JP2529784B2 - Pressure control device - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pressure control device. More specifically, the present invention makes it possible to perform high temperature baking for improving the purity of the used gas, and to safely discharge the unnecessary gas, and to supply gas at a stable gas pressure. The present invention relates to a pressure control device.

[0002]

2. Description of the Related Art Conventionally, as a pressure control system,
For example, a pressure control system using a manual valve, an automatic pressure control system (auto pressure control (A
TP)), a mass flow control system, etc. are known. The auto pressure control system (ATP) includes a servo motor drive valve (a), a pressure gauge (a), a controller (c), a discharge valve (d) and a gas supply valve (e) as shown in FIG. It is configured. When supplying gas to equipment using gas, a gas cylinder or the like is connected to the gas supply valve (e). The gas pressure at the time of gas supply is controlled to a specified pressure by automatically opening and closing the servo motor drive valve (a) by the controller (c) based on the pressure detected by the pressure gauge (a). Moreover, in this system, the unnecessary gas can be released to the atmosphere by the release valve (d).

On the other hand, in the case of a mass flow control system, as shown in FIG. 6, for example, a flow control valve (F), a pressure gauge (K), a flow meter (K), a gas supply valve (K), a controller ( C) and a gas release valve (SA). The gas pressure at the time of gas supply is detected by the pressure gauge (K) and the flow rate by the flow meter (K) while monitoring the pressure of the gas-using equipment. Based on the detection results, the controller (K) Automatically opens and closes the flow control valve (f) to control the specified pressure. In this system as well, unnecessary gas can be released to the atmosphere by a release valve (SA).

[0004]

However, in the conventional pressure control system illustrated in FIGS. 5 and 6, the servo motor drive valve (a),
Since a rubber material is used for the sealing material of the flow control valve (F), etc., and glass etc. is used for the flow meter (K), high-temperature baking is performed to reduce the amount of released gas and water in the system. There was a drawback that you could not do. In addition, there is a problem that the system cannot be kept in a high vacuum state even in a clean state because the structure does not withstand the reverse pressure.

Therefore, in the conventional system, the gas replacement is performed by the gas extrusion method or the like to improve the purity of the supply gas. However, in the case of the auto-pressure control system as illustrated in FIG. 5, the gas pressure control for maintaining the designated pressure is performed depending on the usage status of the gas-using facility, and therefore, as shown in FIG. It is inevitable that (P) fluctuates (overshoot) with time (T).

On the other hand, in the case of the mass flow control system illustrated in FIG. 6, since the control is also based on the gas flow rate as described above, the pressure (P) reaches the designated pressure level as shown in FIG. There is a drawback that it takes a long time to get to. In addition, in the case of the conventional system, the amount of gas used for replacement becomes enormous,
Moreover, there is a problem that the pressure control response of the valve is slow.

For this reason, it is possible to improve the purity of the supply gas by reducing the amount of released gas, water, etc. in the system, and to safely exhaust unnecessary gas. Realization of a control device was desired. In particular,
In a gas injection device for supplying a raw material gas such as a nuclear fusion device, since the gas purity greatly affects the plasma performance, a pressure control device capable of stably supplying a high-purity gas is required. It was

The present invention has been made in view of the above circumstances, solves the drawbacks of the conventional pressure control system, reduces the gas released in the system by high temperature baking, and improves the purity of the used gas. It is an object of the present invention to provide a new pressure control device capable of performing stable gas supply to a gas using facility, which is capable of safely exhausting unnecessary gas.

