JP3324660B2 - Multilayer wiring board and adhesive film used for it - Google Patents

Multilayer wiring board and adhesive film used for it

Info

Publication number
JP3324660B2
JP3324660B2 JP30094192A JP30094192A JP3324660B2 JP 3324660 B2 JP3324660 B2 JP 3324660B2 JP 30094192 A JP30094192 A JP 30094192A JP 30094192 A JP30094192 A JP 30094192A JP 3324660 B2 JP3324660 B2 JP 3324660B2
Authority
JP
Japan
Prior art keywords
adhesive
conductive particles
wiring board
conductive
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP30094192A
Other languages
Japanese (ja)
Other versions
JPH06152139A (en
Inventor
功 塚越
貢 藤縄
和博 井坂
共久 太田
豊 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Showa Denko Materials Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP30094192A priority Critical patent/JP3324660B2/en
Publication of JPH06152139A publication Critical patent/JPH06152139A/en
Application granted granted Critical
Publication of JP3324660B2 publication Critical patent/JP3324660B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、多層配線板の層間接続
構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an interlayer connection structure for a multilayer wiring board.

【0002】[0002]

【従来の技術】多層配線板は、信号回路、電源、アース
回路等を内蔵できることから、配線の高密度化の有効な
方法として種々の電子機器に多用されている。従来の多
層印刷配線板の代表的製造法は、相互接続部以外をカバ
ーレイフィルム等で覆い絶縁性を得ながら、銅めっき等
により各層の配線パターンを相互に電気的に接続するこ
とが一般的に行われている。また、比較的新しい試みと
して、相互接続部以外をカバーレイフィルムやマスクフ
ィルム、レジストフィルム等(これらをカバーフィルム
と以下総称)で覆う等して絶縁性を得ながら、相互接続
部を導電粒子を分散した接着剤よりなる材料を用いて各
層の配線パターンを相互に接続することも提案(例えば
特開昭61−49499号公報や、特開平2−3659
3号公報)されており、この場合の導電粒子としてはは
んだ粒子が用いられている。
2. Description of the Related Art A multilayer wiring board can incorporate a signal circuit, a power supply, an earth circuit, and the like, and is therefore often used in various electronic devices as an effective method for increasing the wiring density. A typical method of manufacturing a conventional multilayer printed wiring board is to cover the portions other than the interconnections with a coverlay film or the like and obtain electrical insulation, and electrically connect the wiring patterns of each layer to each other by copper plating or the like. It has been done. In addition, as a relatively new attempt, the interconnects are covered with conductive particles while obtaining insulation by covering other than the interconnects with a coverlay film, mask film, resist film, etc. (collectively referred to as cover films hereinafter). It has also been proposed to connect the wiring patterns of each layer to each other using a material made of a dispersed adhesive (for example, Japanese Patent Application Laid-Open No. 61-49499 and Japanese Patent Application Laid-Open No. 2-3659).
No. 3), and solder particles are used as the conductive particles in this case.

【0003】[0003]

【発明が解決しようとする課題】上記従来の方法はいず
れも、相互接続部以外をカバーフィルムで覆うため、対
向する配線板間にカバーフィルムが2層存在し多層配線
板とした時、厚みの減少が得にくくコストアップの一因
ともなっていた。また配線パターンの相互接続法につい
ては、銅等でめっきする方法は複雑なめっき工程が必要
であり、またカバーフィルムを熱圧着する時に銅めっき
が破壊し易い欠点がある。導電粒子と接着剤よりなる材
料で接続する場合は、導電粒子が接着中の全体に均一分
散されているので接続時の熱圧着により接着剤が流動
し、配線パターンの接続を必要とする部分以外でも導通
してしまい、導電粒子がはんだの場合は特に融点以下で
は硬質なことからカバーフィルムに傷がつくので絶縁性
が低下し、融点以上では隣接配線パターンで溶融して連
結しリークする等、ますます進行する配線の細線化に対
応不可能となってきた。本発明は、カバーフィルムやめ
っき工程が不要で配線の細線化に対応可能な層間接続を
用いた多層配線板に関する。
In each of the above-mentioned conventional methods, since a portion other than the interconnecting portion is covered with a cover film, two layers of the cover film exist between the opposing wiring boards, and when a multilayer wiring board is formed, the thickness is reduced. It was difficult to obtain a decrease, which also contributed to the cost increase. As for the interconnection method of the wiring patterns, the method of plating with copper or the like requires a complicated plating step, and has a disadvantage that the copper plating is easily broken when the cover film is thermocompressed. When connecting with a material consisting of conductive particles and an adhesive, since the conductive particles are uniformly dispersed throughout the bonding, the adhesive flows due to thermocompression bonding at the time of connection, and other than the parts that require connection of the wiring pattern However, if the conductive particles are solder, the insulating property is reduced because the cover film is damaged because of the hardness below the melting point, and the insulating property is reduced. It has become impossible to cope with increasingly thinner wiring. The present invention relates to a multilayer wiring board using an interlayer connection which does not require a cover film or a plating step and can cope with thinning of wiring.

