JP2503717B2 - Magnetic head - Google Patents
Magnetic headInfo
- Publication number
- JP2503717B2 JP2503717B2 JP2092726A JP9272690A JP2503717B2 JP 2503717 B2 JP2503717 B2 JP 2503717B2 JP 2092726 A JP2092726 A JP 2092726A JP 9272690 A JP9272690 A JP 9272690A JP 2503717 B2 JP2503717 B2 JP 2503717B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic head
- thin film
- sliding surface
- magnetic
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、ビデオテープレコーダ（VTR）やフロッ
ピーディスクあるいはオーディオテープレコーダや磁気
カードリーダ等の磁気記録媒体の磁気記録，磁気記録再
生または磁気消去に使用される磁気ヘッドに関するもの
である。Description: TECHNICAL FIELD The present invention relates to magnetic recording, magnetic recording / reproduction, or magnetic erasing of a magnetic recording medium such as a video tape recorder (VTR), a floppy disk, an audio tape recorder, or a magnetic card reader. The present invention relates to a magnetic head used in.
従来の磁気ヘッドは、第２図に示すように一対のコア
11の各々の中央部にコイル13が所定数巻かれた後、ギャ
ップ12の隙間を開けた状態で固定する。そして、このコ
イル13を巻いた一対のコア11を樹脂（図示せず）でモー
ルドしている。このように構成された各々のコア11の上
面が磁気記録媒体との摺動部14となる。このコア11を形
成する材料は、パーマロイ，センダストまたはフェライ
ト等の材料が使用されている。しかし、摺動部14は磁気
記録媒体と常に摺動して使用されるために摩耗が避けら
れず、その摩耗により磁気ヘッドの寿命が短い。The conventional magnetic head has a pair of cores as shown in FIG.
After a predetermined number of turns of the coil 13 is wound around the center of each 11, the gaps 12 are fixed with the gap 12 left open. Then, the pair of cores 11 around which the coil 13 is wound are molded with resin (not shown). The upper surface of each core 11 configured as described above serves as a sliding portion 14 with respect to the magnetic recording medium. As a material forming the core 11, a material such as permalloy, sendust, or ferrite is used. However, since the sliding portion 14 is always used by sliding on the magnetic recording medium, wear is unavoidable, and the wear shortens the life of the magnetic head.
これを解決するために、特公昭55−12652号でコア11
の磁気記録媒体との摺動面14に少なくとも１種以上の金
属原子のイオンをイオン注入してこの摺動面14を硬化さ
せることにより磁気ヘッドの耐摩耗性を向上させる方法
が提案されている。また、特公昭56−01682号ではコア1
1の磁気記録媒体との摺動面14にボロン賦与材を塗布
し、加熱処理を行い摺動面14にホウ素拡散層を形成して
耐摩耗性を向上させる方法が提案されている。In order to solve this, Japanese Patent Publication No.
There has been proposed a method for improving wear resistance of a magnetic head by injecting ions of at least one kind of metal atom into the sliding surface 14 with the magnetic recording medium to cure the sliding surface 14. . Also, in Japanese Examined Japanese Patent Publication No. 56-01682, Core 1
There has been proposed a method of applying a boron-imparting material to the sliding surface 14 with the magnetic recording medium 1 and performing heat treatment to form a boron diffusion layer on the sliding surface 14 to improve wear resistance.
しかしながら、上記の前者の方法は、硬化される表面
層の厚さが薄く、耐摩耗性を飛躍的に向上させることは
難しい。また、十分な耐摩耗性を得るためにはイオン注
入時または注入後に加熱処理を行う必要があり、この加
熱処理によりコア11の磁気特性が劣化したり、各部分の
寸法精度に悪影響を及ぼすという欠点がある。また、後
者の方法は、加熱処理時間，加熱温度および冷却速度を
厳密に管理しなければ磁気特性の劣化が生じる。そのた
め工程管理が複雑になり製造コストが高くなるという欠
点がある。さらに、この方法は例えばパーマロイからな
るコアに対しては有効であるが、それ以外の材質（フェ
ライト等）からなるコアに対しては適用できない。よっ
て、いかなる材質のコアに対しても実用上十分な耐摩耗
性を付与する方法は確立されていない。However, it is difficult for the former method described above to dramatically improve the wear resistance because the surface layer to be cured is thin. Further, in order to obtain sufficient wear resistance, it is necessary to perform heat treatment during or after ion implantation, and this heat treatment deteriorates the magnetic characteristics of the core 11 or adversely affects the dimensional accuracy of each part. There are drawbacks. In the latter method, the magnetic properties are deteriorated unless the heat treatment time, heating temperature and cooling rate are strictly controlled. Therefore, there is a drawback that the process control becomes complicated and the manufacturing cost becomes high. Furthermore, this method is effective for cores made of, for example, permalloy, but cannot be applied to cores made of other materials (such as ferrite). Therefore, a method for imparting practically sufficient wear resistance to a core made of any material has not been established.
この発明の目的は、磁気ヘッドを構成する材料の寸法
精度に影響を与えたり、磁気特性が変化しないのはもち
ろんのこと、コアを構成する材質にかかわらず耐摩耗性
が向上した磁気ヘッドを提供することである。It is an object of the present invention to provide a magnetic head having improved wear resistance regardless of the material constituting the core, as well as not affecting the dimensional accuracy of the material constituting the magnetic head or changing the magnetic characteristics. It is to be.
請求項（１）記載の磁気ヘッドは、磁気記録媒体との
慴動面に窒化ホウ素含有薄膜を被覆した磁気ヘッドにお
いて、窒化ホウ素含有薄膜は、ホウ素と窒素との組成比
が、磁気記録媒体との慴動表面から磁気ヘッドのコア側
に移行するにつれて、断続的または連続的に増加してい
ることを特徴とする。The magnetic head according to claim (1) is a magnetic head in which a sliding surface of a magnetic recording medium is covered with a boron nitride-containing thin film, and the boron nitride-containing thin film has a composition ratio of boron to nitrogen of that of the magnetic recording medium. It is characterized in that it increases intermittently or continuously as it moves from the sliding surface to the core side of the magnetic head.
請求項（２）記載の磁気ヘッドは、請求項（１）記載
の磁気ヘッドにおいて、窒化ホウ素含有薄膜は、ホウ素
と窒素との組成比を、磁気記録媒体との慴動表面では１
〜８とし、磁気ヘッドのコア側では４〜20としている。A magnetic head according to a second aspect is the magnetic head according to the first aspect, in which the boron nitride-containing thin film has a composition ratio of boron and nitrogen of 1 on a sliding surface with a magnetic recording medium.
8 to 8 and 4 to 20 on the core side of the magnetic head.
窒化ホウ素（以下,BNと略す）は、結晶構造によって
立方晶系閃亜鉛鉱型窒化ホウ素（以下、ｃ−BNと略
す），六方晶系グラファイト型窒化ホウ素（以下、ｈ−
BNと略す），六方晶系ウルツ鉱型窒化ホウ素（以下、ｗ
−BNと略す）の３種類に大別できる。特に、ｃ−BNやｗ
−BNは高硬度を有し、熱的・化学的安定性に優れている
ので各種の耐摩耗性が要求される分野に応用されてい
る。Boron nitride (hereinafter, abbreviated as BN) is a cubic zinc blende type boron nitride (hereinafter, abbreviated as c-BN), hexagonal graphite type boron nitride (hereinafter, h-) depending on a crystal structure.
BN), hexagonal wurtzite boron nitride (hereinafter referred to as w
-BN). Especially, c-BN and w
-BN has high hardness and is excellent in thermal and chemical stability, so it has been applied to various fields requiring abrasion resistance.
しかし、BN薄膜は磁気ヘッドのコアとして用いられる
パーマロイ，センダストまたはフェライト等との親和性
（濡れ性）が悪いことや、これらのコアとの熱膨張係数
や格子定数の違いにより、それらの表面にBN薄膜を形成
しても、形成されるBN薄膜の内部応力が大きくなり密着
性に劣る傾向にある。さらに、BN薄膜とコアとの格子定
数の差が大きいとBN薄膜中で硬質のｃ−BNやｗ−BNの形
成が妨げられる傾向がある。However, the BN thin film has a poor affinity (wettability) with permalloy, sendust, ferrite, etc. used as the core of the magnetic head, and due to the difference in thermal expansion coefficient and lattice constant with these cores, their surface Even if a BN thin film is formed, the internal stress of the formed BN thin film tends to be large and the adhesion tends to be poor. Further, if the difference in lattice constant between the BN thin film and the core is large, the formation of hard c-BN or w-BN in the BN thin film tends to be hindered.
そこで、磁気ヘッドの磁気記録媒体との摺動面にホウ
素元素（Ｂ）を含有する物質の蒸着と窒素元素（Ｎ）を
含有する物質のイオンの照射とを組み合わせて形成され
るBN薄膜中にｃ−BNやｗ−BNを含有させ、かつ、BN薄膜
中のB/N組成比を適宜調整することにより、高硬度でコ
アと密着性に優れた磁気ヘッドを得る。Therefore, in a BN thin film formed by combining vapor deposition of a substance containing a boron element (B) and irradiation of ions of a substance containing a nitrogen element (N) on the sliding surface of a magnetic head with a magnetic recording medium. By including c-BN or w-BN and adjusting the B / N composition ratio in the BN thin film appropriately, a magnetic head having high hardness and excellent adhesion to the core is obtained.