[0009]

In order to solve the above problems, the present invention has one end forming a gas inlet port.
A supply valve is connected to the other end of the pipe, and the pipe is connected to the supply valve.
Connected to the booster valve, and the booster valve is connected to the booster valve via piping.
A refis valve is connected, and piping is connected from the boost orifice valve.
The extended gas outlet port is formed at the tip.
The pipe branches from the middle of the pipe that connects the supply valve and booster valve
The bypass valve is connected to the tip of the branched pipe.
The pipe is extended from the bypass valve, and the tip of the pipe is
Branch connected to the pipe extended from the boost orifice valve
One end of the pipe ^{that forms} the discharge gas port.
A pressure orifice valve is connected, and piping is connected to the pressure reduction orifice valve.
The pressure reducing valve is connected via the
And its tip is extended from the boost orifice valve.
Branched to the pipe, one end forms a vacuum exhaust port
The exhaust valve is connected to the other end of the pipe
Is extended and its tip extends from the boost orifice valve
The pressure boosting orifice is branched and connected to the
The pipe is branched from the middle of the pipe extended from the valve,
A pressure detector port is formed at the end of the pipe
The pressure detector is connected to the pressure detector port.
A baking heater is installed on each valve and piping.
The pressure detected by the pressure detector is input to the controller.
Connected so that the controller is
Opening and closing of valves, boost valves, bypass valves, pressure reducing valves, exhaust valves
By setting and controlling the gas supply pressure by
To control the temperature of the piping with a baking heater.
A pressure control device is provided.

[0010]

In the pressure control device of the present invention, when the raw material gas is supplied from the gas inlet port, the pressure detector provided at the pressure detector port detects the supply pressure, and an arbitrary set value (specified pressure) by the controller is obtained. The valve operates at high speed to prevent a sudden pressure change based on the comparison with the detected pressure. Thereby, the gas having a stable gas pressure controlled to the designated pressure can be supplied to the gas outlet port. The waste gas can be diluted with air and discharged from the discharge gas port to the atmosphere to the exhaust area of the vacuum pump. After the exhaust area of the vacuum pump,
High vacuum can be exhausted by a vacuum exhaust pump as a vacuum exhaust system connected to the vacuum exhaust port.

In the pressure control device of the present invention,
When the released gas, moisture, etc. in the system affect the purity of the supply gas, it is possible to apply a voltage to a baking heater provided in the piping system and perform vacuum evacuation while performing high temperature baking.

[0012]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The pressure control device of the present invention will be described in more detail below with reference to the drawings. 1 and 2 are a plan view and a sectional view, respectively, showing an embodiment of the pressure control device of the present invention.

In this example, one end has a gas inlet port.
The supply valve (1) is connected to the other end of the pipe forming (11).
And the boost valve (2) is connected to the supply valve (1) via a pipe.
And a pressure-increasing orifice valve through a pipe to the pressure-increasing valve (2).
(6) is connected, and piping from the boost orifice valve (6)
Is extended to form a gas outlet port (12) at the tip.
And connecting the supply valve (1) and the boost valve (2).
The pipe is branched from the middle of the pipe, and the tip of the branched pipe
A bypass valve (3) is connected to the bypass valve (3)
Pipe is extended and the tip of the pipe is extended to the boost orifice valve.
Branched to the pipe extended from (6), one end
Depressurizes at the other end of the pipe forming the release gas port (15)
An orifice valve (7) is connected to the pressure reducing orifice valve.
A pressure reducing valve (5) is connected to (7) via a pipe to reduce the pressure.
A pipe is extended from the valve (5), and the tip of the pipe extends from the pressure rising orientation.
Branched to the pipe extended from the fiss valve (6)
Other than the piping whose one end forms the vacuum exhaust port (13)
An exhaust valve (4) is connected to the end, and piping is provided from the exhaust valve (4).
Is extended and its tip is the boost orifice valve (6).
It is branched and connected to the extended pipe from the
From the middle of the pipe extended from the fiss valve (6),
The pressure detector port at the end of the branched pipe.
(14) is formed. Supply valve (1), booster valve (2), bypass valve (3), pressure reducing valve (5), exhaust valve (4), pressure rising orifice valve (6) and pressure reducing orifice valve (7) , and each pipe is a stand It is connected to (8) via a packing such as a metal packing. These supply valve (1), boost valve (2), bypass valve (3),
As the pressure reducing valve (5) and the exhaust valve (4), for example, a metal seal pneumatic valve using compressed air, a high-speed electromagnetic valve, or the like can be appropriately used. When a high-speed solenoid valve is used, the device can be downsized and high-speed control operation can be achieved. Further, the supply valve (1), the boost valve (2), the bypass valve (3), the pressure reducing valve (5) and the exhaust valve (4) are respectively
As shown in FIG. 3, it is also connected to a controller (17) for setting and controlling the gas supply pressure.