【0004】[0004]

【課題を解決するための手段】本発明は、絶縁基板に配
線パターンを形成してなる2枚以上の両面配線板の間
に、要部に貫通孔を有する絶縁フィルムの両面に導電粒
子と接着剤とよりなる接着剤層を配置し、加熱加圧によ
り積層一体化してなる多層印刷配線板及び、接着剤と導
電粒子よりなる接着剤層が絶縁フィルムの両面に形成さ
れており、前記導電粒子の熱的変態点が絶縁フィルムよ
り低温である接着フィルムに関するものである。すなわ
ち、絶縁基板に配線パターンを形成してなる2枚以上の
両面配線板の間に、要部に貫通孔を有する絶縁フィルム
の両面に導電粒子と接着剤とよりなる接着剤層を配置
し、加熱加圧により積層一体化後に要部に導電粒子が集
中してなる多層配線板。接着剤と導電粒子よりなる接着
剤層が貫通孔を有する絶縁フィルムの両面に形成されて
おり、前記導電粒子の熱的変態点が絶縁フィルムより低
温であり、導電粒子が(a)金属粒子、(b)導電性ま
たは非導電性粒子表面に導電層を被覆形成したもの、
(c)導電性粒子に絶縁層を被覆した絶縁被覆粒子より
選択されてなる請求項1に記載の多層配線板に用いる接
着フィルムである。
According to the present invention, conductive particles and an adhesive are provided between two or more double-sided wiring boards each having a wiring pattern formed on an insulating substrate. A multi-layer printed wiring board in which an adhesive layer composed of an adhesive and conductive particles is formed on both sides of an insulating film, and a heat-pressing method for the conductive particles. The present invention relates to an adhesive film whose thermal transformation point is lower than that of an insulating film. Sand
That is, two or more wiring patterns formed on an insulating substrate
Insulating film with a through hole in the main part between double-sided wiring boards
Adhesive layer consisting of conductive particles and adhesive on both sides
After heating and pressurization, conductive particles are collected
A multi-layer wiring board in the middle. Adhesion consisting of adhesive and conductive particles
Agent layer is formed on both sides of the insulating film having through holes
And the thermal transformation point of the conductive particles is lower than that of the insulating film.
(A) metal particles, (b) conductive particles
Or a non-conductive particle surface coated with a conductive layer,
(C) From insulating coated particles obtained by coating conductive particles with an insulating layer
2. The contact used for the multilayer wiring board according to claim 1, which is selected.
It is a wearing film.

【0005】本発明の構成を図面を参照しながら説明す
る。図1は、本発明の一実施例を説明する断面模式図で
ある。1は絶縁基板であり、フェノール樹脂、エポキシ
樹脂、ポリイミド等を、紙、ガラス布、ガラス不織布、
等の基材に含浸し加熱加圧したものや、ポリエステルや
ポリイミド等のプラスチックフィルム、AlやFe等の
金属、及びセラミックス等がある。配線パターン2は、
図1のように絶縁基板1の両面に形成するが、多層配線
板を構成したときの最外層は片面でも良い。配線パター
ン2は図1のように基板面から突出しても、図示してな
いが平面状や凹面状等いずれでも良い。接続安定性の点
から対向する配線パターンの少なくとも一方が突出する
ことが好ましい。これらの配線パターンは、テンティン
グ法、アディティブ法、及び転写法等の一般手段で形成
できる。絶縁基板1と配線パターン2の間に接着層が存
在しても良い。
The configuration of the present invention will be described with reference to the drawings. FIG. 1 is a schematic sectional view illustrating an embodiment of the present invention. Reference numeral 1 denotes an insulating substrate made of phenolic resin, epoxy resin, polyimide, etc., paper, glass cloth, glass nonwoven fabric,
Or the like, which is impregnated into a base material such as polyester, heated and pressed, a plastic film such as polyester or polyimide, a metal such as Al or Fe, and a ceramic. Wiring pattern 2
Although formed on both sides of the insulating substrate 1 as shown in FIG. 1, the outermost layer when a multilayer wiring board is formed may be one side. The wiring pattern 2 may protrude from the substrate surface as shown in FIG. 1 or may have a flat shape or a concave shape (not shown). From the viewpoint of connection stability, it is preferable that at least one of the opposed wiring patterns protrudes. These wiring patterns can be formed by general means such as a tenting method, an additive method, and a transfer method. An adhesive layer may be present between the insulating substrate 1 and the wiring pattern 2.

【0006】層間接続法は、接続を必要とする配線パタ
ーン2を有する、第1及び第2の配線板3、4の間に、
導電粒子5と接着剤6よりなる接着剤層を要部に貫通孔
7を有する絶縁フィルム8の両面に形成した接着フィル
ム10を用いて積層一体化し、2つの配線板同士3−4
を接着すると共に、これらの接続を必要とする配線パタ
ーン間2−2’の電気的導通を得るものである。ここに
接続を必要とする配線パターン2は、パターン全体でも
パターンの一部でも良く、接続面に接続不要配線パター
ン9(例えばバイアホール部)が存在しても良い。
In the interlayer connection method, a wiring pattern 2 requiring connection is provided between first and second wiring boards 3 and 4.
An adhesive layer composed of conductive particles 5 and an adhesive 6 is laminated and integrated using an adhesive film 10 formed on both sides of an insulating film 8 having a through hole 7 in a main part, and the two wiring boards 3-4
And at the same time, obtain electrical conduction between the wiring patterns 2-2 'requiring these connections. The wiring pattern 2 that needs to be connected here may be the entire pattern or a part of the pattern, and the connection-unnecessary wiring pattern 9 (for example, a via hole) may be present on the connection surface.

【0007】本発明に好適な接着フィルムについて説明
する。接着剤6としては、シート等に用いられる熱可塑
性材料や、熱、光、電子線等のエネルギーによる硬化性
材料が広く適用出来る。多層配線板の耐熱性や耐湿性に
優れることから硬化性材料が好ましく、中でもエポキシ
系接着剤やイミド系接着剤は、分子構造上接着性や耐熱
性に優れることや硬化時間が広く設定出来ることから好
ましい。エポキシ系接着剤は、例えば高分子量エポキ
シ、固形エポキシと液状エポキシ、ウレタンやポリエス
テル、NBR等で変性したエポキシを主成分とし、硬化
剤や触媒、カップリング剤、充填剤等を添加してなるも
のが一般的である。これら材料は、抽出水のNaイオン
やClイオンが20ppm以下の高純度品であると、多
層配線板の耐電食性が向上することが好ましい。
The adhesive film suitable for the present invention will be described. As the adhesive 6, a thermoplastic material used for a sheet or the like, or a curable material using energy such as heat, light, or an electron beam can be widely applied. Curable materials are preferred because they have excellent heat resistance and moisture resistance of the multilayer wiring board.Epoxy-based adhesives and imide-based adhesives, among others, have excellent adhesiveness and heat resistance due to their molecular structure and can be set over a wide curing time. Is preferred. Epoxy-based adhesives are, for example, high-molecular-weight epoxies, solid epoxies, liquid epoxies, and epoxies modified with urethane, polyester, NBR, etc. as the main components, and added with curing agents, catalysts, coupling agents, fillers, etc. Is common. When these materials are high-purity products in which Na ions and Cl ions of the extraction water are 20 ppm or less, it is preferable that the electric corrosion resistance of the multilayer wiring board is improved.

