JP3329756B2 - Multilayer wiring board and method of manufacturing the same - Google Patents
Multilayer wiring board and method of manufacturing the sameInfo
- Publication number
- JP3329756B2 JP3329756B2 JP647899A JP647899A JP3329756B2 JP 3329756 B2 JP3329756 B2 JP 3329756B2 JP 647899 A JP647899 A JP 647899A JP 647899 A JP647899 A JP 647899A JP 3329756 B2 JP3329756 B2 JP 3329756B2
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- wiring board
- conductive
- conductive metal
- liquid crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は耐湿性のすぐれた多
層配線板、および多層配線板の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multilayer wiring board having excellent moisture resistance and a method for manufacturing the multilayer wiring board.
【0002】[0002]
【従来の技術】電子機器類の小型化などに伴って、回路
を形成する配線板においてもコンパクト化、もしくは高
密度配線などが要求されている。このような要求に対応
して、各種の多層配線板が開発されている。たとえば、
厚さ65μm 程度のポリイミド樹脂フィルム(絶縁支持
体)の主面に配線パターンを形成し、これら主面に配線
パターンを形成したポリイミド樹脂フィルムを、接着剤
層を介して位置決め積層・一体化して成る多層配線板が
一般的に知られている。2. Description of the Related Art Along with miniaturization of electronic equipment and the like, wiring boards for forming circuits are required to be compact or have high-density wiring. In response to such demands, various multilayer wiring boards have been developed. For example,
A wiring pattern is formed on the main surface of a polyimide resin film (insulating support) with a thickness of about 65 μm, and the polyimide resin film with the wiring pattern formed on these main surfaces is positioned, laminated, and integrated via an adhesive layer. Multilayer wiring boards are generally known.
【0003】そして、前記構成の多層配線板は、次のよ
うにして製造されている。すなわち、厚さ65μm 程度の
ポリイミド樹脂フィルムの主面に、接着剤層を介して厚
さ12〜18μm 程度の銅箔を貼り合わせた銅箔貼りシート
を用意する。次いで、この銅箔貼りシートの所定領域に
穿孔加工を施し、層間接続用の貫通孔を設けた後、銅箔
について穿孔内壁面に導電体層を形成する。その後、フ
ォトエッチング処理を施して、配線パターンを形成し、
前記両面の配線パターン間が接続された配線パターニン
グ付きポリイミド樹脂フィルムとする。[0003] The multilayer wiring board having the above-described structure is manufactured as follows. That is, a copper foil-bonded sheet is prepared by bonding a copper foil having a thickness of about 12 to 18 μm to a main surface of a polyimide resin film having a thickness of about 65 μm via an adhesive layer. Next, a predetermined area of the copper foil-bonded sheet is perforated to provide a through hole for interlayer connection, and then a conductor layer is formed on the inner wall surface of the perforated copper foil. After that, a photo-etching process is performed to form a wiring pattern,
A polyimide resin film with a wiring pattern in which the wiring patterns on both sides are connected.
【0004】一方、所要の領域に打ち抜きプレス加工を
施す一方、所要の箇所に穿孔してこの穿孔内を導電性領
域化した接着剤層付きの厚さ65μm 程度のポリイミド樹
脂フィルムを用意する。その後、このポリイミド樹脂フ
ィルムの両主面側に、上記ポリイミド樹脂フィルムの一
方の配線パターニング面を位置合わせ・積層・配置して
圧着・一体化させることにより多層配線板が製造されて
いる。つまり、スルホール接続部を設けたポリイミド樹
脂フィルムをコア基材とし、このコア基材の両主面に、
両面配線パターンのポリイミド樹脂フィルムを位置合せ
・積層・一体化して多層配線板を得ている。[0004] On the other hand, a required area is subjected to punching and press working, while a required area is perforated to prepare a polyimide resin film having a thickness of about 65 µm with an adhesive layer having a conductive area in the perforated area. Thereafter, a multilayer wiring board is manufactured by aligning, laminating, and arranging one of the wiring patterning surfaces of the polyimide resin film on both main surfaces of the polyimide resin film, followed by crimping and integrating. In other words, a polyimide resin film provided with a through-hole connection portion is used as a core substrate, and on both main surfaces of the core substrate,
A multilayer wiring board is obtained by positioning, laminating and integrating the polyimide resin films of the double-sided wiring pattern.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、上記多
層配線板の場合は、特性の安定性などが欠けるという不
都合がある。すなわち、ポリイミド樹脂フィルム(絶縁
性支持体)と配線パターン(銅箔など)とを接合・一体
化するため、接着剤層を介挿している。ところで、前記
接着剤層は、一般的に、難燃性化の要求に対応して、た
とえばハロゲン化合物、燐化合物などの難燃化剤が添加
・配合されている。ここで、難燃化剤を含有する接着剤
層の介挿・存在は、構成された多層配線板自体の電気的
な特性に悪影響を及ぼすばかりでなく、多層配線板の製
造工程上、または多層配線板の破棄処分などにおいて、
その難燃化剤が環境問題を提起する恐れもある。However, in the case of the above-mentioned multilayer wiring board, there is an inconvenience that the stability of characteristics and the like are lacking. That is, an adhesive layer is interposed in order to join and integrate the polyimide resin film (insulating support) and the wiring pattern (such as copper foil). By the way, the adhesive layer is generally added and blended with a flame retardant such as a halogen compound or a phosphorus compound in response to a demand for flame retardancy. Here, the insertion / presence of the adhesive layer containing the flame retardant not only adversely affects the electrical characteristics of the multilayer wiring board itself, but also affects the manufacturing process of the multilayer wiring board or the multilayer wiring board. In the disposal of wiring boards, etc.
