JP2687931B2 - Substrate transfer device - Google Patents
Substrate transfer deviceInfo
- Publication number
- JP2687931B2 JP2687931B2 JP7133591A JP13359195A JP2687931B2 JP 2687931 B2 JP2687931 B2 JP 2687931B2 JP 7133591 A JP7133591 A JP 7133591A JP 13359195 A JP13359195 A JP 13359195A JP 2687931 B2 JP2687931 B2 JP 2687931B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- roller
- contact portion
- back surface
- dust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning In General (AREA)
- Rollers For Roller Conveyors For Transfer (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、基板搬送装置に関し、
特にローラーに基板端面及び裏面を支持して基板を搬送
する基板搬送装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate transfer device,
In particular, the present invention relates to a substrate transport device that transports a substrate by supporting a substrate end surface and a back surface on a roller.
【0002】[0002]
【従来の技術】従来、この種の基板搬送装置は、特開平
5−279860号公報に記載されるように基板の枚葉
処理及び次工程ユニットへ搬出するために基板を搬送す
ることを目的として用いられている。2. Description of the Related Art Conventionally, a substrate transfer apparatus of this type has a purpose of transferring a substrate for single-wafer processing of the substrate and carrying it out to a next process unit, as described in JP-A-5-279860. It is used.
【0003】図2は搬送処理を示す構成図である。図2
において、処理ユニット9の外部側面にモーター11が
あり、内部側面に数本設置した搬送ローラー8と図示し
ていないギヤ又はベルトなどにより間接的に連結されて
いる。また1は基板,10は搬送方向を示す。FIG. 2 is a block diagram showing the carrying process. FIG.
In the above, there is a motor 11 on the outer side surface of the processing unit 9, and the motor 11 is indirectly connected to a plurality of transport rollers 8 installed on the inner side surface by a gear or belt not shown. Further, 1 indicates the substrate, and 10 indicates the transport direction.
【0004】図4は従来の基板搬送装置を示す正面図で
ある。図4において搬送ローラー8は、シャフト2にロ
ーラー3をシュパンリング方式にて固定されている。FIG. 4 is a front view showing a conventional substrate transfer device. In FIG. 4, the transport roller 8 has the roller 3 fixed to the shaft 2 by a spanning method.
【0005】次に図2,図4について動作を説明する。
図2に示したモーター11が回転し、それをギヤ又はベ
ルトにより伝達することで搬送ローラー8が回転する。
図4に示したローラー3の基板端面接触部13と基板裏
面接触部14にて基板1を支持し、搬送ローラー8が回
転することで処理ユニット9に搬入する。処理ユニット
9内に基板1を搬送後、例えばUVや乾燥処理を行い処
理終了後、次ユニットに搬送ローラー8にて搬出する。Next, the operation will be described with reference to FIGS.
The motor 11 shown in FIG. 2 rotates, and the transmission roller 8 is rotated by transmitting it by a gear or a belt.
The substrate 1 is supported by the substrate end surface contact portion 13 and the substrate back surface contact portion 14 of the roller 3 shown in FIG. 4, and the transport roller 8 rotates to carry the substrate 1 into the processing unit 9. After the substrate 1 is transferred into the processing unit 9, for example, UV or drying processing is performed, and after the processing is completed, it is transferred to the next unit by the transfer roller 8.
【0006】[0006]
【発明が解決しようとする課題】しかし上述した従来の
基板搬送装置では、図4に示すように基板1の幅方向へ
の滑りによるローラー3端面部と基板1との接触により
ローラー3よりも基板1が固い場合は、ローラー3の基
板端面接触部13が削れてゴミ12を発生し、基板裏面
接触部14に付着する。又、基板1よりもローラー3が
固い場合は、逆に基板端面が削れてゴミ12を発生し、
同様に基板裏面接触部14に付着する。However, in the above-mentioned conventional substrate transfer apparatus, as shown in FIG. 4, the contact between the end surface portion of the roller 3 and the substrate 1 due to the sliding of the substrate 1 in the width direction causes the substrate 1 to move more than the roller 3. When 1 is hard, the substrate end surface contact portion 13 of the roller 3 is scraped to generate dust 12, which adheres to the substrate back surface contact portion 14. If the roller 3 is harder than the substrate 1, the end face of the substrate is scraped to generate dust 12.