【0008】導電粒子5としては、Au、Ag、Ni、
Cu、W、Sb、Sn、はんだ等の金属粒子やカーボン
等があり、これら及び非導電性のガラス、セラミック
ス、プラスチック等の高分子核材等に、前記した導電層
を被覆等により形成したものでも良い。さらに前記した
ような導電粒子と絶縁層で被覆してなる絶縁被覆粒子
や、導電粒子と絶縁粒子の併用等も、回路の細線化に極
めて有用である。はんだ等の熱溶融金属や、プラスチッ
ク等の高分子核材に導電層を形成したものは、融点やガ
ラス転移点等の熱的変態点を有するので加熱加圧もしく
は加圧により変形性を有し、積層時に回路との接触面積
が増加し信頼性が向上するので好ましい。この場合導電
粒子の少なくとも核材の熱的変態点が絶縁フィルムによ
り低温であると、積層一体化時の加熱加圧により接着フ
ィルムの絶縁フィルム8に傷がつかないので層間絶縁性
が高度に保たれるので好ましい。特に高分子類を核とし
た場合、はんだのように融点を示さないので軟化の状態
を接続温度で広く制御でき、配線板や配線パターンの厚
みや平坦性ばらつきに対応し易くより好ましい。また例
えばNiやW等の硬質金属粒子の場合、導電粒子が配線
パターンに突きささるので、配線パターン上の酸化膜や
汚染層の存在する場合にも低い接続抵抗が得られ、加え
て接続部の固定による膨張収縮の抑制にも有効で信頼性
が向上する。そのため硬質金属粒子の場合の粒径は、接
続を必要とする配線パターン間の距離(接続後の厚み)
よりも若干大きな粒径が好ましくそれ以下の粒径の場
合、凝集状となっていることが好ましい。導電粒子の数
は、原則的には配線パターン上の接続を必要とする部分
に1個あれば良いが、5個以上とすることで接続信頼性
がさらに向上するので好ましい。粒径は細線化に対応す
るため隣接する配線パターンとの距離以下が好ましい。
As the conductive particles 5, Au, Ag, Ni,
There are metal particles such as Cu, W, Sb, Sn, and solder, carbon, and the like, and the conductive layer described above is formed by coating the above-mentioned conductive layer on a polymer core material such as non-conductive glass, ceramics, and plastic. But it is good. Further, the above-mentioned insulating coated particles formed by coating the conductive particles and the insulating layer, and the combination use of the conductive particles and the insulating particles are also extremely useful for thinning the circuit. Heat-melted metal such as solder or polymer nucleus material such as plastic with a conductive layer formed has a thermal transformation point such as melting point and glass transition point, so it has deformability by heating or pressing. This is preferable because the contact area with the circuit at the time of lamination increases and the reliability improves. In this case, if the thermal transformation point of at least the core material of the conductive particles is low due to the insulating film, the insulating film 8 of the adhesive film is not damaged by heating and pressing during lamination and integration, and the interlayer insulating property is highly maintained. It is preferred because it sags. In particular, when a polymer is used as a nucleus, it does not exhibit a melting point unlike solder, so that a softened state can be widely controlled by a connection temperature, and it is easier to cope with variations in thickness and flatness of a wiring board or a wiring pattern, which is more preferable. Also, in the case of hard metal particles such as Ni and W, the conductive particles pierce the wiring pattern, so that a low connection resistance can be obtained even when an oxide film or a contaminant layer is present on the wiring pattern. It is also effective in suppressing expansion and contraction due to the fixation of the fixing member, and reliability is improved. Therefore, the particle size in the case of hard metal particles is determined by the distance between wiring patterns that require connection (thickness after connection)
It is preferable that the particle size is slightly larger than the above, and when the particle size is smaller than that, it is preferable that the particles are aggregated. In principle, the number of the conductive particles may be one in a portion of the wiring pattern that requires connection, but it is preferable to use five or more because connection reliability is further improved. The particle size is preferably equal to or less than the distance between adjacent wiring patterns in order to cope with thinning.

