Inc. Photoimageable compositions for electrodeposition
JPH0659453A (ja) * 1992-08-07 1994-03-04 Nippon Oil Co Ltd ポジ型感光性樹脂組成物
US5624781A (en) * 1993-05-28 1997-04-29 Kansai Paint Co., Ltd. Positive type anionic electrodeposition photo-resist composition and process for pattern formation using said composition
BRPI0712576A2 (pt) * 2006-06-02 2012-11-20 Dsm Ip Assets Bv processo para preparaÇço de resina hidràxi-aromÁtica, resina hidràxi-aromÁtica e modificaÇço da mesma

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5344652B2 (https=) * 1972-05-29 1978-11-30
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
JPS5532088A (en) * 1978-08-30 1980-03-06 Fuji Photo Film Co Ltd Photo mask forming method
DE3325022A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
DE3325023A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
IT1169682B (it) * 1983-11-08 1987-06-03 I M G Ind Materiali Grafici Sp Composizione per fotoriproduzioni
EP0155231B2 (de) * 1984-03-07 1997-01-15 Ciba-Geigy Ag Verfahren zur Herstellung von Abbildungen
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
GB8430377D0 (en) * 1984-12-01 1985-01-09 Ciba Geigy Ag Modified phenolic resins
JPS6235350A (ja) * 1985-08-07 1987-02-16 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 像反転に有用な保存寿命の長いフオトレジスト

Also Published As

Publication number Publication date
US5002858A (en) 1991-03-26
FR2613848A1 (fr) 1988-10-14
GB2203564A (en) 1988-10-19
FR2613848B1 (https=) 1995-04-21
NL8800912A (nl) 1988-11-01
CA1333855C (en) 1995-01-10
DE3811859A1 (de) 1988-10-27
JPS63271442A (ja) 1988-11-09
GB8808267D0 (en) 1988-05-11
BE1002863A3 (fr) 1991-07-09
DE3811859C2 (de) 2003-03-20
GB8708747D0 (en) 1987-05-20
GB2203564B (en) 1990-05-02

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees