JP2002335080A - Manufacturing method of multilayer wiring board - Google Patents

Manufacturing method of multilayer wiring board

Info

Publication number
JP2002335080A
JP2002335080A JP2002070342A JP2002070342A JP2002335080A JP 2002335080 A JP2002335080 A JP 2002335080A JP 2002070342 A JP2002070342 A JP 2002070342A JP 2002070342 A JP2002070342 A JP 2002070342A JP 2002335080 A JP2002335080 A JP 2002335080A
Authority
JP
Japan
Prior art keywords
wiring
adhesive
wiring board
wiring pattern
conductive particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002070342A
Other languages
Japanese (ja)
Inventor
Isao Tsukagoshi
功 塚越
Yasushi Goto
泰史 後藤
Naoyuki Shiozawa
直行 塩沢
Tomohisa Ota
共久 太田
Yutaka Yamaguchi
豊 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2002070342A priority Critical patent/JP2002335080A/en
Publication of JP2002335080A publication Critical patent/JP2002335080A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of multilayer wiring boards using interlayer connection, which can cope with variation in the height of wiring patterns, connect a desired wiring pattern, eliminate the need for a cove film and a plating process, and also cope with thin-line in wiring. SOLUTION: An adhesive layer has conductivity in a thickness direction and comprises a conductive particle having a particle size smaller than the distance between adjacent wiring patterns and an adhesive. The adhesive layer is arranged between at least two double-sided wiring boards where a wiring pattern is formed projecting to an insulating board. The interlayer connection is carried out by achieving lamination integration due to heating and press, one where a conductive layer is formed on the surface of a molecular nuclide is used as a conductive particle.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、多層配線板の製造
法に関する。
[0001] The present invention relates to a method for manufacturing a multilayer wiring board.

【0002】[0002]

【従来の技術】多層配線板は、信号回路、電源、アース
回路等を内蔵できることから、配線の高密度化の有効な
方法として種々の電子機器に多用されている。従来の多
層印刷配線板の代表的製造法は、相互接続部以外をカバ
ーレイフィルム等で覆い絶縁性を得ながら、銅めっき等
により各層の配線パターンを相互に電気的に接続するこ
とが一般的に行われている。また、比較的新しい試みと
して、相互接続部以外をカバーレイフィルムやマスクフ
ィルム、レジストフィルム等(これらをカバーフィルム
と以下総称)で覆う等して絶縁性を得ながら、相互接続
部を導電粒子を分散した接着剤よりなる材料を用いて各
層の配線パターンを相互に接続することも提案(例えば
特開昭61−49499号公報や、特開平2−3659
3号公報)されており、この場合の導電粒子として、は
んだが用いられている。
2. Description of the Related Art A multilayer wiring board can incorporate a signal circuit, a power supply, an earth circuit, and the like, and is therefore often used in various electronic devices as an effective method for increasing the wiring density. A typical method of manufacturing a conventional multilayer printed wiring board is to cover the portions other than the interconnections with a coverlay film or the like and obtain electrical insulation, and electrically connect the wiring patterns of each layer to each other by copper plating or the like. It has been done. In addition, as a relatively new attempt, the interconnects are covered with conductive particles while obtaining insulation by covering other than the interconnects with a coverlay film, mask film, resist film, etc. (collectively referred to as cover films hereinafter). It has also been proposed to connect the wiring patterns of each layer to each other using a material made of a dispersed adhesive (for example, Japanese Patent Application Laid-Open No. 61-49499 and Japanese Patent Application Laid-Open No. 2-3659).
No. 3), and solder is used as the conductive particles in this case.

【0003】[0003]

