JP4968616B2 - Manufacturing method of multilayer printed wiring board - Google Patents

Manufacturing method of multilayer printed wiring board Download PDF

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JP4968616B2
JP4968616B2 JP2005123969A JP2005123969A JP4968616B2 JP 4968616 B2 JP4968616 B2 JP 4968616B2 JP 2005123969 A JP2005123969 A JP 2005123969A JP 2005123969 A JP2005123969 A JP 2005123969A JP 4968616 B2 JP4968616 B2 JP 4968616B2
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wiring board
bump
conductive layer
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hole
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JP2006303245A (en
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良雄 岡
斉 瀧井
憲器 林
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Sumitomo Electric Industries Ltd
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Description

本発明は、2層以上の回路を有し、この回路間が互いに導通(電気的に接続)されている多層プリント配線板の製造方法、及びその製造方法により製造することができる多層プリント配線板に関する。   The present invention has a method of manufacturing a multilayer printed wiring board having two or more layers of circuits, and the circuits are electrically connected (electrically connected) to each other, and a multilayer printed wiring board that can be manufactured by the manufacturing method About.

多層プリント配線板は、部品の高密度の実装を可能とし、部品間を最短距離で接続(導通することを意味する。)できる技術として知られている。特開平8−288649号公報には、簡略な工程で多層プリント配線板を製造する方法が記載されている。   The multilayer printed wiring board is known as a technology that enables high-density mounting of components and can connect (means to conduct) the components at the shortest distance. Japanese Patent Application Laid-Open No. 8-288649 describes a method of manufacturing a multilayer printed wiring board by a simple process.

この方法は、絶縁性基板上に回路を形成してなる配線板、層間接着用の絶縁シート、及び銅箔を、この順に重ね合わせて積層プレスする方法であり、配線板の層間接続箇所に、積層プレス時の加圧加熱で変形する導電材(導電ペースト)のバンプを設けるとともに、層間接着用の絶縁シートに貫通孔を開け、この貫通孔に前記バンプを挿入し、さらに銅箔を重ね合わせて加熱圧着することを特徴とする。この方法では、加熱圧着の際に、バンプ及び絶縁シートが流動して、導電ペーストが充填された貫通孔が形成され、絶縁性基板上の回路及び銅箔間が層間接続(電気的に接続)される。   This method is a method of laminating and pressing a wiring board formed with a circuit on an insulating substrate, an insulating sheet for interlayer adhesion, and a copper foil in this order. Bumps of conductive material (conductive paste) that are deformed by pressurization and heating at the time of the lamination press are provided, through holes are formed in the insulating sheet for interlayer adhesion, the bumps are inserted into the through holes, and copper foil is overlaid. And thermocompression bonding. In this method, during thermocompression bonding, the bump and the insulating sheet flow to form a through hole filled with the conductive paste, and the circuit on the insulating substrate and the copper foil are connected with each other (electrically connected). Is done.

この方法のように、回路が形成された配線板、又は回路を形成することができる導電層を有する配線基板の層間接続箇所に、変形する導電材からなるバンプを形成し、層間接着用の絶縁シートに開けた貫通孔に前記バンプを挿入し、さらに銅箔等の導電層又は導電層を含む複合層を重ね合わせて加熱圧着する方法により、多層プリント配線板を簡略な工程で製造することができる。しかし、この方法では、加熱圧着後の導電材と導電層との接続が不良となり、従って回路間の導通も不良となる場合が生じ、多層プリント配線板の信頼性が劣るという問題点があった。特に、加熱圧着時の溶融粘度が低い絶縁シートを用いた場合、この問題が大きい。
特開平8−288649号公報
As in this method, a bump made of a deformable conductive material is formed at an interlayer connection portion of a wiring board on which a circuit is formed or a wiring board having a conductive layer capable of forming a circuit, and insulation for interlayer adhesion is formed. A multilayer printed wiring board can be manufactured in a simple process by inserting the bump into a through-hole opened in a sheet, and further superposing a conductive layer such as copper foil or a composite layer including the conductive layer and thermocompression bonding. it can. However, this method has a problem in that the connection between the conductive material and the conductive layer after the thermocompression bonding is poor, and thus the conduction between the circuits is also poor, and the reliability of the multilayer printed wiring board is poor. . This problem is particularly serious when an insulating sheet having a low melt viscosity at the time of thermocompression bonding is used.
JP-A-8-288649

本発明は、配線基板に導電材のバンプを設け、層間接着用の絶縁シートに開けた貫通孔に前記バンプを挿入し、さらに導電層又は導電層を含む複合層を重ね合わせて加熱圧着する多層プリント配線板の製造方法であって、加熱圧着後の導電材と導電層(複合層の表面に設けられた導電層も含む意味である。)間の接続不良が生じない方法を提供することを課題とする。本発明は、さらに、この製造方法により製造可能な多層プリント配線板であって、導電材と導電層間の接続の信頼性が高く、従って、配線板としての信頼性も高い多層プリント配線板を提供することも課題とする。   The present invention provides a multilayer in which bumps made of a conductive material are provided on a wiring board, the bumps are inserted into through holes formed in an insulating sheet for interlayer adhesion, and a conductive layer or a composite layer including a conductive layer is stacked and heat-pressed. A method for manufacturing a printed wiring board, which provides a method in which a connection failure between a conductive material after thermocompression bonding and a conductive layer (including a conductive layer provided on the surface of the composite layer) does not occur. Let it be an issue. The present invention further provides a multilayer printed wiring board that can be manufactured by this manufacturing method, and that has a high connection reliability between a conductive material and a conductive layer, and therefore has a high reliability as a wiring board. It is also an issue to do.

本発明者は、加熱圧着後の導電材と導電層間の接続不良の原因は、加熱圧着時に、バンプの導電材が対面する導電層と接合する前に、層間接着用絶縁シートが流動して導電層と導電材間に流れ込むことによると考えた。そして、導電材のバンプを、配線基板側のみではなく、この配線基板と導通される導電層側にも設けることにより、流動した絶縁シートが、導電層と導電材間へ流れ込むことを防ぎ、接続不良の発生も防ぐことができることを見出し、本発明を完成した。   The inventor believes that the reason for the poor connection between the conductive material after thermocompression bonding and the conductive layer is that the insulating sheet for interlayer adhesion flows and flows before joining the conductive layer facing the conductive material of the bump during thermocompression bonding. It was thought to be due to flowing between the layer and the conductive material. And by providing the conductive material bumps not only on the wiring board side but also on the conductive layer side that is electrically connected to this wiring board, the flowing insulating sheet is prevented from flowing between the conductive layer and the conductive material. The present inventors have found that the occurrence of defects can be prevented and completed the present invention.

