JP2606990B2 - Method and apparatus for reinforcing outer peripheral portion of semiconductor wafer and reinforcing member - Google Patents

Method and apparatus for reinforcing outer peripheral portion of semiconductor wafer and reinforcing member

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Publication number
JP2606990B2
JP2606990B2 JP25187491A JP25187491A JP2606990B2 JP 2606990 B2 JP2606990 B2 JP 2606990B2 JP 25187491 A JP25187491 A JP 25187491A JP 25187491 A JP25187491 A JP 25187491A JP 2606990 B2 JP2606990 B2 JP 2606990B2
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JP
Japan
Prior art keywords
semiconductor wafer
reinforcing member
reinforcing
wafer
outer peripheral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP25187491A
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Japanese (ja)
Other versions
JPH0590232A (en
Inventor
勉 佐藤
Original Assignee
直江津電子工業株式会社
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Priority to JP25187491A priority Critical patent/JP2606990B2/en
Publication of JPH0590232A publication Critical patent/JPH0590232A/en
Application granted granted Critical
Publication of JP2606990B2 publication Critical patent/JP2606990B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、半導体ウエハの外周部
の補強方法及び補強装置並びに補強部材に関する。さら
に詳しくは、半導体ウエハをその厚み巾の中心から内周
式スライサで2分割に切断する際に、半導体ウエハの外
周部の損傷等を防止するため、半導体ウエハの外周部の
切断終端付近に別個に形成した補強部材を接着剤で接着
取付けする半導体ウエハの外周部の補強方法の改良と、
この方法の実施に好適な補強装置と補強部材とに関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for reinforcing an outer peripheral portion of a semiconductor wafer and a reinforcing member. More specifically, when the semiconductor wafer is cut into two parts by the inner peripheral slicer from the center of its thickness and width, in order to prevent the outer peripheral part of the semiconductor wafer from being damaged or the like, a separate part is provided near the cutting end of the outer peripheral part of the semiconductor wafer. Improving the method of reinforcing the outer peripheral portion of the semiconductor wafer by bonding and attaching the reinforcing member formed in the adhesive with an adhesive;
The present invention relates to a reinforcing device and a reinforcing member suitable for performing the method.

【0002】[0002]

【従来の技術】ディスクリート素子用基板を製造する際
に、両面に不純物の拡散層を有し中央に不純物の未拡散
層を有する半導体ウエハをその厚み巾の中心から内周式
スライサで2分割に切断する技術(特開平3−1457
26号等参照)や、この切断される半導体ウエハの外周
部の切断終端付近を補強する技術(特願平1−3222
22号等参照)については、本出願人によって先に多数
提案されている。
2. Description of the Related Art When manufacturing a substrate for a discrete element, a semiconductor wafer having an impurity diffusion layer on both sides and an impurity non-diffusion layer at the center is divided into two parts from the center of the thickness by an inner peripheral slicer. Cutting technology (Japanese Unexamined Patent Publication (Kokai) No. 3-1457)
No. 26, etc.) and a technique for reinforcing the vicinity of the cutting end of the outer peripheral portion of the semiconductor wafer to be cut (Japanese Patent Application No. 1-3222).
No. 22, etc.) have been previously proposed by the present applicant in large numbers.

【0003】従来、半導体ウエハの外周部の切断終端付
近を補強する技術としては、例えば、多数枚の半導体ウ
エハを並設しておき、半導体ウエハとは別個に形成した
半導体ウエハと同数枚の補強部材に熱硬化性樹脂接着剤
を塗布して当接し、そのまま加熱処理して熱硬化性樹脂
接着剤を硬化させ半導体ウエハに補強部材を接着取付け
することが行なわれている。
Conventionally, as a technique for reinforcing the vicinity of the cutting end of the outer peripheral portion of a semiconductor wafer, for example, a large number of semiconductor wafers are juxtaposed, and the same number of reinforcing semiconductor wafers as a semiconductor wafer formed separately from the semiconductor wafer are used. 2. Description of the Related Art A thermosetting resin adhesive is applied to a member and is brought into contact with the member, followed by heat treatment to harden the thermosetting resin adhesive and bond and attach a reinforcing member to a semiconductor wafer.

【0004】このような従来の補強手段では、多数枚の
半導体ウエハ,補強部材を同時的に処理するため、半導
体ウエハの並設等手動で行なわなければならない工程が
多く補強部材の取付けが省力的に行なわれ得ず、さら
に、最近のより薄い半導体ウエハにおいては、切断に伴
なう損傷等が外周部の切断終端付近のみではなく外周部
の略全周に生ずるため、損傷等を有効に防止することが
できないという問題点を有している。
In such a conventional reinforcing means, since a large number of semiconductor wafers and reinforcing members are processed simultaneously, there are many steps which must be performed manually, such as arranging semiconductor wafers in parallel. In addition, in recent thinner semiconductor wafers, since damage due to cutting occurs not only near the cutting end of the outer peripheral portion but also substantially all around the outer peripheral portion, damage is effectively prevented. There is a problem that cannot be done.

【0005】[0005]

【発明が解決しようとする課題】本発明は、前述の問題
点を考慮してなされたもので、半導体ウエハ1枚毎に連
続して精密かつ効率的に補強部材を取付けることがで
き、しかも極薄化された半導体ウエハの外周部の損傷等
を有効に防止することのできる半導体ウエハの外周部の
補強方法と、この方法の実施に好適な補強装置と補強部
材とを提供することを課題とする。
SUMMARY OF THE INVENTION The present invention has been made in consideration of the above-mentioned problems, and enables a reinforcing member to be attached precisely and efficiently continuously for each semiconductor wafer. An object of the present invention is to provide a method of reinforcing the outer peripheral portion of a semiconductor wafer, which can effectively prevent damage to the outer peripheral portion of the thinned semiconductor wafer, and a reinforcing device and a reinforcing member suitable for implementing the method. I do.