【発明が解決しようとする課題】上記従来の方法はいず
れも、相互接続部以外をカバーフィルムで覆うため、対
向する配線板間にカバーフィルムが2層存在し多層配線
板とした時、厚みの減少が得難くコストアップの一因と
もなっていた。また配線パターンの相互接続法について
は、銅等でめっきする方法は複雑なめっき工程が必要で
あり、またカバーフィルムを熱圧着する時に銅めっき破
壊し易い欠点がある。導電粒子と接着剤よりなる材料で
接続する場合は、配線パターンの高さのばらつきに対応
しにくく実用性に乏しかった。すなわち硬質導電粒子の
場合、スペーサ状となりこの部分より高さの低い配線パ
ターンの接続が不可能となり、はんだのような接続時に
溶融し比較的配線パターンの高さのばらつきに対応可能
な軟質導電粒子の場合、隣接配線パターン間で溶融して
連結しリークする等、ますます進行する配線の細線化に
対応不可能となってきた。本発明は、配線パターンの高
さのばらつきに対応可能で所望の配線パターンが接続で
き、カバーフィルムやめっき工程が不要でさらに配線の
細線化にも対応可能な層間接続を用いた多層配線板の製
造法に関する。
In each of the above-mentioned conventional methods, since a portion other than the interconnecting portion is covered with a cover film, two layers of the cover film exist between the opposing wiring boards, and when a multilayer wiring board is formed, the thickness is reduced. The decrease was difficult to obtain, which contributed to the cost increase. As for the interconnection method of the wiring patterns, the method of plating with copper or the like requires a complicated plating step, and has a disadvantage that the copper plating is easily broken when the cover film is thermocompressed. When the connection is made of a material composed of conductive particles and an adhesive, it is difficult to cope with variations in the height of the wiring pattern, and the practicability is poor. That is, in the case of hard conductive particles, the conductive pattern becomes a spacer, and the connection of the wiring pattern lower than this portion becomes impossible, and the soft conductive particles that are melted at the time of connection like solder and can relatively cope with the variation in the height of the wiring pattern. In such a case, it has become impossible to cope with increasingly thinning of the wiring, such as melting and connecting between adjacent wiring patterns and leaking. The present invention is directed to a multilayer wiring board using an interlayer connection that can cope with a variation in the height of a wiring pattern, can connect a desired wiring pattern, does not require a cover film or a plating step, and can also cope with thinning of wiring. Related to manufacturing method.

【0004】[0004]

【課題を解決するための手段】本発明は、絶縁基板に突
出した配線パターンを形成してなる2枚以上の両面配線
板の間に、粒径が隣接配線パターン間距離よりも小さな
導電粒子と接着剤とよりなる厚み方向に導電性を有する
接着剤層を配置し、加熱加圧により積層一体化すること
により層間接続を行う多層印刷配線板の製造法に関する
ものである。すなわち、絶縁基板に突出した配線パター
ンを形成してなる2枚以上の両面配線板の間に、粒径が
隣接配線パターン間距離よりも小さな導電粒子と接着剤
とよりなる厚み方向に導電性を有する接着剤層を配置
し、加熱加圧により積層一体化することにより層間接続
を行う多層配線板の製造法で、導電粒子が高分子核体の
表面に導電層を形成した多層配線板の製造法。そして、
層間接続部の配線パターン上の接続を必要とする部分に
5個以上の導電粒子が変形して存在する多層配線板の製
造法。接着剤層に、さらに、積層一体化後の対向する配
線パターンの最小部の距離と同等な、少なくとも積層時
に導電粒子より変形しにくい硬質な粒状物を含有させる
多層配線板の製造法。接着剤の抽出水(純水で100
℃、10時間抽出後)のNa及びClイオンがそれぞれ
接着剤重量に対して20ppm以下である多層配線板の
製造法である。
SUMMARY OF THE INVENTION The present invention relates to a method of forming a conductive pattern between two or more double-sided wiring boards, each having a wiring pattern protruding from an insulating substrate, and a conductive particle having a particle size smaller than the distance between adjacent wiring patterns. The present invention relates to a method for manufacturing a multilayer printed wiring board in which an adhesive layer having conductivity is arranged in the thickness direction and the layers are integrated by heating and pressing to perform interlayer connection. That is, an adhesive having conductivity in the thickness direction comprising conductive particles having a particle size smaller than the distance between adjacent wiring patterns and an adhesive is provided between two or more double-sided wiring boards each having a protruding wiring pattern formed on an insulating substrate. A method for producing a multilayer wiring board in which conductive layers are formed on a surface of a polymer nucleus by forming conductive layers on a surface of a polymer nucleus. And
A method of manufacturing a multilayer wiring board in which five or more conductive particles are deformed and present in a part of a wiring pattern of an interlayer connection part that requires connection. A method for producing a multilayer wiring board, wherein the adhesive layer further contains hard particles that are at least equal to the distance of the opposing wiring pattern after lamination and integration and are less likely to deform than conductive particles during lamination. Adhesive extraction water (100 with pure water)
This is a method for producing a multilayer wiring board in which Na and Cl ions (after extraction at 10 ° C. for 10 hours) are each 20 ppm or less based on the weight of the adhesive.