すなわち、前記の本発明の課題は、絶縁層及び導電層からなる配線基板であって、1表面上に加圧加熱により変形する導電材のバンプAを有する配線基板A、
前記バンプAに対応する位置に、貫通孔を有する層間接着用絶縁シート、並びに
1表面上の、前記バンプAに対応する位置に、加圧加熱により変形する導電材からなるバンプBが設けられた導電層B又は導電層Bをその1表面に貼り合せた配線基板Bを、
前記層間接着用絶縁シートを、前記配線基板Aと導電層B間に挟持し、かつバンプA及びバンプBが、前記貫通孔内に挿入されるように重ね、これらを積層プレスする工程を有することを特徴とする多層プリント配線板の製造方法(請求項1)により達成される。
That is, the subject of the present invention is a wiring board composed of an insulating layer and a conductive layer, the wiring board A having a bump A of a conductive material deformed by pressure heating on one surface,
An insulating sheet for interlayer adhesion having a through-hole at a position corresponding to the bump A, and a bump B made of a conductive material that is deformed by pressure heating are provided at a position corresponding to the bump A on one surface. Conductive layer B or wiring substrate B having conductive layer B bonded to one surface thereof,
The interlayer adhesive insulating sheet is sandwiched between the wiring board A and the conductive layer B, and the bump A and the bump B are stacked so as to be inserted into the through-hole, and these are stacked and pressed. This is achieved by a method for manufacturing a multilayer printed wiring board characterized by the above (claim 1).

前記の本発明の製造方法では、配線基板Aと、導電層B又は導電層Bをその1表面に貼り合せた配線基板Bとを、層間接着用絶縁シートを挟持しながら積層プレスして、多層プリント配線板を製造する。ここで、配線基板Aとは、1層以上の導電層を有し、その1表面上に加圧加熱により変形する導電材のバンプAを有し、かつ絶縁層を有するものである。絶縁層は、通常、導電層とバンプA間や、導電層が2層以上の場合には導電層間に設けられる。   In the manufacturing method of the present invention described above, the wiring board A and the wiring board B having the conductive layer B or the conductive layer B bonded to one surface thereof are laminated and pressed while sandwiching an insulating sheet for interlayer adhesion. Manufactures printed wiring boards. Here, the wiring board A has one or more conductive layers, has bumps A made of a conductive material that is deformed by pressure heating on one surface, and has an insulating layer. The insulating layer is usually provided between the conductive layer and the bump A, or between the conductive layers when there are two or more conductive layers.

配線基板Aとしては、絶縁層の片面のみに導電層を有する片面配線基板、絶縁層の両面に導電層を有し、それらがスルーホールメッキや導電材が充填された孔等により導通されている両面配線基板、又絶縁層により互いに隔てられた多数の導電層を有し、それらがスルーホールメッキや導電材が充填された孔等により導通されている多層配線基板が挙げられる。中でも、配線基板Aが、絶縁層である絶縁性基板、及び、前記絶縁性基板の、前記バンプAが設けられた面とは異なる表面上に設けられた導電層からなり、前記絶縁性基板(絶縁層)内に、導電材が充填された孔を有し、前記バンプAと導電層が、この孔により導通されている片面配線板基材である場合、本発明の多層プリント配線板の製造方法が好ましく適用される。請求項2は、この好ましい態様に該当する。   As the wiring board A, a single-sided wiring board having a conductive layer only on one side of the insulating layer, a conductive layer on both sides of the insulating layer, and these are electrically connected by a through hole plating or a hole filled with a conductive material. Examples thereof include a double-sided wiring board and a multilayer wiring board having a large number of conductive layers separated from each other by an insulating layer, which are conducted by through-hole plating or holes filled with a conductive material. Among them, the wiring substrate A is composed of an insulating substrate which is an insulating layer, and a conductive layer provided on a surface different from the surface of the insulating substrate on which the bump A is provided, and the insulating substrate ( In the case where the insulating layer has a hole filled with a conductive material, and the bump A and the conductive layer are a single-sided wiring board substrate that is electrically connected by the hole, the multilayer printed wiring board of the present invention is manufactured. The method is preferably applied. Claim 2 corresponds to this preferable mode.

配線基板Aを構成する絶縁層としては、ポリエチレンテレフタレート(PET)、アラミド等のポリアミド、ポリイミド、液晶フィルム、ポリエステル等を主体とする樹脂フィルムが例示される。ポリイミドを主体とする樹脂フィルムは耐熱フィルムであり、鉛フリーはんだ採用に対応した高耐熱化の要求に応えることができるので好ましい。又絶縁性基板の薄厚化、高強度化を達成できる。   Examples of the insulating layer constituting the wiring board A include resin films mainly composed of polyethylene terephthalate (PET), polyamide such as aramid, polyimide, liquid crystal film, polyester and the like. A resin film mainly composed of polyimide is a heat-resistant film and is preferable because it can meet the demand for higher heat resistance corresponding to the use of lead-free solder. In addition, the insulating substrate can be made thinner and stronger.

配線基板Aを構成する導電層とは、導電性の材質からなる薄膜であれば特に限定されないが、通常銅箔や、銀入り銅箔、ベリリウム銅合金箔、黄銅箔、リン青銅箔等の銅合金箔等が用いられる。1表面上に導電層が設けられた絶縁性基板としては、銅箔が片面に貼付けられた銅箔付き樹脂基材、特にポリイミド樹脂基材を用いることができ、銅箔と樹脂基材間に接着剤付きのものでも接着剤を用いずに貼り合せたものでも良い。   The conductive layer constituting the wiring board A is not particularly limited as long as it is a thin film made of a conductive material, but copper such as copper foil, silver-containing copper foil, beryllium copper alloy foil, brass foil, phosphor bronze foil, etc. An alloy foil or the like is used. As an insulating substrate provided with a conductive layer on one surface, a copper foil-attached resin base material, particularly a polyimide resin base material, on which one side of the copper foil is attached, can be used. The thing with an adhesive agent or the thing bonded together without using an adhesive agent may be used.