The flame retardant may raise environmental issues.
【0006】また、ポリイミド樹脂フィルム自体の吸水
性ないし吸湿性によって、ポリイミド樹脂フィルムを絶
縁体とした多層配線板は、外界の湿度の影響などを受け
る恐れがあり、たとえば高周波領域の電気信号を扱う場
合、信頼性が損なわれ易い。つまり、一般的に、耐湿性
が劣るため、絶縁体としての性能(たとえばインピーダ
ンス)が変動し、結果的に、安定した高周波信号の伝達
性・伝導性が低下する。 この改善策として、液晶ポリ
マーを絶縁体とした多層配線板の構成が考えられる。す
なわち、液晶ポリマーは、吸湿性がほとんどなく、誘電
率が約 3.0(1MHz)程度であり、広い周波数領域で安定し
ているので、前記絶縁体の吸湿作用に起因する不都合を
解消し得ると思われる。Further, a multilayer wiring board using a polyimide resin film as an insulator may be affected by external humidity due to the water absorption or moisture absorption of the polyimide resin film itself. For example, electric signals in a high frequency region are handled. In such a case, the reliability is easily impaired. That is, in general, the moisture resistance is poor, so that the performance (for example, impedance) as an insulator fluctuates, and as a result, stable high-frequency signal transmission and conductivity are reduced. As a remedy, a configuration of a multilayer wiring board using a liquid crystal polymer as an insulator can be considered. That is, since the liquid crystal polymer has almost no hygroscopicity, has a dielectric constant of about 3.0 (1 MHz), and is stable in a wide frequency range, it is considered that the disadvantage caused by the hygroscopic action of the insulator can be solved. It is.
【0007】しかし、一方では、熱変形など起こし易
く、また、機械的な強度も劣るという問題がある。ここ
で、熱変形などを起こし易いことは、多層化工程などに
おける形状の安定性に悪影響を及ぼすことになり、一
方、機械的な強度が劣ることは、多層配線板の着脱操作
など取扱過程での損傷、あるいは製造工程での損傷など
を招来するという問題がある。なお、液晶ポリマーは、
たとえばキシダール(商品名.Dartco社製)、ベクトラ
(商品名.Clanese 社製)で代表される多軸配向の熱可
塑性ポリマーである。[0007] However, on the other hand, there is a problem that heat deformation is liable to occur and mechanical strength is also poor. Here, the fact that thermal deformation easily occurs has an adverse effect on the stability of the shape in the multilayering process and the like, while the mechanical strength is inferior in the handling process such as the attaching and detaching operation of the multilayer wiring board. There is a problem that damage to the device or damage in the manufacturing process is caused. The liquid crystal polymer is
For example, it is a multiaxially oriented thermoplastic polymer represented by Xidal (trade name, manufactured by Dartco) and Vectra (trade name, manufactured by Clanese).
【0008】本発明は、上記事情に対処してなされたも
ので、接着剤による接合一体化の構成を省略した実用性
が高く、また、環境問題を軽減し、かつ従来の多層配線
板よりも電気特性、特に、高速信号を劣化させることな
く伝送できる多層配線板、およびその製造方法の提供を
目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and has high practicability in which the structure of joining and integrating with an adhesive is omitted. It is an object of the present invention to provide a multilayer wiring board capable of transmitting electrical characteristics, particularly, high-speed signals without deteriorating, and a method for manufacturing the same.
【0009】[0009]
【課題を解決するための手段】請求項1の発明は、強化
用繊維を含有するビスマレイミドトリアジン樹脂系の絶
縁体層と、前記絶縁体層の両主面にそれぞれ積層・一体
化された液晶ポリマーを層間絶縁体層とした配線板と、
前記絶縁体層の少なくとも一層を厚さ方向に貫通し、配
線板の配線パターン間を接続する層間接続部とを有する
ことを特徴とする多層配線板である。According to the present invention, there is provided a bismaleimide triazine resin-based insulating layer containing reinforcing fibers, and a liquid crystal laminated and integrated on both main surfaces of the insulating layer. A wiring board using a polymer as an interlayer insulating layer;
A multilayer wiring board, comprising: an interlayer connection portion that penetrates at least one of the insulator layers in a thickness direction and connects between wiring patterns of the wiring board.
【0010】請求項2の発明は、請求項1記載の配線基
板において、配線パターン間を接続する層間接続部が絶
縁体層を貫挿した導電性バンプで形成されていることを
特徴とする。According to a second aspect of the present invention, in the wiring board according to the first aspect, an interlayer connecting portion for connecting the wiring patterns is formed of a conductive bump penetrating an insulator layer.
