JP2688452B2 - 高表面積、低金属不純物のタンタル粉末の製造方法 - Google Patents

高表面積、低金属不純物のタンタル粉末の製造方法

Info

Publication number
JP2688452B2
JP2688452B2 JP3509993A JP50999391A JP2688452B2 JP 2688452 B2 JP2688452 B2 JP 2688452B2 JP 3509993 A JP3509993 A JP 3509993A JP 50999391 A JP50999391 A JP 50999391A JP 2688452 B2 JP2688452 B2 JP 2688452B2
Authority
JP
Japan
Prior art keywords
reaction vessel
tantalum
active ingredient
powder
reactor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3509993A
Other languages
English (en)
Japanese (ja)
Other versions
JPH05508686A (ja
Inventor
チャン，ホンジュ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cabot Corp
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Publication of JPH05508686A publication Critical patent/JPH05508686A/ja
Application granted granted Critical
Publication of JP2688452B2 publication Critical patent/JP2688452B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004—Details
    • H01G9/04—Electrodes or formation of dielectric layers thereon
    • H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
    • H01G9/052—Sintered electrodes
    • H01G9/0525—Powder therefor
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B34/00—Obtaining refractory metals
    • C22B34/20—Obtaining niobium, tantalum or vanadium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/16—Making metallic powder or suspensions thereof using chemical processes
    • B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
    • B22F9/24—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B34/00—Obtaining refractory metals
    • C22B34/20—Obtaining niobium, tantalum or vanadium
    • C22B34/24—Obtaining niobium or tantalum
JP3509993A 1990-05-17 1991-05-17 高表面積、低金属不純物のタンタル粉末の製造方法 Expired - Lifetime JP2688452B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US52436490A 1990-05-17 1990-05-17
US524,364 1990-05-17

Publications (2)

Publication Number Publication Date
JPH05508686A JPH05508686A (ja) 1993-12-02
JP2688452B2 true JP2688452B2 (ja) 1997-12-10

Family

ID=24088890

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3509993A Expired - Lifetime JP2688452B2 (ja) 1990-05-17 1991-05-17 高表面積、低金属不純物のタンタル粉末の製造方法

Country Status (2)

Country Link
JP (1) JP2688452B2 (ko)
KR (1) KR100220881B1 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6348113B1 (en) * 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
JP2004339567A (ja) * 2003-05-15 2004-12-02 Cabot Supermetal Kk タンタルおよび／またはニオブの製造方法
WO2007130483A2 (en) * 2006-05-05 2007-11-15 Cabot Corporation Tantalum powder with smooth surface and methods of manufacturing same
KR101616559B1 (ko) * 2016-01-25 2016-04-28 에이치알엠알(주) 탄탈륨 분말의 제조방법
KR102376746B1 (ko) * 2019-11-05 2022-03-21 한국생산기술연구원 금속열환원법을 이용한 탄탈륨의 제련 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4347084A (en) * 1975-04-18 1982-08-31 Hermann C. Starck Berlin Electrodes of sintered tantalum powder of fine grain size and process of production
JPS60145304A (ja) * 1984-01-09 1985-07-31 Showa Kiyabotsuto Suupaa Metal Kk タンタル粉末の製造法
JPS61281831A (ja) * 1985-06-07 1986-12-12 Nippon Telegr & Teleph Corp <Ntt> 高純度タンタルの精製法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4347084A (en) * 1975-04-18 1982-08-31 Hermann C. Starck Berlin Electrodes of sintered tantalum powder of fine grain size and process of production
JPS60145304A (ja) * 1984-01-09 1985-07-31 Showa Kiyabotsuto Suupaa Metal Kk タンタル粉末の製造法
JPS61281831A (ja) * 1985-06-07 1986-12-12 Nippon Telegr & Teleph Corp <Ntt> 高純度タンタルの精製法

Also Published As

Publication number Publication date
KR930700687A (ko) 1993-03-15
KR100220881B1 (ko) 1999-09-15
JPH05508686A (ja) 1993-12-02

Similar Documents

Publication Publication Date Title
US5234491A (en) Method of producing high surface area, low metal impurity
US6558447B1 (en) Metal powders produced by the reduction of the oxides with gaseous magnesium
US6171363B1 (en) Method for producing tantallum/niobium metal powders by the reduction of their oxides with gaseous magnesium
US4684399A (en) Tantalum powder process
CA2190603C (en) Tantalum production and product
JP5119065B2 (ja) 金属粉末の製造方法
US4954169A (en) Fine-grained, high-purity earth acid metal powders, a process for their production and their use
US6786951B2 (en) Process for the production of high surface area tantalum and/or niobium powders
JP4215911B2 (ja) ニオブ粉末凝集物
AU2011201793B2 (en) Reduction method
JP4202609B2 (ja) 気体状マグネシウムを用いる酸化物の還元により製造される金属粉末
WO2000067936A1 (en) Metal powders produced by the reduction of the oxides with gaseous magnesium
US3829310A (en) High surface area valve metal powder
RU2089350C1 (ru) Способ получения танталового порошка
JP2688452B2 (ja) 高表面積、低金属不純物のタンタル粉末の製造方法
AU2005281918A1 (en) Deoxidisation of valve metal powders
CA2331707C (en) Reduction of nb or ta oxide powder by a gaseous light metal or a hydride thereof
RU2284248C1 (ru) Способ получения порошка вентильного металла
RU2189294C1 (ru) Способ получения порошка вентильного металла
RU2164194C2 (ru) Способ получения порошка вентильного металла

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20070822

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080822

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080822

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090822

Year of fee payment: 12

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090822

Year of fee payment: 12

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100822

Year of fee payment: 13

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110822

Year of fee payment: 14

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110822

Year of fee payment: 14