バンプAは、積層プレス時の加圧加熱により変形する導電材からなる突起である。加圧加熱により変形する導電材としては、導電性ペーストが例示される。導電性ペーストとは、導電性フィラーを流動性の樹脂に分散したものであり、導電性フィラーとしては、銀、銅、Ni、Sn、鉛半田、鉛フリー半田等の微粒子が好適に用いられる。また、これらの2種以上を複層化した微粒子(銀コート銅、銀コートNi等)や、混合物等も用いることが可能である。流動性の樹脂としては、エポキシ、ポリエステル、フェノール、ポリイミド、ポリアミド及びこれらの混合物等を用いることができる。   The bump A is a protrusion made of a conductive material that is deformed by pressurization and heating during the lamination press. An example of the conductive material that is deformed by pressure heating is a conductive paste. The conductive paste is obtained by dispersing a conductive filler in a flowable resin. As the conductive filler, fine particles such as silver, copper, Ni, Sn, lead solder, and lead-free solder are preferably used. In addition, fine particles (silver coated copper, silver coated Ni, etc.) obtained by multilayering two or more of these, a mixture, and the like can be used. As the fluid resin, epoxy, polyester, phenol, polyimide, polyamide, and a mixture thereof can be used.

前記請求項2の態様に用いられる片面配線板基材(以後、単に片面配線板基材と言う。)において、バンプAは、前記絶縁性基板の、導電層が設けられた表面と反対側の表面上に設けられる。この片面配線板基材を用いる場合、この導電層とバンプBが設けられた導電層Bはそれぞれ異層の回路を形成するが、積層プレス後、導電層と導電層Bの間には、層間接着用絶縁シートから形成される接着剤層とともに絶縁性基板が挟持される。層間接着用絶縁シートは、変形するものであるので、積層プレス時に絶縁不良箇所を生じる可能性があるが、さらに絶縁性基板が挟持されるので、絶縁不良箇の発生はなく、優れた絶縁性が達成される。バンプAの高さとしては、10〜100μm程度が好ましく、その径としては、30〜300μm程度が好ましい。   In the single-sided wiring board base material (hereinafter simply referred to as a single-sided wiring board base material) used in the aspect of claim 2, the bump A is opposite to the surface of the insulating substrate on which the conductive layer is provided. On the surface. When this single-sided wiring board substrate is used, the conductive layer B and the conductive layer B provided with the bumps B each form a different layer circuit, but after the lamination press, there is an interlayer between the conductive layer and the conductive layer B. The insulating substrate is sandwiched together with the adhesive layer formed from the adhesive insulating sheet. Since the insulating sheet for interlayer adhesion is deformed, there is a possibility that a defective part of insulation is generated at the time of laminating press. However, since the insulating substrate is further sandwiched, there is no occurrence of defective insulation and excellent insulation. Is achieved. The height of the bump A is preferably about 10 to 100 μm, and the diameter is preferably about 30 to 300 μm.

配線基板Aが、前記片面配線板基材の場合、バンプAとは異なる表面に設けられた導電層は、絶縁性基板内の導電材が充填された孔により、バンプAと導通される。この孔は、絶縁性基板を貫通し、その両端において、それぞれバンプAと導電層に接続している。孔を充填する導電材としては、バンプAの形成に用いられる導電材と同様な材質を用いることができ、例えば、前記と同様な導電性ペーストを用いることができる。配線基板Aが、前記片面配線板基材以外の場合であっても、バンプAが設けられた面以外に設けられた導電層と、バンプAとを、絶縁層内に形成され導電材が充填された孔により、導通することができる。   When the wiring board A is the single-sided wiring board base, the conductive layer provided on the surface different from the bump A is electrically connected to the bump A through the hole filled with the conductive material in the insulating substrate. This hole penetrates the insulating substrate and is connected to the bump A and the conductive layer at both ends thereof. As the conductive material filling the holes, the same material as the conductive material used for forming the bump A can be used. For example, the same conductive paste as described above can be used. Even if the wiring board A is other than the single-sided wiring board substrate, the conductive layer provided on the surface other than the surface on which the bump A is provided and the bump A are formed in the insulating layer and filled with the conductive material. Conduction can be made by the formed hole.

導電材を充填する孔は、絶縁層の層間接続が所望される位置に、レーザ等を用いて穴あけ加工を行うことにより形成することができる。レーザとしては、COレーザ、UV−YAGレーザ等が好ましく例示される。レーザによる穴あけ加工後、通常、湿式のデスミア処理、ウエットブラスト処理、プラズマ処理等により、デスミア処理がされる。 The hole filled with the conductive material can be formed by drilling using a laser or the like at a position where interlayer connection of the insulating layer is desired. Preferred examples of the laser include a CO 2 laser and a UV-YAG laser. After drilling with a laser, the desmear treatment is usually performed by wet desmear treatment, wet blast treatment, plasma treatment, or the like.

孔への導電材の充填は、導電材が導電性ペーストの場合は、例えば、スクリーン印刷により行われる。このスクリーン印刷の後、さらにその上に導電性ペースト等をスクリーン印刷で塗布する方法により導電性ペーストからなるバンプAを形成することができる。バンプAを、孔に充填される導電材と同様な材質により形成すると、スクリーン印刷による両者の製造が容易になり、又両者間の接続の信頼性も高まるので好ましい。ここで、同様な材質とは、同じ原料から構成される材質を意味する。スクリーン印刷の容易さ等を考慮して、粘度等を異なったものとしても良い。   When the conductive material is a conductive paste, the hole is filled with the conductive material, for example, by screen printing. After this screen printing, bumps A made of a conductive paste can be formed by a method in which a conductive paste or the like is further applied thereon by screen printing. It is preferable to form the bumps A by the same material as the conductive material filled in the holes, since both can be easily manufactured by screen printing and the reliability of connection between the two can be increased. Here, the same material means a material composed of the same raw material. Considering the ease of screen printing and the like, the viscosity and the like may be different.

配線基板Aを構成する導電層は、多層プリント配線板における回路を形成するものであるが、層間接着用絶縁シートと貼合わされる表面と反対側の面に設けられた導電層、例えば、配線基板Aが、前記片面配線板基材の場合のバンプAとは異なる表面に設けられた導電層については、積層前に回路形成がされていてもよいし、積層後に回路形成されてもよい。請求項3は、配線基板Aが前記片面配線板基材の場合であって、前記導電層が、積層前に回路形成されたものである態様に該当するものである。   The conductive layer constituting the wiring board A forms a circuit in the multilayer printed wiring board, but the conductive layer provided on the surface opposite to the surface to be bonded to the insulating sheet for interlayer adhesion, for example, the wiring board As for the conductive layer provided on the surface different from the bump A in the case of the single-sided wiring board substrate, A may be formed before stacking, or may be formed after stacking. The third aspect corresponds to a mode in which the wiring board A is the single-sided wiring board base material, and the conductive layer is formed by a circuit before lamination.