【0011】請求項3の発明は、強化用繊維を含有する
ビスマレイミドトリアジン樹脂系の絶縁基体の両主面
に、液晶ポリマーから成る絶縁基体面に配線パターンが
形成された配線板を位置決め積層する工程と、前記積層
体を加熱圧着して一体化する工程と、前記絶縁基体の少
なくとも一層を厚さ方向に貫通させた配線パターン間の
接続ぶを形成する工程とを有することを特徴とする多層
配線板の製造方法である。 請求項4の発明は、液晶ポ
リマーから成る絶縁体層の両主面に、少なくとも一方の
所定箇所に導電性バンプを設けてある導電性金属箔を載
置して加圧・加熱一体化し、絶縁体層を貫挿する導電性
バンプによって両導電性金属箔間を電気的に接合させた
両面導電性金属箔張り板を形成する工程と、前記両面導
電性金属箔張り板の導電性金属箔を配線パターニングし
て配線板化する工程と、前記配線板2枚の主面を対向さ
せ、その主面間に強化用繊維を含有するビスマレイミド
トリアジン樹脂系で、かつ所要の箇所に厚さ方向に貫挿
する電気的な層間接続部が設けられた絶縁基体を位置決
め配置して積層化する工程と、前記積層体を加圧・加熱
一体化するとともに、絶縁基体を介して両配線板の配線
パターン間を接続する工程とを有することを特徴とする
多層配線板の製造方法である。According to a third aspect of the present invention, a wiring board having a wiring pattern formed on a surface of an insulating substrate made of a liquid crystal polymer is positioned and laminated on both principal surfaces of a bismaleimide triazine resin-based insulating substrate containing reinforcing fibers. A step of forming a connection between wiring patterns in which at least one layer of the insulating base is penetrated in a thickness direction. This is a method for manufacturing a wiring board. According to a fourth aspect of the present invention, a conductive metal foil provided with conductive bumps at at least one predetermined position is placed on both main surfaces of an insulator layer made of a liquid crystal polymer, and pressurized and heated to be integrated. Forming a double-sided conductive metal foil-clad board in which both conductive metal foils are electrically joined by conductive bumps penetrating the body layer; and A step of forming a wiring board by patterning the wiring, and a bismaleimide triazine resin containing reinforcing fibers between the two main faces of the two wiring boards facing each other, and in a thickness direction at a required location. A step of positioning and arranging and stacking an insulating substrate provided with an electrical interlayer connecting portion to be inserted, and a step of integrating the laminated body under pressure and heat, and a wiring pattern of both wiring boards via the insulating substrate. And a step of connecting between A method for manufacturing a multilayer wiring board to.
【0012】請求項5の発明は、液晶ポリマーから成る
絶縁体層の両主面に、少なくとも一方の所定箇所に導電
性バンプを設けてある導電性金属箔を載置し、加圧・加
熱一体化し、絶縁体層を貫挿する導電性バンプによって
両導電性金属箔間を電気的に接合させた両面導電性金属
箔張り板を形成する工程と、前記両面導電性金属箔張り
板の導電性金属箔を配線パターニングして配線板化する
工程と、前記配線板2枚の主面を対向させ、その主面間
に強化用繊維を含有するビスマレイミドトリアジン樹脂
系の絶縁基体を位置決め配置して積層化する工程と、前
記積層体を加圧・加熱一体化する工程とを有し、前記積
層体の加圧・加熱一体化時において、少なくとも一方の
配線板の配線パターン面に導電性パンプを設けておき、
この導電性パンプの絶縁基体貫挿により対向する配線パ
ターン間の接続を行うことを特徴とする多層配線板の製
造方法である。According to a fifth aspect of the present invention, a conductive metal foil provided with conductive bumps on at least one of predetermined positions is placed on both main surfaces of an insulator layer made of a liquid crystal polymer, and pressurized and heated integrally. Forming a double-sided conductive metal foil-clad board in which both conductive metal foils are electrically joined by conductive bumps penetrating the insulator layer; A step of forming a wiring board by patterning a metal foil, and positioning and arranging a bismaleimide triazine resin-based insulating substrate containing a reinforcing fiber between the main faces of the two wiring boards so as to face each other. A step of laminating, and a step of pressurizing and heating and integrating the laminate, and at the time of pressurizing and heating integration of the laminate, applying a conductive pump to the wiring pattern surface of at least one wiring board. Set it up,
A method for manufacturing a multilayer wiring board, characterized in that connection between opposed wiring patterns is performed by inserting the conductive pump through an insulating substrate.
【0013】上記各発明において、外層側の絶縁体層
(絶縁性支持体)を形成する液晶ポリマーは、たとえば
キシダール(商品名.Dartco社製)、ベクトラ(商品
名.Clanese 社製)で代表される多軸配向の熱可塑性ポ
リマーで、一般的に、厚さ25〜 100μm 程度である。こ
こで、液晶ポリマーは、その分子構造によって、その融
点なども異なっており、同一の分子構造でも、結晶構造
や添加物によって融点が変動する。たとえばベクトラン
Aタイプ(融点, 285℃)、ベクトランCタイプ(融
点, 325℃)、BIACフィルム(融点, 335℃)などが例
示される。In each of the above inventions, the liquid crystal polymer forming the outer insulating layer (insulating support) is represented by, for example, Xidal (trade name, manufactured by Dartco) and Vectra (trade name, manufactured by Clanese). A multiaxially oriented thermoplastic polymer having a thickness of about 25 to 100 μm. Here, the melting point of the liquid crystal polymer differs depending on the molecular structure, and the melting point varies depending on the crystal structure and the additive even with the same molecular structure. For example, Vectran A type (melting point, 285 ° C.), Vectran C type (melting point, 325 ° C.), BIAC film (melting point, 335 ° C.) and the like are exemplified.
【0014】また、内層の絶縁体層は、たとえばガラス
繊維や液晶ポリマー繊維などの強化剤にビスマレイミド
トリアジン樹脂(BT)、もしくはこのBTを主体とした混
合樹脂を含浸・担持させたフィルム状ないしシート状の
ものである。そして、その膜厚は、一般的に、25〜 100
μm 程度である。[0014] The inner insulating layer may be a film-like material in which a reinforcing agent such as glass fiber or liquid crystal polymer fiber is impregnated and supported with bismaleimide triazine resin (BT) or a mixed resin mainly composed of BT. It is a sheet. And the film thickness is generally 25-100
It is about μm.
【0015】なお、上記各絶縁体層は、複数層の積層で
構成することもできる。つまり外層側絶縁体層は、同種
もしくは異種の液晶ポリマー層を組み合わせ、また、内
層の絶縁体層は同種もしくは異種の絶縁体シートを組み
合わせることもできる。[0015] Each of the above-mentioned insulator layers may be formed by laminating a plurality of layers. That is, the outer insulating layer may be formed by combining the same or different liquid crystal polymer layers, and the inner insulating layer may be formed by combining the same or different insulating sheets.
【0016】一般的に、液晶ポリマーは吸湿性がほとん
どなく、誘電率が約 3.0(1MHz)程度であり、広い周波数
領域で安定している。また、たとえば 300℃程度の高温
で、熱プレスによって熱変形し、かつ対向する配線パタ
ーンや、液晶ポリマー層と容易に接合・一体化する。こ
の場合、配線パターン面、液晶ポリマー面の粗化された
面での場合、固着・一体化がより強固になる。In general, liquid crystal polymers have almost no hygroscopicity, a dielectric constant of about 3.0 (1 MHz), and are stable over a wide frequency range. Further, it is thermally deformed by a hot press at a high temperature of, for example, about 300 ° C., and is easily joined and integrated with a wiring pattern facing the liquid crystal layer. In this case, in the case of the roughened surface of the wiring pattern surface and the liquid crystal polymer surface, the fixation / integration becomes stronger.
【0017】また、上記各発明において、配線パターン
層間の電気的な接続は、いわゆる穿孔加工および穿孔内
の導電性化(たとえばメッキ層の形成、導電体の充填)
など一般的な手段で行ってもよいが、次のような手段が
好ましい。すなわち、配線パターン面(もしくは配線パ
ターン形成予定面)の所定位置に、導電性バンプを形成
しておき、この導電性バンプ先端部の絶縁体層貫挿によ
り、絶縁離隔された他の配線パターン側面に対接させる
構造を採ると、製造工程を簡略化できるし、さらに、微
細で信頼性の高い配線パターン層間の接続が得られる。In each of the above-mentioned inventions, the electrical connection between the wiring pattern layers is made by so-called perforation processing and making the inside of the perforations conductive (for example, formation of a plating layer, filling of a conductor).
For example, the following means may be used, but the following means are preferable. That is, a conductive bump is formed at a predetermined position on the wiring pattern surface (or a surface on which a wiring pattern is to be formed), and the other side of the wiring pattern that is insulated and separated by inserting an insulator layer at the tip of the conductive bump. By adopting a structure in which the wiring patterns are brought into contact with each other, the manufacturing process can be simplified, and furthermore, a fine and highly reliable connection between wiring pattern layers can be obtained.
【0018】なお、上記配線パターン層間の接続に推奨
した導電性バンプは、導電性ペーストの印刷などで配置
・形成できる。ここで、導電性ペーストは、たとえば
銀,金,銅,半田粉などの導電性粉末、これらの合金粉
末もしくは複合(混合)金属粉末と、樹脂バインダー成
分とを混合して調製されたペースト類が挙げられる。前
記樹脂バインダー成分としては、たとえばポリカーボネ
ート樹脂、ポリスルホン樹脂、ポリエステル樹脂、フェ
ノキシ樹脂などの熱可塑性樹脂、フェノール樹脂、ポリ
イミド樹脂、メラミン樹脂、エポキシ樹脂などの熱硬化
性樹脂などが一般的に挙げられる。The conductive bumps recommended for the connection between the wiring pattern layers can be arranged and formed by printing a conductive paste or the like. Here, examples of the conductive paste include pastes prepared by mixing a conductive powder such as silver, gold, copper, and solder powder, or an alloy powder or a composite (mixed) metal powder thereof with a resin binder component. No. Examples of the resin binder component include thermoplastic resins such as polycarbonate resin, polysulfone resin, polyester resin, and phenoxy resin, and thermosetting resins such as phenol resin, polyimide resin, melamine resin, and epoxy resin.