【0005】本発明の構成を図面を参照しながら説明す
る。図1は、本発明の一実施例を説明する断面模式図で
ある。1は絶縁基板であり、フェノール樹脂、エポキシ
樹脂、ポリイミド等を、紙、ガラス布、ガラス不織布、
等の基材に含浸し加熱加圧したものや、ポリエステルや
ポリイミド等のプラスチックフィルム、AlやFe等の
金属、及びセラミックス等がある。配線パターン2は、
図1のように絶縁基板1の両面に形成するが、多層配線
板を構成したときの最外層は片面でも良い。配線パター
ン2は図1のように基板面から少なくとも一方が突出す
る必要がある。対抗する配線パターンは図示してないが
平面状や凹面状等いずれでも良いが、絶縁基板1の表面
から突出することが接続安定性の点から好ましい。これ
らの配線パターンは、テンティング法、アディティブ
法、及び転写法等の一般手段で形成できる。絶縁基板1
と配線パターン2の間に接着層が存在しても良い。
The configuration of the present invention will be described with reference to the drawings. FIG. 1 is a schematic sectional view illustrating an embodiment of the present invention. Reference numeral 1 denotes an insulating substrate made of phenolic resin, epoxy resin, polyimide, etc., paper, glass cloth, glass nonwoven fabric,
Or the like, which is impregnated into a base material such as polyester, heated and pressed, a plastic film such as polyester or polyimide, a metal such as Al or Fe, and a ceramic. Wiring pattern 2
Although formed on both sides of the insulating substrate 1 as shown in FIG. 1, the outermost layer when a multilayer wiring board is formed may be one side. It is necessary that at least one of the wiring patterns 2 protrudes from the substrate surface as shown in FIG. The opposing wiring pattern is not shown, but may be any of a flat shape and a concave shape, but it is preferable to protrude from the surface of the insulating substrate 1 from the viewpoint of connection stability. These wiring patterns can be formed by general means such as a tenting method, an additive method, and a transfer method. Insulating substrate 1
An adhesive layer may be present between the wiring pattern 2.

【0006】本発明に好適な接着剤層7について説明す
る。接着剤6としては、シート等に用いられる熱可塑性
材料や、熱、光、電子線等のエネルギーによる硬化性材
料が広く適用出来る。多層配線板の耐熱性や耐湿性に優
れることから硬化性材料が好ましく、中でもエポキシ系
接着剤やイミド系接着剤は、分子構造上接着性や耐熱性
に優れることや硬化時間が広く設定出来ることから好ま
しい。エポキシ系接着剤は、例えば高分子量エポキシ、
固形エポキシと液状エポキシ、ウレタンやポリエステ
ル、NBR等で変性したエポキシを主成分とし、硬化剤
や触媒、カップリング剤、充填剤等を添加してなるもの
が一般的である。これら材料は、抽出水のNaイオンや
Clイオンが20ppm以下の高純度品であると、多層
配線板の耐電食性が向上することが好ましい。
The adhesive layer 7 suitable for the present invention will be described. As the adhesive 6, a thermoplastic material used for a sheet or the like, or a curable material using energy such as heat, light, or an electron beam can be widely applied. Curable materials are preferred because they have excellent heat resistance and moisture resistance of the multilayer wiring board.Epoxy-based adhesives and imide-based adhesives have excellent adhesiveness and heat resistance due to their molecular structure, and can be set over a wide range of curing times. Is preferred. Epoxy adhesives, for example, high molecular weight epoxy,
In general, a solid epoxy, a liquid epoxy, an epoxy modified with urethane, polyester, NBR or the like as a main component, and a curing agent, a catalyst, a coupling agent, a filler, and the like are added. When these materials are high-purity products in which Na ions and Cl ions of the extraction water are 20 ppm or less, it is preferable that the electric corrosion resistance of the multilayer wiring board is improved.