磁気ヘッドの磁気記録媒体との摺動面に窒化ホウ素
（BN）薄膜を形成する製造装置の一例を第１図に基づい
て説明する。An example of a manufacturing apparatus for forming a boron nitride (BN) thin film on a sliding surface of a magnetic head with a magnetic recording medium will be described with reference to FIG.
従来と同様の方法で形成した磁気ヘッド２が、真空装
置内（図示せず）のホルダ１に固定されている。イオン
源５は、窒素ガスまたは窒素元素を含む化合物と不活性
ガスとの混合ガス等の窒素元素（Ｎ）を含有する物質を
イオン化した後、イオン６にして磁気ヘッド２の磁気記
録媒体との摺動面14に照射するもので、例えばカウフマ
ン型またはプラズマを閉じ込めたるためにカプス磁場を
用いたバケット型等のものが使用されるが特に限定する
ものではない。また、磁気ヘッド２の下方には電子ビー
ム，レーザ線または高周波等により高温度に加熱するこ
とのできる蒸発源３が設けられている。この蒸発源３の
中にはホウ素単体，ホウ素酸化物またはホウ素窒化物等
よりなるホウ素元素（Ｂ）を含有する蒸発物質４が入れ
られている。そして、膜厚計７とイオン電流測定器８と
が配置されている。この膜厚計７は、蒸発源３から蒸発
する蒸発物質４の粒子数や磁気ヘッド２の磁気記録媒体
との摺動面14に蒸着される膜厚を計測するものであり、
例えば水晶振動子を使用した振動型膜厚計等である。ま
た、イオン電流測定器８は、磁気ヘッド２の摺動面14に
照射されるイオン６の個数を計測するものであり、例え
ばファラデーカップのような２次電子抑制電極をもつカ
ップ型構造のものである。なお、ホルダ１は、水冷等に
より冷却されているのが望ましい。A magnetic head 2 formed by a method similar to the conventional one is fixed to a holder 1 in a vacuum device (not shown). The ion source 5 ionizes a substance containing a nitrogen element (N) such as nitrogen gas or a mixed gas of a compound containing a nitrogen element and an inert gas, and then ionizes the substance to form an ion 6 and a magnetic recording medium of the magnetic head 2. The irradiation is performed on the sliding surface 14, and for example, a Kauffman type or a bucket type using a Kaps magnetic field for confining plasma is used, but not limited thereto. Further, below the magnetic head 2 is provided an evaporation source 3 which can be heated to a high temperature by an electron beam, a laser beam, a high frequency or the like. In the evaporation source 3, an evaporation substance 4 containing a boron element (B) composed of elemental boron, boron oxide, boron nitride or the like is put. A film thickness meter 7 and an ion current measuring device 8 are arranged. The film thickness meter 7 measures the number of particles of the evaporation material 4 evaporated from the evaporation source 3 and the film thickness deposited on the sliding surface 14 of the magnetic head 2 with the magnetic recording medium.
For example, it is a vibrating film thickness meter using a crystal oscillator. The ion current measuring device 8 measures the number of the ions 6 with which the sliding surface 14 of the magnetic head 2 is irradiated, and has a cup type structure having a secondary electron suppressing electrode such as a Faraday cup. Is. The holder 1 is preferably cooled by water cooling or the like.
このような構成において、真空装置内を高真空度に維
持した後、蒸発源３からホウ素元素（Ｂ）を含有する蒸
発物質４を磁気ヘッド２の磁気記録媒体との摺動面14に
蒸着すると同時，交互または蒸着後にイオン源５から窒
素元素（Ｎ）を含有するイオン６を照射する。このと
き、磁気ヘッド２の磁気記録媒体との摺動面14に形成さ
れるBN薄膜中のホウ素と窒素との組成比（以下、B/N組
成比と略す）が、BN薄膜の磁気記録媒体との慴動表面か
ら磁気ヘッド２のコア側に移行するにつれて連続的また
は断続的に増加するように膜厚計7,電流測定器８で蒸発
物質４の蒸着量とイオン６の照射量とを測定制御しなが
ら形成する。具体的には、形成されるBN薄膜のB/N組成
比が４〜20の範囲になるように制御して磁気ヘッド２の
磁気記録媒体との摺動面14にBN薄膜を形成し始め、その
後積層されるBN薄膜のB/N組成比が連続的または断続的
に減少していくように制御し、最終的に形成されるBN薄
膜の表面のB/N組成比が１〜８になるように形成する。B
N薄膜の形成し始めでB/N組成比が４〜20の範囲を逸脱し
た場合、形成されるBN薄膜と摺動面14との間の熱膨張係
数および格子定数の差が大きくなるため、ｃ−BN,w−BN
構造の生成や密着性に悪影響を及ぼす。また、BN薄膜の
表面のB/N組成比が１〜８の範囲を逸脱した場合、形成
されるBN薄膜中に含まれるｃ−BNやｗ−BN構造の窒化ホ
ウ素の含有量が少なくなり、高硬度や化学的安定性等の
特性に悪影響を及ぼす。In such a structure, after the inside of the vacuum device is maintained at a high degree of vacuum, the evaporation material 3 containing the elemental boron (B) is evaporated from the evaporation source 3 on the sliding surface 14 of the magnetic head 2 with the magnetic recording medium. Simultaneously, alternately or after vapor deposition, ions 6 containing nitrogen element (N) are irradiated from the ion source 5. At this time, the composition ratio of boron and nitrogen in the BN thin film formed on the sliding surface 14 of the magnetic head 2 with respect to the magnetic