【0019】上記各発明において、多層配線板の配線パ
ターンは、一般的に、厚さ 5〜35μm 程度のたとえば
銅、アルミニウムなどの導電性金属箔のフォトエッチン
グで形成される。つまり、液晶ポリマーフィルム面に貼
着された導電性金属箔の選択的なエッチングで配線パタ
ーンが形成される。したがって、一般的に、配線パター
ンは、その厚さ分だけ、液晶ポリマーフィルム面から突
出しているが、これを液晶ポリマーフィルム面に圧入し
て、液晶ポリマーフィルム面と平坦な面とすれば、カバ
ーフィルムの配置・被覆が容易になるだけでなく、凹凸
のないパターンなどの緻密な被覆層を形成するので、ボ
イドの巻き込みを低減できカバーコートの信頼性が向上
すること、また、配線パターンの基板に対する密着強度
が向上する。 請求項1ないし2の発明では、外層配線
パターンを支持する絶縁体層が液晶ポリマーで形成さ
れ、かつ接着剤層の介挿も不要となるので、接着剤層が
含む難燃化剤に起因する環境問題などなくなる。つま
り、液晶ポリマーが有する本来の特長である耐湿性、高
い電気絶縁性と高速信号伝送安定性を有する信頼性の高
い配線回路を提供できる。In each of the above inventions, the wiring pattern of the multilayer wiring board is generally formed by photo-etching a conductive metal foil of, for example, copper or aluminum having a thickness of about 5 to 35 μm. That is, a wiring pattern is formed by selective etching of the conductive metal foil adhered to the liquid crystal polymer film surface. Therefore, in general, the wiring pattern protrudes from the liquid crystal polymer film by the thickness thereof, but if this is pressed into the liquid crystal polymer film surface to make the liquid crystal polymer film flat with the flat surface, Not only is it easy to arrange and cover the film, but also because it forms a dense coating layer such as a pattern with no irregularities, it reduces the entrapment of voids and improves the reliability of the cover coat. The adhesion strength with respect to is improved. According to the first and second aspects of the present invention, the insulator layer supporting the outer wiring pattern is formed of a liquid crystal polymer, and no interposition of an adhesive layer is required. There will be no environmental issues. In other words, it is possible to provide a highly reliable wiring circuit having moisture resistance, high electrical insulation, and high-speed signal transmission stability, which are inherent features of the liquid crystal polymer.
【0020】請求項3ないし5の発明では、液晶ポリマ
ー本来の特長である耐湿性、高い電気絶縁性と高速信号
伝送安定性などが生かされ、高機能化された配線回路を
歩留まりよく提供できる。According to the third to fifth aspects of the present invention, it is possible to provide a highly functionalized wiring circuit with high yield by utilizing the inherent characteristics of the liquid crystal polymer such as moisture resistance, high electrical insulation and high-speed signal transmission stability.
【0021】[0021]
【発明の実施の形態】図1および図2(a) ,(b) ,(c)
を参照して実施例を説明する。1 and 2 (a), 2 (b) and 2 (c).
An example will be described with reference to FIG.
【0022】図1は、実施例に係る配線基板の要部構成
を示す断面図である。図1において、1は厚さ60μm 程
度のビスマレイミドトリアジンフィルム(BTフィルム)
…絶縁体層…、2は前記BTフィルム1の一主面側に一体
的に配置された液晶ポリマーを層間絶縁体層2aとした配
線板、3は同じく前記BTフィルムの他主面側に一体的に
配置された液晶ポリマーを層間絶縁体層3aとした配線
板、4は前記絶縁体層1,2a,3aの厚さ方向に貫通し、
配線板の配線パターン2b,2c,3b,3c間などを接続する
層間接続部である。FIG. 1 is a sectional view showing the structure of a main part of a wiring board according to an embodiment. In FIG. 1, reference numeral 1 denotes a bismaleimide triazine film (BT film) having a thickness of about 60 μm.
... an insulator layer ... 2 is a wiring board having a liquid crystal polymer as an interlayer insulator layer 2a integrally disposed on one main surface side of the BT film 1, and 3 is also integrated on the other main surface side of the BT film Wiring board 4 in which a liquid crystal polymer arranged in an interposed manner is an interlayer insulating layer 3a, penetrates in the thickness direction of the insulating layers 1, 2a, 3a,
This is an interlayer connecting portion for connecting the wiring patterns 2b, 2c, 3b, 3c of the wiring board.
【0023】ここで、BTフィルム1は、ガラス繊維にビ
スマレイミドトリアジンを含浸・担持させた系で、厚さ
60μm 程度のフィルムないしシートであり、また、層間
絶縁体層2a,3aは、融点 285℃(もしくは 325℃)、厚
さ50μm 程度の液晶ポリマーフィルム(絶縁体層)であ
る。さらに、前記液晶ポリマーフィルム2a,3aの両面に
設けられた配線パターン2b,2c,3b,3cは、厚さ12μm
程度の電解銅箔製の配線パターンである。そして、これ
らの配線パターン2b,2cもしくは3b,3cを有する配線板
2,3は、前記BTフィルム(内層絶縁体…支持体層)1
面に熱圧着的に、接合・一体化した構成を成している。
一方、前記配線パターン2b,2c間、2c,3c間、もしくは
3b,3c間の電気的な接続部4は、前記各絶縁体層1,2
a,3aを貫挿した導電性バンプによって形成されてい
る。Here, the BT film 1 is a system in which bismaleimide triazine is impregnated and supported on glass fiber and has a thickness of
The interlayer insulating layers 2a and 3a are liquid crystal polymer films (insulating layers) having a melting point of 285 ° C. (or 325 ° C.) and a thickness of about 50 μm. Further, the wiring patterns 2b, 2c, 3b, 3c provided on both sides of the liquid crystal polymer films 2a, 3a have a thickness of 12 μm.
It is a wiring pattern made of electrolytic copper foil. The wiring boards 2 and 3 having these wiring patterns 2b and 2c or 3b and 3c are connected to the BT film (inner insulator ... support layer) 1
It is configured to be bonded and integrated with the surface by thermocompression bonding.
On the other hand, between the wiring patterns 2b and 2c, between 2c and 3c, or
The electrical connection part 4 between 3b and 3c is connected to each of the insulator layers 1 and 2
It is formed by conductive bumps penetrating a and 3a.
【0024】次に、その実施態様を模式的に示す図2
(a) 〜(C) を参照して、上記多層配線板の製造方法につ
いて説明する。Next, FIG. 2 schematically shows the embodiment.
With reference to (a) to (C), a method for manufacturing the multilayer wiring board will be described.