【0006】[0006]

【課題を解決するための手段】前述の課題を解決するた
め、本発明に係る半導体ウエハの外周部の補強方法は、
両面に不純物の拡散層を有し中央に不純物の未拡散層を
有する半導体ウエハをその厚み巾の中心から内周式スラ
イサで2分割に切断する際に、半導体ウエハの外周部の
損傷等を防止するため、半導体ウエハの外周部の切断終
端付近に別個に形成した補強部材を接着剤で接着取付け
する半導体ウエハの外周部の補強方法において、合成樹
脂材で半導体ウエハの外周の半分以上の弧長を有し半導
体ウエハの径と同一または僅かに小さい径に形成され接
着剤が塗布された1個の補強部材を径が拡大された拡開
状態にして1枚の半導体ウエハを嵌合した後に、補強部
材の拡開状態を解除することを特徴とする手段を採用す
る。
In order to solve the above-mentioned problems, a method for reinforcing an outer peripheral portion of a semiconductor wafer according to the present invention comprises:
Prevents damage to the outer peripheral portion of a semiconductor wafer when the semiconductor wafer having an impurity diffusion layer on both sides and an impurity non-diffusion layer in the center is cut into two by an inner peripheral slicer from the center of its thickness and width. Therefore, in a method of reinforcing the outer peripheral portion of a semiconductor wafer, in which a reinforcing member separately formed near the cutting end of the outer peripheral portion of the semiconductor wafer is attached with an adhesive, an arc length of at least half the outer periphery of the semiconductor wafer is made of a synthetic resin material. After having one reinforcing member formed to have the same or slightly smaller diameter as the diameter of the semiconductor wafer and having the adhesive applied thereto in an expanded state in which the diameter is enlarged, and fitting one semiconductor wafer, Means characterized by releasing the expanded state of the reinforcing member is employed.

【0007】また、本発明に係る半導体ウエハの外周部
の補強装置は、補強部材が取付けられていない未加工の
半導体ウエハを1枚づつ引渡し可能なウエハ供給部と、
補強部材が取付けられた加工済の半導体ウエハを1枚づ
つ引受け可能なウエハ回収部と、径が拡大された拡開状
態にした1個の補強部材に1枚の半導体ウエハを嵌合す
る取付け機構と、取付け機構へ合成樹脂材で半導体ウエ
ハの外周の半分以上の弧長を有し半導体ウエハの径と同
一または僅かに小さい径に形成された補強部材を1個づ
つ供給する補強部材供給部と、取付け機構に供給された
補強部材に対して接着剤を塗布する塗布機構と、ウエハ
供給部,取付け機構,ウエハ回収部と連係して未加工,
加工済みの半導体ウエハを搬送する搬送機構とからなる
手段を採用する。
[0007] Further, the apparatus for reinforcing an outer peripheral portion of a semiconductor wafer according to the present invention comprises: a wafer supply unit capable of transferring unprocessed semiconductor wafers to which a reinforcing member is not attached one by one;
A wafer collecting portion capable of accepting one processed semiconductor wafer to which the reinforcing member is attached one by one, and an attaching mechanism for fitting one semiconductor wafer to one reinforcing member in an expanded state having an enlarged diameter; A reinforcing member supply unit for supplying a reinforcing member having an arc length of at least half of the outer circumference of the semiconductor wafer to the mounting mechanism and having a diameter equal to or slightly smaller than the diameter of the semiconductor wafer one by one; A coating mechanism for applying an adhesive to the reinforcing member supplied to the mounting mechanism;
A means comprising a transport mechanism for transporting the processed semiconductor wafer is employed.

【0008】また、本発明に係る半導体ウエハの外周部
の補強部材は、可撓性を有する合成樹脂材で半導体ウエ
ハの外周の半分以上の弧長を有し半導体ウエハの径と同
一または僅かに小さい径に形成され、断面形状がL字形
に形成され、弧長の中央部の外側に凸部が形成されてな
る手段を採用する。
The reinforcing member for the outer peripheral portion of the semiconductor wafer according to the present invention is made of a flexible synthetic resin material and has an arc length of at least half of the outer periphery of the semiconductor wafer and is equal to or slightly smaller than the diameter of the semiconductor wafer. A means having a small diameter, an L-shaped cross section, and a convex portion formed outside the central portion of the arc length is adopted.

【0009】[0009]

【作用】前述の手段によると、本発明に係る半導体ウエ
ハの外周部の補強方法では、1枚の半導体ウエハと可撓
性を有する材料で半導体ウエハの外周の半分以上の弧長
を有し半導体ウエハの径と同一またはわずかに小さい径
に形成した1個の補強部材とを、補強部材を径が拡大さ
れた拡開状態にして半導体ウエハを嵌合し、その後に補
強部材の拡開状態を解除することから、補強部材の収縮
力により取付け位置がズレたり、接着剤に熱硬化性樹脂
接着剤を使用する場合でも該接着剤が流れたりしないた
め、また半導体ウエハの外周部の略全周が補強部材によ
って補強されることになるため、機械的手段で連続的な
補強処理が可能で半導体ウエハ1枚毎に連続して精密か
つ効率的に補強部材を取付けることができ、しかも極薄
化された半導体ウエハの外周部の損傷等を有効に防止す
ることのできる半導体ウエハの外周部の補強方法を提供
するという課題が解決される。
According to the above-mentioned means, in the method for reinforcing the outer peripheral portion of a semiconductor wafer according to the present invention, a semiconductor material having a semi-circular length longer than half of the outer circumference of the semiconductor wafer by using a flexible material. One reinforcing member formed to have the same or slightly smaller diameter as the diameter of the wafer is fitted to the semiconductor wafer with the reinforcing member in an expanded state in which the diameter is enlarged, and then the expanded state of the reinforcing member is changed. Since it is released, the mounting position shifts due to the contracting force of the reinforcing member, and even when a thermosetting resin adhesive is used as the adhesive, the adhesive does not flow, and almost the entire circumference of the outer peripheral portion of the semiconductor wafer is also used. Is reinforced by a reinforcing member, so that a continuous reinforcing process can be performed by a mechanical means, and the reinforcing member can be attached precisely and efficiently continuously for each semiconductor wafer, and furthermore, it is extremely thin. Semiconductor c Challenge of providing a method for reinforcing the outer peripheral portion of the semiconductor wafer that can effectively prevent damage to the outer peripheral portion of the wafer can be solved.

