JP2558864Y2 - Lapping whetstone surface plate - Google Patents

Lapping whetstone surface plate

Info

Publication number
JP2558864Y2
JP2558864Y2 JP1992082775U JP8277592U JP2558864Y2 JP 2558864 Y2 JP2558864 Y2 JP 2558864Y2 JP 1992082775 U JP1992082775 U JP 1992082775U JP 8277592 U JP8277592 U JP 8277592U JP 2558864 Y2 JP2558864 Y2 JP 2558864Y2
Authority
JP
Japan
Prior art keywords
polished
lapping
polishing
grindstone
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1992082775U
Other languages
Japanese (ja)
Other versions
JPH0639357U (en
Inventor
武 山崎
剛士 園田
Original Assignee
鐘紡株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 鐘紡株式会社 filed Critical 鐘紡株式会社
Priority to JP1992082775U priority Critical patent/JP2558864Y2/en
Publication of JPH0639357U publication Critical patent/JPH0639357U/en
Application granted granted Critical
Publication of JP2558864Y2 publication Critical patent/JP2558864Y2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Polishing Bodies And Polishing Tools (AREA)

Description

【考案の詳細な説明】[Detailed description of the invention]

【0001】[0001]

【産業上の利用分野】本考案は、砥石を固定してなるラ
ッピング研磨装置の砥石定盤の構造に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of a grindstone plate of a lapping polishing apparatus having a fixed grindstone.

【0002】[0002]

【従来の技術】上下両方の定盤にセグメント状の固形合
成砥石を配設固定した研磨装置は、一般的に砥石ラッピ
ング方式の研磨装置と呼ばれ、アルミメモリーディスク
用のサブストレート,シリコンウェハー,ガラスウェハ
ー等、高度の平坦度、平行度を必要とする平板状をした
被研磨体の研磨に広く使用されている。
2. Description of the Related Art A polishing apparatus in which segment-shaped solid synthetic whetstones are arranged and fixed on both upper and lower platens is generally referred to as a whetstone lapping type polishing apparatus, and includes a substrate for an aluminum memory disk, a silicon wafer, It is widely used for polishing flat objects such as glass wafers which require a high degree of flatness and parallelism.

【0003】上記方式の研磨装置は、通常、太陽歯車、
内歯歯車及び両歯車とかみ合って自転及び公転するキャ
リアからなる遊星歯車機構を有し、上記キャリアにはそ
の両面に貫通し被研磨体を保持する保持孔が設けられて
おり、該キャリアを静止状態で下定盤の上面に載せると
共に被研磨体を保持孔に保持させた後、該キャリアの上
面に上定盤をのせ、太陽歯車、内歯歯車及び上下定盤を
それぞれ独立して回転させることにより被研磨体の両面
を研磨するものである。また作業効率上、上記キャリア
は、複数設置すると共に、各キャリアには被研磨体を複
数個保持することが好ましく一般的である。
[0003] A polishing apparatus of the above type usually comprises a sun gear,
It has a planetary gear mechanism consisting of a carrier that rotates and revolves in engagement with the internal gear and both gears, and the carrier is provided with a holding hole that penetrates both surfaces of the carrier and holds a body to be polished. After placing the workpiece on the upper surface of the lower platen and holding the object to be polished in the holding hole in the state, place the upper platen on the upper surface of the carrier, and independently rotate the sun gear, the internal gear, and the upper and lower platens. Is used to polish both surfaces of the object to be polished. In addition, from the viewpoint of work efficiency, it is preferable and general to set a plurality of the carriers and hold a plurality of the members to be polished in each carrier.

【0004】上述のような研磨装置は、研磨作業が終了
した後、まず上定盤を吊り上げて、被研磨体を取り出す
が、その際、被研磨体と定盤とは極めて平坦で両者は密
着状態であるため、研磨に使用した研磨液の影響等によ
り、被研磨体がしばしば上定盤に貼り付くことがある。
この場合、被研磨体をセグメント状の砥石の間隙や端面
に来るようにずらした後、被研磨体を剥がして回収する
が、ずらす際に被研磨体を傷つける虞がある。いずれに
せよこのような作業は極めて煩雑なものである。また、
被研磨体が貼り付いたことに気づかず、そのまま次の作
業に入り、思わぬ故障を発生させることもある。
In the above-described polishing apparatus, after the polishing operation is completed, first, the upper platen is lifted to take out the object to be polished. At this time, the object to be polished and the platen are extremely flat and both are in close contact with each other. In this state, the object to be polished often adheres to the upper platen due to the influence of the polishing liquid used for polishing.
In this case, after the object to be polished is shifted so as to come to the gap or the end face of the segment-shaped grindstone, the object to be polished is peeled off and collected. In any case, such an operation is extremely complicated. Also,
The user may not notice that the object to be polished has adhered to the next operation and may cause an unexpected failure.