recording medium (hereinafter referred to as B / N composition ratio) is a BN thin film magnetic recording medium. The film thickness meter 7 and the current measuring device 8 adjust the deposition amount of the vaporized substance 4 and the irradiation amount of the ions 6 so as to increase continuously or intermittently as it moves from the sliding surface to the core side of the magnetic head 2. It is formed while controlling measurement. Specifically, the B / N composition ratio of the BN thin film to be formed is controlled so as to fall within the range of 4 to 20, and the BN thin film is formed on the sliding surface 14 of the magnetic head 2 with the magnetic recording medium. The B / N composition ratio of the subsequently laminated BN thin film is controlled so as to decrease continuously or intermittently, and the B / N composition ratio of the surface of the finally formed BN thin film becomes 1 to 8. To form. B
When the B / N composition ratio deviates from the range of 4 to 20 at the beginning of formation of the N thin film, the difference in the thermal expansion coefficient and the lattice constant between the BN thin film formed and the sliding surface 14 becomes large. c-BN, w-BN
It adversely affects the formation and adhesion of the structure. Further, when the B / N composition ratio of the surface of the BN thin film deviates from the range of 1 to 8, the content of the boron nitride having the c-BN or w-BN structure contained in the formed BN thin film becomes small, It adversely affects properties such as high hardness and chemical stability.
なお、本発明は耐摩耗性を向上させた磁気ヘッドを実
現するものであるが、磁気ヘッドに耐摩耗処理を施すこ
とによって、再生出力が劣ってしまっては磁気ヘッドの
価値が無くなるので、BN薄膜を被覆しない磁気ヘッドと
比較して再生出力が−2dB内の劣化におさまるように処
理を施す必要がある。そのためには、磁気ヘッド２の各
部位の寸法精度に影響を与えないようにBN薄膜を形成し
なければならず、これは、イオン６の加速エネルギの値
を、イオン１個当たり2KeV以下に調整することにより可
能である。加速エネルギがイオン１個当たり2KeVより大
きくなると、イオン６の照射により磁気ヘッド２の各部
位の寸法精度に影響を与えたり、磁気特性に悪影響を与
え、BN薄膜を被覆しない磁気ヘッドと比較して再生出力
が−2dB以上変動し、再生出力の能力が大きく劣ってし
まうという恐れがある。Although the present invention realizes a magnetic head with improved wear resistance, the wear resistance of the magnetic head causes the magnetic head to lose its value if the reproduction output is poor. Compared to a magnetic head that does not cover the thin film, it is necessary to perform processing so that the reproduction output will be degraded within -2 dB. For that purpose, a BN thin film must be formed so as not to affect the dimensional accuracy of each part of the magnetic head 2. This is because the acceleration energy value of the ion 6 is adjusted to 2 KeV or less per ion. It is possible by When the acceleration energy is higher than 2 KeV per ion, the irradiation of the ions 6 affects the dimensional accuracy of each part of the magnetic head 2 and adversely affects the magnetic characteristics, and thus the BN thin film is not covered with the magnetic head. There is a risk that the playback output will fluctuate more than −2 dB and the playback output performance will be greatly degraded.
そして、BN薄膜の形成工程の途中でイオン６の照射エ
ネルギの値を2KeV以下の範囲で随時変更しても良い。た
とえば、摺動面14の付近では形成されるBN薄膜との密着
性を高めるために１〜2KeVの照射エネルギでイオン６を
照射して一定の膜厚のBN薄膜を形成した後、BN薄膜内部
の欠陥等を少なくするためにイオン６の照射エネルギを
1KeV以下に下げてBN薄膜をさらに積層して形成しても良
い。Then, during the process of forming the BN thin film, the value of the irradiation energy of the ions 6 may be changed within the range of 2 KeV or less at any time. For example, in order to improve the adhesion with the BN thin film formed near the sliding surface 14, the ions 6 are irradiated with an irradiation energy of 1 to 2 KeV to form a BN thin film having a constant film thickness, The irradiation energy of the ion 6 in order to reduce the defects of the
The BN thin film may be further laminated by lowering it to 1 KeV or less.