【0009】要部に貫通孔7を有する絶縁フィルム8と
しては、ポリイミド、ポリエチレンテレフタレート、ポ
リエチレン等の一般的な絶縁フィルムで良く、なるべく
薄いものが多層配線板の厚みの減少やコスト低減から好
ましい。通孔7は層間の導電性が必要な部分に形成す
るが、導電粒子5と接着剤6よりなる接着剤層を含んだ
構成(図1、7)、接着剤層と絶縁フィルムを含まな
いで貫通孔のみ(図1、7)でも良い。加工性の点か
ら後者が好ましい
As the insulating film 8 having the through hole 7 in the main part, a general insulating film such as polyimide, polyethylene terephthalate, or polyethylene may be used, and a thin film as possible is preferable from the viewpoint of reducing the thickness and cost of the multilayer wiring board. Transmural hole 7 is formed on the conductivity required portion of the interlayer, including the adhesive layer conductive particles 5 and consisting of an adhesive 6
Configuration (Figure 1, 7 B), only the through-holes not include an adhesive layer insulating film (Fig. 1, 7 A) may be used. The latter is preferred from the viewpoint of workability .

【0010】積層一体化に際しては、配線パターン面の
接続を必要とする部分を位置合わせし加熱加圧する。こ
の時積層を必要とする所定枚の配線板と接着フィルムに
例えば貫通孔を形成しておきピン等で位置合わせするい
わゆるピンラミネーション法が好適であり、一体化の方
法としては、プレスやロールラミネータ等の一般的な方
法で良い。ピンラミネーション法の貫通孔を導電性接着
剤で充填することや、スルーホールめっきすることで、
全層間の電気的接続を得ることも出来る。
At the time of lamination and integration, a portion of the wiring pattern surface that requires connection is positioned and heated and pressed. At this time, a so-called pin lamination method in which, for example, a through-hole is formed in a predetermined number of wiring boards and an adhesive film that require lamination and alignment is performed with pins or the like is preferable. As a method of integration, a press or roll laminator is used. A general method such as the above may be used. By filling the through-holes of the pin lamination method with a conductive adhesive or plating through holes,
Electrical connections between all layers can also be obtained.

【0011】図2は図1の構成の積層一体化後を示す断
面模式図である。加熱加圧により、接着剤は流動し導電
粒子5が配線パターン上の接続を必要とする部分2−
2’に集中し電気的接続を可能とし、接着剤は流動して
両基板1−1’間を充填して接着し、絶縁フィルム8に
より層間絶縁性が保たれる。また接続不要配線パターン
9も同様に絶縁性が保たれる。この層を任意に積層する
ことで任意の多層配線板とすることが出来る。好ましい
導電粒子であるはんだ等の熱溶融金属や、プラスチック
等の高分子核材に導電層を形成したものは、導電粒子5
が配線パターン上の接続を必要とする部分2−2’に変
形して挟まれパターンとの接触面積が増大し接続抵抗が
安定化し信頼性も向上する。接着剤の最適充填量は接着
剤の厚みで管理できるが、積層一体化により端部に流出
させて不要部を除去すると気泡の混入が少なく好まし
い。
FIG. 2 is a schematic sectional view showing the structure of FIG. 1 after lamination and integration. Due to the heating and pressing, the adhesive flows and the conductive particles 5 need to be connected on the wiring pattern.
The adhesive concentrates on 2 'to enable electrical connection, the adhesive flows and fills and adheres between the two substrates 1-1', and the insulating film 8 maintains interlayer insulation. Also, the connection unnecessary wiring pattern 9 is similarly kept insulative. By arbitrarily laminating this layer, an arbitrary multilayer wiring board can be obtained. Preferred conductive particles are those obtained by forming a conductive layer on a hot-melt metal such as solder or a polymer nucleus material such as plastic.
Is deformed into a portion 2-2 'requiring connection on the wiring pattern, the contact area with the interposed pattern is increased, the connection resistance is stabilized, and the reliability is improved. Although the optimum filling amount of the adhesive can be controlled by the thickness of the adhesive, it is preferable that the unnecessary portion is removed by flowing out to the end by laminating and integrating, so that air bubbles are less mixed.