【0025】先ず、厚さ12μm の電解銅箔2c′(3b′)
の一主面上に、メタルマスクを位置決め配置し、導電性
ペーストを印刷し、乾燥後、同一のメタルマスクを用い
て同一位置に導電性ペーストを印刷、乾燥を繰り返して
高さ 200μm 程度の円錐型導電性バンプ4aを形成した。
なお、メタルマスクは、厚さ約 250μm のステンレス鋼
板の所要箇所に直径 250μm の孔を穿設したものであ
り、導電性ペーストは、銀粉およびエポキシ樹脂からな
る導電性組成物である。First, an electrolytic copper foil 2c '(3b') having a thickness of 12 μm
Position and arrange the metal mask on one main surface, print the conductive paste, dry it, print the conductive paste at the same position using the same metal mask, repeat the drying, and repeat the cone to a height of about 200 μm. The mold conductive bump 4a was formed.
The metal mask is a stainless steel plate having a thickness of about 250 μm and a hole having a diameter of 250 μm is formed at a required position. The conductive paste is a conductive composition made of silver powder and epoxy resin.
【0026】上記導電性バンプ4aを所要の位置に設けた
電解銅箔2c′(3b′)を、予め用意しておいた厚さ50μ
m 程度の液晶ポリマーフィルム2a(3a)の片面側に、導電
性バンプの先端側を対向させる一方、他面に銅箔2b′
(3c′)を配置する。この状態で、真空熱プレス加工を
施して、液晶ポリマーフィルム2a(3a)の両面側に電解銅
箔2c′(3b′)もしくは2b′(3c′)を圧着し、導電性
バンプ4aによって両面の電解銅箔2c′,2b′同士、もし
くは3c′,3b′同士が電気的に接続された両面銅箔貼り
シートを作製した(図2(a) 参照)。Electrodeposited copper foil 2c '(3b') having conductive bumps 4a provided at required positions is provided with a thickness of 50 μm prepared in advance.
m on one side of the liquid crystal polymer film 2a (3a), the front end of the conductive bump is opposed to the other side, and the copper foil 2b '
(3c ') is arranged. In this state, a vacuum hot press is performed, and electrolytic copper foil 2c '(3b') or 2b '(3c') is crimped on both sides of the liquid crystal polymer film 2a (3a), and the conductive bumps 4a A double-sided copper foil-bonded sheet in which the electrolytic copper foils 2c 'and 2b' or 3c 'and 3b' were electrically connected was produced (see FIG. 2A).
【0027】その後、両面銅箔貼りシートの両銅箔2
c′,2b′(もしくは3c′,3b′)面にそれぞれドライ
フィルム型の感光性レジストを貼り合せ、配線パターン
フィルムマスクを位置決めし、露光処理を施してからエ
ッチング処理を行って、配線パターニングすることによ
り、両面配線型の配線板2(3)を作製する(図2(b)
参照)。ここで、一方の両面配線型配線板3の配線パタ
ーン3cの所要位置の面に、上記導電性バンプ4aの形成に
準じて導電性バンプ4aを形成する。Thereafter, the copper foil 2 of the double-sided copper foil-bonded sheet 2
A dry film type photosensitive resist is bonded to each of the c 'and 2b' (or 3c 'and 3b') surfaces, a wiring pattern film mask is positioned, an exposure process is performed, and then an etching process is performed to perform wiring patterning. Thus, a double-sided wiring type wiring board 2 (3) is manufactured (FIG. 2B).
reference). Here, a conductive bump 4a is formed on a surface of a required position of the wiring pattern 3c of one double-sided wiring type wiring board 3 in accordance with the formation of the conductive bump 4a.
【0028】次いで、前記導電性バンプ4aを配線パター
ン3c面に形成した配線板3上に、予め用意しておいたBT
フィルム1を介して、配線板2を位置決め・積層配置
し、真空熱プレス加工(加圧着処理)を施して両配線板
2,3をBTフィルム1に貼着(接合)・一体化する一
方、配線パターン3c面上の導電性バンプ4a先端部を、対
向する配線パターン2c側に、BTフィルム1を貫挿させ接
続することにより、前記図1に示すような多層配線板を
作製する。Next, the BT prepared in advance is placed on the wiring board 3 on which the conductive bumps 4a are formed on the surface of the wiring pattern 3c.
The wiring board 2 is positioned, laminated and arranged via the film 1 and subjected to vacuum hot press processing (pressure bonding processing) to attach (join) and integrate the two wiring boards 2 and 3 to the BT film 1. The BT film 1 is inserted through and connected to the tip of the conductive bump 4a on the wiring pattern 3c side to the facing wiring pattern 2c side, thereby producing a multilayer wiring board as shown in FIG.
【0029】なお、上記配線パターン2b,2c間、2c,3c
間、もしくは3b,3c間の電気的な接続部4は、導電性バ
ンプ4a先端部の絶縁体層1,2a,3a貫挿により形成する
代わりに、たとえばエキシマレーザーを使用し、選択的
なレーザー光の照射による穿孔加工でスルホールを形成
し、そのスルホール内壁面および隣接する配線パターン
面に銅メッキ層などを成長させること、あるいは導電体
を充填することによって行ってもよい。Incidentally, between the wiring patterns 2b and 2c, 2c and 3c
Instead of forming the electrical connection portion 4 between the conductive bumps 4a or 3b and 3c by penetrating the insulator layers 1, 2a and 3a at the tip of the conductive bump 4a, for example, an excimer laser is used and a selective laser is used. The hole may be formed by forming a through hole by light irradiation and growing a copper plating layer or the like on the inner wall surface of the through hole and the adjacent wiring pattern surface, or by filling a conductor.
