JP5008086B2 - High-speed gas switching device with pressure adjustment function - Google Patents

Description

  The present invention relates to a gas switching device that supplies two types of gas while switching, and in particular, the switching operation is performed at high speed, and the pressure fluctuation at the time of switching is small, so that switching can be performed while arbitrarily controlling the total pressure. The present invention relates to a high-speed gas switching device with a pressure adjusting function.

  Plasma processing is performed by exciting a gas with a high-frequency power source in a vacuum and bringing a highly reactive plasma into contact with an object to be processed, such as etching or CVD in a semiconductor manufacturing process or the like. It has been widely done. In that case, it is necessary to change the gas in the vacuum apparatus for performing various treatments to a plasma state depending on the kind of treatment, and in particular, many treatment steps are often required when manufacturing one product. The gas needs to be exchanged for each type of treatment.

  At that time, it is necessary to change the gas supply path in a short time while controlling the total internal pressure of the gas supplied to the vacuum apparatus for performing various processes. At that time, the gas previously supplied to the gas supply pipe line If the gas remains, it will be mixed with the gas to be supplied next, and the gas mixed with the previous gas will be supplied even after the gas in the vacuum device is eliminated. It takes a lot of time to do this, and it is necessary to continue unnecessary gas supply for a long time.

In addition, a plasma decomposition apparatus having a vent gas inflow portion, a vacuum pump exhausting the plasma decomposition apparatus connected to the subsequent stage of the plasma decomposition apparatus, and a vent gas decomposed by the plasma decomposition apparatus connected to the subsequent stage of the vacuum pump are finally processed. Japanese Patent Application Laid-Open No. 2002-306927 discloses a technique that allows a hardly-decomposable gas to be decomposed with high decomposition efficiency and gas exchange with high replacement efficiency by a small-sized facility by using a vent gas excluding device including a cracking gas processing device. (Patent Document 1). The technique described in Patent Document 1 is different in configuration and application from the present invention.
JP 2002-306927 A

  As described above, when various processes must be continuously performed in the vacuum apparatus, it is necessary to frequently change the type and the total pressure of the gas supplied to the vacuum apparatus. Therefore, in the gas supply path at that time, it is necessary to be able to change the type and flow rate of the supplied gas while controlling the total pressure in a short time. If the gas is not switched properly at that time, the process is not performed properly, which affects the performance of the product. In addition, in order to exchange all the gas in a short time, it is necessary to prevent the previous gas from remaining in the pipeline as much as possible.

  An apparatus for supplying a desired gas to a predetermined apparatus as described above by switching at high speed while adjusting the total pressure is not limited to performing plasma processing as described above, for example, when inspecting the performance of a gas sensor. Is also required. In other words, the gas sensor needs to detect a gas with a predetermined property as soon as possible, so the detection response time is one of the important performances, but in order to measure the response speed, the gas sensor must be slower than the response time. It is necessary to supply a gas having a predetermined property at a speed of one digit or more.

  Therefore, the present invention provides a device that can change the gas supply path in a short time while controlling the total pressure in the vacuum device, thereby mainly changing the gas type and flow rate frequently in a short time. Providing a high-speed gas switching device with a pressure adjustment function that improves the performance and functions of products obtained by film formation and plasma treatment, and can measure the exact response time of the gas sensor by changing the gas supply at high speed The main purpose is to do.

  It is the present invention to provide a device for switching between two different gas flows while controlling the pressure in the device through which it flows. To that end, a switching valve for quickly switching between two gas flow paths and There is a need for a pressure control valve to control the pressure in the device. Furthermore, in order to reduce the pressure fluctuation that can occur immediately after switching the gas flow, it is necessary to exhaust the gas flow that is not supplied into the device separately from the flow into the device. In addition, it is necessary to provide a bypass evacuation system, which is an evacuation system different from the actual processing apparatus.

  A gas path switching valve for quickly switching between two gas flow paths is a combination of a plurality of electromagnetic on-off valves that can be opened and closed quickly and easily controlled from the outside. Connected to this switching valve are two types of gas supply sources to be switched now, a device that actually uses the gas, and the bypass evacuation system described in the previous paragraph.

  In actual switching, the pressure in the device was adjusted with the pressure control valve in the state of gas supply before and after switching, and the pressure control valve on the bypass line was adjusted to reduce pressure fluctuation immediately after switching. Above, high-speed gas flow switching in which the pressure in the apparatus is controlled is performed by electrically reversing the opening and closing of the electromagnetic valves constituting the switching valve at the same time. Details are shown in the following examples, but the features of the present invention are as follows.