On the other hand, as the pressure-increasing orifice valve (6) and the pressure-reducing orifice valve (7), a metal seal orifice valve or the like can be appropriately adopted, and the opening degree is adjusted so as not to cause a sudden pressure change of the supply gas. So that it can be done easily. As a result, it is possible to quickly deal with the difference in gas velocity due to the type of gas.

As shown in FIG. 3, the gas inlet port (1
A gas cylinder for supplying the raw material gas can be connected to 1), and the gas can be supplied to the facility used connected to the gas outlet port (12). Pressure detector port (1
4) is equipped with a pressure detector (16), which detects the gas pressure during gas supply. The detected result is sent to the controller (17) shown in FIG. In this controller (17), the designated pressure (set value) of the gas supply pressure is compared with the actually measured value. Further, a vacuum exhaust pump as an exhaust system can be connected to the vacuum exhaust port (13) so that the system can be exhausted to a high vacuum. The gas that is no longer needed in the gas use facility is diluted with air through the discharge gas port (15) and then safely discharged to the exhaust region of the vacuum exhaust pump. After this, further evacuation is performed by, for example, an evacuation pump connected to the evacuation port (13).

Further, in this apparatus, a baking heater for baking the inside of the system at a high temperature is provided from the upstream side of the supply valve (1) with each valve (2) to (7) and each port (1).
It is attached to the non-inductive winding in 1) to (15). On this baking heater, a heat insulating material (18) is arranged so as not to radiate heat from here. Next, the operation of the pressure control device having the above configuration when supplying gas will be described. Place the raw material gas cylinder in the gas inlet port (11),
With the vacuum exhaust pump connected to the vacuum exhaust port (13) and the gas use equipment connected to the gas outlet port (12), respectively, a desired specified pressure P ₀ is set in the controller (17).
To enter. Then, the pressure reducing valve (5) and the bypass valve (3)
And the exhaust valve (4) remains closed, but first the supply valve (1) is opened and then the boost valve (2) is opened. In this way, the outlet pressure rises to the designated pressure P ₀ via the boost orifice valve (6).

After this, when the outlet pressure exceeds the designated pressure P ₀ , the pressure increasing valve (2) is closed and the pressure reducing valve (5).
Opens and the specified pressure P is reached via the pressure reducing orifice valve (7).
_The pressure is reduced to ₀ . The pressure at this time is the pressure detector (1
It can be monitored in 6). Further, opening and closing of the series of valves are all controlled by the controller (17). Gas supply pressure, the controller for the specified pressure _{P 0} (1
Stable and continuous control is performed by opening and closing the pressure increasing valve (2) and the pressure reducing valve (5) within a range of ± ΔP (designated pressure change amount) input to 7). This range of ± ΔP (designated pressure change) can be set arbitrarily in the controller (17).

When the gas supply becomes unnecessary in the gas using equipment, this time, the exhaust command is input to the controller (17) to close the supply valve (1 ) and the booster valve (2), and the bypass valve. Open (3) and pressure reducing valve (5),
It releases safely while diluting with air until the pressure in the system reaches the exhaust area of the vacuum pump. The pressure at this time can also be detected by the pressure detector (16). When the gas pressure reaches the exhaustable pressure of the vacuum exhaust pump, the pressure reducing valve (5) is closed and the exhaust valve (4) is opened, so that the system can be exhausted to a high vacuum.

On the other hand, when the released gas, residual gas, moisture, etc. in the system influence the purity of the supply gas, the baking command and the baking temperature are input to the controller (17) while the exhaust gas is kept in the exhausted state. Then, a voltage is applied to the baking heater to raise the inside of the system to a specified temperature. The released gas, residual gas, moisture, etc. in the burned-out system are safely exhausted in a gas state by a vacuum exhaust pump connected to the vacuum exhaust port (13).