【0030】上記多層配線板の製造方法においては、液
晶ポリマー層2a,3aに対する銅箔2c′,2b′,3c′,3
b′の貼り合わせ、BTフィルム1に対する配線板2,3
の貼り合わせ(接合・一体化)に当たって、液晶ポリマ
ーの特性を利用して熱融着されるので、着接着剤が不要
となって製造工程が大幅に簡略化する。また、多層配線
板の廃棄処分などにおいては、燃焼によりハロゲンやリ
ンを含む有害物質の発生がないので、環境衛生面でも有
利であるとともに、熱可塑性樹脂と金属の組み合わせと
いう簡単な構成であるため、熱溶融で容易に樹脂分と金
属分に分離でき、樹脂と金属とを別けてリサイクルでき
るという特長もある。In the method of manufacturing the multilayer wiring board, the copper foils 2c ', 2b', 3c ', 3 for the liquid crystal polymer layers 2a, 3a are formed.
b 'lamination, wiring board 2, 3 for BT film 1
In the bonding (joining / integration), heat bonding is performed using the properties of the liquid crystal polymer, so that a bonding adhesive is not required and the manufacturing process is greatly simplified. In addition, in the disposal of multilayer wiring boards, there is no generation of harmful substances including halogens and phosphorus by combustion, which is advantageous in terms of environmental hygiene and has a simple structure consisting of a combination of thermoplastic resin and metal. Another advantage is that resin and metal can be easily separated by heat melting, and the resin and metal can be separated and recycled.
【0031】本発明は上記例示に限定されるものでな
く、発明の主旨を逸脱しない範囲でいろいろの変化を採
ることができる。たとえば内層の絶縁体層(絶縁性支持
体)の厚さ、外層の絶縁体層(液晶ポリマー層)の厚
さ、配線パターンの材質、配線パターン層数、導電性バ
ンプの形成用素材などは、用途・目的に応じて適宜選択
して用いることができる。The present invention is not limited to the above examples, and various changes can be made without departing from the gist of the invention. For example, the thickness of the inner insulating layer (insulating support), the thickness of the outer insulating layer (liquid crystal polymer layer), the material of the wiring pattern, the number of wiring pattern layers, the material for forming the conductive bumps, etc. It can be appropriately selected and used depending on the use and purpose.
【0032】[0032]
【発明の効果】請求項1ないし2の発明によれば、接着
剤層の介挿が不要となるので、接着剤層を含むことによ
る難燃化剤に起因する環境問題などが解消されるだけで
なく、液晶ポリマー本来の特長である耐湿性、すぐれた
高周波特性などが生かされた信頼性の高い配線基板が提
供される。According to the first and second aspects of the present invention, since there is no need to interpose an adhesive layer, environmental problems caused by the flame retardant due to the inclusion of the adhesive layer can be solved. In addition, a highly reliable wiring board utilizing the inherent characteristics of the liquid crystal polymer such as moisture resistance and excellent high frequency characteristics is provided.
【0033】請求項3ないし5の発明によれば、液晶ポ
リマー本来の特長である耐湿性、すぐれた高周波特性な
どが生かされながら、高機能化された配線基板が提供さ
れる。According to the third to fifth aspects of the present invention, a highly functional wiring board is provided while taking advantage of the inherent characteristics of a liquid crystal polymer such as moisture resistance and excellent high-frequency characteristics.
【図1】実施例に係る多層配線板の要部構成を示す断面
図。FIG. 1 is a sectional view showing a configuration of a main part of a multilayer wiring board according to an embodiment.
【図2】(a) ,(b) ,(c) は実施例に係る多層配線板の
製造工程の実施態様を示す断面図。FIGS. 2A, 2B, and 2C are cross-sectional views illustrating an embodiment of a manufacturing process of a multilayer wiring board according to an example.
1……BT系絶縁体層 2,3……配線板 2a,3a……液晶ポリマーからなる絶縁体層 2b,2c,3b,3c……配線パターン 4……層間接続部 1 BT insulating layer 2, 3 Wiring board 2a, 3a Insulating layer 2b, 2c, 3b, 3c made of liquid crystal polymer Wiring pattern 4 Interlayer connection
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H05K 3/46 H05K 1/11 H05K 3/40 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) H05K 3/46 H05K 1/11 H05K 3/40
Claims (5)
リアジン樹脂系の絶縁体層と、 前記絶縁体層の両主面にそれぞれ積層・一体化された液
晶ポリマーを層間絶縁体層とした配線板と、 前記絶縁体層の少なくとも一層を厚さ方向に貫通し、配
線板の配線パターン間を接続する層間接続部とを有する
ことを特徴とする多層配線板。1. A bismaleimide triazine resin-based insulating layer containing a reinforcing fiber, and a wiring board having a liquid crystal polymer laminated and integrated on both main surfaces of the insulating layer as an interlayer insulating layer. A multi-layer wiring board, comprising: an interlayer connecting portion that penetrates at least one of the insulator layers in a thickness direction and connects between wiring patterns of the wiring board.
絶縁体層を貫挿した導電性バンプで形成されていること
を特徴とする請求項1記載の配線基板。2. The wiring board according to claim 1, wherein the interlayer connection for connecting the wiring patterns is formed of a conductive bump penetrating the insulator layer.
