JP2622231B2 - 光化学的に酸を発生するフォトレジスト用化合物 - Google Patents

光化学的に酸を発生するフォトレジスト用化合物

Info

Publication number
JP2622231B2
JP2622231B2 JP448294A JP448294A JP2622231B2 JP 2622231 B2 JP2622231 B2 JP 2622231B2 JP 448294 A JP448294 A JP 448294A JP 448294 A JP448294 A JP 448294A JP 2622231 B2 JP2622231 B2 JP 2622231B2
Authority
JP
Japan
Prior art keywords
lower alkyl
hydrogen
diazonaphthoquinone
moiety
ch2os
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP448294A
Other languages
English (en)
Japanese (ja)
Other versions
JPH06256292A (ja
Inventor
エー．コーイス トーマス
Original Assignee
モートン インターナショナル，インコーポレイティド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by モートン インターナショナル，インコーポレイティド filed Critical モートン インターナショナル，インコーポレイティド
Publication of JPH06256292A publication Critical patent/JPH06256292A/ja
Application granted granted Critical
Publication of JP2622231B2 publication Critical patent/JP2622231B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/71—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP448294A 1993-03-05 1994-01-20 光化学的に酸を発生するフォトレジスト用化合物 Expired - Lifetime JP2622231B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US026923 1993-03-05
US08/026,923 US5308744A (en) 1993-03-05 1993-03-05 Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP8261806A Division JPH09120158A (ja) 1993-03-05 1996-10-02 ポジ型フォトレジスト組成物

Publications (2)

Publication Number Publication Date
JPH06256292A JPH06256292A (ja) 1994-09-13
JP2622231B2 true JP2622231B2 (ja) 1997-06-18

Family

ID=21834576

Family Applications (2)

Application Number Title Priority Date Filing Date
JP448294A Expired - Lifetime JP2622231B2 (ja) 1993-03-05 1994-01-20 光化学的に酸を発生するフォトレジスト用化合物
JP8261806A Pending JPH09120158A (ja) 1993-03-05 1996-10-02 ポジ型フォトレジスト組成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP8261806A Pending JPH09120158A (ja) 1993-03-05 1996-10-02 ポジ型フォトレジスト組成物

Country Status (9)

Country Link
US (1) US5308744A (https=)
EP (1) EP0614120B1 (https=)
JP (2) JP2622231B2 (https=)
KR (1) KR940021519A (https=)
CN (1) CN1095060A (https=)
AT (1) ATE151895T1 (https=)
CA (1) CA2111632A1 (https=)
DE (1) DE69402592T2 (https=)
TW (1) TW268106B (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5314782A (en) * 1993-03-05 1994-05-24 Morton International, Inc. Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
DE59504286D1 (de) * 1994-09-12 1998-12-24 Siemens Ag Photolithographische strukturerzeugung
CA2306478A1 (en) 1997-10-16 1999-04-22 Sun Chemical Corporation Photoneutralization of ph sensitive aqueous polymeric dispersions and methods for using same
JP3285086B2 (ja) 1999-05-20 2002-05-27 日本電気株式会社 化学増幅型レジスト組成物
CN1318410C (zh) * 2002-06-28 2007-05-30 北京师范大学 重氮萘醌系光－热活性化合物及其合成方法
US7354692B2 (en) * 2005-05-09 2008-04-08 International Business Machines Corporation Photoresists for visible light imaging
US9977339B2 (en) 2014-01-27 2018-05-22 Tokyo Electron Limited System and method for shifting critical dimensions of patterned films
US9645495B2 (en) * 2014-08-13 2017-05-09 Tokyo Electron Limited Critical dimension control in photo-sensitized chemically-amplified resist

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046121A (en) * 1949-07-23 1962-07-24 Azoplate Corp Process for the manufacture of printing plates and light-sensitive material suttablefor use therein
NL95407C (https=) * 1954-08-20
JPS5562444A (en) * 1978-11-02 1980-05-10 Konishiroku Photo Ind Co Ltd Photosensitive composition
DE3038605A1 (de) * 1980-10-13 1982-06-03 Hoechst Ag, 6000 Frankfurt Verfahren zur herstellung von reliefkopien
DE3144499A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
EP0155231B2 (de) * 1984-03-07 1997-01-15 Ciba-Geigy Ag Verfahren zur Herstellung von Abbildungen
EP0239423B1 (en) * 1986-03-28 1996-03-20 Japan Synthetic Rubber Co., Ltd. Positive type radiation-sensitive resin composition
US4837121A (en) * 1987-11-23 1989-06-06 Olin Hunt Specialty Products Inc. Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin
JP2623309B2 (ja) * 1988-02-22 1997-06-25 ユーシービー ソシエテ アノニム レジストパターンを得る方法

Also Published As

Publication number Publication date
EP0614120B1 (en) 1997-04-16
EP0614120A1 (en) 1994-09-07
JPH09120158A (ja) 1997-05-06
JPH06256292A (ja) 1994-09-13
CN1095060A (zh) 1994-11-16
US5308744A (en) 1994-05-03
KR940021519A (ko) 1994-10-19
DE69402592T2 (de) 1997-07-24
TW268106B (https=) 1996-01-11
ATE151895T1 (de) 1997-05-15
CA2111632A1 (en) 1994-09-06
DE69402592D1 (de) 1997-05-22

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