  In order to solve the above problems, a high-speed gas switching device with a pressure regulating function according to the present invention includes a first pipe for supplying a first supply gas to a vacuum device via a first flow control valve, and a second flow control valve. And a second pipe for supplying the second supply gas via the first three-way valve, and the first supply gas and the second supply gas are supplied from the first three-way valve to the third flow rate. An exhaust pipe that can be supplied to a vacuum device through a control valve and exhausts through a pipe line between the second flow rate control valve of the second pipe line and the first three-way valve, and a fourth flow rate control valve. And a pipe branching from the first pipe to the pipe between the fourth flow control valve and the second three-way valve of the exhaust pipe, Either the first supply gas or the second supply gas can be exhausted via the fourth flow control valve. And a first on-off valve is provided in a pipe line between the first three-way valve and the second three-way valve, and a second on-off valve is provided in a pipe line connecting the first pipe line and the exhaust pipe line. The first on-off valve and the second on-off valve are closed when the first supply gas is supplied, and the first three-way valve and the second three-way valve are all opened, and the first on-off valve is supplied when the second supply gas is supplied. The second on / off valve is opened, and the first pipeline side of the first three-way valve and the exhaust pipeline side of the second three-way valve are closed.

  Another high-speed gas switching device with a pressure regulating function according to the present invention is the above-described high-speed gas switching device with a pressure regulating function, wherein three or more types of the high-speed gas switching device with a pressure regulating function are connected in series. It is characterized by performing gas switching.

  Another high-speed gas switching device with a pressure control function according to the present invention is characterized in that the high-speed gas switching device with a pressure control function is used in a plasma processing apparatus that performs various processes using plasma.

  Another high-speed gas switching device with a pressure regulating function according to the present invention is characterized in that the high-speed gas switching device with a pressure regulating function is used as a gas supply device in a measuring device for a response time of a gas sensor.

  Since the present invention is configured as described above, it is possible to reduce the residual amount of the previously supplied gas in the gas switching pipe line portion in the gas supply path, while controlling the total pressure in the vacuum apparatus. The gas supply path can be changed in a short time. As a result, by frequently changing the gas type and flow rate in a short time, it is possible to improve the productivity of the product obtained mainly by plasma film formation and plasma treatment, and to improve the performance and function of the product. . Further, by changing the gas supply at high speed, it is possible to obtain a high-speed gas switching device with a pressure adjusting function capable of measuring an accurate response time of the gas sensor.

  The present invention provides a first pipe for supplying a first supply gas to a vacuum device via a first flow rate control valve in order to change the gas supply path in a short time while controlling the total pressure in the vacuum device. And a second pipe for supplying the second supply gas via the second flow rate control valve are connected by a first three-way valve, and either one of the first supply gas and the second supply gas is connected to the first supply gas. 1 A three-way valve can be supplied to a vacuum device via a third flow rate control valve, a pipe line between the second flow rate control valve of the second pipe line and the first three-way valve, and a fourth flow rate control The exhaust line that exhausts through the valve is connected by a second three-way valve, and branches from the first pipe to a pipe line between the fourth flow rate control valve and the second three-way valve in the exhaust line. The first and second supply gases are connected to the fourth flow rate. A conduit that allows exhaust through a control valve, and that is provided with a first on / off valve in a conduit between the first three-way valve and the second three-way valve, and that connects the first conduit and the exhaust conduit. Is provided with a second on / off valve, and when the first supply gas is supplied, the first on / off valve and the second on / off valve are closed, and the first three-way valve and the second three-way valve are all opened to supply the second supply gas. The first on / off valve and the second on / off valve are opened at the time of supply, and the first pipeline side of the first three-way valve and the exhaust pipeline side of the second three-way valve are closed.

Embodiments of the present invention will be described with reference to the drawings. FIG. 1 shows a typical configuration example of the present invention, in which supply of the supply gases A and B supplied to the vacuum apparatus can be switched in a short time. That is, a three-way valve and the first three-way valve V 3 second way valve V 1 was to be connected to the three directions of the tube in FIG. 1 (a), in the valve, as shown in FIG. (B) (i ) In two directions and (ii) in only one direction. In FIG. 6 (ii), the black portion of the valve indicates a cut-off state. Such a three-way valve may be any of various conventionally known valves.