導電層の回路形成は、例えば、エッチング加工により行うことができる。例えば、導電層上に、レジスト層の回路パターンを形成した後、導電層を腐食するエッチャントに浸漬して、回路パターン以外の部分を取り除き、その後レジスト層を除去する化学エッチング(湿式エッチング)により行うことができる。この場合のエッチャントとしては、塩化第二鉄が主成分である塩化第二鉄系エッチャントや、塩化第二銅系エッチャント、アルカリエッチャント等が挙げられる。   Circuit formation of the conductive layer can be performed, for example, by etching. For example, after a circuit pattern of a resist layer is formed on a conductive layer, the conductive layer is immersed in an etchant that corrodes to remove portions other than the circuit pattern, and then is performed by chemical etching (wet etching) that removes the resist layer. be able to. Examples of the etchant in this case include a ferric chloride-based etchant mainly composed of ferric chloride, a cupric chloride-based etchant, and an alkali etchant.

層間接着用絶縁シートは、加熱加圧により変形する接着剤からなるシートに、貫通孔を、前記孔に対応する位置に形成して得られる。貫通孔を前記孔に対応する位置に形成するとは、前記配線基板Aと層間接着用絶縁シートを重ねたときに、バンプAが貫通孔内に挿入されるように貫通孔を形成することを意味する。貫通孔の形成方法は特に限定されず、レーザによる穴あけ加工や、ドリル、金型等を用いて機械的に穴あけを行う方法等を採用することができる。   The insulating sheet for interlayer adhesion is obtained by forming a through hole at a position corresponding to the hole in a sheet made of an adhesive that is deformed by heating and pressing. Forming the through hole at a position corresponding to the hole means forming the through hole so that the bump A is inserted into the through hole when the wiring board A and the interlayer adhesive insulating sheet are overlapped. To do. The method for forming the through hole is not particularly limited, and it is possible to employ a method of drilling with a laser, a method of mechanically drilling using a drill, a mold, or the like.

層間接着用絶縁シートを形成する接着剤としては、エポキシ、アクリル、ポリイミド、熱可塑性ポリイミド等の熱可塑性樹脂等及びこれらの混合物等からなる接着剤が好適に用いられる。層間接着用絶縁シートとしては、厚みが10μm〜100μm程度のものが通常用いられ、好ましくは15μm〜70μmである。厚みが10μm未満では、層間接着の積層プレスの際に接着剤が充分拡がらず、バンプA及びバンプBと接着剤間の間隙が解消しにくくなる。一方、100μmを越えると、この厚みに対応する突起の長さを有するバンプA及び/又はバンプBの形成が困難になる。なお、層間接着用絶縁シートを形成する接着剤の溶融粘度の最小値の範囲は特に限定されない。ただし、100〜200℃でのこの値が、1×10 Pa・s以下の接着剤は、積層プレス時に流れやすいので、従来の方法では絶縁不良が特に生じやすい。本発明によれば、この接着剤を用いる場合でも絶縁不良が生じにくいので、この接着剤を用いる場合に本発明の効果が顕著になる。 As the adhesive for forming the insulating sheet for interlayer adhesion, an adhesive made of a thermoplastic resin such as epoxy, acrylic, polyimide, thermoplastic polyimide, or a mixture thereof is preferably used. As an insulating sheet for interlayer adhesion, a sheet having a thickness of about 10 μm to 100 μm is usually used, preferably 15 μm to 70 μm. If the thickness is less than 10 μm, the adhesive does not spread sufficiently during the laminating press for interlayer adhesion, and the gaps between the bumps A and B and the adhesive are difficult to be eliminated. On the other hand, when the thickness exceeds 100 μm, it becomes difficult to form bumps A and / or bumps B having a projection length corresponding to this thickness. In addition, the range of the minimum value of the melt viscosity of the adhesive forming the insulating sheet for interlayer adhesion is not particularly limited. However, an adhesive having this value at 100 to 200 ° C. of 1 × 10 3 Pa · s or less is liable to flow at the time of laminating press. According to the present invention, insulation failure is unlikely to occur even when this adhesive is used. Therefore, the effect of the present invention becomes remarkable when this adhesive is used.

導電層Bは、導電性の材質からなる薄膜であり、特に限定されないが、通常銅箔や、銀入り銅箔、ベリリウム銅合金箔、黄銅箔、リン青銅箔等の銅合金箔等が用いられる。本発明では、導電層Bの前記バンプAに対応する位置、すなわち層間接着がされる位置に加圧加熱により変形する導電材のバンプBが設けられていることを特徴とする。   The conductive layer B is a thin film made of a conductive material, and is not particularly limited. Usually, a copper alloy foil such as a copper foil, a silver-containing copper foil, a beryllium copper alloy foil, a brass foil, or a phosphor bronze foil is used. . The present invention is characterized in that a bump B of a conductive material that is deformed by pressure heating is provided at a position corresponding to the bump A of the conductive layer B, that is, a position where interlayer bonding is performed.

バンプBも、バンプAと同様に、積層プレス時の加圧加熱により変形する導電材からなる突起である。加圧加熱により変形する導電材としても、バンプAの場合と同様な導電性ペーストが例示される。導電性ペーストを用いる場合は、バンプBもスクリーン印刷により形成することができる。   Similarly to the bump A, the bump B is also a protrusion made of a conductive material that is deformed by pressure heating at the time of the lamination press. As the conductive material that is deformed by pressure heating, the same conductive paste as in the case of the bump A is exemplified. When the conductive paste is used, the bumps B can also be formed by screen printing.

バンプBの高さとしては、5〜100μm程度が好ましく、その径としては、20〜300μm程度が好ましい。後述するように、バンプBの径は、層間接着用絶縁シートに形成される貫通孔の径より同等もしくは大きくても良いが、小さい方が好ましい。   The height of the bump B is preferably about 5 to 100 μm, and the diameter is preferably about 20 to 300 μm. As will be described later, the diameter of the bump B may be equal to or larger than the diameter of the through hole formed in the interlayer adhesive insulating sheet, but is preferably smaller.