【0005】更に、上定盤に貼り付いた被研磨体が上定
盤を吊り上げる途中で落下するといったこともある。こ
の場合には、下定盤の砥石面や周辺機器が損傷したり、
落下した被研磨体自身が破損することになる。
[0005] Furthermore, the object to be polished adhered to the upper surface plate may fall during the lifting of the upper surface plate. In this case, the whetstone surface of the lower platen and peripheral devices may be damaged,
The polished body itself that has fallen will be damaged.

【0006】[0006]

【考案が解決しようとする課題】本考案は上述のような
問題点に鑑みなされたものであって、本考案の目的は、
砥石ラッピング方式の研磨装置において、研磨終了後に
上定盤を吊り上げた際、被研磨体が上定盤に貼り付くこ
とのない砥石定盤の形態を提供するにある。
[Problems to be solved by the present invention] The present invention has been made in view of the above-mentioned problems.
An object of the present invention is to provide a grinding wheel lapping type polishing apparatus in which an object to be polished does not stick to the upper lapping plate when the upper lapping plate is lifted after completion of polishing.

【0007】[0007]

【課題を解決するための手段】本考案の上記目的は、キ
ャリアに被研磨体を保持して複数の被研磨体の両面を研
磨するラッピング研磨装置に装着した砥石定盤におい
て、上側に装着した砥石定盤には研磨面と連通する貫通
孔が穿孔され、前記研磨面における前記貫通孔の穿孔位
置は、前記キャリア及び砥石定盤が所定位置に停止した
時に被研磨体の上面と重なり合う部分のみであり、また
被研磨体の上面と重なり合う各研磨面の当接部分には少
なくとも一つの貫通孔が各々穿孔されていることを特徴
とするラッピング砥石定盤によって達成される。
SUMMARY OF THE INVENTION The object of the present invention is to provide a grindstone plate attached to an upper side of a grindstone plate attached to a lapping polishing apparatus which holds a member to be polished on a carrier and polishes both surfaces of a plurality of members to be polished. A through-hole communicating with the polishing surface is drilled in the grinding wheel surface plate, and the perforation position of the through-hole in the polishing surface is only a portion overlapping the upper surface of the object to be polished when the carrier and the grinding wheel surface plate stop at a predetermined position. Further, at least one through-hole is formed in a contact portion of each of the polishing surfaces overlapping with the upper surface of the object to be polished.

【0008】上記本考案のラッピング定盤において、研
磨面と連通する貫通孔の他端は、砥石の側面に開放され
るものである。
[0008] In the lapping platen of the present invention, the other end of the through hole communicating with the polishing surface is open to the side surface of the grindstone.

【0009】本考案にかかる貫通孔は、研磨終了後、被
研磨体を保持したキャリアーと上下定盤とが所定位置に
停止した時に、砥石の研磨面のうち各被研磨体の上面に
位置する各々当接部分には一つ又は二つ以上の貫通孔が
穿孔されている。貫通孔の内径及び数は被研磨体の大き
さ、重量等により適宜設定すればよいが、通常3〜10
mm程度である。貫通孔の内径が大き過ぎる場合あるいは
貫通孔の数が多過ぎる場合は研磨性能に影響を及ぼし、
被研磨体の上面と下面との仕上がり状態に差異を生ずる
ことになる。逆に貫通孔の内径が小さ過ぎる場合には、
本考案の目的を達成することができなくなる。
The through hole according to the present invention is located on the upper surface of each of the polished surfaces of the grindstone when the carrier holding the polished object and the upper and lower platens are stopped at predetermined positions after polishing. Each contact portion is provided with one or more through holes. The inner diameter and number of the through holes may be appropriately set depending on the size, weight, etc. of the object to be polished, but usually 3 to 10
mm. If the inner diameter of the through hole is too large or if the number of through holes is too large, it will affect the polishing performance,
The finished state of the upper and lower surfaces of the object to be polished will be different. Conversely, if the inner diameter of the through hole is too small,
The object of the present invention cannot be achieved.

【0010】上記本考案以外に、ラッピング定盤におい
て、研磨面と連通する貫通孔の他端を、研磨定盤の外側
に開放する、さらには、開放した他端を加圧手段に連結
することにしてもよい。ただし、研磨定盤の外側に開放
した場合には、通常、貫通孔は砥石、取付板及びラッピ
ング定盤を貫通して穿孔されることになる。一方、砥石
の側面に開放した場合には、取付板及びラッピング定盤
に穿孔する必要がない。
In another aspect of the present invention, in the lapping plate, the other end of the through hole communicating with the polishing surface is opened to the outside of the polishing plate, and the open end is connected to a pressing means. It may be. However, when it is opened to the outside of the polishing platen, the through-hole is usually drilled through the grindstone, the mounting plate and the lapping platen. On the other hand, when it is opened to the side surface of the grindstone, it is not necessary to pierce the mounting plate and the lapping plate.