  The first on / off valve V2 and the second on / off valve V4 are valves for controlling the on / off of the gas flow in the straight pipe. These valves are similar to the normally used valves in FIG. 1 (c) (i). Switching between the state of passing through the valve and the state of blocking in (ii). The above three-way valve and on / off valve can operate at high speed as electromagnetic valves, and the time required for opening and closing the valves is 3.5 and 5 ms, respectively.

  These valves are connected as shown in FIG. 1A, and are connected to a supply gas system A as a first pipeline and a supply gas system B as a second pipeline, as shown in FIG. At the same time, the first gas is supplied through the first flow rate control valve CV1, and connected to the bypass exhaust line through the second flow rate control valve CV2 and a vacuum device for manufacturing various products such as a plasma processing apparatus. The vacuum device is equipped with a pressure gauge (vacuum gauge) for measuring pressure.

  The connection state of these pipes is summarized as follows. That is, a first pipeline that supplies the first supply gas A to the vacuum device via the first flow control valve CV1, and a second pipeline that supplies the second supply gas B via the second flow control valve CV2. Can be connected by the first three-way valve V3, and either the first supply gas A or the second supply gas B can be supplied from the first three-way valve V3 to the vacuum device via the third flow control valve CV3. It is said. Further, a second pipe for supplying the second supply gas B, a pipe line between the second flow rate control valve CV2 and the first three-way valve V3, and an exhaust pipe for exhausting through the fourth flow rate control valve CV4. And a pipe branched from the first pipe to the pipe between the fourth flow rate control valve CV4 and the second three-way valve V1 of the exhaust pipe. Thus, any one of the first supply gas A and the second supply gas B that is not supplied to the apparatus can be exhausted via the fourth flow rate control valve CV4. In addition, a first on / off valve V2 is provided in a pipe line between the first three-way valve V3 and the second three-way valve V1, and a second on / off valve V4 is connected to a pipe line connecting the first pipe line and the exhaust pipe line. Is provided.

  In such a pipe configuration, as will be described in detail later, when the first supply gas A is supplied, the first on-off valve V2 and the second on-off valve V4 are closed, and the first three-way valve V3 and the second three-way valve are closed. All the valves V1 are opened, and when the second supply gas B is supplied, the first on / off valve V2 and the second on / off valve V4 are opened, and the first three-way valve V3 and the second three-way valve are opened. The present invention is implemented by closing the exhaust pipe side of V1.

  A procedure for switching and replacing the supply gases A and B supplied to the vacuum apparatus in a short time by the system shown in FIG. 1A will be described in more detail. First, in the initial first stage, as shown in FIG. 2A, the supply gas A is supplied to the vacuum apparatus. That is, the supply gas A is supplied to the vacuum device by closing the first and second on / off valves V2 and V4 and opening the first and second three-way valves 1 and V3. In this state, the supply gas A flows to the vacuum device through the first flow control valve CV1, the first three-way valve V3, and the third flow control valve CV3.

  On the other hand, the supply gas B cannot flow to the vacuum device because the first and second on / off valves V2 and V4 are closed at this time, and in the drawing, the first flow control valve CV2, the second three-way valve V1, And the exhaust is bypassed through the fourth flow control valve CV4. The above gas flow state is indicated by solid lines in the piping.

  The switching from the state in which the supply gas A is supplied to the vacuum device to the supply to the supply gas B is performed as shown in FIG. 2 (b) by the first and second three-way valves in (a). This is accomplished by reversing the opening and closing of all the valves V1, V3 and the first and second on / off valves V2, V4. These opening / closing operations are all performed simultaneously by an electrical signal, whereby the first and second three-way valves V1 and V3 are closed, and the first and second on / off valves V2 and V4 are opened.

  As a result, the supply gas A supplied to the vacuum device is stopped from flowing to the vacuum device because the first three-way valve V3 is closed, and exhausted from the bypass exhaust line because the second on / off valve V4 is opened. The On the other hand, since the first and second three-way valves V1 and V3 are closed, the supply gas B has a second flow control valve CV2, a second three-way valve V1, a first on / off valve V2, and a first three-way valve in the figure. V3 is supplied to the vacuum device through the third flow rate control valve CV3. As described above, by using the electromagnetic valve, the supply gas to the vacuum apparatus can be switched in a short time, and the gas in the vacuum apparatus can be exchanged.