本発明の多層プリント配線板の製造方法では、層間接着用絶縁シートを、配線基板Aと、導電層B又は導電層Bをその1表面に貼り合せた配線基板B間に挟持し、かつバンプA及びバンプBが、前記貫通孔内に挿入されるように、配線基板A、層間接着用絶縁シート、及び導電層B又は導電層Bを有する配線基板Bを重ね、これらを積層プレスする。すなわち、層間接着用絶縁シートに貼り合わされるものとして、導電層Bのみからなるもの、例えば銅箔等の導電材の薄膜のみからなるフィルムを用いてもよいが、導電層Bをその1表面に貼り合せた配線基板Bを用いてもよい。請求項4は、前記の多層プリント配線板の製造方法であって、導電層Bをその1表面に貼り合せた配線基板Bを用いることを特徴とする態様を提供するものである。   In the method for producing a multilayer printed wiring board of the present invention, an insulating sheet for interlayer adhesion is sandwiched between a wiring board A and a wiring board B in which a conductive layer B or a conductive layer B is bonded to one surface thereof, and a bump A Then, the wiring board A, the interlayer adhesion insulating sheet, and the conductive layer B or the wiring board B having the conductive layer B are stacked, and these are laminated and pressed so that the bumps B are inserted into the through holes. That is, as the material to be bonded to the insulating sheet for interlayer adhesion, a film composed only of the conductive layer B, for example, a film composed only of a thin film of a conductive material such as copper foil may be used. The bonded wiring board B may be used. According to a fourth aspect of the present invention, there is provided a method for manufacturing the multilayer printed wiring board, wherein the wiring substrate B having the conductive layer B bonded to one surface thereof is used.

導電層Bをその1表面に貼り合せた配線基板Bは、絶縁層を含む基板の一表面にバンプBが形成された導電層Bを設けてなるものである。このような配線基板Bとしては、絶縁層の片面のみに導電層Bを有する片面配線基板、例えば導電層Bを絶縁性基板上に貼り合わせたものの他、導電層Bとともに絶縁性基板の他の表面にも導電層を有し、それらがスルーホールメッキや導電材が充填された孔等により導通されている両面配線基板、又、片面に導電層Bを有し、さらに互いに絶縁層で隔てられた多数の導電層を有し、それらがスルーホールメッキや導電材が充填された孔等により互いに導通されている多層配線基板等が挙げられる。   The wiring board B in which the conductive layer B is bonded to one surface is provided with the conductive layer B having the bumps B formed on one surface of the substrate including the insulating layer. As such a wiring board B, a single-sided wiring board having a conductive layer B only on one side of an insulating layer, for example, a conductive layer B bonded to an insulating substrate, and other insulating substrates together with the conductive layer B A double-sided wiring board that has a conductive layer on the surface and is electrically connected by through-hole plating or a hole filled with a conductive material, or has a conductive layer B on one side and is further separated by an insulating layer. In addition, a multilayer wiring board having a large number of conductive layers, which are connected to each other by through-hole plating, holes filled with a conductive material, or the like can be used.

配線基板Bを構成する絶縁層としては、配線基板Aの絶縁層と同様、ポリエチレンテレフタレート(PET)、アラミド等のポリアミド、ポリイミド、液晶フィルム、ポリエステル等を主体とする樹脂フィルムが例示される。又、配線基板Bを構成する導電層B以外の導電層としては、配線基板Aを構成する導電層と同様、導電性の材質からなる薄膜、例えば銅箔が用いられる。片面配線基板である配線基板Bとしては、銅箔が片面に貼付けられた銅箔付き樹脂基材、特にポリイミド樹脂基材を用いることができ、銅箔と樹脂基材間に接着剤付きのものでも接着剤を用いずに貼り合せたものでも良い。   Examples of the insulating layer constituting the wiring board B include resin films mainly composed of polyethylene terephthalate (PET), polyamide such as aramid, polyimide, liquid crystal film, polyester, and the like, similar to the insulating layer of the wiring board A. Further, as the conductive layers other than the conductive layer B constituting the wiring board B, a thin film made of a conductive material, such as a copper foil, is used similarly to the conductive layer constituting the wiring board A. As the wiring board B which is a single-sided wiring board, a copper foil-attached resin base material with a copper foil, particularly a polyimide resin base material can be used, and an adhesive is provided between the copper foil and the resin base material. However, it may be bonded without using an adhesive.

導電層Bは、多層プリント配線板の回路を形成するものであるが、導電層Bのみが貼り合わされる場合、この回路形成は積層後に行われる。一方、導電層Bをその1表面に貼り合せた配線基板Bが用いられる場合は、積層前に行われる。導電層Bの回路形成は、配線基板Aの導電層と同様に、エッチング加工を施すことにより行うことができる。エッチング加工の方法も前記と同様である。   The conductive layer B forms a circuit of a multilayer printed wiring board. When only the conductive layer B is bonded, this circuit formation is performed after lamination. On the other hand, when the wiring board B in which the conductive layer B is bonded to one surface is used, it is performed before the lamination. The circuit formation of the conductive layer B can be performed by performing etching as in the case of the conductive layer of the wiring board A. The etching method is the same as described above.

積層プレスは、キュアプレスや真空プレス等により、加熱、加圧することにより行うことができる。積層物の間のボイドの発生を抑制するためには、好ましくは真空プレスが採用される。   The lamination press can be performed by heating and pressurizing with a cure press or a vacuum press. In order to suppress the generation of voids between the laminates, a vacuum press is preferably employed.

層間接着用絶縁シートに形成された貫通孔の径が、バンプA及びバンプBの径より大きい場合、積層プレスの開始前では、層間接着用絶縁シートを形成する接着剤とバンプとの間に間隙があるが、積層プレスにより接着剤がバンプに接触するまで拡がってこの間隙は解消する。又、バンプA及びバンプBも積層プレスにより変形して、この間隙を解消する作用をする。又、積層プレスにより、バンプA及びバンプBは一体化して貫通孔内を充填する。   When the diameter of the through-hole formed in the insulating sheet for interlayer adhesion is larger than the diameter of the bump A and the bump B, the gap between the adhesive forming the insulating sheet for interlayer adhesion and the bump is before the start of the lamination press. However, this gap is eliminated by spreading until the adhesive contacts the bumps by the lamination press. Further, the bump A and the bump B are also deformed by the laminating press, and the gap is eliminated. Further, the bump A and the bump B are integrated and filled in the through hole by the lamination press.