【0012】[0012]

【作用】本発明によれば、絶縁基板に配線パターンを形
成してなる複数枚以上の両面配線板の間に、要部に貫通
孔を有する絶縁フィルムの両面に導電粒子と接着剤とよ
りなる接着剤層を形成し、加熱加圧により積層一体化し
てなる多層印刷配線板なので、相互接続部以外は絶縁性
接着剤に接するためカバーフィルムが不要であり、相互
接続部は導電粒子により電気的接続を得ているのでめっ
きが不要である。本発明の導電粒子は、積層一定化によ
り配線パターンの要部のみに集中的に流動し配置される
ので、隣接パターン間でリークが発生せず熱圧着の条件
が広範囲に適用可能である。たとえ接続部以外に導電粒
子が存在しても絶縁フィルムが層間に存在するので絶縁
性が保たれ、その濃度も薄いので隣接配線パターンでの
リークが発生しない。そのため接続抵抗が安定化し信頼
性も向上し回路の細線化に対応可能であり、加えて多層
配線板の厚みの減少やコスト低減にも有効な多層配線板
が極めて容易に得られる。
According to the present invention, an adhesive comprising conductive particles and an adhesive on both sides of an insulating film having a through hole in a main part between a plurality of double-sided wiring boards each having a wiring pattern formed on an insulating substrate. Since it is a multilayer printed wiring board that forms layers and is laminated and integrated by heating and pressing, it does not require a cover film because it is in contact with the insulating adhesive except for the interconnects, and the interconnects are electrically connected by conductive particles. No plating is required because it is obtained. Since the conductive particles of the present invention are intensively flown and arranged only in the main part of the wiring pattern by the constant lamination, there is no leak between adjacent patterns, and the conditions of thermocompression bonding can be widely applied. Even if conductive particles are present in portions other than the connection portion, the insulating property is maintained because the insulating film exists between the layers, and the concentration thereof is low, so that leakage does not occur in the adjacent wiring pattern. Therefore, the connection resistance is stabilized, the reliability is improved, and it is possible to cope with the thinning of the circuit. In addition, a multilayer wiring board which is effective in reducing the thickness and cost of the multilayer wiring board can be obtained very easily.

【0013】また本発明に好適な接着フィルムは、接着
剤と導電粒子よりなる接着剤層を絶縁フィルムの両面に
形成してなるので、従来のカバーフィルムとそれを接着
する接着剤とが当初から一体化しているので、コスト低
減に有効な多層印刷配線板が極めて容易に得られる。特
に導電粒子として高分子類を核とした場合、軟化の状態
を接続温度で広く制御でき配線板や配線パターンの厚み
や平坦性ばらつきに対応し易くなる。
Further, the adhesive film suitable for the present invention is obtained by forming an adhesive layer comprising an adhesive and conductive particles on both sides of an insulating film, so that the conventional cover film and the adhesive for bonding the same are originally formed. Since they are integrated, a multilayer printed wiring board effective for cost reduction can be obtained very easily. In particular, when a polymer is used as the core as the conductive particles, the softening state can be widely controlled by the connection temperature, and it is easy to cope with variations in the thickness and flatness of the wiring board or wiring pattern.

【0014】[0014]

【実施例】以下実施例でさらに詳細に説明するが、本発
明はこれに限定されない。また、説明を分かりやすくす
るため2枚の両面基板を層間接続した4層配線板につい
て述べるが、2枚の両面基板のうち1枚が片面基板でも
よく、4層をこえる多層配線板にも当然適用できる。
The present invention will be described in more detail with reference to the following Examples, but it should not be construed that the present invention is limited thereto. In addition, a four-layer wiring board in which two double-sided boards are connected to each other for easy understanding will be described. However, one of the two double-sided boards may be a single-sided board, or a multilayer wiring board having more than four layers may be used. Applicable.