The supply, exhaust, and baking operation sequences described above can be automatically / manually performed by the program of the controller (17). FIG. 4 is a correlation diagram showing the relationship between the gas supply pressure and the time when the source gas is supplied at an arbitrary set pressure P ₀ using the pressure control device of the present invention. As is apparent from FIG. 4, when the pressure control device of the present invention is used, the gas supply pressure rises quickly to the designated pressure P ₀ , and is stable and continuous within the range of ± ΔP depending on the condition of the equipment used. Can be supplied with gas.

Further, when a gas injection device for supplying a raw material gas to a nuclear fusion device was used to measure the gas purity when a 99.99999% hydrogen cylinder was used, it was about 99.9% before baking and after baking. 99.999%
It was experimentally confirmed that the purity was higher than the above (outside of the measuring range of the open-air meter). Of course, the present invention is not limited to the above examples. It goes without saying that various aspects are possible for details such as the type of gas, the detection range and accuracy of the pressure detector, and the like.

[0022]

As described in detail above, according to the present invention, an arbitrary gas supply pressure can be stably and continuously supplied to a facility to be used at a desired set value. Further, the unnecessary gas can be safely discharged, and the system can be evacuated to a high vacuum. Further, the released gas in the system, residual gas, can you discharge the moisture from the system by high-temperature baking, it is possible to supply a stable high purity gas use facility.

[Brief description of drawings]

FIG. 1 is a plan view showing an embodiment of a pressure control device of the present invention.

FIG. 2 is a cross-sectional view of the pressure control device illustrated in FIG.

FIG. 3 is a block diagram systematically showing the pressure control device illustrated in FIGS. 1 and 2.

FIG. 4 is a correlation diagram showing the relationship between supply pressure and time for gas supply using the pressure control device of the present invention.

FIG. 5 is a block diagram systematically showing a conventional auto pressure control system.

FIG. 6 is a block diagram systematically showing a conventional mass flow control system.

FIG. 7 is a correlation diagram showing a relationship between supply pressure and time of the auto pressure control system shown in FIG.

8 is a correlation diagram showing a relationship between supply pressure and time of the mass flow control system shown in FIG.

[Explanation of symbols]

 1 Supply Valve 2 Booster Valve 3 Bypass Valve 4 Exhaust Valve 5 Reducer Valve 6 Booster Orifice Valve 7 Reducer Orifice Valve 8 Frame 11 Gas Inlet Port 12 Gas Outlet Port 13 Vacuum Exhaust Port 14 Pressure Detector Port 15 Release Gas Port 16 Pressure Detector 17 Controller 18 Heat insulation material

Claims (1)

(57) [Claims] 1. The pressure of the supply gas to the gas using equipment is controlled.
A pressure control device that has a supply valve at the other end of the pipe that forms the gas inlet port
Connected, the boost valve is connected to the supply valve via a pipe,
A booster orifice valve is connected to the booster valve through piping,
Piping is extended from the booster orifice valve and a gas outlet is provided at the tip.
A port is formed , and the pipe is connected from the middle of the pipe connecting the supply valve and the booster valve.
A branch valve is connected to the tip of the branched pipe.
The pipe is extended from the bypass valve and its tip is
Branch connection to the pipe extended from the booster orifice valve
The decompression ori
A fis valve is connected to the pressure reducing orifice valve through piping.
A pressure reducing valve is connected, and a pipe is extended from the pressure reducing valve.
The tip of the pipe is divided into the pipe extended from the boost orifice valve.
The exhaust valve is connected to the other end of the pipe that forms the vacuum exhaust port.
Connected, the pipe is extended from the exhaust valve,
Branch connection to the pipe extended from the booster orifice valve
And has, distribution from the middle of the piping extended from the boost orifice valve
The pipe is branched, and the pressure detector port is attached to the tip of the branched pipe.
Of the pressure sensor is connected to the pressure sensor port.
And a baking heater is installed in each valve and piping.
The pressure detected by the pressure detector is the controller
And the controller is connected to
Opening and closing of supply valve, boost valve, bypass valve, pressure reducing valve, exhaust valve
By setting and controlling the gas supply pressure by operating
In addition, the temperature of the piping is controlled by the baking heater.
A pressure control device characterized in that