JP2811995B2 - Method of manufacturing through-hole printed wiring board - Google Patents

Method of manufacturing through-hole printed wiring board

Info

Publication number
JP2811995B2
JP2811995B2 JP3107191A JP10719191A JP2811995B2 JP 2811995 B2 JP2811995 B2 JP 2811995B2 JP 3107191 A JP3107191 A JP 3107191A JP 10719191 A JP10719191 A JP 10719191A JP 2811995 B2 JP2811995 B2 JP 2811995B2
Authority
JP
Japan
Prior art keywords
hole
wiring board
manufacturing
printed wiring
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3107191A
Other languages
Japanese (ja)
Other versions
JPH04335596A (en
Inventor
佳久 高山
文昭 吉田
幸延 沢田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP3107191A priority Critical patent/JP2811995B2/en
Publication of JPH04335596A publication Critical patent/JPH04335596A/en
Application granted granted Critical
Publication of JP2811995B2 publication Critical patent/JP2811995B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、ポリイミドフィルム,
ガラスエポキシ樹脂等の絶縁基板の表裏両面に設けられ
た導通パターンの所定の部署を導通させた、いわゆるス
ルーホールプリント配線基板の製造方法に関する。
BACKGROUND OF THE INVENTION The present invention relates to a polyimide film,
The present invention relates to a method for manufacturing a so-called through-hole printed wiring board in which predetermined sections of conductive patterns provided on both front and back surfaces of an insulating substrate such as a glass epoxy resin are made conductive.

【0002】[0002]

【従来の技術】従来、スルーホールプリント配線基板を
製造する方法としては、スルーホールメッキを施す方法
が採られている。すなわち、図6に示すようにまずポリ
イミドフィルムまたはガラスエポキシ樹脂等の絶縁基板
3の両面にそれぞれ銅箔1を接着剤4により接合し、し
かる後に所定の場所に貫通孔5をあける。次いで、図7
に示すように無電解銅メッキ、電解銅メッキにより孔5
内に銅メッキ層7を形成し、表裏面の銅箔1同志を導通
させる。その後、銅箔1上にフォトレジスト等のレジス
トを塗布し、エッチングして所望の配線パターンを得
る。配線パターンは前記貫通孔5を含むように設けら
れ、孔5内に付着した銅メッキ層7によって表裏面の配
線パターンが電気的に導通される。
2. Description of the Related Art Conventionally, as a method of manufacturing a through-hole printed wiring board, a method of performing through-hole plating has been adopted. That is, as shown in FIG. 6, first, copper foil 1 is bonded to both sides of an insulating substrate 3 such as a polyimide film or a glass epoxy resin by an adhesive 4, and then a through hole 5 is formed in a predetermined place. Then, FIG.
Hole 5 by electroless copper plating and electrolytic copper plating as shown in
A copper plating layer 7 is formed therein, and the copper foils 1 on the front and back surfaces are made conductive. After that, a resist such as a photoresist is applied on the copper foil 1 and etched to obtain a desired wiring pattern. The wiring pattern is provided so as to include the through hole 5, and the wiring pattern on the front and back surfaces is electrically conducted by the copper plating layer 7 attached in the hole 5.

【0003】[0003]

【発明が解決しようとする課題】しかし、上記製造方法
によれば、無電解メッキ及び電気メッキを施すためにコ
ストが高くなる欠点があり、また、銅箔上には電解メッ
キによる銅が付着するためそれだけで厚くなり、線間隔
の狭い配線パターンを形成する事ができない欠点があっ
た。
However, according to the above-mentioned manufacturing method, there is a disadvantage that the cost is increased due to electroless plating and electroplating, and copper by electrolytic plating adheres to the copper foil. Therefore, there is a drawback that the wiring pattern becomes thicker by itself and a wiring pattern with a narrow line spacing cannot be formed.

【0004】本発明はこれらの問題を解決し、確実な導
通が得られ、かつ、十分な信頼性を持つスルーホールプ
リント配線基板の製造方法を提供せんとするものであ
る。
An object of the present invention is to solve these problems and to provide a method of manufacturing a through-hole printed wiring board which can achieve reliable conduction and has sufficient reliability.

【0005】[0005]

【課題を解決するための手段】本発明のスルーホールプ
リント配線基板の製造方法は、その金属箔よりも導電率
の低い第2の金属層が片面に形成された金属箔を、貫通
孔を設けた絶縁基板の両面に前記貫通孔を覆うようにラ
ミネートし、前記貫通孔の両面から金属箔を押圧、変形
せしめ、その貫通孔内で抵抗溶接法にて上下金属箔を接
続、導通させ、その後金属箔を所定の配線パターン形状
にエッチングする事を特徴としている。
According to a method of manufacturing a through-hole printed wiring board of the present invention, a metal foil having a second metal layer having a lower conductivity than that of a metal foil formed on one side is provided with a through hole. Laminated so as to cover the through holes on both sides of the insulating substrate, pressing the metal foil from both sides of the through holes, deforming, connecting the upper and lower metal foils by resistance welding in the through holes, conducting, and then It is characterized in that the metal foil is etched into a predetermined wiring pattern shape.