実施例１ 第２図に示すように、従来と同様の方法でパーマロイ
（78％Ni−Fe合金）からなる所定形状のコア材を積層接
着して得られたコア11にコイル13を巻いた後、正確な幅
のギャップ12を形成するためにチタン（Ti）系の合金か
らなるスペーサ（図示せず）をギャップ12を形成する位
置に挟んだ状態で一対のコア11を固定し、コア材と同じ
材料のパーマロイよりなるシールドケース（図示せず）
に収め、一対のコア11とシールドケースとの空間をエポ
キシ系の樹脂で固定する。樹脂が硬化した後、摺動面14
を研磨して磁気ヘッド２を形成した。Example 1 As shown in FIG. 2, after winding a coil 13 around a core 11 obtained by laminating and bonding a core material of a predetermined shape made of permalloy (78% Ni-Fe alloy) in the same manner as the conventional method. , A pair of cores 11 are fixed with a spacer (not shown) made of a titanium (Ti) alloy in order to form a gap 12 having an accurate width, at a position where the gap 12 is formed. Shield case made of Permalloy made of the same material (not shown)
Then, the space between the pair of cores 11 and the shield case is fixed with an epoxy resin. After the resin hardens, the sliding surface 14
Was polished to form a magnetic head 2.
そして、第１図に示すように、磁気ヘッド２の摺動面
14がイオン源５に正対するようにホルダ１に固定し、真
空装置内を２×10-6Torr以下の高真空に保持した後、ホ
ウ素（純度99％）からなる蒸発物質４を入れた蒸発源３
を電子ビームで加熱して磁気ヘッド２の摺動面14に蒸着
すると同時にバケット型のイオン源５に窒素ガス（純度
99.999％）を導入し、磁気ヘッド２の摺動面14に窒素元
素（Ｎ）のイオン６を照射した。Then, as shown in FIG. 1, the sliding surface of the magnetic head 2
14 was fixed to the holder 1 so as to face the ion source 5, the inside of the vacuum device was kept at a high vacuum of 2 × 10 −6 Torr or less, and then the evaporation substance 4 made of boron (purity 99%) was put in the evaporation device. Source 3
Is heated by an electron beam to deposit on the sliding surface 14 of the magnetic head 2 and at the same time nitrogen gas (purity
99.999%) was introduced, and the sliding surface 14 of the magnetic head 2 was irradiated with ions 6 of nitrogen element (N).
このとき、イオン６を2KeVの加速エネルギで照射し、
BN薄膜のB/N組成比の値が８になるようにして磁気ヘッ
ド２の摺動面14にBN薄膜を1000Åの厚さに成膜した。At this time, ion 6 is irradiated with an acceleration energy of 2 KeV,
A BN thin film having a thickness of 1000 Å was formed on the sliding surface 14 of the magnetic head 2 so that the B / N composition ratio of the BN thin film was 8.
さらに、イオン６の加速エネルギを2KeVのままで、形
成されるBN薄膜のB/N組成比を３に減少させて500ÅのBN
薄膜を積層して最終的に1500ÅのBN薄膜を得た。Furthermore, the B / N composition ratio of the formed BN thin film is reduced to 3 while the acceleration energy of the ions 6 remains 2 KeV and the BN of 500 Å
The thin films were laminated to finally obtain a 1500Å BN thin film.
実施例２ 実施例１と同様にして形成した磁気ヘッド２を真空装
置内のホルダ１に固定した後、実施例１と同じイオン６
および蒸発物質４を用いて磁気ヘッド２の摺動面14に蒸
発物質４の蒸着と同時にイオン６を2KeVの加速エネルギ
で照射し、BN薄膜のB/N組成比が８になるように制御し
て摺動面４に1000ÅのBN薄膜を成膜した。Example 2 After fixing the magnetic head 2 formed in the same manner as in Example 1 to the holder 1 in the vacuum device, the same ion 6 as in Example 1 was used.
Using the evaporation material 4, the sliding surface 14 of the magnetic head 2 is irradiated with ions 6 at an acceleration energy of 2 KeV at the same time as the evaporation material 4 is deposited, and the B / N composition ratio of the BN thin film is controlled to be 8. As a result, a 1000 Å BN thin film was formed on the sliding surface 4.
さらに、イオン６の加速エネルギを500eVとし、形成
されるBN薄膜のB/N組成比を２に減少するように制御し
て500ÅのBN薄膜を積層して最終的に1500ÅのBN薄膜を
得た。Furthermore, the acceleration energy of the ions 6 was set to 500 eV, and the B / N composition ratio of the BN thin film formed was controlled to be reduced to 2 to deposit a 500 Å BN thin film to finally obtain a 1500 Å BN thin film. .