【0015】実施例1〜4 厚み50μmのポリイミドフィルムの両面に接着剤10
μmを介して銅箔18μmを形成してなる両面基板を、
パターン印刷及びエッチング等を行った配線板を用意し
た。接続を必要とする配線パターンの最小径は50μm
であった。ポリイミドフィルム25μmに接続を必要と
する配線パターンと一致した貫通孔をパンチしこの両面
に、高分子量エポキシを主成分とする厚み15μmの接
着剤(純水で100℃10h抽出後の抽出水のNaイオ
ン、Clイオンがそれぞれ10ppm以下)を形成し
た。この接着剤中には下記の導電粒子を12体積%均一
分散させて、本発明の接着剤フィルムとした。ここに用
いた導電粒子は、架橋ポリスチレンからなる核材の表面
にNi/Auの複合導電層を有する粒径10μmのめっ
きプラスチック球(実施例1)、平均粒径7μmのカー
ボニル法Ni(実施例2)、平均粒径15μmの融点1
80℃のはんだ粒子(実施例3)、実施例1の粒子表面
を厚み約0.2μmのナイロンで被覆した絶縁被覆粒子
(実施例4)である。前記配線板の一方の接続を必要と
する配線パターンと接着フィルムの貫通孔及び他の配線
板との、周辺の4辺に形成したスルーホールにピンで位
置合わせ後、スルーホール部を導電性接着剤で充填し、
180℃20kg/cm2 で30分加熱加圧して接着剤
を硬化した。以上により、2枚の両面基板を層間接続し
た4層配線板を得た。実施例1〜4はいずれも十分な層
間接続特性を示した。
Examples 1 to 4 An adhesive 10 was applied to both sides of a polyimide film having a thickness of 50 μm.
A double-sided board formed by forming a copper foil 18 μm through
A wiring board on which pattern printing, etching, and the like were performed was prepared. The minimum diameter of the wiring pattern that requires connection is 50 μm
Met. Punch a through-hole corresponding to the wiring pattern requiring connection on the polyimide film 25 μm, and apply a 15 μm thick adhesive mainly composed of high molecular weight epoxy (Na of extracted water after extraction at 100 ° C. for 10 hours with pure water) on both sides. Ions and Cl ions are each 10 ppm or less). The following conductive particles were uniformly dispersed in the adhesive in an amount of 12% by volume to obtain an adhesive film of the present invention. The conductive particles used here were plated plastic spheres having a particle diameter of 10 μm having a Ni / Au composite conductive layer on the surface of a core material made of cross-linked polystyrene (Example 1), and carbonyl method Ni having an average particle diameter of 7 μm (Example 1). 2), melting point 1 with an average particle size of 15 μm
80 ° C. solder particles (Example 3), and insulating coated particles (Example 4) obtained by coating the particle surface of Example 1 with nylon having a thickness of about 0.2 μm. After aligning the through-holes formed on the four sides of the wiring pattern with the through-hole of the adhesive film and the other wiring board with the wiring pattern that requires connection of one of the wiring boards with pins, the through-hole portion is conductively bonded. Filling with the agent,
180 ° C 20 kg / cm 2 For 30 minutes to cure the adhesive. As described above, a four-layer wiring board in which two double-sided boards are connected between layers is obtained. Examples 1 to 4 all showed sufficient interlayer connection characteristics.

【0016】実施例5 厚み0.2mmのガラスエポキシ基板の両面に接着剤1
0μmを介して銅箔18μmを形成してなる両面基板
を、パターン印刷及びエッチング等を行った配線板を用
意した。接続を必要とする配線パターンの最小径は20
μmであった。実施例1の接着フィルムを用いて、実施
例1と同様な位置合わせ、加熱加圧、接着剤硬化を行
い、2枚の両面基板を層間接続した4層配線板を得た。
実施例5も十分な層間接続特性を示した。
Example 5 Adhesive 1 was applied to both sides of a glass epoxy substrate having a thickness of 0.2 mm.
A wiring board was prepared by performing pattern printing, etching, and the like on a double-sided board formed with a copper foil of 18 μm through 0 μm. The minimum diameter of the wiring pattern that requires connection is 20
μm. Using the adhesive film of Example 1, the same positioning, heating, pressurizing, and curing of the adhesive as in Example 1 were performed to obtain a four-layer wiring board in which two double-sided boards were interconnected.
Example 5 also showed sufficient interlayer connection characteristics.

【0017】[0017]

【発明の効果】以上のように本発明によれば、カバーフ
ィルムやめっき工程が不要で回路の細線化に対応可能で
あり、加えて多層配線板の厚みの減少やコスト低減にも
有効な接続信頼性が向上した多層配線板が極めて合理的
に容易に得られる。
As described above, according to the present invention, a cover film and a plating step are not required, and it is possible to cope with thinning of a circuit, and in addition, a connection effective for reducing the thickness of a multilayer wiring board and reducing costs. A multilayer wiring board with improved reliability can be obtained very reasonably easily.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の製造時の構成の一実施例を示す断面模
式図である。
FIG. 1 is a schematic cross-sectional view showing one embodiment of a configuration at the time of manufacture of the present invention.

【図2】本発明の積層一体化後の一実施例を示す断面模
式図である。
FIG. 2 is a schematic sectional view showing one embodiment of the present invention after lamination and integration.