【0006】[0006]

【作用】上述の本発明の製造法によれば、絶縁基板の貫
通孔に、電気メッキをする必要がないため、コストの削
減や、線間隔の狭い配線パターンを形成する事が可能に
なる。さらに第2の金属層が金属箔よりも高い抵抗値を
有しているため、接続部分では発熱量が多くなり、上下
金属箔間の溶解量が増し同一金属箔同志の場合よりもい
っそう金属箔間の接続強度が増す。
According to the above-described manufacturing method of the present invention, it is not necessary to electroplate the through holes of the insulating substrate, so that it is possible to reduce the cost and to form a wiring pattern with a narrow line interval. Further, since the second metal layer has a higher resistance value than the metal foil, the amount of heat generated at the connection portion increases, the amount of dissolution between the upper and lower metal foils increases, and the metal foil is further increased than in the case of the same metal foil. The connection strength between them increases.

【0007】[0007]

【実施例】以下に、本発明の実施例を図1ないし図5に
示す各工程図を参照して詳述する。まず、図1に示すよ
うに35μm厚みの銅箔1の片面に、前記銅箔1より導
電率の低い第2の金属層である亜鉛層2を100Å形成
する。次ぎに図2に示されるように、両面に20μm厚
の接着剤層4が形成された25μm厚のポリイミドから
なるフィルム状の絶縁基板3の、スルーホールを施す位
置に300μmφの貫通孔5を搾設する。しかる後に、
図3に示すように絶縁基板3の表裏面に前記貫通孔5を
覆うように第2の金属層2が対向するように銅箔1を貼
り付ける。次いで図4に示されるように、先端径が10
0μmφの加熱ツールにより貫通孔5の部分にある銅箔
1及び第2の金属層2を押圧、折曲せしめ1.7〜1.
9mVの電流を流し、上下銅箔1を抵抗加熱法により接
続する。このとき、銅箔1に比べ導電率の低い亜鉛層2
同志が接触する事になり、この導電率の低い亜鉛層2の
発熱量が高くなり、上下金属箔間の溶解量が増し、同一
金属箔同志の場合よりも良好な接続が得られる。しかる
後に図5に示すように絶縁基板3上の両面の導電層を既
知の方法でエッチングして所望の配線パターンを得る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below in detail with reference to FIGS. First, as shown in FIG. 1, on one surface of a copper foil 1 having a thickness of 35 μm, a zinc layer 2 which is a second metal layer having a lower conductivity than the copper foil 1 is formed at 100 °. Next, as shown in FIG. 2, a 300 μm φ through-hole 5 is squeezed at a position where a through-hole is to be formed on a 25 μm-thick film-like insulating substrate 3 made of polyimide having a 20 μm-thick adhesive layer 4 formed on both sides. Set up. After a while
As shown in FIG. 3, a copper foil 1 is attached to the front and back surfaces of the insulating substrate 3 so that the second metal layer 2 faces the through holes 5. Then, as shown in FIG.
The copper foil 1 and the second metal layer 2 in the portion of the through hole 5 are pressed and bent by a heating tool having a diameter of 0 μm φ.
A current of 9 mV is passed, and the upper and lower copper foils 1 are connected by a resistance heating method. At this time, the zinc layer 2 having lower conductivity than the copper foil 1
The two members come into contact with each other, and the calorific value of the low-conductivity zinc layer 2 increases, the amount of dissolution between the upper and lower metal foils increases, and a better connection can be obtained than in the case of the same metal foil. Thereafter, as shown in FIG. 5, the conductive layers on both surfaces of the insulating substrate 3 are etched by a known method to obtain a desired wiring pattern.

【0008】[0008]

【発明の効果】以上のように本発明によれば、メッキ処
理によるコストアップは低減され、また、単一金属同志
の接続よりも強い強度で接続でき、信頼性の高いスルー
ホールプリント配線基板が得られるものである。
As described above, according to the present invention, the cost increase due to the plating process is reduced, and the connection can be made with stronger strength than the connection between the single metals, and a highly reliable through-hole printed wiring board can be obtained. It is obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のスルーホールプリント配線基板の製造
方法の一実施例に使用される金属箔の断面図
FIG. 1 is a cross-sectional view of a metal foil used in an embodiment of a method for manufacturing a through-hole printed wiring board according to the present invention.

【図2】本発明のスルーホールプリント配線基板の製造
方法の一実施例に使用される絶縁基板の断面図
FIG. 2 is a cross-sectional view of an insulating substrate used in an embodiment of the method for manufacturing a through-hole printed wiring board according to the present invention.

【図3】本発明のスルーホールプリント配線基板の製造
方法の一実施例に使用される一工程における配線基板の
断面図
FIG. 3 is a cross-sectional view of the wiring board in one step used in one embodiment of the method of manufacturing a through-hole printed wiring board according to the present invention.