比較例１ 実施例１と同時にして形成した磁気ヘッド２を真空装
置内のホルダ１に固定した後、実施例１と同じイオン６
および蒸発物質４を用いて磁気ヘッド２の摺動面14に蒸
発物質４の蒸着と同時にイオン６を10KeVの加速エネル
ギで照射し、BN薄膜のB/N組成比が２になるように制御
して摺動面14にBN薄膜を被覆して1500ÅのBN薄膜を得
た。Comparative Example 1 After fixing the magnetic head 2 formed at the same time as in Example 1 to the holder 1 in the vacuum device, the same ions 6 as in Example 1 were used.
Using the evaporation material 4, the sliding surface 14 of the magnetic head 2 is irradiated with ions 6 at an acceleration energy of 10 KeV at the same time as the evaporation material 4 is deposited, and the B / N composition ratio of the BN thin film is controlled to be 2. The sliding surface 14 was coated with a BN thin film to obtain a 1500 Å BN thin film.
比較例２ 実施例１と同様にして形成した磁気ヘッド２を真空装
置内のホルダ１に固定した後、実施例１と同じイオン６
および蒸気物質４を用いて磁気ヘッド２の摺動面14に蒸
発物質４の蒸着と同時にイオン６を500eVの加速エネル
ギで照射し、BN薄膜のB/N組成比が２になるように制御
して摺動面14にBN薄膜を被覆して1500ÅのBN薄膜を得
た。Comparative Example 2 After fixing the magnetic head 2 formed in the same manner as in Example 1 to the holder 1 in the vacuum device, the same ions 6 as in Example 1 were used.
And the vaporized substance 4 is used to irradiate the sliding surface 14 of the magnetic head 2 with the vaporized substance 4 and simultaneously irradiate the ions 6 with an acceleration energy of 500 eV to control the B / N composition ratio of the BN thin film to be 2. The sliding surface 14 was coated with a BN thin film to obtain a 1500 Å BN thin film.
比較例３ 実施例１と同様にして形成した磁気ヘッド２を真空装
置内のホルダ１に固定した後、実施例１と同じイオン６
および蒸発物質４を用いて磁気ヘッド２の摺動面14に蒸
発物質４の蒸着と同時にイオン６を10KeVの加速エネル
ギで照射し、BN薄膜のB/N組成比が８になるように制御
して摺動面14に1000ÅのBN薄膜を成膜した。Comparative Example 3 After fixing the magnetic head 2 formed in the same manner as in Example 1 to the holder 1 in the vacuum device, the same ions 6 as in Example 1 were used.
Using the evaporation material 4, the sliding surface 14 of the magnetic head 2 is irradiated with ions 6 at an acceleration energy of 10 KeV at the same time as the evaporation material 4 is vapor-deposited, and the B / N composition ratio of the BN thin film is controlled to be 8. As a result, a 1000 Å BN thin film was formed on the sliding surface 14.
さらに、イオン６の加速エネルギを500eVとし、形成
されるBN薄膜のB/N組成比を２に減少するように制御し
て500ÅのBN薄膜を積層して最終的に1500ÅのBN薄膜を
得た。Furthermore, the acceleration energy of the ions 6 was set to 500 eV, and the B / N composition ratio of the BN thin film formed was controlled to be reduced to 2 to deposit a 500 Å BN thin film to finally obtain a 1500 Å BN thin film. .
このようにして得られた各実施例および比較例の磁気
ヘッド２の磁気特性と寿命（耐摩耗性）とを測定し、そ
の結果を次表に示す。The magnetic characteristics and the life (wear resistance) of the magnetic heads 2 of the respective examples and comparative examples thus obtained were measured, and the results are shown in the following table.
なお、磁気特性の測定方法は、低域特性として周波数
315Hzにおける低域感度と、高域特性として周波数6.3KH
zの315Hzに対する出力レベル差とを測定した。また、寿
命（耐摩耗性）の測定方法は、各磁気ヘッド２の摺動面
14に磁気記録媒体（ｒ−Fe2O3製カセットテープ）をテ
ープ速度4.75cm/sec（室温30℃，湿度70％）の条件で30
0時間走行させて摺動面14の摩耗量（μｍ）を測定し
た。また、BN薄膜を被覆していない磁気ヘッド２につい
ても同様に測定し、“無処理”として下記の表に示す。In addition, the measurement method of the magnetic characteristics is the frequency characteristics as low frequency characteristics.
Low-frequency sensitivity at 315Hz and high-frequency characteristic of frequency 6.3KH
The output level difference of z with respect to 315 Hz was measured. Further, the method of measuring the life (wear resistance) is to measure the sliding surface of each magnetic head 2.