Similarly, it adheres to the back surface contact portion 14 of the substrate.
【0007】この結果、ローラー3の基板裏面接触部1
4に付着したゴミ12が基板1を搬送する際に基板1に
付着してしまうため、基板1を汚染し製品品質が低下す
る。As a result, the substrate back surface contact portion 1 of the roller 3
The dust 12 adhering to the substrate 4 adheres to the substrate 1 when the substrate 1 is conveyed, which contaminates the substrate 1 and deteriorates the product quality.
【0008】本発明の目的は、基板とローラーの接触に
よるゴミを基板に付着させないようにした基板搬送装置
を提供することにある。It is an object of the present invention to provide a substrate transfer device which prevents dust from adhering to the substrate due to contact between the substrate and the roller.
【0009】[0009]
【課題を解決するための手段】前記目的を達成するた
め、本発明に係る基板搬送装置は、搬送ローラーと、エ
アーノズルと、排気ユニットとを有する基板搬送装置で
あって、搬送ローラーは、基板端面接触部に基板の端面
をあてがい、基板裏面接触部に基板の裏面を支え、回転
することにより基板に送りを与えるものであり、エアー
ノズルは前記搬送ローラーと基板との接触部にエアーを
吹き付けて、該接触部に生ずるゴミを払拭するものであ
り、排気ユニットは前記エアーノズルのエアー吹き付け
により払拭されたゴミを排出するものである。In order to achieve the above object, a substrate transfer device according to the present invention is a substrate transfer device having a transfer roller, an air nozzle, and an exhaust unit, and the transfer roller is a substrate. The end face of the substrate is applied to the end face contact part, the back face of the substrate is supported on the back face contact part of the substrate, and the substrate is fed by rotating, and the air nozzle blows air to the contact part between the transfer roller and the substrate. Then, the dust generated on the contact portion is wiped off, and the exhaust unit discharges the dust wiped off by the air blowing of the air nozzle.
【0010】また前記搬送ローラーは周方向に逃げ溝を
有し、前記エアーノズルは前記搬送ローラーの逃げ溝内
にゴミを吹き落すことにより、ゴミを払拭するものであ
る。Further, the transport roller has an escape groove in the circumferential direction, and the air nozzle wipes the dust by blowing the dust into the escape groove of the transport roller.
【0011】また前記搬送ローラーは前記逃げ溝に隣接
して、基板裏面を支える基板裏面接触部を有するもので
ある。Further, the transport roller has a substrate back surface contact portion for supporting the substrate back surface, which is adjacent to the escape groove.
【0012】また前記搬送ローラーは基板裏面接触部が
平面形状をなすものである。The transport roller has a substrate rear surface contact portion having a planar shape.
【0013】また前記搬送ローラーは基板裏面接触部が
円弧形状をなすものである。Further, the transport roller is such that the contact portion on the back surface of the substrate has an arc shape.
【0014】[0014]
【作用】搬送ローラーと基板との接触部分に発生するゴ
ミをエアーの吹き付けにより払拭し、ゴミの基板への付
着を阻止する。The dust generated at the contact portion between the transport roller and the substrate is wiped by blowing air to prevent the dust from adhering to the substrate.
【0015】[0015]
【実施例】以下、本発明の実施例を図により説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the drawings.
【0016】(実施例1)図1は本発明の実施例1を示
す断面図である。(Embodiment 1) FIG. 1 is a sectional view showing Embodiment 1 of the present invention.
【0017】図において本発明に係る基板搬送装置は、
搬送ローラー8と、エアーノズル4と、排気ユニット6
とを有している。In the figure, the substrate transfer apparatus according to the present invention is
Conveyor roller 8, air nozzle 4, exhaust unit 6
And
【0018】各構成の機能を説明すると、搬送ローラー
8は、シャフト2にローラー3を基板1の巾方向間隔に
合わせてシュパンリング方式にて軸支させており、シャ
フト2は両端が装置本体に回転可能に支持され、モータ
等の駆動力を受けてローラー3を回転させ基板1に送り
を与えるようになっている。Explaining the function of each component, the transport roller 8 has a shaft 2 that supports the roller 3 in accordance with the widthwise interval of the substrate 1 by a spun ring method. It is rotatably supported, and receives the driving force of a motor or the like to rotate the roller 3 to feed the substrate 1.
【0019】また搬送ローラー8は、ローラー3の側面
にテーパ状の基板端面接触部13が形成され、基板端面
接触部13の内側に平面状の基板裏面接触部14が形成
されており、基板端面接触部13に基板1の端面があて
がわれ、基板裏面接触部14に基板1の裏面を支えて回
転することにより、基板1に送りを与えるようになって
いる。Further, the transport roller 8 has a tapered substrate end surface contact portion 13 formed on the side surface of the roller 3, and a planar substrate back surface contact portion 14 formed inside the substrate end surface contact portion 13. The end surface of the substrate 1 is applied to the contact portion 13, and the back surface of the substrate 1 is supported by the contact portion 14 on the back surface of the substrate to rotate so that the substrate 1 is fed.
【0020】また搬送ローラー8は、基板裏面接触部1
4に隣接したローラー3の周面を凹ませて、周方向に逃
げ溝15を設けている。Further, the transport roller 8 is the backside contact portion 1 of the substrate.
The circumferential surface of the roller 3 adjacent to 4 is recessed to provide an escape groove 15 in the circumferential direction.
【0021】エアーノズル4は基板1の端面がローラー
3の接触部13にあてがわれる領域の上方に、その吹出
口を下向きにして配置され、エアー5を吹き付けて基板
1とローラ3との接触により発生するゴミ12を逃げ溝
15内に吹き落し、ゴミ12を払拭するようになってい
る。The air nozzle 4 is arranged above the area where the end surface of the substrate 1 is applied to the contact portion 13 of the roller 3, with its outlet facing downward, and blows air 5 to bring the substrate 1 into contact with the roller 3. The dust 12 generated by the above is blown down into the escape groove 15 to wipe the dust 12.
【0022】排気ユニット6は、搬送ローラー8の下部
を取り囲んで設置された排気室6aと、排気室6aの底
部に接続された排気管6bとを有し、排気管6bよりポ
ンプ等により排気室6aを排気して、搬送ローラー8の
逃げ溝15内に吹き落されたゴミ12を排出するように
なっている。The exhaust unit 6 has an exhaust chamber 6a installed so as to surround the lower portion of the transport roller 8 and an exhaust pipe 6b connected to the bottom of the exhaust chamber 6a. 6a is exhausted, and the dust 12 blown down into the escape groove 15 of the transport roller 8 is discharged.
【0023】次に図1,図2について動作を説明する。
図2に示したモーター11が回転し、それをギヤ又はベ
ルトにより伝達することで搬送ローラー8が回転する。Next, the operation will be described with reference to FIGS.
The motor 11 shown in FIG. 2 rotates, and the transmission roller 8 is rotated by transmitting it by a gear or a belt.
【0024】図1に示したローラー3の基板端面接触部
13と逃げ溝15部以外の基板裏面接触部14にて基板
1を支持し、基板1を搬送ローラー8の回転により処理
ユニット9に搬入する。The substrate 1 is supported by the substrate end surface contact portion 13 of the roller 3 shown in FIG. 1 and the substrate back surface contact portion 14 other than the escape groove 15, and the substrate 1 is carried into the processing unit 9 by the rotation of the transport roller 8. To do.
【0025】処理ユニット9内に基板1を搬送後、例え
ばUVや乾燥処理を行い処理終了後、次ユニットに搬送
ローラー8にて搬出する。After the substrate 1 is transferred into the processing unit 9, for example, UV or drying processing is performed, and after the processing is completed, it is transferred to the next unit by the transfer roller 8.