【0010】また、本発明に係る半導体ウエハの外周部
の補強装置では、補強部材を拡開状態にして半導体ウエ
ハを嵌合する取付け機構とウエハ供給部,ウエハ回収部
とを搬送機構で連係して未加工,加工済みの半導体ウエ
ハを搬送すると共に、取付け機構に補強部材が直接供給
される補強部材供給部を備えてあることから、ウエハ供
給部の未加工の半導体ウエハを連続的に精度よく補強処
理してウエハ回収部に回収することができる。このた
め、前記方法の実施に好適な半導体ウエハの外周部の補
強装置を提供するという課題が解決される。
In the apparatus for reinforcing an outer peripheral portion of a semiconductor wafer according to the present invention, a mounting mechanism for fitting the semiconductor wafer with the reinforcing member in an expanded state, and a wafer supply unit and a wafer recovery unit are linked by a transfer mechanism. In addition, the unprocessed and processed semiconductor wafers are transported, and the mounting mechanism is provided with a reinforcing member supply unit for directly supplying a reinforcing member. It can be recovered by the wafer recovery unit after the reinforcement processing. This solves the problem of providing an apparatus for reinforcing the outer peripheral portion of a semiconductor wafer suitable for carrying out the method.

【0011】また、本発明に係る半導体ウエハの外周部
の補強部材では、可撓性を有する材質で形成され半導体
ウエハの外周の半分以上の弧長を有し弧長方向に直交す
る方向の断面形状がL字形に形成されていることから、
拡開して半導体ウエハを嵌合しやすくすることができ、
接着の際に半導体ウエハが当接しやすく自動的に位置決
めされる。また、半導体ウエハの径と同一または僅かに
小さい径に形成されているため、半導体ウエハの外周部
の全周を補強すると共に、拡開状態の解除により半導体
ウエハを強固に保持することになる。さらに、弧長の中
央部の外側に凸部が形成されているため、半導体ウエハ
の2分割の際の回収作業が容易になる。このため、前記
方法の実施に好適な半導体ウエハの外周部の補強部材を
提供するという課題が解決される。
The reinforcing member for the outer peripheral portion of the semiconductor wafer according to the present invention is formed of a flexible material and has a cross section in a direction perpendicular to the arc length direction having an arc length of at least half of the outer periphery of the semiconductor wafer. Since the shape is formed in an L shape,
It can be expanded to make it easier to fit the semiconductor wafer,
At the time of bonding, the semiconductor wafer is easily abutted and is automatically positioned. Further, since the diameter is formed to be the same as or slightly smaller than the diameter of the semiconductor wafer, the entire circumference of the outer peripheral portion of the semiconductor wafer is reinforced, and the semiconductor wafer is firmly held by releasing the expanded state. Further, since the convex portion is formed outside the central portion of the arc length, the collecting operation at the time of dividing the semiconductor wafer into two is facilitated. This solves the problem of providing a reinforcing member for an outer peripheral portion of a semiconductor wafer suitable for performing the above method.

【0012】[0012]

【実施例】以下、本発明に係る半導体ウエハの外周部の
補強方法および補強装置,補強部材の実施例を補強部材
の実施例を図面に基いて説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of a method and apparatus for reinforcing an outer peripheral portion of a semiconductor wafer according to the present invention will be described below with reference to the accompanying drawings.

【0013】まず、本発明に係る半導体ウエハの外周部
の補強方法の実施例の基本概略を図1に基いて説明す
る。
First, a basic outline of an embodiment of a method for reinforcing an outer peripheral portion of a semiconductor wafer according to the present invention will be described with reference to FIG.

【0014】補強部材Pは、図1(A)に示すように、
可撓性を有し且つ切断性を損なわない合成樹脂材(例え
ば、エポキシ樹脂,ポリスチレン樹脂)で半導体ウエハ
Wの外周の半分以上の弧長を有し半導体ウエハWの径と
同一または僅かに小さい径に半導体ウエハWとは別個に
形成され、両端部に外側へ突出した突起Paを備えてい
る。この1個の補強部材については、円弧内側面に接着
剤、例えば溶融ワックスあるいは熱硬化性樹脂接着剤E
を塗布してから、図1(B)に示すように突起Paを離
間するようにして径を拡大した拡開状態にして1枚の半
導体ウエハWが嵌合される。而後,図1(C)に示すよ
うに補強部材Pの拡開状態を解除すると、補強部材P半
導体ウエハWに圧着し半導体ウエハWを挾持するように
して保持して、補強部材Pの半導体ウエハWからの脱
落,位置ズレが防止される。即ち、補強部材Pの拡開,
半導体ウエハWの嵌合,補強部材Pの拡開状態の解除の
連続的動作を行なうことで、接着剤Eの硬化時間を待た
ずして半導体ウエハWに補強部材Pを連続的に取付ける
ことができる。なお、この後には、半導体ウエハW,補
強部材Pをウエハキャリアに収納して、常温放置または
加熱処理により接着剤Eを硬化させることになる。上記
突起Paはウエハ切断時には不要であるため、容易に折
損できる構造とすることが好ましい。
As shown in FIG. 1A, the reinforcing member P
A synthetic resin material (eg, an epoxy resin or a polystyrene resin) which is flexible and does not impair the cutting property , has an arc length equal to or more than half of the outer circumference of the semiconductor wafer W, and is equal to or slightly smaller than the diameter of the semiconductor wafer W. The diameter is formed separately from the semiconductor wafer W, and has projections Pa projecting outward at both ends. For this one reinforcing member, an adhesive such as a molten wax or a thermosetting resin adhesive E is attached to the inner surface of the arc.
Then, as shown in FIG. 1B, one semiconductor wafer W is fitted in an expanded state in which the diameter is enlarged by separating the protrusions Pa as shown in FIG. Thereafter, as shown in FIG. 1C, when the expanded state of the reinforcing member P is released, the reinforcing member P is pressed against the semiconductor wafer W and held so as to sandwich the semiconductor wafer W. Drops from W and displacement are prevented. That is, the expansion of the reinforcing member P,
By continuously performing the fitting of the semiconductor wafer W and the release of the expanded state of the reinforcing member P, the reinforcing member P can be continuously attached to the semiconductor wafer W without waiting for the curing time of the adhesive E. it can. After that, the semiconductor wafer W and the reinforcing member P are housed in a wafer carrier, and the adhesive E is cured by standing at room temperature or heating. Since the projections Pa are unnecessary when cutting the wafer, it is preferable that the projections Pa have a structure that can be easily broken.