バンプBを設けない従来技術では、層間接着用絶縁シートを形成する接着剤が、積層プレスの際にバンプAと導電層B間に拡がり、バンプAと導電層B間に電気的な接続不良を生じやすいが、バンプBを設けた本発明では、この問題を生ぜず良好な接続が達成される。このようにして、配線基板Aと、導電層Bをその1表面に貼り合せた配線基板Bが、層間接着用絶縁シートにより強固に接着され、優れた接続信頼性が得られる。   In the prior art in which the bump B is not provided, the adhesive forming the interlayer adhesive insulating sheet spreads between the bump A and the conductive layer B at the time of the laminating press, resulting in poor electrical connection between the bump A and the conductive layer B. Although it is likely to occur, in the present invention in which the bump B is provided, this problem does not occur and a good connection is achieved. In this way, the wiring board A and the wiring board B having the conductive layer B bonded to one surface thereof are firmly bonded by the interlayer adhesive insulating sheet, and excellent connection reliability is obtained.

導電層Bを絶縁性基板上に貼り合わせた配線基板Bを用いた場合、この絶縁性基板内に孔を形成し、その孔を導電材で充填して、さらにその上にバンプAと同様な導電材のバンプを形成することができる。   When the wiring board B in which the conductive layer B is bonded to the insulating substrate is used, a hole is formed in the insulating substrate, the hole is filled with a conductive material, and the same as the bump A is further formed thereon. Bumps of conductive material can be formed.

そして、前記と同様に、貫通孔を有する層間接着用絶縁シート及び導電層Bをその1表面に貼り合せた配線基板Bを積層してプレスすることにより、より多層の回路からなり、それらが互いに導通している多層プリント配線板を製造することができる。同様な操作を繰り返すことにより、さらに多層からなる多層プリント配線板を製造することができる。   Then, in the same manner as described above, by laminating and pressing an interlayer adhesive insulating sheet having a through-hole and a wiring substrate B bonded with the conductive layer B on one surface thereof, it is composed of a multi-layer circuit, and these are mutually connected. A conductive multilayer printed wiring board can be manufactured. By repeating the same operation, a multilayer printed wiring board composed of multiple layers can be manufactured.

前記層間接着用絶縁シートの貫通孔の径は、バンプA及びバンプBの径の、0.5〜5倍が好ましい。0.5倍未満であると、層間接着用絶縁シートと配線板基材を重ねる際の位置合わせが容易でなくなり、バンプが貫通孔に挿入しなくなる場合が生じやすい。一方5倍以上であると、積層プレス時に、接着剤がバンプに接触するまで拡がりにくくなり、この両者間の間隙が解消しない可能性がある。より好ましくは1.2〜3倍であり、位置合わせがより容易となり、又間隙の発生をより確実に防ぐことができる。請求項5は、この好ましい態様に該当する。   The diameter of the through hole of the interlayer adhesive insulating sheet is preferably 0.5 to 5 times the diameter of the bump A and the bump B. If it is less than 0.5 times, the alignment when the insulating sheet for interlayer adhesion and the wiring board substrate are overlapped is not easy, and the case where the bumps are not inserted into the through holes tends to occur. On the other hand, when it is 5 times or more, it becomes difficult to spread until the adhesive comes into contact with the bumps at the time of the lamination press, and there is a possibility that the gap between the two is not eliminated. More preferably, it is 1.2 to 3 times, and alignment becomes easier, and generation of a gap can be prevented more reliably. Claim 5 corresponds to this preferable mode.

本発明は、さらに、2層以上の回路、回路間に挟持された絶縁層、及びその絶縁層を貫通し、絶縁層を挟持する回路間を導通する導電部を有する多層プリント配線板であって、その導電部を前記回路に平行な面により切断した断面の面積が、絶縁層の厚みの中央部において小さく、回路との接触部において大きいことを特徴とする多層プリント配線板を提供する(請求項6)。前記の本発明の製造方法により、この請求項6の特徴を有する多層プリント配線板を容易に製造することができる。すなわち、前記の本発明の製造方法における層間接着用絶縁シート及び配線基板AのバンプAが形成されている絶縁層により、多層プリント配線板の絶縁層が形成され、バンプA及びバンプBにより導電部が形成され、配線基板Aの導電層及び導電層B、場合により配線基板Bの他の導電層により2層以上の回路が形成される。   The present invention further includes a multilayer printed wiring board having a circuit having two or more layers, an insulating layer sandwiched between the circuits, and a conductive portion passing through the insulating layer and conducting between the circuits sandwiching the insulating layer. The multilayer printed wiring board is characterized in that an area of a cross section obtained by cutting the conductive portion by a plane parallel to the circuit is small at the central portion of the thickness of the insulating layer and large at the contact portion with the circuit (claim). Item 6). By the manufacturing method of the present invention, a multilayer printed wiring board having the features of claim 6 can be easily manufactured. That is, the insulating layer of the multilayer printed wiring board is formed by the insulating layer on which the interlayer adhesion insulating sheet and the bump A of the wiring board A are formed in the manufacturing method of the present invention, and the conductive portion is formed by the bump A and the bump B. A circuit of two or more layers is formed by the conductive layer and conductive layer B of the wiring board A, and possibly other conductive layers of the wiring board B.

本発明の多層プリント配線板は、回路との接触部において導電部の断面積が大きいことを特徴とする。従って、回路と導電部との接触面積は大きく、電気的接続の不良は生じにくく、多層プリント配線板として高い信頼性が得られる。   The multilayer printed wiring board of the present invention is characterized in that the cross-sectional area of the conductive portion is large at the contact portion with the circuit. Therefore, the contact area between the circuit and the conductive portion is large, and poor electrical connection is unlikely to occur, and high reliability can be obtained as a multilayer printed wiring board.

本発明の多層プリント配線板の製造方法によれば、配線基板に導電材のバンプを設け、層間接着用の絶縁シートに開けた貫通孔に前記バンプを挿入し、さらに他の導電層または導電層を表面に有する他の配線基板を重ね合わせて加熱圧着するとの簡略な工程により、多層の回路が積層された多層プリント配線板であって、かつ加熱圧着後の導電材と導電層間の接続不良を生ぜず、高い信頼性を有する多層プリント配線板を製造することができる。又、本発明の多層プリント配線板は、導電材と導電層間の接続の信頼性が高く、配線板としての信頼性も高い多層プリント配線板である。   According to the method for producing a multilayer printed wiring board of the present invention, a conductive material bump is provided on a wiring board, the bump is inserted into a through hole opened in an insulating sheet for interlayer adhesion, and another conductive layer or conductive layer. It is a multilayer printed wiring board in which multilayer circuits are laminated by a simple process of superimposing other wiring boards on the surface and thermocompression bonding, and the connection failure between the conductive material and the conductive layer after thermocompression bonding Thus, a multilayer printed wiring board having high reliability can be manufactured. The multilayer printed wiring board of the present invention is a multilayer printed wiring board having high reliability of connection between a conductive material and a conductive layer and high reliability as a wiring board.