【0026】基板1の搬送後は、搬送ローラー8を回転
した状態でノズル4にてローラー3に数分間エアー5を
吹き付けながら端面部や逃げ溝15等に付着したゴミ1
2を剥がし、排気ユニット6にて排気の流れ方向7へ排
出する。After the substrate 1 is conveyed, while the conveying roller 8 is rotated, the nozzle 4 blows air 5 onto the roller 3 for several minutes, and dust 1 attached to the end face portion, the escape groove 15, etc.
2 is peeled off, and the exhaust unit 6 discharges in the exhaust flow direction 7.
【0027】したがって本実施例によれば、基板1の搬
送の際に発生したゴミは、搬送ローラーから払拭され、
除去されることとなり、ゴミが基板に付着することを阻
止できる。Therefore, according to this embodiment, dust generated when the substrate 1 is transported is wiped from the transport roller,
As a result, the dust can be prevented from adhering to the substrate.
【0028】(実施例2)図3は本発明の実施例2を示
す正面図である。図3に示す本実施例は、ローラー3の
基板裏面接触部14の逃げ溝15部を除く基板裏面接触
部14の周面を円弧状にしたものである。従って本実施
例によれば、実施例1と同様の効果を得ることができる
ばかりでなく、基板1とローラ3との接触面積が少なく
なるため、ゴミ12の付着を更に少なくすることができ
るという利点を有する。(Second Embodiment) FIG. 3 is a front view showing a second embodiment of the present invention. In this embodiment shown in FIG. 3, the peripheral surface of the substrate back surface contact portion 14 excluding the clearance groove 15 of the substrate back surface contact portion 14 of the roller 3 is formed into an arc shape. Therefore, according to this embodiment, not only the same effects as in Embodiment 1 can be obtained, but also the contact area between the substrate 1 and the roller 3 is reduced, so that the adhesion of dust 12 can be further reduced. Have advantages.
【0029】[0029]
【発明の効果】以上説明したように本発明によれば、基
板とローラーとの接触によるゴミをエアーの吹付けによ
り払拭するため、基板へのゴミの付着を防止することが
できる。As described above, according to the present invention, the dust caused by the contact between the substrate and the roller is wiped by blowing air, so that the dust can be prevented from adhering to the substrate.
【0030】さらにローラーの基板裏面接触部に逃げ溝
を設け、ゴミを逃げ溝に吹き落して除去することによ
り、基板とローラー端面部との接触によるゴミを捕捉す
ることができ、ゴミの基板への付着を確実に防止するこ
とができる。Further, by providing an escape groove in the contact portion of the back surface of the roller of the roller and blowing off the dust into the escape groove to remove the dust, it is possible to capture the dust caused by the contact between the substrate and the end surface portion of the roller. It is possible to reliably prevent the adherence of.
【0031】さらにローラーの逃げ溝と基板は非接触で
あり、逃げ溝の部分に一時的に付着したゴミをエアーノ
ズルと排気ユニットを用いたダウンフロー方式にて排出
するため、処理ユニット内のクリーン化が可能となり、
基板のゴミによる汚染の発生率を0%にすることができ
る。Further, since the escape groove of the roller and the substrate are not in contact with each other, dust temporarily attached to the escape groove portion is discharged by a downflow method using an air nozzle and an exhaust unit. Is possible,
It is possible to reduce the occurrence rate of contamination by dust on the substrate to 0%.
【図1】本発明の実施例1を示す正面図である。FIG. 1 is a front view showing a first embodiment of the present invention.
【図2】搬送処理を示す構成図である。FIG. 2 is a configuration diagram showing a carrying process.
【図3】本発明の実施例2を示す正面図である。FIG. 3 is a front view showing a second embodiment of the present invention.
【図4】従来の基板搬送装置を示す正面図である。FIG. 4 is a front view showing a conventional substrate transfer device.