【0011】また、貫通孔の他端を圧搾空気、加圧水等
の加圧手段に接続した場合には、貫通孔の断面を小さく
することができると共に、圧力によって被研磨体を確実
に研磨面から剥がすことができるが、装置が複雑にな
る。
When the other end of the through-hole is connected to a pressurizing means such as compressed air or pressurized water, the cross-section of the through-hole can be reduced and the object to be polished can be reliably removed from the polishing surface by the pressure. It can be peeled off, but it complicates the equipment.

【0012】[0012]

【作用】研磨作業が終了し上下の定盤及びキャリアーが
所定位置に停止したのち、上部砥石定盤を吊り上げる際
に、貫通孔から自然に空気等が送通して来るため、被研
磨体は自重により上部砥石定盤から容易に剥がれ、上部
研磨面に貼り付くことがない。
[Function] After the polishing operation is completed and the upper and lower platens and the carrier are stopped at predetermined positions, when the upper grindstone platen is lifted, air or the like naturally flows through the through-holes, so that the object to be polished has its own weight. Thereby, it is easily peeled off from the upper grindstone plate and does not stick to the upper polished surface.

【0013】[0013]

【実施例】本考案を図面に基づいて具体的に説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described with reference to the drawings.

【0014】図1は本考案の砥石定盤の一実施例を示す
下から見たときの平面図である。
FIG. 1 is a plan view of an embodiment of the grindstone plate of the present invention when viewed from below.

【0015】図2は、本考案にかかる貫通孔の形態の実
施態様を示す要部斜視図である。図において貫通孔11
は、L字形に穿孔され、他端を砥石の側面に開放するも
のである。貫通孔をこのように穿孔した場合、取付板2
及びラッピング定盤3を穿孔する必要がない。
FIG. 2 is a perspective view showing a main portion of the embodiment of the through hole according to the present invention. In FIG.
Is drilled in an L-shape and the other end is open to the side surface of the grindstone. When the through hole is drilled in this way, the mounting plate 2
Further, it is not necessary to pierce the lapping platen 3.

【0016】図3は、上記砥石定盤を装着したラッピン
グ研磨装置が研磨作業を終了して所定位置に停止した時
(以下、「停台時」という)の、砥石定盤とキャリア6
との位置関係を示す下から見たときの平面図である。キ
ャリア6には被研磨体7を保持する保持孔8が8箇所穿
孔され、各保持孔8には被研磨体7がそれぞれ保持され
ている。また本実施例では、キャリア6は全部で4枚搭
載され、各キャリアの歯車は、太陽歯車9及び内歯歯車
10とかみ合っている。
FIG. 3 shows the grinding wheel platen and the carrier 6 when the lapping polishing apparatus equipped with the grinding wheel platen finishes the polishing operation and stops at a predetermined position (hereinafter referred to as “stopping stage”).
FIG. 5 is a plan view showing the positional relationship between the above and when viewed from below. Eight holding holes 8 for holding the polished body 7 are formed in the carrier 6, and the polished body 7 is held in each holding hole 8. Further, in this embodiment, four carriers 6 are mounted in total, and the gears of each carrier mesh with the sun gear 9 and the internal gear 10.

【0017】貫通孔11は、研磨面のうち停台時に各被
研磨体7の上面と重なり合う当接部分の略中央に1個づ
つ穿孔されている。従って、本実施例においては、貫通
孔は砥石定盤全体で32か所に穿孔され、停台時にはい
ずれの被研磨体も各1個の貫通孔と重なり合うように構
成されている。
The through holes 11 are formed one by one substantially at the center of the abutting portion of the polishing surface which overlaps with the upper surface of each of the polished bodies 7 at the time of stopping. Therefore, in the present embodiment, the through holes are formed at 32 locations on the whole grindstone platen, and each of the objects to be polished overlaps one through hole at the time of stopping.

【0018】図6は、従来の砥石定盤で、貫通孔を持た
ないものである。
FIG. 6 shows a conventional grindstone plate having no through holes.