14 magnetic recording medium (r-Fe 2 O 3 cassette tape) at a tape speed of 4.75 cm / sec (room temperature 30 ° C, humidity 70%) 30
The amount of wear (μm) of the sliding surface 14 was measured after running for 0 hours. Further, the magnetic head 2 not coated with the BN thin film was also measured in the same manner, and shown in the table below as "untreated".
上記表に示すように、比較例1,3の再生出力は、無処
理のものと比べ、−2dB以上特性が変化している。した
がって、BN薄膜を被覆して耐摩耗性を向上させても、磁
気ヘッドとしての価値がなくなっている。この比較例1,
3の再生出力の劣化は、BN薄膜を被覆する際、実施例1,2
および比較例２がイオン１個当たり2KeV以下の加速エネ
ルギを用いているのに対し、比較例1,3ではイオン１個
当たり10KeVと大きい加速エネルギを用いたため、磁気
ヘッド２の樹脂の部分の寸法が変化したことによるもの
である。 As shown in the above table, the reproduction outputs of Comparative Examples 1 and 3 are changed by −2 dB or more as compared with the unprocessed output. Therefore, even if the BN thin film is coated to improve wear resistance, it is no longer worth the magnetic head. This comparative example 1,
The deterioration of the reproduction output of No. 3 was caused when the BN thin film was coated.
While Comparative Example 2 uses an acceleration energy of 2 KeV or less per ion, Comparative Examples 1 and 3 use a large acceleration energy of 10 KeV per ion, so that the size of the resin portion of the magnetic head 2 is large. Is due to the change.
また、各磁気ヘッドの寿命（耐摩耗性）の測定結果
は、無処理の磁気ヘッドが25μm,比較例２の磁気ヘッド
が13μｍの摩耗量であったのに対し、実施例1,2の磁気
ヘッドは摩耗量が０μｍと摩耗が認められなかった。The results of measuring the life (wear resistance) of each magnetic head showed that the untreated magnetic head had a wear amount of 25 μm and the magnetic head of Comparative Example 2 had a wear amount of 13 μm. The amount of wear of the head was 0 μm, and no wear was recognized.
請求項（１）記載の磁気ヘッドは、磁気記録媒体との
慴動面にBN薄膜を被覆した磁気ヘッドにおいて、BN薄膜
のB/N組成比が、磁気記録媒体との慴動表面から磁気ヘ
ッドのコア側に移行するにつれて、断続的または連続的
に増加しているため、BN薄膜がコアとの密着性に優れ、
かつｃ−BNやｗ−BNといった硬質のBNを薄膜中に含有
し、BN薄膜が高硬度で化学的安定性に優れ、コアの慴動
面の耐摩耗性を向上することができる。The magnetic head according to claim 1, wherein the sliding surface of the magnetic recording medium is covered with a BN thin film, and the B / N composition ratio of the BN thin film is from the sliding surface of the magnetic recording medium to the magnetic head. Since it increases intermittently or continuously as it moves to the core side of, the BN thin film has excellent adhesion to the core,
In addition, hard BN such as c-BN or w-BN is contained in the thin film, the BN thin film has high hardness and excellent chemical stability, and the wear resistance of the sliding surface of the core can be improved.
請求項（２）記載の磁気ヘッドは、請求項（１）記載
の磁気ヘッドにおいて、BN薄膜のB/N組成比を、磁気記
録媒体との慴動表面では１〜８とすることにより、BN薄
膜中のｃ−BNやｗ−BNといった硬質のBNの含有量が少な
くなるのを防ぎ、さらに、磁気ヘッドのコア側では４〜
20とすることにより、BN薄膜とコアとの間の熱膨張係数
および格子定数の不一致によって生じるBN薄膜の密着性
の劣化やｃ−BN,w−BNの生成の妨げを防ぐことができ、
その結果、コアとの密着性が良く硬質なBN薄膜を被覆で
き、コアの慴動面の耐摩耗性を向上する。The magnetic head according to claim (2) is the magnetic head according to claim (1), in which the B / N composition ratio of the BN thin film is 1 to 8 on the sliding surface with the magnetic recording medium. It prevents the content of hard BN such as c-BN and w-BN in the thin film from decreasing, and it is 4 to 4 on the core side of the magnetic head.
By setting to 20, it is possible to prevent the deterioration of the adhesion of the BN thin film and the hindrance of the formation of c-BN, w-BN caused by the mismatch of the thermal expansion coefficient and the lattice constant between the BN thin film and the core,
As a result, a hard BN thin film with good adhesion to the core can be coated and wear resistance of the sliding surface of the core can be improved.