  Such gas switching was confirmed using air as the supply gas A and a hydrogen-air mixed gas as the supply gas B in the illustrated apparatus configuration. The gas switching was confirmed by measuring the pressure in the vacuum apparatus using a diaphragm vacuum gauge and a quartz oscillator type pressure gauge capable of measuring an absolute pressure. Since the output of the quartz oscillator type pressure gauge changes depending on the viscosity and molecular weight of the gas in addition to the total pressure, the absolute pressure is measured simultaneously and the output of the quartz oscillator type pressure gauge is calibrated with the total pressure. By obtaining an output that depends on the viscosity and molecular weight of the gas, it is possible to detect changes in the gas configuration in the vacuum apparatus.

  In this gas switching, since this switching simulates hydrogen leakage into the atmosphere, the total pressure before and after the gas switching needs to be maintained at atmospheric pressure (100 kpa). Therefore, first, flow control valves CV1, CV2, and CV4 that can change the conductance of the gas path that passes through the valve, although the gas cannot be completely closed so that the total pressure becomes 100 kPa before and after the gas switching, are used. The pressure was adjusted with a vacuum device. The procedure is shown below.

  First, in a state where air (supply gas A) is flowed to the vacuum device at a flow rate of 101 sccm, the first flow control valve CV1 is adjusted to maintain the absolute pressure in the vacuum device at 100 kPa. Next, the supply gas is switched from A to B, and 147 sccm of air and 10 sccm of hydrogen are supplied as supply gas B to the vacuum apparatus by the method described above. Thereafter, the pressure is adjusted to 100 kPa using only the second flow rate control valve CV2. Thus, 100 kPa is achieved before and after the gas supply. When the total flow rate of the supply gas B is larger than the total flow rate of the supply gas A, the third flow rate control valve CV3 can be used instead of the first flow rate control valve CV1. Further, the fourth flow rate control valve CV4 connected to the bypass exhaust line is appropriately used for minimizing the pressure fluctuation accompanying the gas switching and the pressure fluctuation immediately after the switching. After the adjustment as described above, the supply gas was switched from the air to the hydrogen-air mixed gas, and gas switching by pressure measurement was confirmed.

  The obtained results are shown in FIG. Fig. 3 (a) shows the absolute pressure and crystal oscillator pressure gauge output for gas switching with respect to the time on the horizontal axis, and Fig. 3 shows the relative change in absolute pressure and the output value of the crystal oscillator pressure gauge after pressure calibration. Plotted in b), when the supply gas A and B are switched at the time of about 5 seconds on the horizontal axis, the absolute pressure changes slightly, but the value of the quartz crystal type pressure gauge calibrated is Changed more than. Since the indicated value of the pressure calibrated quartz crystal type pressure gauge has decreased, the viscosity and molecular weight of the supply gas have decreased due to this gas switching. It can be seen that This decrease in molecular weight and viscosity qualitatively coincides with the fact that the type of supply gas is switched from pure air to hydrogen mixed air. This is because the molecular weight and viscosity of hydrogen gas (molecular weight 2.02, viscosity 8.35 μ · Pa · s) are extremely small compared to air (molecular weight 28.97, viscosity 17.08 μ · Pa · s). Separately, referring to the results of the dependence of the pressure calibrated Q gauge value on the hydrogen concentration in the air shown in FIG. 4, the result of the pressure calibrated crystal oscillator pressure gauge indication value in FIG. 3B (= 0.499). From this, it can be seen that the hydrogen concentration in the air after switching the supply gas is about 45.7 vol%. Since supply of pure air, that is, a gas having a hydrogen concentration of 0 vol%, was performed before the supply gas was switched, it was shown that the supply gas was switched to the vacuum apparatus in a very short time.

  Here, considering that the absolute pressure in Fig. 3 (a) changes within the time resolution of time-resolved measurement, the actual time required for gas switching is 50 ms, which is the time resolution here. Could be too short. The time resolution of 50 ms is limited by the performance of the apparatus related to the current measurement, and has nothing to do with the original performance of gas switching. Therefore, if the measurement with faster time resolution can be performed, the faster switching speed of the gas switching method can be obtained more accurately.