【図4】本発明のスルーホールプリント配線基板の製造
方法の一実施例の一工程における配線基板の断面図
FIG. 4 is a sectional view of a wiring board in one step of an embodiment of the method for manufacturing a through-hole printed wiring board according to the present invention;

【図5】本発明のスルーホールプリント配線基板の製造
方法の一実施例の他の一工程における配線基板の断面図
FIG. 5 is a cross-sectional view of the wiring board in another step of the embodiment of the method for manufacturing a through-hole printed wiring board according to the present invention;

【図6】従来のスルーホールプリント配線基板の製造方
法の一工程における配線基板の断面図
FIG. 6 is a cross-sectional view of a wiring board in one step of a method of manufacturing a conventional through-hole printed wiring board.

【図7】従来のスルーホールプリント配線基板の製造方
法の他の工程における配線基板の断面図
FIG. 7 is a cross-sectional view of a wiring board in another step of a method for manufacturing a conventional through-hole printed wiring board.

【符号の説明】[Explanation of symbols]

1 金属箔 2 第2の金属層 3 絶縁基板 4 接着剤 5 貫通孔 6 ツール 7 メッキ層 REFERENCE SIGNS LIST 1 metal foil 2 second metal layer 3 insulating substrate 4 adhesive 5 through hole 6 tool 7 plating layer

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平2−122589(JP,A) 特公 昭58−6318(JP,B2) (社)プリント回路工業会編 「プリ ント回路技術便覧」 昭和62年2月28 日、日刊工業新聞社発行、第250〜266頁 (58)調査した分野(Int.Cl.6,DB名) H05K 3/40,1/11──────────────────────────────────────────────────の Continuation of the front page (56) References JP-A-2-122589 (JP, A) JP-B-58-6318 (JP, B2) Printed Circuit Industry Association, Japan Printed Circuit Technology Handbook Showa Published February 28, 62, Nikkan Kogyo Shimbun, pages 250-266 (58) Fields investigated (Int. Cl. 6 , DB name) H05K 3 / 40,1 / 11

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】金属箔の片面に、その金属箔より導電率の
低い第2の金属層を形成し、貫通孔を施した絶縁基板の
両面に、前記第2の金属層どうしが前記貫通孔内で対向
するよう前記第2の金属層を内側にして接着した後に、
前記貫通孔の両側から抵抗溶接法を用いて、前記第2の
金属層を前記金属箔より高温に発熱させて溶解させるこ
とにより両金属箔を前記接合することで、前記絶縁基板
の両面に形成される配線パターンの導通が得られるよう
にしたことを特徴とするスルーホールプリント配線基板
の製造方法。
1. A metal foil having a conductivity lower than that of the metal foil on one side.
Forming a low second metal layer and forming a through hole in the insulating substrate;
On both surfaces, the second metal layers face each other in the through hole
After bonding with the second metal layer inside,
Using a resistance welding method from both sides of the through hole, the second
The metal layer is heated and melted to a higher temperature than the metal foil.
And bonding the two metal foils to the insulating substrate.
Of the wiring pattern formed on both sides of the
A method for manufacturing a through-hole printed wiring board, characterized in that:
JP3107191A 1991-05-13 1991-05-13 Method of manufacturing through-hole printed wiring board Expired - Lifetime JP2811995B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3107191A JP2811995B2 (en) 1991-05-13 1991-05-13 Method of manufacturing through-hole printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3107191A JP2811995B2 (en) 1991-05-13 1991-05-13 Method of manufacturing through-hole printed wiring board

Publications (2)

Publication Number Publication Date
JPH04335596A JPH04335596A (en) 1992-11-24
JP2811995B2 true JP2811995B2 (en) 1998-10-15

Family

ID=14452782

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3107191A Expired - Lifetime JP2811995B2 (en) 1991-05-13 1991-05-13 Method of manufacturing through-hole printed wiring board

Country Status (1)

Country Link
JP (1) JP2811995B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101119308B1 (en) * 2009-02-03 2012-03-19 삼성전기주식회사 A printed circuit board and a fabricating method the same

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2502902B2 (en) * 1992-12-28 1996-05-29 インターナショナル・ビジネス・マシーンズ・コーポレイション Printed wiring board and method of manufacturing the same
JP2831970B2 (en) * 1996-04-12 1998-12-02 山一電機株式会社 Interlayer connection method for circuit boards
US6005198A (en) * 1997-10-07 1999-12-21 Dimensional Circuits Corporation Wiring board constructions and methods of making same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
(社)プリント回路工業会編 「プリント回路技術便覧」 昭和62年2月28日、日刊工業新聞社発行、第250〜266頁

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101119308B1 (en) * 2009-02-03 2012-03-19 삼성전기주식회사 A printed circuit board and a fabricating method the same

Also Published As

Publication number Publication date
JPH04335596A (en) 1992-11-24

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