JP2683385C - - Google Patents
Info
- Publication number
- JP2683385C JP2683385C JP2683385C JP 2683385 C JP2683385 C JP 2683385C JP 2683385 C JP2683385 C JP 2683385C
- Authority
- JP
- Japan
- Prior art keywords
- light
- alignment
- fringe
- reflected
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 22
- 238000012545 processing Methods 0.000 claims description 17
- 238000001514 detection method Methods 0.000 claims description 13
- 230000035559 beat frequency Effects 0.000 claims description 12
- 238000006073 displacement reaction Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 9
- 239000011159 matrix material Substances 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 239000003550 marker Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 64
- 230000010287 polarization Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 210000001747 pupil Anatomy 0.000 description 7
- 238000005259 measurement Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000012935 Averaging Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 235000006810 Caesalpinia ciliata Nutrition 0.000 description 1
- 241000059739 Caesalpinia ciliata Species 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- RJMUSRYZPJIFPJ-UHFFFAOYSA-N niclosamide Chemical compound OC1=CC=C(Cl)C=C1C(=O)NC1=CC=C([N+]([O-])=O)C=C1Cl RJMUSRYZPJIFPJ-UHFFFAOYSA-N 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 238000007619 statistical method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Family
ID=
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4604069B2 (ja) | プリズム | |
| EP1372040B1 (en) | Lithographic apparatus and device manufacturing method | |
| JP2658051B2 (ja) | 位置合わせ装置，該装置を用いた投影露光装置及び投影露光方法 | |
| JP6612452B2 (ja) | 対物レンズシステム | |
| US11906906B2 (en) | Metrology method and associated metrology and lithographic apparatuses | |
| EP0534758B1 (en) | Method and device for measuring positional deviation between a plurality of diffraction gratings on the same object | |
| JPS60143632A (ja) | アライメント装置 | |
| CN111149062B (zh) | 量测方法和装置 | |
| JPS62224025A (ja) | マスクと基板を互に位置合せする装置 | |
| JPH10267613A (ja) | 位置測定装置 | |
| JP3428705B2 (ja) | 位置検出装置及びそれを用いた半導体素子の製造方法 | |
| JP2683385B2 (ja) | 位置合せ方法および位置合せ装置 | |
| JP2906433B2 (ja) | 投影露光装置及び投影露光方法 | |
| JP2683385C (enrdf_load_stackoverflow) | ||
| JP2005183415A (ja) | シアリング干渉測定方法及びシアリング干渉計 | |
| JP2809439B2 (ja) | 位置合せ装置 | |
| JP2683409B2 (ja) | 位置合わせ装置 | |
| JP3199042B2 (ja) | 半導体装置の製造方法及び露光方法 | |
| JPH02272305A (ja) | 位置合わせ装置及び位置合わせ方法 | |
| WO2020244854A1 (en) | Image formation apparatus | |
| JP3305058B2 (ja) | 露光方法及び装置 | |
| JP2546356B2 (ja) | 位置合わせ装置 | |
| JPH10270347A (ja) | 位置ずれ検出方法及びその装置 | |
| JP2906585B2 (ja) | 位置検出方法 | |
| JP2883385B2 (ja) | 位置合せ方法およびそれらの装置 |