  When the response time of the pressure gauge is defined as the time required to reach 90% of the amount of change until the saturation value after switching, the response time of the indicated value of the quartz oscillator type pressure gauge is several times that of the diaphragm pressure gauge. From dozens of times longer. This delay in the response time is not due to the delay in the gas switching time, considering the more rapid change in the reading value of the diaphragm pressure gauge. It is thought to do. Incidentally, the response time of the diaphragm vacuum gauge and the quartz crystal type pressure gauge used here is 16 ms or less and several hundred ms or less in terms of manufacturer's nominal values, respectively, so the results in FIG. 3 almost correspond to these nominal values. . However, although it is slow compared with the diaphragm vacuum gauge, response time measurement of about several hundred milliseconds is performed by using a high-speed gas switching method in units of milliseconds as proposed here, and at the latest several tens of milliseconds. Since the measurement can be performed for the first time, the present gas switching method is an effective method for measuring the response speed of various sensors of several hundred milliseconds or more. The limit value of the response time measurement is currently several hundred milliseconds, but this is also limited by the time resolution measurement limit of 50 milliseconds. It is possible to measure time.

  As described above, according to the present invention, it was shown that the gas can be switched within 50 ms while simultaneously controlling the pressure for the different supply flow rates before and after the gas switching. In the above example, the pressures before and after the gas switching are made equal, but it goes without saying that the pressures before and after the gas switching can be arbitrarily controlled within the limits of the supply flow rate by adjusting the flow control valve CV. An example will be shown later.

  The present invention can change the gas supply path in a short time while controlling the total pressure in the vacuum apparatus by the configuration of the valve switching system. In particular, by using the three-way valves V1 and V3, Gas switching can be performed. That is, the function of these three-way valves is, for example, a T-shaped pipe without providing any valve at this part, and an on / off valve is provided in front of the part intersecting the pipe of the on / off valve V4 in the vertical pipe. Can switch the flow path in the same way, but in that case, there is a dead space between the pipe connection part of the T-shaped pipe line and the newly installed on-off valve, and the gas supply amount is accurately controlled. In addition, it is difficult to switch the gas properly even if the residual gas existing in the dead space is supplied immediately after switching. Therefore, in the present invention, by using the three-way valve as described above, the pipe line can be switched directly at the coupling portion of the T-shaped pipe line, and appropriate switching can be performed.

For example, a combination such as in FIG. 5 (b), gas switching is possible. However , as a cause of the pressure fluctuation that may occur at the time of gas switching, the gas introduced after the switching is caused by the gas that was stopped before the switching (the thick line portions in FIGS. 5A and 5B). it is considered to be the, was constructed using a three-way valve as shown in FIG. 1 to the amount of gas had been stopped Re flow to a minimum (Figure 5 (a)).

  Next, the effect of the bypass exhaust system will be described. For example, the supply gases A and B can be switched at high speed even if a valve configuration as shown in FIG. 6 without a bypass exhaust system is used. First, the gas A before switching is supplied to the apparatus by opening V3 and closing V2 (gray line in FIG. 6). Next, when the opening and closing of V2 and V3 are electrically reversed at the same time, V2 is opened and V3 is closed, so that only gas B is supplied to the apparatus (black line in FIG. 6). However, in the configuration of FIG. 6, the gas B existing in the portion closed by V2 before switching is retained in this portion, and the pressure of the gas B in V2 is the pressure in the upstream portion, in this case the gas cylinder. This is equivalent to the secondary pressure of the connected pressure controller. If the gas is switched in this state, the pressure in the apparatus is affected by the pressure of this portion at the time of switching, and the pressure fluctuation at the time of switching cannot be controlled even if there is the flow control valve CV2. In order to reduce the pressure fluctuation at the time of switching, it is necessary to keep the flow unstopped even before the switching and to control the pressure at that time. The bypass evacuation system is used to keep the gas before switching in a flowable state before switching. This exhaust system is also effective because the gas A supplied before switching is quickly exhausted after switching.

  FIG. 7 shows the results when the pressure is different before and after switching. In this case, argon is 24 SCCM, 8 kPa before switching, and hydrogen is 50 SCCM, 10 kPa after switching. First, argon was flowed under the above conditions, and after about 7 seconds, the gas was switched to hydrogen gas. Thereafter, the flow of argon gas was returned to about 22 seconds. FIG. 7A shows the indication values of the diaphragm vacuum gauge for measuring the absolute pressure and the quartz oscillator pressure gauge sensitive to the viscosity and molecular weight of the gas to be measured. The gas switching timing is simultaneously shown in FIG. When switching from argon to hydrogen, the absolute pressure increases but the indicated value of the pressure calibrated quartz crystal manometer decreases, so the viscosity and molecular weight of the supply gas decreases due to this gas switching. That is, it can be seen that the type of the supply gas is changed and the gas switching is performed quickly. Considering that this molecular weight and viscosity decrease are larger than that of hydrogen gas (molecular weight: 2.02, viscosity: 8.35 μ · Pa · s), the molecular weight and viscosity of argon (molecular weight: 39.95, viscosity: 20.96 μ · Pa · s). This is qualitatively consistent with the supply gas type switching from argon to hydrogen.