【0015】次に、前述の補強方法に使用されている補
強部材Pの詳細を図2,図3に基いて説明する。
Next, details of the reinforcing member P used in the above-described reinforcing method will be described with reference to FIGS.

【0016】補強部材Pは、前述のような形状から、半
導体ウエハWの外周部の略全体を補強することになり、
半導体ウエハWが極薄化されていても2分割切断による
損傷等を有効に防止することができる。また、図2,図
3に示すように、弧長方向に直交する方向の断面形状が
L字形に形成され、2つの面Pb,Pcで半導体ウエハ
Wに当接し半導体ウエハWの位置決めが正確に行なわれ
るようになっている。さらに、図3に示すように、弧長
の中央部の外側に凸部Pd が形成され、内周式スライサ
による切断の余裕域を確保して半導体ウエハWの2分割
の際の分割片の回収タイミングの調整を可能にして、回
収作業が容易に行なわれるようにしている。
The reinforcing member P reinforces substantially the entire outer peripheral portion of the semiconductor wafer W from the shape described above.
Even if the semiconductor wafer W is extremely thin, it is possible to effectively prevent damage or the like due to the two-piece cutting. As shown in FIGS. 2 and 3, the cross-sectional shape in a direction perpendicular to the arc length direction is formed in an L-shape, and the semiconductor wafer W is abutted on the two surfaces Pb and Pc to accurately position the semiconductor wafer W. Is being done. Further, as shown in FIG. 3, a convex portion Pd is formed outside the central portion of the arc length, and a margin area for cutting by the inner peripheral slicer is secured to collect the divided pieces when the semiconductor wafer W is divided into two. The timing can be adjusted so that the collection operation can be easily performed.

【0017】次に、前述の補強方法に使用される補強装
置の実施例を図4〜図8に基いて説明する。
Next, an embodiment of a reinforcing device used in the above-described reinforcing method will be described with reference to FIGS.

【0018】この実施例では、図4に示すように、中央
部には1枚の半導体ウエハWに1個の補強部材Pを取付
ける取付け機構1が設置され、取付け機構1を挟んで両
側に補強部材Pが取付けられていない未加工の半導体ウ
エハWを1枚づつ引渡し可能なウエハ供給部2と補強部
材Pが取付けられた加工済みの半導体ウエハWを1枚づ
つ引受け可能なウエハ回収部3とが設置され、これ等取
付け機構1,ウエハ供給部2,ウエハ回収部3の間に未
加工,加工済み半導体ウエハWを搬送する搬送機構4が
直線的に配設設置されている。さらに、取付け機構1に
は補強部材Pを1個づつ供給する補強部材供給部5が搬
送機構4と直交する方向に隣接設置され、取付け機構1
には接着剤Eを補強部材Pに塗布する塗布機構6が近接
設置されている。
In this embodiment, as shown in FIG. 4, an attachment mechanism 1 for attaching one reinforcing member P to one semiconductor wafer W is installed at the center, and reinforcement is provided on both sides of the attachment mechanism 1. A wafer supply unit 2 capable of delivering unprocessed semiconductor wafers W to which the member P is not attached one by one; a wafer collection unit 3 capable of accepting one processed semiconductor wafer W to which the reinforcing member P is attached; A transfer mechanism 4 for transferring unprocessed and processed semiconductor wafers W is linearly arranged between the mounting mechanism 1, the wafer supply unit 2, and the wafer recovery unit 3. Further, a reinforcing member supply unit 5 that supplies the reinforcing members P one by one is installed adjacent to the mounting mechanism 1 in a direction orthogonal to the transport mechanism 4.
Is provided with an application mechanism 6 for applying the adhesive E to the reinforcing member P.