【0007】導電粒子5としては、Au、Ag、Ni、
Cu、W、Sb、Sn、はんだ等の金属粒子やカーボン
等があり、これら及び非導電性のプラスチック等の高分
子核材等に、前記した導電層を被覆等により形成したも
のでも良い。さらに前記したような導電粒子と絶縁層で
被覆してなる絶縁被覆粒子や、導電粒子と絶縁粒子の併
用等も、回路の細線化に極めて有用である。これら導電
粒子の粒径は隣接配線パターン間距離よりも小さいこと
が、配線の細線化に対応する上で必要である。導電粒子
5は、加熱加圧もしくは加圧により変形性を有し、積層
時に回路との接触面積が増加し信頼性が向上するので好
ましい。この変形性とは、導電粒子が高分子核材の表面
に導電層を有する被覆粒子の場合や、導電粒子が凝集体
を形成し積層時に凝集状態を変える場合をいう。これら
の粒子は、はんだのように溶融せずに積層時の加熱加圧
により変形性を有するので、配線板や配線パターンの厚
みや平坦性のばらつき、あるいは配線パターンが突起し
た配線パターンと突起しない配線パターンとが混在して
なる場合等に対応し易く、またはんだのように溶融しな
いのでリークの心配はない。導電粒子の数は、加圧方向
にのみ導電性を有する程度の数で良い。このため原則的
には配線パターン上の接続を必要とする部分に1個あれ
ば良いが、5個以上とすることで接続信頼性がさらに向
上するので好ましい。導電粒子の数が増すと積層一体化
後に、隣接パターン間でリークが発生し易くなる。
As the conductive particles 5, Au, Ag, Ni,
There are metal particles such as Cu, W, Sb, Sn, and solder, carbon, and the like, and the conductive layer may be formed by coating the conductive layer on a polymer core material such as a non-conductive plastic or the like. Further, the above-mentioned insulating coated particles formed by coating the conductive particles and the insulating layer, and the combination use of the conductive particles and the insulating particles are also extremely useful for thinning the circuit. It is necessary that the particle size of these conductive particles be smaller than the distance between adjacent wiring patterns in order to cope with thinning of wiring. The conductive particles 5 are preferable because they have deformability by heating or pressurizing or pressurizing, and increase the contact area with the circuit at the time of lamination and improve reliability. The term “deformability” refers to a case where the conductive particles are coated particles having a conductive layer on the surface of a polymer core material, or a case where the conductive particles form an aggregate and change the aggregation state during lamination. These particles do not melt like solder and have deformability due to heating and pressing during lamination, so they do not protrude from the wiring pattern or the wiring pattern in which the thickness or flatness varies, or the wiring pattern protrudes. It is easy to cope with the case where the wiring pattern is mixed with the wiring pattern, or the like. The number of conductive particles may be such that the particles have conductivity only in the pressing direction. For this reason, in principle, it is sufficient that only one portion is required on the wiring pattern, but it is preferable to use five or more portions because connection reliability is further improved. When the number of the conductive particles increases, a leak easily occurs between adjacent patterns after lamination and integration.

【0008】本発明に好適な高分子核材の表面に、金
属、金属酸化物、合金等の導電層を有する被覆粒子の高
分子核材としては、ポリスチレンやエポキシ樹脂等のプ
ラスチックやゴム類等の高分子類がある。高分子核材の
表面に導電層を有する導電粒子は、はんだのように融点
を示さないので軟化の状態を接続温度で広く制御でき
る。被覆粒子や、例えばNiやW等の硬質金属粒子の場
合、凝集体を形成し積層時に凝集状態を変えることで信
頼性が向上する。
[0008] The polymer core material of the coated particles having a conductive layer of metal, metal oxide, alloy or the like on the surface of the polymer core material suitable for the present invention includes plastics such as polystyrene and epoxy resin, rubbers and the like. Polymers. The conductive particles having a conductive layer on the surface of the polymer nucleus material do not show a melting point unlike solder, so that the softened state can be widely controlled by the connection temperature. In the case of coated particles or hard metal particles such as Ni and W, reliability is improved by forming an aggregate and changing the aggregate state during lamination.

【0009】積層一体化に際しては、絶縁性基板に少な
くとも突起した配線パターンを有してなる複数枚以上の
両面配線板の間に、導電粒子と接着剤とよりなる接着剤
層を形成し、配線パターン面の接続を必要とする部分を
位置合わせし加熱加圧により積層一体化する。この時積
層を必要とする所定枚の配線板に例えば貫通孔を形成し
ておきピン等で位置合わせするいわゆるピンラミネーシ
ョン法が好適であり、一体化の方法としては、プレスや
ロールラミネータ等の一般的な方法で良い。ピンラミネ
ーション法の貫通孔を導電性接着剤で充填することや、
スルーホールめっきすることで全層間の電気的接続を得
ることも出来る。
At the time of lamination and integration, an adhesive layer made of conductive particles and an adhesive is formed between a plurality of double-sided wiring boards having at least a wiring pattern protruding on an insulating substrate, and the wiring pattern surface is formed. The parts requiring connection are aligned and laminated by heating and pressing. At this time, a so-called pin lamination method in which, for example, a through-hole is formed in a predetermined number of wiring boards that require lamination and alignment is performed with pins or the like is preferable. As a method of integration, a general method such as pressing or a roll laminator is used. Good way. Filling the through-hole of the pin lamination method with a conductive adhesive,
Electrical connection between all layers can be obtained by plating through holes.