第１図はこの発明の実施例の磁気ヘッドの製造装置の概
略図、第２図は磁気ヘッドの構造の概略側面図である。 ２……磁気ヘッド、３……蒸発源、４……蒸発物質、５
……イオン源、６……イオン、11……コア、14……摺動
面FIG. 1 is a schematic view of a magnetic head manufacturing apparatus according to an embodiment of the present invention, and FIG. 2 is a schematic side view of the structure of the magnetic head. 2 ... magnetic head, 3 ... evaporation source, 4 ... evaporation material, 5
…… Ion source, 6 …… Ion, 11 …… Core, 14 …… Sliding surface
フロントページの続き (72)発明者 桑原 創 京都府京都市右京区梅津高畝町47番地 日新電機株式会社内 (56)参考文献 特開 昭62−209709（ＪＰ，Ａ)Front page continued (72) Inventor So Kuwahara 47 Umezu Takaunecho, Ukyo-ku, Kyoto City, Nissin Electric Co., Ltd. (56) Reference JP-A-62-209709 (JP, A)
Claims (2)
薄膜を被覆した磁気ヘッドにおいて、 前記窒化ホウ素含有薄膜は、ホウ素と窒素との組成比
が、前記磁気記録媒体との慴動表面から磁気ヘッドのコ
ア側に移行するにつれて、断続的または連続的に増加し
ていることを特徴とする磁気ヘッド。1. A magnetic head comprising a boron nitride-containing thin film coated on a sliding surface of a magnetic recording medium, wherein the boron nitride-containing thin film has a composition ratio of boron to nitrogen of the sliding surface of the magnetic recording medium. From the magnetic head to the core side of the magnetic head, the magnetic head is characterized by increasing intermittently or continuously.
組成比を、磁気記録媒体との慴動表面では１〜８とし、
磁気ヘッドのコア側では４〜20とした請求項（１）記載
の磁気ヘッド。2. The boron nitride-containing thin film has a composition ratio of boron to nitrogen of 1 to 8 on a sliding surface with a magnetic recording medium,
The magnetic head according to claim 1, wherein the core side of the magnetic head is 4 to 20.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2092726A JP2503717B2 (en) | 1990-04-06 | 1990-04-06 | Magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2092726A JP2503717B2 (en) | 1990-04-06 | 1990-04-06 | Magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03290808A JPH03290808A (en) | 1991-12-20 |
| JP2503717B2 true JP2503717B2 (en) | 1996-06-05 |
Family
ID=14062441
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2092726A Expired - Fee Related JP2503717B2 (en) | 1990-04-06 | 1990-04-06 | Magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2503717B2 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6440880B2 (en) | 1993-10-29 | 2002-08-27 | 3M Innovative Properties Company | Pressure-sensitive adhesives having microstructured surfaces |
| US6524675B1 (en) | 1999-05-13 | 2003-02-25 | 3M Innovative Properties Company | Adhesive-back articles |
| US6656567B1 (en) | 1999-04-30 | 2003-12-02 | 3M Innovative Properties Company | Adhesive sheet and adhesive sheet applied structure |
| US6911243B2 (en) | 1996-12-31 | 2005-06-28 | 3M Innovative Properties Company | Adhesives having a microreplicated topography and methods of making and using same |
| US7799157B2 (en) | 2004-03-08 | 2010-09-21 | Lintec Corporation | Pressure-sensitive adhesive sheet and method of manufacturing the same |
| US7867601B2 (en) | 2004-07-20 | 2011-01-11 | Nitto Denko Corporation | Pressure-sensitive adhesive tape |
| US7897226B2 (en) | 2004-04-16 | 2011-03-01 | Riken Technos Corporation | Adhesive sheet and a release liner |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06101095B2 (en) * | 1986-03-11 | 1994-12-12 | 株式会社東芝 | Magnetic head |
-
1990
- 1990-04-06 JP JP2092726A patent/JP2503717B2/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6440880B2 (en) | 1993-10-29 | 2002-08-27 | 3M Innovative Properties Company | Pressure-sensitive adhesives having microstructured surfaces |
| US6911243B2 (en) | 1996-12-31 | 2005-06-28 | 3M Innovative Properties Company | Adhesives having a microreplicated topography and methods of making and using same |
| US6656567B1 (en) | 1999-04-30 | 2003-12-02 | 3M Innovative Properties Company | Adhesive sheet and adhesive sheet applied structure |
| US6524675B1 (en) | 1999-05-13 | 2003-02-25 | 3M Innovative Properties Company | Adhesive-back articles |
| US7799157B2 (en) | 2004-03-08 | 2010-09-21 | Lintec Corporation | Pressure-sensitive adhesive sheet and method of manufacturing the same |
| US7897226B2 (en) | 2004-04-16 | 2011-03-01 | Riken Technos Corporation | Adhesive sheet and a release liner |
| US7867601B2 (en) | 2004-07-20 | 2011-01-11 | Nitto Denko Corporation | Pressure-sensitive adhesive tape |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03290808A (en) | 1991-12-20 |
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