【0019】取付け機構1は、図4に詳細に示されるよ
うに、1枚の半導体ウエハWに1個の補強部材Pを取付
けるための水平な作業テーブル11を備えている。この
作業テーブル11には中央部に塗布機構6の動作域を確
保するために開孔された窓孔12と、窓孔12の周縁に
は補強部材供給部5から水平方向へ供給された補強部材
Pを位置決めするストッパ13と補強部材Pに垂直方向
から嵌合される半導体ウエハWと作業テーブル11との
間に介在して半導体ウエハを支承する上下動可能なウエ
ハ支持台14とが設けられている。さらに、作業テーブ
ル11上には補強部材Pの突起Paに係止可能なフラン
ジ15を有するエアシリンダ16が相対して設置され、
エアシリンダ16の駆動により補強部材Pをその径が拡
大された拡開状態とすることができるようになってい
る。
The mounting mechanism 1 has a horizontal work table 11 for mounting one reinforcing member P on one semiconductor wafer W, as shown in detail in FIG. The work table 11 has a window hole 12 formed at the center thereof to secure an operation area of the coating mechanism 6, and a reinforcing member supplied in a horizontal direction from the reinforcing member supply unit 5 at a periphery of the window hole 12. A vertically movable wafer support 14 for supporting the semiconductor wafer is provided between the work table 11 and the semiconductor wafer W fitted vertically with the reinforcing member P and the stopper 13 for positioning the P. I have. Further, an air cylinder 16 having a flange 15 that can be locked to the projection Pa of the reinforcing member P is installed on the work table 11 so as to face each other.
By driving the air cylinder 16, the reinforcing member P can be brought into an expanded state in which the diameter is enlarged.

【0020】ウエハ供給部2は、図4,図5に詳細に示
されるように、未加工の半導体ウエハWを並列させたウ
エハキャリア21を垂直に収納した受台22をステッピ
ングモータ等により降下させ、収納されている各半導体
ウエハWを一定位置に水平状態で順次位置させることが
できるようになっている。この半導体ウエハWが順次位
置される面には、搬送機構4へ向けてウエハ引渡し部2
3が配設されている。このウエハ引渡し部23は、モー
タ23aによって駆動され順次位置される半導体ウエハ
Wの下面に当接して搬送機構4下まで半導体ウエハWを
水平に移動させる引渡しベルト23bと、水平移動され
た半導体ウエハWのオリフラの向きを一定にする板形の
固定ガイド板23c,従動形のガイドローラ23d,モ
ータ23e駆動型のガイドローラ23fとからなる。
As shown in detail in FIGS. 4 and 5, the wafer supply unit 2 lowers a receiving table 22 which vertically stores a wafer carrier 21 in which unprocessed semiconductor wafers W are arranged in parallel by a stepping motor or the like. The stored semiconductor wafers W can be sequentially positioned at a certain position in a horizontal state. On the surface on which the semiconductor wafers W are sequentially positioned, the wafer transfer unit 2
3 are provided. The wafer transfer section 23 is driven by a motor 23a and contacts a lower surface of the sequentially positioned semiconductor wafer W to move the semiconductor wafer W horizontally to a position below the transfer mechanism 4; A fixed guide plate 23c for keeping the orientation of the orientation flat constant, a driven guide roller 23d, and a guide roller 23f driven by a motor 23e.

【0021】ウエハ回収部3は、図4,図5に詳細に示
されるように、ウエハ供給部2と同様にウエハキャリア
31,受台32からなる構造で、受台32をステッピン
グモータ等により降下させ加工済みの各半導体ウエハW
が一定位置で水平状態で順次収納されウエハキャリア3
1に並列されるようになっている。なお、ウエハ供給部
2のウエハ引渡し部23に対応するウエハ引受け部33
は、ウエハキャリア31への並列に際して半導体ウエハ
Wのオリフラの向きがそれほど重要ではないため、一部
が省略されて、モータ33a,引受しベルト33b,従
動形のガイドローラ33cのみからなる。
As shown in detail in FIGS. 4 and 5, the wafer collecting section 3 has a structure including a wafer carrier 31 and a receiving table 32 like the wafer supplying section 2, and the receiving table 32 is lowered by a stepping motor or the like. Processed semiconductor wafers W
Are sequentially stored in a horizontal position at a certain position,
1 is arranged in parallel. The wafer receiving unit 33 corresponding to the wafer transfer unit 23 of the wafer supply unit 2
Since the orientation of the orientation flat of the semiconductor wafer W is not so important when the semiconductor wafer W is arranged in parallel with the wafer carrier 31, a part thereof is omitted, and only the motor 33a, the undertaking belt 33b and the driven guide roller 33c are included.

【0022】搬送機構4は、図4,図5に詳細に示され
るように、ロッドレスシリンダを利用したもので、ウエ
ハ供給部2,ウエハ回収部3と取付け機構1との間隔に
対応した間隔を介して一対の吸着パッド41,42を備
えている。これ等吸着パッド41,42には昇降用のエ
アシリンダ43,44が設けられ、両吸着パッド41,
42が搬送機構4のピストンマウント(移動体)45に
より配設方向へ一体的に水平移動することができると共
に、各吸着パッド41,42が夫々独立して昇降移動す
ることができるようになっている。即ち、一方の吸着パ
ッド41で未加工の半導体ウエハWをウエハ供給部2か
ら取出して取付け機構1に渡し、他方の吸着パッド42
で加工済みの半導体ウエハWを取付け機構1から取出し
てウエハ回収部3に渡すことができるようになってい
る。
As shown in detail in FIGS. 4 and 5, the transfer mechanism 4 uses a rodless cylinder, and has an interval corresponding to the interval between the wafer supply section 2, the wafer recovery section 3 and the mounting mechanism 1. , A pair of suction pads 41 and 42 are provided. The suction pads 41, 42 are provided with air cylinders 43, 44 for lifting and lowering.
42 can be horizontally moved integrally in the disposition direction by a piston mount (moving body) 45 of the transport mechanism 4 and each of the suction pads 41 and 42 can be independently moved up and down. I have. That is, the unprocessed semiconductor wafer W is taken out of the wafer supply unit 2 by one suction pad 41 and passed to the mounting mechanism 1, and the other suction pad 42
Then, the semiconductor wafer W which has been processed can be taken out of the mounting mechanism 1 and delivered to the wafer collecting section 3.