【0010】図2は図1の構成の積層一体化後を示す断
面模式図である。接続を必要とする配線パターン2を有
する、第1及び第2の配線板3、4間に、導電粒子5と
接着剤6よりなる接着剤層7を用いて積層一体化し、2
つの配線板同士3−4を接着すると共に、これらの接続
を必要とする配線パターン間2−2’の電気的導通を得
るものである。ここに接続を必要とする配線パターン2
は、パターン全体でもパターンの一部でも良く、接続面
に接続不要配線パターン8(例えばバイアホール部)が
存在しても良い。好ましい導電粒子である変形性粒子の
場合、導電粒子5が配線パターン上の接続を必要とする
部分2−2’に変形して挟まれパターンとの接触面積が
増大し接続抵抗が安定化し信頼性も向上する。
FIG. 2 is a schematic sectional view showing the structure of FIG. 1 after lamination and integration. An adhesive layer 7 made of conductive particles 5 and an adhesive 6 is laminated and integrated between the first and second wiring boards 3 and 4 having the wiring pattern 2 requiring connection.
The two wiring boards 3-4 are bonded together, and electrical connection between the wiring patterns 2-2 'which requires these connections is obtained. Wiring pattern 2 which needs connection here
May be an entire pattern or a part of the pattern, and a connection-free wiring pattern 8 (for example, a via hole) may be present on the connection surface. In the case of the deformable particles, which are preferable conductive particles, the conductive particles 5 are deformed into the portion 2-2 'that requires connection on the wiring pattern, so that the contact area with the pattern is increased, the connection resistance is stabilized, and the reliability is improved. Also improve.

【0011】この層を任意に積層することで任意の多層
配線板とすることが出来る。接着剤の最適充填量は接着
剤の厚みで管理できるが、積層一体化により端部に流出
させて不要部を除去すると気泡の混入が少なく好まし
い。この様子を図3で被覆導電粒子の場合により説明す
る。突起した配線パターンの高さの差(2,2A)に応
じて変形度をかえており、図3は被覆導電粒子の核材の
熱変形により変形する。この時、積層一体化後の対向す
る配線パターンの最小部の距離と同等な、少なくとも積
層時に導電粒子より変形しにくい硬質な粒状物9を含有
すると、配線パターンの高さの差に応じた導電粒子の変
形度をコントロールし易く好ましい。粒状物9は硬質な
導電粒子の単粒径をそのまま用いて良く、また絶縁性の
シリカ、ガラス、ヘンゾグアナミン等の硬質樹脂等があ
る。
By arbitrarily laminating this layer, an arbitrary multilayer wiring board can be obtained. Although the optimum filling amount of the adhesive can be controlled by the thickness of the adhesive, it is preferable that the unnecessary portion is removed by flowing out to the end by laminating and integrating, so that air bubbles are less mixed. This situation will be described with reference to FIG. The degree of deformation is changed according to the difference in height (2, 2A) of the protruding wiring pattern, and FIG. 3 is deformed by thermal deformation of the core material of the coated conductive particles. At this time, if at least a hard granular material 9 that is at least equal to the distance of the opposing wiring pattern after lamination and integration and is less likely to be deformed than the conductive particles at the time of lamination is contained, the conductivity according to the difference in the height of the wiring pattern is increased. This is preferable because the degree of deformation of the particles can be easily controlled. The granular material 9 may use the single particle size of hard conductive particles as they are, and may be insulating silica, glass, hard resin such as henzoguanamine, or the like.

【0012】図4は本発明で得た多層配線板の断面構造
の例である。配線パターンが突出した配線パターン11
と突出しない配線パターン12とが混在しているが、ス
ルーホール部13を含む配線パターンの接続を必要とす
る、突出した配線パターンを含む部分が層間接続され、
突出しない配線パターン例えば平面もしくは凹面の突出
しない配線パターンは層間が絶縁されて接続している。
FIG. 4 shows an example of a sectional structure of a multilayer wiring board obtained by the present invention. Wiring pattern 11 with protruding wiring pattern
And the wiring pattern 12 that does not protrude are mixed, but a portion including the protruding wiring pattern that requires connection of the wiring pattern including the through-hole portion 13 is interlayer-connected,
Wiring patterns that do not protrude, for example, wiring patterns that do not protrude on a flat surface or a concave surface, are insulated and connected between layers.