【符号の説明】[Explanation of symbols]

1 絶縁基板 2 配線パターン 3 第1の配線板 4 第2の配線板 5 導電粒子 6 接着剤 7 貫通孔 8 絶縁フィルム 9 接続不要配線パターン 10 接着フィルム DESCRIPTION OF SYMBOLS 1 Insulating board 2 Wiring pattern 3 1st wiring board 4 2nd wiring board 5 Conductive particle 6 Adhesive 7 Through hole 8 Insulating film 9 Connection unnecessary wiring pattern 10 Adhesive film

───────────────────────────────────────────────────── フロントページの続き (72)発明者 井坂 和博 茨城県下館市大字小川1500番地 日立化 成工業株式会社 下館研究所内 (72)発明者 太田 共久 茨城県下館市大字小川1500番地 日立化 成工業株式会社 下館研究所内 (72)発明者 山口 豊 茨城県下館市大字小川1500番地 日立化 成工業株式会社 下館研究所内 (56)参考文献 特開 昭61−49499(JP,A) 特開 昭52−79268(JP,A) 特開 平2−36593(JP,A) 特開 昭61−187394(JP,A) ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor Kazuhiro Isaka 1500 Oji Ogawa, Shimodate City, Ibaraki Pref.Hitachi Chemical Industry Co., Ltd. (72) Inventor Yutaka Yamaguchi 1500 Ogawa, Shimodate-shi, Ibaraki Pref. Hitachi Chemical Industries, Ltd. Shimodate Research Laboratory (56) References JP-A-61-49499 (JP, A) -79268 (JP, A) JP-A-2-36593 (JP, A) JP-A-61-187394 (JP, A)

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】絶縁基板に配線パターンを形成してなる2
枚以上の両面配線板の間に、要部に貫通孔を有する絶縁
フィルムの両面に導電粒子と接着剤とよりなる接着剤層
を配置し、加熱加圧により積層一体化後に要部に導電粒
子が集中してなる多層配線板。
1. An insulating substrate on which a wiring pattern is formed.
Between two or more double-sided wiring boards, an adhesive layer composed of conductive particles and an adhesive is disposed on both sides of an insulating film having a through hole in a main part, and the conductive particles are applied to the main part after lamination and integration by heating and pressing.
Multilayer wiring board with children concentrated .
【請求項2】接着剤と導電粒子よりなる接着剤層が貫通
孔を有する絶縁フィルムの両面に形成されており、前記
導電粒子の熱的変態点が絶縁フィルムより低温であり、
導電粒子が(a)金属粒子、(b)導電性または非導電
性粒子表面に導電層を被覆形成したもの、(c)導電性
粒子に絶縁層を被覆した絶縁被覆粒子より選択されてな
る請求項1に記載の多層配線板に用いる接着フィルム。
2. An adhesive layer comprising an adhesive and conductive particles penetrates.
It is formed on both sides of the insulating film having holes, the thermal transformation point of the conductive particles is lower temperature than the insulating film ,
The conductive particles are (a) metal particles, (b) conductive or non-conductive
A conductive layer coated on the surface of conductive particles, (c) conductive
Not selected from insulating coated particles in which particles are coated with an insulating layer
An adhesive film used for the multilayer wiring board according to claim 1 .
JP30094192A 1992-11-11 1992-11-11 Multilayer wiring board and adhesive film used for it Expired - Fee Related JP3324660B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30094192A JP3324660B2 (en) 1992-11-11 1992-11-11 Multilayer wiring board and adhesive film used for it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30094192A JP3324660B2 (en) 1992-11-11 1992-11-11 Multilayer wiring board and adhesive film used for it

Publications (2)

Publication Number Publication Date
JPH06152139A JPH06152139A (en) 1994-05-31
JP3324660B2 true JP3324660B2 (en) 2002-09-17

Family

ID=17890946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30094192A Expired - Fee Related JP3324660B2 (en) 1992-11-11 1992-11-11 Multilayer wiring board and adhesive film used for it

Country Status (1)

Country Link
JP (1) JP3324660B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4595471B2 (en) 2004-09-30 2010-12-08 住友電気工業株式会社 Conductive paste and method for producing multilayer printed wiring board using the same

Also Published As

Publication number Publication date
JPH06152139A (en) 1994-05-31

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