次に本発明を実施するための最良の形態を、実施例により説明する。なお、本発明はこの実施例の形態に限定されるものではなく、本発明の趣旨を損なわない限り、他の形態への変更も可能である。   Next, the best mode for carrying out the present invention will be described by way of examples. In addition, this invention is not limited to the form of this Example, The change to another form is also possible unless the meaning of this invention is impaired.

実施例1
図1は、以下に示すようにして作製された片面配線板基材、層間接着用絶縁シート及び導電層Bを、積層プレスするために重ね合わせた様子を示す概略断面図である。
Example 1
FIG. 1 is a schematic cross-sectional view showing a state in which a single-sided wiring board substrate, an interlayer adhesive insulating sheet, and a conductive layer B produced as described below are stacked in order to perform lamination pressing.

[片面配線板基材の作製]
ポリイミドフィルム1(PI)の片面に銅箔2を、接着剤を用いずに貼り合せた片面銅貼り基板(PI:25μm、銅厚:18μm)に、YAGレーザにより、有底の孔3(開口径100μm)を開け、アルカリと過マンガン酸カリウムにより湿式デスミアを施した。孔3は、計8個形成した。
[Production of single-sided wiring board substrate]
A bottomed hole 3 (opened) is applied to a single-sided copper-clad substrate (PI: 25 μm, copper thickness: 18 μm) bonded to one side of the polyimide film 1 (PI) without using an adhesive by a YAG laser. The aperture was 100 μm) and wet desmearing was performed with alkali and potassium permanganate. A total of eight holes 3 were formed.

それぞれの孔3に、ビスフェノールA型エポキシ樹脂70重量部(エポキシ当量7000〜8500)とビスフェノールF型エポキシ樹脂30重量部(エポキシ当量160〜170)からなるエポキシ樹脂を、ブチルカルビトールアセテートに溶解し溶液を作る。これに、イミダゾール系の潜在性硬化剤を添加し、さらに、銀粒子を全固形分の55体積%にして分散し、銀ペースト4を得る。この銀ペースト4を、それぞれの孔3に、スクリーン印刷により充填し、仮硬化を実施、さらに、固形分が銀ペースト4と同じ成分のからなり粘度を高くした銀ペースト41をスクリーン印刷して、(最大)径200μm、高さ60μmのバンプA(凸部)を計8個形成し、仮硬化を実施した。   In each hole 3, an epoxy resin composed of 70 parts by weight of a bisphenol A type epoxy resin (epoxy equivalents 7000-8500) and 30 parts by weight of a bisphenol F type epoxy resin (epoxy equivalents 160-170) is dissolved in butyl carbitol acetate. Make a solution. To this, an imidazole-based latent curing agent is added, and the silver particles are dispersed with a total solid content of 55% by volume to obtain a silver paste 4. The silver paste 4 is filled into each hole 3 by screen printing, and is temporarily cured. Further, the silver paste 41 having a solid content made of the same component as the silver paste 4 and having a high viscosity is screen-printed, A total of eight bumps A (convex portions) having a (maximum) diameter of 200 μm and a height of 60 μm were formed, and temporary curing was performed.

[層間接着用絶縁シートの作製]
厚み35μmのアラミド不織布にエポキシ樹脂を含浸した接着剤のシート5(新神戸電機(株)製、商品名:EA541、120℃での溶融粘度:60Pa・s)の、所定の位置(バンプAに対応する位置)に、ドリルを用いて径300μmの貫通孔6を形成した。
[Preparation of insulating sheet for interlayer adhesion]
Adhesive sheet 5 (made by Shin-Kobe Electric Co., Ltd., trade name: EA541, melt viscosity at 120 ° C .: 60 Pa · s ) obtained by impregnating an epoxy resin into an aramid nonwoven fabric having a thickness of 35 μm (on bump A) A through hole 6 having a diameter of 300 μm was formed at a corresponding position) using a drill.

[導電層Bの作製]
厚み18μmの銅箔7の層間接続する位置(バンプAに対応する位置)に、前記の片面配線板基材の作製に用いた銀ペースト41と同じ銀ペースト8を印刷し、仮硬化を実施し、(最大)径200μm、高さ60μmのバンプBを形成して、導電層Bを得た。
[Preparation of conductive layer B]
The same silver paste 8 as the silver paste 41 used for the production of the single-sided wiring board base material is printed at a position where the interlayer connection of the copper foil 7 having a thickness of 18 μm (a position corresponding to the bump A) is performed, and temporary curing is performed. A bump B having a (maximum) diameter of 200 μm and a height of 60 μm was formed to obtain a conductive layer B.

[積層プレス]
前記の片面配線板基材、層間接着用絶縁シート及び導電層Bを、図1に示すように、層間接着用絶縁の貫通孔に、バンプA及びバンプBを挿入するように重ね合わせた後、真空プレスにより接合処理を実施し、その後、8個の層間接続部分が、デイジーチェーンとなるように回路を形成し、多層プリント配線板を作製した。
[Lamination press]
After superposing the single-sided wiring board substrate, the interlayer adhesive insulating sheet and the conductive layer B so as to insert the bumps A and B into the through holes of the interlayer adhesive insulation, as shown in FIG. A joining process was performed by vacuum pressing, and then a circuit was formed so that the eight interlayer connection portions were daisy chained to produce a multilayer printed wiring board.

実施例2
銅箔7の代わりに、ポリイミドフィルム9(PI)の片面に銅箔10を、接着剤を用いずに貼り合せた片面銅貼り基板(PI:25μm、銅厚:18μm)に、予めエッチング処理を施して回路を作製した基板を用い、この回路上に(最大)径200μm、高さ60μmのバンプBを形成して配線基板Bを得た以外は、実施例1と同様にして、多層プリント配線板を作製した。図2は、この例における片面配線板基材、層間接着用絶縁シート及び配線基板Bを、積層プレスするために重ね合わせた様子を示す概略断面図である。
Example 2
Instead of the copper foil 7, a single-sided copper-clad substrate (PI: 25 μm, copper thickness: 18 μm) in which the copper foil 10 is bonded to one side of the polyimide film 9 (PI) without using an adhesive is etched in advance. Multilayer printed wiring as in Example 1, except that a substrate on which a circuit was fabricated and a bump substrate B having a (maximum) diameter of 200 μm and a height of 60 μm was formed on this circuit to obtain a wiring substrate B A plate was made. FIG. 2 is a schematic cross-sectional view showing a state in which the single-sided wiring board base material, the interlayer adhesion insulating sheet, and the wiring board B in this example are superposed for the lamination press.