【0013】本発明によれば、絶縁基板に突出した配線
パターンを有してなる2枚以上の両面配線板の間に、粒
径が隣接配線パターン間距離よりも小さな導電粒子と接
着剤とよりなる接着剤層を配置し、加熱加圧により積層
一体化してなる多層配線板なので、相互接続部以外は絶
縁性接着剤に接するためカバーフィルムが不要であり、
相互接続部は加圧方向のみに導電性の導電粒子により電
気的接続を得ているのでめっきが不要である。導電粒子
は、加熱加圧もしくは加圧により変形性を有するが溶融
しないので、配線パターンの高さのばらつきに対応可能
で所望の配線パターンが接続でき、積層時に回路との接
触面積が増加し信頼性が向上する。また導電粒子の濃度
を管理することとも合わせて、パターン間でリークが発
生せず熱圧着の条件が広範囲に適用可能である。そのた
め接続抵抗が安定化し信頼性も向上し回路の細線化に対
応可能であり、加えて多層配線板の厚みの減少やコスト
低減にも有効な多層配線板が極めて容易に得られる。
[0013] According to the present invention, the bonding between conductive particles having a particle size smaller than the distance between adjacent wiring patterns and an adhesive is provided between two or more double-sided wiring boards having wiring patterns protruding from the insulating substrate. Since it is a multi-layered wiring board with an agent layer arranged and laminated and integrated by heating and pressing, a cover film is unnecessary because it is in contact with the insulating adhesive except for the interconnecting parts,
Since the interconnects are electrically connected only by the pressure in the pressing direction by conductive particles, no plating is required. The conductive particles have deformability due to heating and pressurizing or pressurizing but do not melt, so they can cope with variations in the height of the wiring pattern, connect the desired wiring pattern, and increase the contact area with the circuit at the time of lamination and increase reliability. The performance is improved. In addition to controlling the concentration of the conductive particles, no leak occurs between the patterns, and the conditions of thermocompression bonding can be applied in a wide range. Therefore, the connection resistance is stabilized, the reliability is improved, and it is possible to cope with the thinning of the circuit. In addition, a multilayer wiring board which is effective in reducing the thickness and cost of the multilayer wiring board can be obtained very easily.

【0014】[0014]

【実施例】以下実施例でさらに詳細に説明するが、本発
明はこれに限定されない。また、説明を分かりやすくす
るため2枚の両面基板を層間接続した4層配線板につい
て述べるが、2枚の両面基板のうち1枚が片面基板でも
よく、4層をこえる多層配線板にも当然適用できる。
The present invention will be described in more detail with reference to the following Examples, but it should not be construed that the present invention is limited thereto. In addition, for simplicity of description, a four-layer wiring board in which two double-sided boards are connected to each other will be described. However, one of the two double-sided boards may be a single-sided board, and a multilayer wiring board having more than four layers may be used. Applicable.

【0015】実施例1〜3 厚み50μmのポリイミドフィルムの両面に接着剤10
μmを介して銅箔18μmを形成してなる両面基板を、
パターン印刷及びエッチング等を行った配線板を用意し
た。接続を必要とする配線パターンの最小径は50μm
であった。ポリテトラフルオロエチレンフィルム25μ
m上に、高分子量エポキシを主成分とする厚み30μm
の接着剤(純水で100℃10h抽出後の抽出水のNa
イオン、Clイオンがそれぞれ10ppm以下)を形成
した。この接着剤中には下記の導電粒子を2体積%均一
分散させて、接着剤フィルムを得た。ここに用いた導電
粒子は、架橋ポリスチレンからなる核材の表面にNi/
Auの複合導電層を有する粒径10μmのめっきプラス
チック球(実施例1)、実施例1の粒子と粒径3μmの
シリカ粒子1体積%を併用(実施例2)、実施例1と同
様であるが粒径3μmのめっきプラスチック球の粒子表
面を厚み約0.2μmのナイロンで被覆した絶縁被覆粒
子(実施例3)である。前記配線板の一方の接続を必要
とする配線パターン上に接着フィルムを載せて、70℃
のゴムロール間を通過させた後ポリテトラフルオロエチ
レンフィルムを剥離し、他の配線板の接続を必要とする
配線パターンと位置合わせ後、スルーホール部を導電性
接着剤で充填し、180℃、20kg/cm2 で30分
加熱加圧して接着剤を硬化した。以上により、2枚の両
面基板を層間接続した4層配線板を得た。実施例1〜3
はいずれも十分な層間接続特性を示した。実施例1では
めっきプラスチック球が適度に変形し、対向する配線パ
ターンの最小部の距離が2μmに制御された。実施例2
では対向する配線パターンの最小部の距離が3μmであ
りシリカ粒子の粒径で制御された。実施例3は小粒径の
ため凝集していたが、加圧方向のみに導電性が得られ
た。
Examples 1 to 3 Adhesive 10 was applied to both sides of a polyimide film having a thickness of 50 μm.
A double-sided board formed by forming a copper foil 18 μm through
A wiring board on which pattern printing, etching, and the like were performed was prepared. The minimum diameter of the wiring pattern that requires connection is 50 μm
Met. Polytetrafluoroethylene film 25μ
m, thickness of 30 μm mainly composed of high molecular weight epoxy
Adhesive (Na of extraction water after extraction with pure water at 100 ° C for 10h)
Ions and Cl ions are each 10 ppm or less). The following conductive particles were uniformly dispersed in the adhesive at 2% by volume to obtain an adhesive film. The conductive particles used here were Ni / Ni particles on the surface of a core material made of cross-linked polystyrene.
As in Example 1, a plated plastic sphere having a composite conductive layer of Au and having a particle diameter of 10 μm (Example 1), a combination of the particles of Example 1 and 1% by volume of silica particles having a particle diameter of 3 μm (Example 2). Are insulating coated particles (Example 3) obtained by coating the surface of a plated plastic sphere having a particle diameter of 3 μm with nylon having a thickness of about 0.2 μm. Place an adhesive film on a wiring pattern of the wiring board that requires one connection,
After passing between the rubber rolls, the polytetrafluoroethylene film is peeled off, aligned with a wiring pattern requiring connection of another wiring board, and then filled with a through-hole portion with a conductive adhesive at 180 ° C. and 20 kg. / Cm 2 for 30 minutes to cure the adhesive. As described above, a four-layer wiring board in which two double-sided boards are connected between layers is obtained. Examples 1-3
All showed sufficient interlayer connection characteristics. In Example 1, the plated plastic ball was appropriately deformed, and the distance between the minimum portions of the opposed wiring patterns was controlled to 2 μm. Example 2
In Example 1, the distance between the minimum portions of the opposing wiring patterns was 3 μm, and the distance was controlled by the particle size of the silica particles. Example 3 was agglomerated because of its small particle size, but conductivity was obtained only in the pressing direction.