1 基板 2 シャフト 3 ローラー 4 エアーノズル 5 エアー 6 排気ユニット 8 搬送ローラー 13 基板端面接触部 14 基板裏面接触部 15 逃げ溝 1 Substrate 2 Shaft 3 Roller 4 Air Nozzle 5 Air 6 Exhaust Unit 8 Conveying Roller 13 Substrate End Face Contact Part 14 Substrate Backside Contact Part 15 Escape Groove
Claims (5)
ユニットとを有する基板搬送装置であって、 搬送ローラーは、基板端面接触部に基板の端面をあてが
い、基板裏面接触部に基板の裏面を支え、回転すること
により基板に送りを与えるものであり、 エアーノズルは前記搬送ローラーと基板との接触部にエ
アーを吹き付けて、該接触部に生ずるゴミを払拭するも
のであり、 排気ユニットは前記エアーノズルのエアー吹き付けによ
り払拭されたゴミを排出するものであることを特徴とす
る基板搬送装置。1. A substrate transfer device having a transfer roller, an air nozzle, and an exhaust unit, wherein the transfer roller applies the end face of the substrate to the contact part of the substrate end face and supports the back surface of the substrate on the contact part of the back surface of the substrate. , Is to feed the substrate by rotating, the air nozzle blows air to the contact portion between the transfer roller and the substrate, and wipes dust generated in the contact portion. A substrate transfer device, which discharges dust wiped by blowing air from a nozzle.
し、 前記エアーノズルは前記搬送ローラーの逃げ溝内にゴミ
を吹き落すことにより、ゴミを払拭するものであること
を特徴とする請求項1に記載の基板搬送装置。2. The transport roller has an escape groove in the circumferential direction, and the air nozzle wipes the dust by blowing dust into the escape groove of the transport roller. Item 2. The substrate transfer apparatus according to Item 1.
て、基板裏面を支える基板裏面接触部を有するものであ
ることを特徴とする請求項2に記載の基板搬送装置。3. The substrate transfer device according to claim 2, wherein the transfer roller has a substrate back surface contact portion which supports the substrate back surface and is adjacent to the escape groove.
面形状をなすものであることを特徴とする請求項3に記
載の基板搬送装置。4. The substrate transfer device according to claim 3, wherein the transfer roller has a substrate back surface contact portion having a planar shape.
弧形状をなすものであることを特徴とする請求項3に記
載の基板搬送装置。5. The substrate carrying device according to claim 3, wherein the carrying roller has a substrate back surface contact portion having an arc shape.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7133591A JP2687931B2 (en) | 1995-05-31 | 1995-05-31 | Substrate transfer device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7133591A JP2687931B2 (en) | 1995-05-31 | 1995-05-31 | Substrate transfer device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH08330380A JPH08330380A (en) | 1996-12-13 |
JP2687931B2 true JP2687931B2 (en) | 1997-12-08 |
Family
ID=15108397
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7133591A Expired - Fee Related JP2687931B2 (en) | 1995-05-31 | 1995-05-31 | Substrate transfer device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2687931B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE50200399D1 (en) * | 2002-04-15 | 2004-06-03 | Rena Sondermaschinen Gmbh | Transport rollers, hold-down devices and transport system for flat goods |
WO2008093419A1 (en) * | 2007-01-31 | 2008-08-07 | Hirata Corporation | Transfer apparatus and transfer method |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5994840A (en) * | 1982-11-22 | 1984-05-31 | Hitachi Plant Eng & Constr Co Ltd | Wafer conveying device |
JPS63230442A (en) * | 1987-03-20 | 1988-09-26 | Tokyo Electron Ltd | Wafer carriage device |
JPS6417440A (en) * | 1987-07-13 | 1989-01-20 | Hitachi Ltd | Wafer transfer device |
JPH02191355A (en) * | 1989-01-19 | 1990-07-27 | Tokyo Electron Ltd | Wafer branching/converging device |
JPH02132017U (en) * | 1989-04-10 | 1990-11-02 | ||
JPH04154118A (en) * | 1990-10-18 | 1992-05-27 | Toshiba Corp | Treatment apparatus for semiconductor wafer |
JPH05190645A (en) * | 1992-01-09 | 1993-07-30 | Nec Kyushu Ltd | Semiconductor substrate transfer mechanism |
-
1995
- 1995-05-31 JP JP7133591A patent/JP2687931B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH08330380A (en) | 1996-12-13 |
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