リアジン樹脂系の絶縁基体の両主面に、液晶ポリマーか
ら成る絶縁基体面に配線パターンが形成された配線板を
位置決め積層する工程と、 前記積層体を加熱圧着して一体化する工程と、 前記絶縁基体の少なくとも一層を厚さ方向に貫通させた
配線パターン間の接続ぶを形成する工程とを有すること
を特徴とする多層配線板の製造方法。3. A step of positioning and laminating a wiring board having a wiring pattern formed on a surface of an insulating substrate made of a liquid crystal polymer on both principal surfaces of a bismaleimide triazine resin-based insulating substrate containing reinforcing fibers; A process for forming a connection between wiring patterns in which at least one layer of the insulating base is penetrated in a thickness direction, the method comprising the steps of: .
に、少なくとも一方の所定箇所に導電性バンプを設けて
ある導電性金属箔を載置して加圧・加熱一体化し、絶縁
体層を貫挿する導電性バンプによって両導電性金属箔間
を電気的に接合させた両面導電性金属箔張り板を形成す
る工程と、 前記両面導電性金属箔張り板の導電性金属箔を配線パタ
ーニングして配線板化する工程と、 前記配線板2枚の主面を対向させ、その主面間に強化用
繊維を含有するビスマレイミドトリアジン樹脂系で、か
つ所要の箇所に厚さ方向に貫挿する電気的な層間接続部
が設けられた絶縁基体を位置決め配置して積層化する工
程と、 前記積層体を加圧・加熱一体化するとともに、絶縁基体
を介して両配線板の配線パターン間を接続する工程とを
有することを特徴とする多層配線板の製造方法。4. An insulating layer comprising a liquid crystal polymer, a conductive metal foil having conductive bumps provided on at least one predetermined position is placed on both main surfaces of the insulating layer, and pressurized and heated to be integrated. Forming a double-sided conductive metal foil-clad board in which both conductive metal foils are electrically joined by conductive bumps penetrating the wiring, and wiring patterning the conductive metal foil of the double-sided conductive metal-foiled board Forming a wiring board, and inserting a bismaleimide triazine resin containing reinforcing fibers between the two main faces of the two wiring boards in a thickness direction at a required position. Positioning and arranging and laminating an insulating substrate provided with an electrical interlayer connecting portion to be formed, and pressing and heating the laminated body, and connecting the wiring patterns of both wiring boards via the insulating substrate. And a step of connecting Of manufacturing a multilayer wiring board.
に、少なくとも一方の所定箇所に導電性バンプを設けて
ある導電性金属箔を載置し、加圧・加熱一体化し、絶縁
体層を貫挿する導電性バンプによって両導電性金属箔間
を電気的に接合させた両面導電性金属箔張り板を形成す
る工程と、 前記両面導電性金属箔張り板の導電性金属箔を配線パタ
ーニングして配線板化する工程と、 前記配線板2枚の主面を対向させ、その主面間に強化用
繊維を含有するビスマレイミドトリアジン樹脂系の絶縁
基体を位置決め配置して積層化する工程と、 前記積層体を加圧・加熱一体化する工程とを有し、 前記積層体の加圧・加熱一体化時において、少なくとも
一方の配線板の配線パターン面に導電性パンプを設けて
おき、この導電性パンプの絶縁基体貫挿により対向する
配線パターン間の接続を行うことを特徴とする多層配線
板の製造方法。5. A conductive metal foil having conductive bumps provided on at least one predetermined position is placed on both main surfaces of an insulator layer made of a liquid crystal polymer, and pressurized and heated to be integrated. Forming a double-sided conductive metal foil-clad board in which both conductive metal foils are electrically joined by conductive bumps penetrating the wiring, and wiring patterning the conductive metal foil of the double-sided conductive metal-foiled board Forming a wiring board; and positioning and laminating a bismaleimide triazine resin-based insulating substrate containing reinforcing fibers between the two main faces of the two wiring boards. A step of pressurizing and heating the laminate, and at the time of pressurizing and heating the laminate, providing a conductive pump on the wiring pattern surface of at least one of the wiring boards. Insertion of conductive pump into insulating substrate Method for manufacturing a multilayer wiring board and performing more connections between the opposed wiring patterns.
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JP647899A JP3329756B2 (en) | 1999-01-13 | 1999-01-13 | Multilayer wiring board and method of manufacturing the same |
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Application Number | Priority Date | Filing Date | Title |
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JP647899A JP3329756B2 (en) | 1999-01-13 | 1999-01-13 | Multilayer wiring board and method of manufacturing the same |
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JP4689263B2 (en) * | 2004-12-21 | 2011-05-25 | 日本メクトロン株式会社 | Multilayer wiring board and manufacturing method thereof |
JP5151265B2 (en) | 2007-06-14 | 2013-02-27 | 日立電線株式会社 | Multilayer wiring board and method for manufacturing multilayer wiring board |
US8778124B2 (en) * | 2008-01-17 | 2014-07-15 | Harris Corporation | Method for making three-dimensional liquid crystal polymer multilayer circuit boards |
US9117602B2 (en) | 2008-01-17 | 2015-08-25 | Harris Corporation | Three-dimensional liquid crystal polymer multilayer circuit board including membrane switch and related methods |
CN102922809B (en) * | 2012-11-01 | 2016-08-10 | 广东生益科技股份有限公司 | A kind of liquid crystal polymer glass fibre bonding sheet, copper-clad plate and preparation method thereof |
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