【0023】補強部材供給部5は、図5,図6に詳細に
示されるように、取付け機構1に隣接して設けられ、多
数個の補強部材Pを凸部Pdを取付け機構1側と反対側
にしL字形の面Pb,Pcを上側にして収納マガジン5
1に水平に積層収納して重錘56で下方へ加圧してお
き、ロッドレスシリダ52のピストンマウント(移動
体)53上に連結され前記作業テーブル11上をスライ
ドする押出板材54によって、補強部材Pを収納マガジ
ン51の最下層から1個づつ押出し取付け機構1へ送出
し、送出された補強部材Pをピストンマウント53,押
出板材54の間に設けられたバネ55を介して押圧する
ようになっている。
As shown in detail in FIGS. 5 and 6, the reinforcing member supply section 5 is provided adjacent to the mounting mechanism 1, and a plurality of reinforcing members P are provided with the convex portions Pd opposite to the mounting mechanism 1 side. Storage magazine 5 with the L-shaped surfaces Pb and Pc on the upper side.
1 and pressurized downward by a weight 56, and reinforced by an extruded plate 54, which is connected to a piston mount (moving body) 53 of a rodless cylinder 52 and slides on the work table 11. P is sent out one by one from the lowermost layer of the storage magazine 51 to the push-out mounting mechanism 1, and the sent-out reinforcing member P is pressed via a spring 55 provided between the piston mount 53 and the push-out plate 54. ing.

【0024】塗布機構6は、図5,図7に詳細に示され
るように、取付け機構1の窓孔12内を昇降可能に設置
され、補強部材Pの内側面(面Pb)に接着剤Eを吐出
するノズル61と、該ノズル61を拡開状態で真円形で
はなくなっている補強部材Pに沿って押圧接触させる押
圧部材63(ミニシリンダ63a,ロッド63b,バネ
63cで構成されている)と、ノズル61及び押圧部材
63を一体的に回転可能に支持する回転軸64と、回転
軸64をベアリング65,減速ギア66を介して回転駆
動するステッピングモータ67とを備えている。即ち、
ノズル61は、不必要時に作業テーブル11の下方に待
機し必要時に窓孔12から作業テーブル11上に上昇
し、拡開状態で真円形ではなくなっている補強部材Pに
沿って水平方向へスライドしながら回転し、補強部材P
に接着剤Eを塗布するようになっている。
As shown in detail in FIGS. 5 and 7, the application mechanism 6 is installed so as to be able to move up and down in the window hole 12 of the mounting mechanism 1, and the adhesive E is attached to the inner surface (surface Pb) of the reinforcing member P. And a pressing member 63 (comprised of a mini-cylinder 63a, a rod 63b, and a spring 63c) that presses the nozzle 61 along a reinforcing member P that is no longer a perfect circle in the expanded state. , A rotary shaft 64 that integrally supports the nozzle 61 and the pressing member 63 so as to be rotatable, and a stepping motor 67 that rotates the rotary shaft 64 via a bearing 65 and a reduction gear 66. That is,
The nozzle 61 waits below the work table 11 when it is unnecessary, rises from the window hole 12 onto the work table 11 when necessary, and slides horizontally along the reinforcing member P which is no longer a perfect circle in the expanded state. While rotating, the reinforcing member P
Is applied with an adhesive E.

【0025】以下、図9に基いた前述の補強装置の実施
例の動作の説明と共に、補強方法の詳細な実施例を説明
する。
Hereinafter, a detailed embodiment of the reinforcing method will be described together with the operation of the embodiment of the above-described reinforcing device based on FIG.

【0026】図9(A)では、取付け機構1による半導
体ウエハWへの補強部材Pの取付けが完了し、搬送機構
4の一方の吸着パッド41,42がウエハ供給部2,取
付け機構1上で待機している状態が示されている。
In FIG. 9A, the attachment of the reinforcing member P to the semiconductor wafer W by the attachment mechanism 1 is completed, and one of the suction pads 41 and 42 of the transfer mechanism 4 is moved onto the wafer supply unit 2 and the attachment mechanism 1. The waiting state is shown.

【0027】この図9(A)の状態から、まず図9
(B)に示すように、搬送機構4の一方の吸着パッド4
1によって未加工の1枚の半導体ウエハWをウエハ供給
部2で吸着し、搬送機構4の他方の吸着パッド42によ
って加工済みの1枚の半導体ウエハWを取付け機構1で
吸着し、次に図9(C)に示すように、搬送機構4を駆
動して一方の吸着パッド41が取付け機構1上に位置し
他方の吸着パッド42がウエハ回収部3上に位置させ
る。なお、この間には、取付け機構1に新な補強部材P
が供給されている。
From the state of FIG. 9A, first, FIG.
As shown in (B), one suction pad 4 of the transport mechanism 4
1, one unprocessed semiconductor wafer W is sucked by the wafer supply unit 2, and one processed semiconductor wafer W is sucked by the other suction pad 42 of the transfer mechanism 4 by the mounting mechanism 1. As shown in FIG. 9C, the transport mechanism 4 is driven so that one suction pad 41 is located on the mounting mechanism 1 and the other suction pad 42 is located on the wafer collection unit 3. During this time, a new reinforcing member P is attached to the mounting mechanism 1.
Is supplied.

【0028】而後、図9(D)に示すように搬送機構4
の他方の吸着パッド42を降下させて加工済みの半導体
ウエハWをウエハ回収部3に引渡すが、搬送機構4の一
方の吸着パッド41は前記位置で待機させ、図9(D)
(E)に示すように補強部材Pを拡開状態にして塗布機
構6により接着剤Eを塗布した後に、図9(F)に示す
ように一方の吸着パッド41を降下させて補強部材Pに
半導体ウエハWを嵌合し、図9(G)に示すように補強
部材Pの拡開状態を解除する。この結果、補強部材Pの
収縮力により半導体ウエハW,補強部材Pが加圧接着さ
れることになる。
Thereafter, as shown in FIG.
The processed semiconductor wafer W is delivered to the wafer collecting section 3 by lowering the other suction pad 42 of FIG. 9A, but the one suction pad 41 of the transfer mechanism 4 is kept waiting at the above position, and FIG.
After the adhesive E is applied by the application mechanism 6 with the reinforcing member P in the expanded state as shown in FIG. 9E, one of the suction pads 41 is lowered as shown in FIG. The semiconductor wafer W is fitted and the expanded state of the reinforcing member P is released as shown in FIG. As a result, the semiconductor wafer W and the reinforcing member P are bonded under pressure by the contraction force of the reinforcing member P.