  Compared with FIG. 3, it takes time for the absolute pressure to stabilize. This is because it takes time for the pressure to reach a new equilibrium value at the same evacuation speed setting because the pressure is different before and after gas switching. In order to control the pressure more quickly, it is necessary to change the speed of evacuation transiently or to change the degree of opening and closing on the flow path immediately after switching. In this case, the speed of pressure increase can be increased by reducing the evacuation speed or reducing the degree of opening and closing on the flow path. As described above, even when the pressure is different before and after gas switching, the control is possible, but in this case, it is necessary to transiently control the evacuation speed and the opening / closing degree on the flow path as described above.

  Further, in the above example, an example of switching between two types of gas, supply gas A and supply gas B, has been shown. For example, as shown in FIG. By connecting them in series and controlling the opening and closing of the valves of these pipe lines in the same manner as described above, it is possible to switch a large number of gases in the same manner.

  As described above, the present invention can be effectively used for apparatuses for performing various plasma treatments such as plasma deposition, and for measuring the response time of a gas sensor. It can be effectively used for the same apparatus that supplies by switching.

It is a figure which shows the typical structural example of the Example of the high-speed gas switching apparatus with a pressure regulation function by this invention. It is a figure which shows the gas switching aspect of the Example. Example of experiment of the present invention, change of diaphragm pressure gauge indicating value and crystal oscillator pressure gauge indicating value when switching pure air-hydrogen / air mixed gas (a), relative change of absolute pressure, and pressure calibrated crystal oscillator It is a figure which shows the change of a pressure gauge instruction | indication value (b). It is a graph which shows the result of the hydrogen concentration dependence in the air of the crystal oscillator pressure gauge indication value which carried out pressure calibration. It is a comparison figure of the valve composition of a gas change valve. It is a figure which shows the gas switch apparatus structure considered when a bypass exhaust system does not exist. The figure which shows the change (a) of the diaphragm pressure gauge instruction | indication value and quartz oscillator pressure gauge instruction | indication value at the time of argon-hydrogen switching, the relative change with respect to an absolute pressure, and the change (b) of the quartz oscillator pressure gauge instruction | indication value which pressure-calibrated is there. It is a figure which shows the valve | bulb block diagram used for three types of gas switching.

Claims (5)

A first three-way valve includes a first pipe that supplies the first supply gas to the vacuum device via the first flow control valve and a second pipe that supplies the second supply gas via the second flow control valve. In connection with each other, it is possible to supply either the first supply gas or the second supply gas from the first three-way valve to the vacuum device via the third flow control valve,
The pipe line between the second flow rate control valve of the second pipe line and the first three-way valve is connected to the exhaust pipe line for exhausting through the fourth flow rate control valve by the second three-way valve. A pipe branched from the first pipe is connected to a pipe between the fourth flow rate control valve and the second three-way valve in the exhaust pipe, and one of the first supply gas and the second supply gas Gas can be exhausted through the fourth flow control valve,
A first on / off valve is provided in a pipe line between the first three-way valve and the second three-way valve, and a second on / off valve is provided in a pipe line connecting the first pipe line and the exhaust pipe line;
When supplying the first supply gas, the first on-off valve and the second on-off valve are closed, and the first three-way valve and the second three-way valve are all opened.
When supplying the second supply gas, the first on-off valve and the second on-off valve are opened, and the first pipeline side of the first three-way valve and the exhaust pipeline side of the second three-way valve are closed. High-speed gas switching device with pressure adjustment function.   The high-speed gas switching device with a pressure adjusting function according to claim 1, wherein a plurality of types of supply gas are switched by connecting a plurality of high-speed gas switching devices with a pressure adjusting function in series.   2. The high-speed gas switching apparatus with a pressure adjusting function according to claim 1, wherein the high-speed gas switching apparatus with a pressure adjusting function is used in a plasma processing apparatus that performs various processes using plasma.   The high-speed gas switching device with a pressure adjusting function according to claim 1, wherein the high-speed gas switching device with a pressure adjusting function is used as a gas supply device in a response time measuring device of a gas sensor.   2. The high-speed gas switching device with a pressure regulating function according to claim 1, wherein the valve is a gas switching valve including a high-speed operation valve such as an electromagnetic valve, and includes a bypass exhaust and a pressure control mechanism.