【0019】[0019]

【考案の効果】本発明の砥石定盤は、被研磨体の上面と
重なり合う砥石表面の当接部分に貫通孔を穿孔し、他端
を空気中に開放したため、研磨作業終了後に上定盤を吊
り上げた際に、この貫通孔から空気等が送出され、被研
磨体が上定盤に貼り付いて、一緒に持ち上がったり、途
中で剥がれ落ちたりするといったことがない。したがっ
て、被研磨体を容易に回収することができ、また被研磨
体の落下等による被研磨体及び研磨砥石の損傷を未然に
防止できるものである。
According to the present invention, the grinding wheel surface plate of the present invention has a through hole formed in the contact portion of the grinding wheel surface overlapping with the upper surface of the object to be polished, and the other end is opened to the air. At the time of lifting, air or the like is sent out from the through holes, and the object to be polished does not stick to the upper platen and is lifted together or peeled off in the middle. Therefore, the object to be polished can be easily collected, and damage to the object to be polished and the polishing grindstone due to dropping of the object to be polished can be prevented beforehand.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本考案の砥石定盤の一実施例を示す下から見た
ときの平面図である。
FIG. 1 is a plan view of one embodiment of a grindstone platen of the present invention when viewed from below.

【図2】図1の砥石定盤における貫通孔の実施態様を示
す斜視図である。
FIG. 2 is a perspective view showing an embodiment of a through hole in the grindstone platen of FIG.

【図3】図1の砥石定盤を装着したラッピング研磨装置
が所定位置に停止した時における、砥石定盤とキャリア
ーとの位置関係を示す下から見たときの平面図である。
FIG. 3 is a plan view showing the positional relationship between the grindstone plate and the carrier when the lapping polishing apparatus equipped with the grindstone plate of FIG. 1 is stopped at a predetermined position, as viewed from below.

【図4】従来の砥石定盤の一例を示す平面図である。FIG. 4 is a plan view showing an example of a conventional grindstone platen.

【符号の説明】[Explanation of symbols]

1 セグメント状砥石 2 取付板 3 ラッピング定盤 4 ボルト 5 溝 6 キャリア 7 被研磨体 8 保持孔 9 太陽歯車 10 内歯歯車 11 貫通孔 DESCRIPTION OF SYMBOLS 1 Segment whetstone 2 Mounting plate 3 Lapping surface plate 4 Bolt 5 Groove 6 Carrier 7 Object to be polished 8 Holding hole 9 Sun gear 10 Internal gear 11 Through hole

Claims (1)

(57)【実用新案登録請求の範囲】(57) [Scope of request for utility model registration] 【請求項1】 キャリアに被研磨体を保持して複数の被
研磨体の両面を研磨するラッピング研磨装置に装着した
砥石定盤において、上側に装着した砥石定盤の砥石の研
磨面と該砥石の側面とを連通する貫通孔が穿孔され、前
記研磨面における前記貫通孔の穿孔位置は、前記キャリ
ア及び砥石定盤が所定位置に停止した時に被研磨体の上
面と重なり合う部分のみであって、且つ被研磨体の上面
と重なり合う各研磨面の当接部分には少なくとも一つの
貫通孔が各々穿孔されていることを特徴とするラッピン
グ砥石定盤。
1. A grindstone plate attached to a lapping polishing apparatus which holds a body to be polished on a carrier and grinds both sides of a plurality of polished bodies. The through-hole communicating with the side surface is drilled, and the drilling position of the through-hole in the polishing surface is only a portion that overlaps with the upper surface of the body to be polished when the carrier and the grindstone platen stop at a predetermined position, A lapping whetstone surface plate, wherein at least one through hole is formed at a contact portion of each polishing surface overlapping with an upper surface of the object to be polished.
JP1992082775U 1992-11-04 1992-11-04 Lapping whetstone surface plate Expired - Fee Related JP2558864Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1992082775U JP2558864Y2 (en) 1992-11-04 1992-11-04 Lapping whetstone surface plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1992082775U JP2558864Y2 (en) 1992-11-04 1992-11-04 Lapping whetstone surface plate

Publications (2)

Publication Number Publication Date
JPH0639357U JPH0639357U (en) 1994-05-24
JP2558864Y2 true JP2558864Y2 (en) 1998-01-14

Family

ID=13783809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1992082775U Expired - Fee Related JP2558864Y2 (en) 1992-11-04 1992-11-04 Lapping whetstone surface plate

Country Status (1)

Country Link
JP (1) JP2558864Y2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005238413A (en) * 2004-02-27 2005-09-08 Yachiyo Microscience Inc Rotary lapping plate for lapping machine
JP4818613B2 (en) * 2005-01-19 2011-11-16 アイオン株式会社 Double-sided surface polishing machine
JP2008155312A (en) * 2006-12-22 2008-07-10 Disco Abrasive Syst Ltd Grinding wheel

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61203269A (en) * 1985-03-04 1986-09-09 Kobe Steel Ltd Device for preventing adhesion of product in lapping/ polishing machine
JPH04129675A (en) * 1990-09-14 1992-04-30 Mitsubishi Materials Corp Perforated grinding wheel

Also Published As

Publication number Publication date
JPH0639357U (en) 1994-05-24

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