【0016】実施例4 厚み0.2mmのガラスエポキシ基板の両面に接着剤1
0μmを介して銅箔18μmを形成してなる両面基板
を、パターン印刷及びエッチング等を行った配線板を用
意した。接続を必要とする配線パターンの最小径は20
μmであった。実施例1の接着フィルムを用いて、実施
例1と同様な位置合わせ、加熱加圧、接着剤硬化を行
い、2枚の両面基板を層間接続した4層配線板を得た。
実施例4も十分な層間接続特性を示した。
Example 4 Adhesive 1 was applied to both sides of a glass epoxy substrate having a thickness of 0.2 mm.
A wiring board was prepared by performing pattern printing, etching, and the like on a double-sided board formed with a copper foil of 18 μm through 0 μm. The minimum diameter of the wiring pattern that requires connection is 20
μm. Using the adhesive film of Example 1, the same positioning, heating, pressurizing, and curing of the adhesive as in Example 1 were performed to obtain a four-layer wiring board in which two double-sided boards were interconnected.
Example 4 also showed sufficient interlayer connection characteristics.

【0017】[0017]

【発明の効果】以上のように本発明によれば、配線パタ
ーンの高さのばらつきに対応可能で所望の配線パターン
が接続出来、カバーフィルムやめっき工程が不要でさら
に配線の細線化にも対応可能な層間接続を用いた多層配
線板を提供できる。
As described above, according to the present invention, it is possible to cope with the variation in the height of the wiring pattern, to connect a desired wiring pattern, and to eliminate the need for a cover film or a plating step and to cope with thinning of the wiring. A multilayer wiring board using a possible interlayer connection can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の構成の一実施例を示す断面模式図であ
る。
FIG. 1 is a schematic sectional view showing an embodiment of the configuration of the present invention.

【図2】本発明の積層一体化後の一実施例を示す断面模
式図である。
FIG. 2 is a schematic sectional view showing one embodiment of the present invention after lamination and integration.

【図3】本発明の導電粒子の変形状態の一実施例を示す
断面模式図である。
FIG. 3 is a schematic sectional view showing one embodiment of a deformed state of the conductive particles of the present invention.

【図4】本発明の多層配線板の一実施例を示す断面模式
図である。
FIG. 4 is a schematic sectional view showing one embodiment of the multilayer wiring board of the present invention.

【符号の説明】[Explanation of symbols]

1 絶縁基板 2 配線パターン 3 第1の配線板 4 第2の配線板 5 導電粒子 6 接着剤 7 接着剤層 8 接続不要配線パタ
ーン 9 粒状物 11 突起した配線パタ
ーン 12 突起していない配線パターン 13 スルーホール部
DESCRIPTION OF SYMBOLS 1 Insulating board 2 Wiring pattern 3 First wiring board 4 Second wiring board 5 Conductive particles 6 Adhesive 7 Adhesive layer 8 Connection unnecessary wiring pattern 9 Granular object 11 Projected wiring pattern 12 Non-projected wiring pattern 13 Through Hall