【0029】このように半導体ウエハWへ補強部材Pを
一応取付けた後には、図9(H)に示すように搬送機構
4の一方の吸着パッド41を上昇させ、図9(I)に示
すように図9(A)の状態に至るように搬送機構4を動
作させることになる。
After the reinforcing member P is temporarily attached to the semiconductor wafer W in this manner, one suction pad 41 of the transfer mechanism 4 is raised as shown in FIG. 9H, and as shown in FIG. 9I. Then, the transport mechanism 4 is operated to reach the state shown in FIG.

【0030】[0030]

【発明の効果】以上のように本発明に係る半導体ウエハ
の外周部の補強方法は、1枚の半導体ウエハと半導体ウ
エハの外周部の略全体を囲撓するような1個の補強部材
とを、補強部材を拡開状態にして嵌合接着し、補強部材
で半導体ウエハを挾持するような格好となることから、
接着剤として一般的に硬化時間の長い熱硬化性樹脂接着
剤を使用する場合でも該接着剤の硬化を待たずして連続
的な動作が可能で補強部材の位置ズレ等が防止され取付
け精度が良好になるため、また半導体ウエハの外周部の
略全体が補強されることになるため、より薄い半導体ウ
エハ1枚毎に精密かつ効率的に補強部材を取付けること
ができ、極薄化された半導体ウエハに対しても外周部の
損傷等を有効に防止することができて原料ロスを低減し
コストを節減できる効果がある。
As described above, the method for reinforcing the outer peripheral portion of a semiconductor wafer according to the present invention comprises the steps of combining one semiconductor wafer and one reinforcing member that surrounds substantially the entire outer peripheral portion of the semiconductor wafer. Since the reinforcing member is in the expanded state and fitted and bonded, the semiconductor member is sandwiched by the reinforcing member.
Generally, even when a thermosetting resin adhesive having a long curing time is used as an adhesive, continuous operation is possible without waiting for the adhesive to be cured, and displacement of the reinforcing member is prevented, and mounting accuracy is reduced. In addition, since the entire outer peripheral portion of the semiconductor wafer is reinforced, the reinforcing member can be accurately and efficiently attached to each of the thinner semiconductor wafers. This also has the effect of effectively preventing damage to the outer peripheral portion of the wafer, thereby reducing material loss and cost.

【0031】さらに、本発明に係る半導体ウエハの外周
部の補強装置は、前記方法を実施する各部機構を備えて
前記効果の達成に寄与すると共に、半導体ウエハに補強
部材を取付ける取付け機構を中心として各部機構が配置
されているため全体がコンパクト化されている効果があ
る。
Further, the apparatus for reinforcing the outer peripheral portion of a semiconductor wafer according to the present invention is provided with each mechanism for performing the above-described method, thereby contributing to the achievement of the above-mentioned effects, and focusing on a mounting mechanism for attaching a reinforcing member to the semiconductor wafer. Since each mechanism is arranged, there is an effect that the whole is made compact.

【0032】さらに、本発明に係る半導体ウエハの外周
部の補強部材は、弧長,径により半導体ウエハの外周部
の略全体を補強し、断面L字形の構造により前記方法を
実施するに半導体ウエハへの当接性を高め前記効果の達
成に寄与すると共に、内周式スライサによる2分割の際
の回収作業を容易にする効果がある。
Further, the reinforcing member for the outer peripheral portion of the semiconductor wafer according to the present invention reinforces substantially the entire outer peripheral portion of the semiconductor wafer by an arc length and a diameter, and performs the above-described method with an L-shaped cross section. This has the effect of increasing the contact with the inner surface and contributing to the achievement of the above-mentioned effects, and also facilitating the recovery operation when the inner peripheral slicer is divided into two parts.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明に係る半導体ウエハの外周部の補強方
法の実施例を示す簡略図で、(A)〜(C)の順に工程
を示すものである。
FIG. 1 is a simplified diagram showing an embodiment of a method for reinforcing an outer peripheral portion of a semiconductor wafer according to the present invention, showing steps in the order of (A) to (C).

【図2】 本発明に係る半導体ウエハの外周部の補強部
材の実施例を示すもので、図1(A)の(イ)−(イ)
線断面図である。
FIG. 2 shows an embodiment of a reinforcing member for an outer peripheral portion of a semiconductor wafer according to the present invention, and (A)-(A) of FIG. 1 (A).
It is a line sectional view.

【図3】 図2と同様に、図1(A)の(ロ)−(ロ)
線断面図である。
FIG. 3 (B)-(B) of FIG.
It is a line sectional view.

【図4】 本発明に係る半導体ウエハの外周部の補強装
置の実施例を示す平面図である。
FIG. 4 is a plan view showing an embodiment of an apparatus for reinforcing an outer peripheral portion of a semiconductor wafer according to the present invention.

【図5】 図4の要部断面図である。FIG. 5 is a sectional view of a main part of FIG.

【図6】 図4の(ハ)−(ハ)線拡大断面図である。FIG. 6 is an enlarged sectional view taken along line (c)-(c) of FIG.

【図7】 図4の(ニ)−(ニ)線拡大断面図である。FIG. 7 is an enlarged sectional view taken along line (d)-(d) of FIG.

【図8】 図4の(ホ)−(ホ)線断面図である。8 is a sectional view taken along line (e)-(e) of FIG.

【図9】 本発明に係る半導体ウエハの外周部の補強装
置の実施例の動作を示す簡略図である。
FIG. 9 is a simplified view showing the operation of the embodiment of the device for reinforcing the outer peripheral portion of a semiconductor wafer according to the present invention.

【符号の説明】[Explanation of symbols]

1 取付け機構 2 ウエハ供給部 3 ウエハ回収部 4 搬送機構 5 補強部材供給部 6 塗布機構 P 補強部材 W 半導体ウエハ DESCRIPTION OF SYMBOLS 1 Mounting mechanism 2 Wafer supply part 3 Wafer collection part 4 Transfer mechanism 5 Reinforcement member supply part 6 Coating mechanism P Reinforcement member W Semiconductor wafer

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 両面に不純物の拡散層を有し中央に不純
物の未拡散層を有する半導体ウエハをその厚み巾の中心
から内周式スライサで2分割に切断する際に、半導体ウ
エハの外周部の損傷等を防止するため、半導体ウエハの
外周部の切断終端付近に別個に形成した補強部材を接着
剤で接着取付けする半導体ウエハの外周部の補強方法に
おいて、合成樹脂材で半導体ウエハの外周の半分以上の
弧長を有し半導体ウエハの径と同一または僅かに小さい
径に形成され接着剤が塗布された1個の補強部材を径が
拡大された拡開状態にして1枚の半導体ウエハを嵌合し
た後に、補強部材の拡開状態を解除することを特徴とす
る半導体ウエハの外周部の補強方法。
1. A semiconductor wafer having an impurity diffusion layer on both surfaces and an impurity non-diffusion layer at the center is cut into two parts by an inner peripheral slicer from the center of the thickness of the semiconductor wafer. In order to prevent damage to the outer periphery of the semiconductor wafer, a reinforcing member separately formed near the cutting end of the outer periphery of the semiconductor wafer is bonded and attached with an adhesive. One reinforcing member having an arc length of at least half and having a diameter equal to or slightly smaller than the diameter of the semiconductor wafer and coated with an adhesive is placed in an expanded state in which the diameter is enlarged, and one semiconductor wafer is removed. A method for reinforcing an outer peripheral portion of a semiconductor wafer, wherein the expanded state of the reinforcing member is released after the fitting.
【請求項2】 補強部材が取付けられていない未加工の
半導体ウエハを1枚づつ引渡し可能なウエハ供給部と、
補強部材が取付けられた加工済の半導体ウエハを1枚づ
つ引受け可能なウエハ回収部と、径が拡大された拡開状
態にした1個の補強部材に1枚の半導体ウエハを嵌合す
る取付け機構と、取付け機構へ合成樹脂材で半導体ウエ
ハの外周の半分以上の弧長を有し半導体ウエハの径と同
一または僅かに小さい径に形成された補強部材を1個づ
つ供給する補強部材供給部と、取付け機構に供給された
補強部材に対して接着剤を塗布する塗布機構と、ウエハ
供給部,取付け機構,ウエハ回収部と連係して未加工,
加工済みの半導体ウエハを搬送する搬送機構とからなる
半導体ウエハの外周部の補強装置。
2. A wafer supply unit capable of delivering unprocessed semiconductor wafers to which no reinforcing member is attached one by one,
A wafer collecting portion capable of accepting one processed semiconductor wafer to which the reinforcing member is attached one by one, and an attaching mechanism for fitting one semiconductor wafer to one reinforcing member in an expanded state having an enlarged diameter; A reinforcing member supply unit for supplying a reinforcing member having an arc length of at least half of the outer circumference of the semiconductor wafer to the mounting mechanism and having a diameter equal to or slightly smaller than the diameter of the semiconductor wafer one by one; A coating mechanism for applying an adhesive to the reinforcing member supplied to the mounting mechanism;
A reinforcing device for an outer peripheral portion of a semiconductor wafer, comprising a transport mechanism for transporting a processed semiconductor wafer.
【請求項3】 可撓性を有する合成樹脂材で半導体ウエ
ハの外周の半分以上の弧長を有し半導体ウエハの径と同
一または僅かに小さい径に形成され、断面形状がL字形
に形成され、弧長の中央部の外側に凸部が形成されてな
る半導体ウエハの外周部の補強部材。
3. A flexible synthetic resin material having an arc length of at least half of the outer circumference of the semiconductor wafer and having the same or slightly smaller diameter as the semiconductor wafer, and having an L-shaped cross section. A reinforcing member for an outer peripheral portion of a semiconductor wafer having a convex portion formed outside a central portion of an arc length.
JP25187491A 1991-09-30 1991-09-30 Method and apparatus for reinforcing outer peripheral portion of semiconductor wafer and reinforcing member Expired - Fee Related JP2606990B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25187491A JP2606990B2 (en) 1991-09-30 1991-09-30 Method and apparatus for reinforcing outer peripheral portion of semiconductor wafer and reinforcing member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25187491A JP2606990B2 (en) 1991-09-30 1991-09-30 Method and apparatus for reinforcing outer peripheral portion of semiconductor wafer and reinforcing member

Publications (2)

Publication Number Publication Date
JPH0590232A JPH0590232A (en) 1993-04-09
JP2606990B2 true JP2606990B2 (en) 1997-05-07

Family

ID=17229221

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25187491A Expired - Fee Related JP2606990B2 (en) 1991-09-30 1991-09-30 Method and apparatus for reinforcing outer peripheral portion of semiconductor wafer and reinforcing member

Country Status (1)

Country Link
JP (1) JP2606990B2 (en)

Also Published As

Publication number Publication date
JPH0590232A (en) 1993-04-09

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