図3は、このようにして得られた多層プリント配線板を示す概略断面図である。この多層プリント配線板の導電部11(導電層間の接続部)は、図3より明らかなように、その導電部を前記回路に平行な面により切断した断面の面積が、絶縁層の厚みの中央部において小さく、回路との接触部(銅箔に面したところ)において大きく、その直径を測定したところ、中央部は210μm、接触部は250μmであった。   FIG. 3 is a schematic cross-sectional view showing the multilayer printed wiring board thus obtained. As is clear from FIG. 3, the conductive portion 11 (connection portion between the conductive layers) of this multilayer printed wiring board has a cross-sectional area obtained by cutting the conductive portion by a plane parallel to the circuit, and the center of the thickness of the insulating layer. When the diameter was measured, the central part was 210 μm and the contact part was 250 μm.

従来例
銅箔7の層間接続する部分に銀ペーストを印刷しなかった以外は、実施例1と同様にして、多層プリント配線板を作製した。図4は、この例における片面配線板基材、層間接着用絶縁シート及び導電層を、積層プレスするために重ね合わせた様子を示す概略断面図である。
Conventional Example A multilayer printed wiring board was produced in the same manner as in Example 1 except that the silver paste was not printed on the portion of the copper foil 7 where the interlayer connection was made. FIG. 4 is a schematic cross-sectional view showing a state in which the single-sided wiring board substrate, the interlayer adhesion insulating sheet, and the conductive layer in this example are overlapped for the lamination press.

[評価]
実施例1、2、従来例で得られた多層プリント配線板について、所定の導通が得られるか否かを検査した。検査はデイジーチェーンの両端から、4端子法により、抵抗を測定することにより実施した。その結果(所定の導通が得られなかった検査の数/検査の総数 : 所定の導通が得られた検査の割合)を以下に示す。
実施例1 0/12 : 100%
実施例2 0/12 : 100%
従来例 12/12 : 0%
[Evaluation]
The multilayer printed wiring boards obtained in Examples 1 and 2 and the conventional example were inspected to determine whether or not predetermined continuity was obtained. The inspection was performed by measuring the resistance from both ends of the daisy chain by the 4-terminal method. The results (number of inspections where predetermined continuity was not obtained / total number of inspections: ratio of inspection where predetermined continuity was obtained) are shown below.
Example 1 0/12: 100%
Example 2 0/12: 100%
Conventional example 12/12: 0%

この結果より明らかなように、本発明の方法(実施例1、2)により、高い信頼性を有する多層プリント配線板を得ることができる。   As is clear from this result, a multilayer printed wiring board having high reliability can be obtained by the method of the present invention (Examples 1 and 2).

実施例1の一工程の概略を示す概略断面図である。3 is a schematic cross-sectional view showing an outline of one step in Example 1. FIG. 実施例2の一工程の概略を示す概略断面図である。10 is a schematic cross-sectional view showing an outline of one step in Example 2. FIG. 実施例2で得られた多層プリント配線板を示す概略断面図である。6 is a schematic cross-sectional view showing a multilayer printed wiring board obtained in Example 2. FIG. 従来例の一工程の概略を示す概略断面図である。It is a schematic sectional drawing which shows the outline of 1 process of a prior art example.

符号の説明Explanation of symbols

1、9 ポリイミドフィルム
2、7、10 銅箔
3、 孔
4、8、41 銀ペースト
5、 接着剤のシート
6、 貫通孔
1, 9 Polyimide film 2, 7, 10 Copper foil 3, Hole 4, 8, 41 Silver paste 5, Adhesive sheet 6, Through hole

Claims (3)

絶縁層である絶縁性基板、前記絶縁性基板の1表面上に設けられた、加圧加熱により変形する導電材のバンプA、及び、前記絶縁性基板の、前記バンプAが設けられた面とは異なる表面上に設けられた導電層からなり、
前記絶縁性基板内に、前記バンプAの底面に接して導電材が充填された孔が設けられ、前記バンプAと導電層が、この孔により導通されている片面配線板基材である配線基板A、
前記バンプAに対応する位置に、貫通孔を有する層間接着用絶縁シート、並びに
1表面上の、前記バンプAに対応する位置に、加圧加熱により変形する導電材からなるバンプBが設けられた導電層B又は導電層Bをその1表面に貼り合せた配線基板Bを、
前記層間接着用絶縁シートを、前記配線基板Aと導電層B間に挟持し、かつバンプA及びバンプBが、前記貫通孔内に挿入されるように重ね、これらを積層プレスする工程を有することを特徴とする多層プリント配線板の製造方法。
An insulating substrate that is an insulating layer, a bump A of a conductive material that is deformed by pressure heating provided on one surface of the insulating substrate, and a surface of the insulating substrate on which the bump A is provided; Consists of conductive layers provided on different surfaces,
A wiring board which is a single-sided wiring board substrate in which a hole filled with a conductive material is provided in contact with the bottom surface of the bump A in the insulating substrate, and the bump A and the conductive layer are electrically connected by the hole. A,
An insulating sheet for interlayer adhesion having a through-hole at a position corresponding to the bump A, and a bump B made of a conductive material that is deformed by pressure heating are provided at a position corresponding to the bump A on one surface. Conductive layer B or wiring substrate B having conductive layer B bonded to one surface thereof,
The interlayer adhesive insulating sheet is sandwiched between the wiring board A and the conductive layer B, and the bump A and the bump B are stacked so as to be inserted into the through-hole, and these are stacked and pressed. A method for producing a multilayer printed wiring board characterized by the above.
前記導電層が、回路形成されたものであることを特徴とする請求項1に記載の多層プリント配線板の製造方法。   The method for manufacturing a multilayer printed wiring board according to claim 1, wherein the conductive layer is formed with a circuit. 前記層間接着用絶縁シートの貫通孔の径が、バンプA及びバンプBの径の、1.2〜3倍であることを特徴とする請求項1又は請求項2に記載の多層プリント配線板の製造方法。 Diameter of the layer indirectly wearing insulating sheet through hole of, the diameter of the bump A, and the bumps B, the multilayer printed wiring board according to claim 1 or claim 2, characterized in that a 1.2 to 3-fold Production method.
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