───────────────────────────────────────────────────── フロントページの続き (72)発明者 塩沢 直行 茨城県下館市大字小川1500番地 日立化成 工業株式会社総合研究所内 (72)発明者 太田 共久 茨城県下館市大字小川1500番地 日立化成 工業株式会社総合研究所内 (72)発明者 山口 豊 茨城県下館市大字小川1500番地 日立化成 工業株式会社総合研究所内 Fターム(参考) 4J040 EC001 EH031 HA066 KA32 NA19 5E344 AA01 AA22 BB02 BB06 CD02 DD06 EE21 EE23 5E346 AA12 AA15 AA16 AA22 AA32 AA35 AA51 CC42 EE06 EE07 EE12 EE18 GG28 HH26 HH31 ──────────────────────────────────────────────────の Continued on the front page (72) Inventor Naoyuki Shiozawa 1500 Oji Ogawa, Shimodate City, Ibaraki Pref.Hitachi Chemical Industry Co., Ltd. (72) Inventor Yutaka Yamaguchi 1500 Ogawa, Shimodate-shi, Ibaraki Pref.Hitachi Chemical Industry Co., Ltd.F-term (reference) 4J040 EC001 EH031 HA066 KA32 NA19 5E344 AA01 AA22 BB02 BB06 CD02 DD06 EE21 EE23 5E346 AA12 AA15 AA16 AA22 AA32 AA35 AA51 CC42 EE06 EE07 EE12 EE18 GG28 HH26 HH31

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 絶縁基板に突出した配線パターンを形成
してなる2枚以上の両面配線板の間に、粒径が隣接配線
パターン間距離よりも小さな導電粒子と接着剤とよりな
る厚み方向に導電性を有する接着剤層を配置し、加熱加
圧により積層一体化することにより層間接続を行う多層
配線板の製造法であり、導電粒子が高分子核体の表面に
導電層を形成したものである多層配線板の製造法。
A conductive material having a particle size smaller than a distance between adjacent wiring patterns and an adhesive is provided between two or more double-sided wiring boards each having a protruding wiring pattern formed on an insulating substrate. Is a method for producing a multilayer wiring board in which an adhesive layer having a layer is disposed and laminated and integrated by heating and pressing to perform interlayer connection, in which conductive particles are formed on the surface of a polymer core. Manufacturing method of multilayer wiring board.
【請求項2】 層間接続部の配線パターン上の接続を必
要とする部分に5個以上の導電粒子が存在することを特
徴とする請求項1に記載の多層配線板の製造法。
2. The method for manufacturing a multilayer wiring board according to claim 1, wherein five or more conductive particles are present in a portion of the interlayer connection requiring connection on the wiring pattern.
【請求項3】 接着剤層に、さらに、積層一体化後の対
向する配線パターンの最小部の距離と同等な、少なくと
も積層時に導電粒子より変形しにくい硬質な粒状物を含
有させることを特徴とする請求項1または請求項2に記
載の多層配線板の製造法。
3. The method according to claim 1, wherein the adhesive layer further contains hard particles which are at least equal to the distance between the opposing wiring patterns after lamination and integration and are less likely to deform than conductive particles during lamination. The method for manufacturing a multilayer wiring board according to claim 1 or 2, wherein
【請求項4】 接着剤の抽出水(純水で100℃、10
時間抽出後)のNa及びClイオンがそれぞれ接着剤重
量に対して20ppm以下である請求項1ないし請求項
3のいずれかに記載の多層配線板の製造法。
4. Extraction water of an adhesive (pure water at 100 ° C., 10
The method for producing a multilayer wiring board according to any one of claims 1 to 3, wherein Na and Cl ions after time extraction) are each 20 ppm or less based on the weight of the adhesive.
JP2002070342A 2002-03-14 2002-03-14 Manufacturing method of multilayer wiring board Pending JP2002335080A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002070342A JP2002335080A (en) 2002-03-14 2002-03-14 Manufacturing method of multilayer wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002070342A JP2002335080A (en) 2002-03-14 2002-03-14 Manufacturing method of multilayer wiring board

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP30094292A Division JPH06152140A (en) 1992-11-11 1992-11-11 Manufacture of multi-layer wiring board

Publications (1)

Publication Number Publication Date
JP2002335080A true JP2002335080A (en) 2002-11-22

Family

ID=19193166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002070342A Pending JP2002335080A (en) 2002-03-14 2002-03-14 Manufacturing method of multilayer wiring board

Country Status (1)

Country Link
JP (1) JP2002335080A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012140589A (en) * 2010-12-29 2012-07-26 Cheil Industries Inc Anisotropic conductive film, anisotropic conductive film composition included in the same, and device using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012140589A (en) * 2010-12-29 2012-07-26 Cheil Industries Inc Anisotropic conductive film, anisotropic conductive film composition included in the same, and device using the same
JP2016189334A (en) * 2010-12-29 2016-11-04 チェイル インダストリーズ インコーポレイテッド Anisotropic conductive film, anisotropic conductive film composition contained in the same, and apparatus including the same

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