JP2810911B2 - 露光装置 - Google Patents
露光装置Info
- Publication number
- JP2810911B2 JP2810911B2 JP6063057A JP6305794A JP2810911B2 JP 2810911 B2 JP2810911 B2 JP 2810911B2 JP 6063057 A JP6063057 A JP 6063057A JP 6305794 A JP6305794 A JP 6305794A JP 2810911 B2 JP2810911 B2 JP 2810911B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- clean
- exposure
- original film
- original
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 claims description 110
- 238000004140 cleaning Methods 0.000 claims description 19
- 239000000428 dust Substances 0.000 claims description 14
- 239000002390 adhesive tape Substances 0.000 claims description 9
- 239000000853 adhesive Substances 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 16
- 239000011889 copper foil Substances 0.000 description 14
- 230000005611 electricity Effects 0.000 description 12
- 230000003068 static effect Effects 0.000 description 11
- 230000001681 protective effect Effects 0.000 description 10
- 230000032258 transport Effects 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6063057A JP2810911B2 (ja) | 1994-03-31 | 1994-03-31 | 露光装置 |
| TW84109271A TW278313B (enrdf_load_stackoverflow) | 1994-03-31 | 1995-09-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6063057A JP2810911B2 (ja) | 1994-03-31 | 1994-03-31 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07271048A JPH07271048A (ja) | 1995-10-20 |
| JP2810911B2 true JP2810911B2 (ja) | 1998-10-15 |
Family
ID=13218338
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6063057A Expired - Fee Related JP2810911B2 (ja) | 1994-03-31 | 1994-03-31 | 露光装置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2810911B2 (enrdf_load_stackoverflow) |
| TW (1) | TW278313B (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008216433A (ja) * | 2007-03-01 | 2008-09-18 | Adtec Engineeng Co Ltd | 露光装置 |
| CN107130379A (zh) * | 2017-07-17 | 2017-09-05 | 太仓秦风广告传媒有限公司 | 一种自动检测与清理异物的印染轧车 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100831620B1 (ko) * | 2006-12-29 | 2008-05-27 | (주)엔에스 | 필름 낱장공급장치 |
| JP5004786B2 (ja) * | 2007-12-27 | 2012-08-22 | 株式会社オーク製作所 | 露光装置の反転部 |
| JP2010182997A (ja) * | 2009-02-09 | 2010-08-19 | Seiko Instruments Inc | ウエハ露光装置及びウエハ露光方法 |
| CN110376853A (zh) * | 2019-08-27 | 2019-10-25 | 爱司凯科技股份有限公司 | 高精度全自动双面曝光机 |
| JP7004331B2 (ja) * | 2019-12-10 | 2022-01-21 | 株式会社レヨーン工業 | 露光機の除塵装置 |
-
1994
- 1994-03-31 JP JP6063057A patent/JP2810911B2/ja not_active Expired - Fee Related
-
1995
- 1995-09-06 TW TW84109271A patent/TW278313B/zh active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008216433A (ja) * | 2007-03-01 | 2008-09-18 | Adtec Engineeng Co Ltd | 露光装置 |
| CN107130379A (zh) * | 2017-07-17 | 2017-09-05 | 太仓秦风广告传媒有限公司 | 一种自动检测与清理异物的印染轧车 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07271048A (ja) | 1995-10-20 |
| TW278313B (enrdf_load_stackoverflow) | 1996-06-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |