JP2024541191A5 - - Google Patents

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Publication number
JP2024541191A5
JP2024541191A5 JP2024521776A JP2024521776A JP2024541191A5 JP 2024541191 A5 JP2024541191 A5 JP 2024541191A5 JP 2024521776 A JP2024521776 A JP 2024521776A JP 2024521776 A JP2024521776 A JP 2024521776A JP 2024541191 A5 JP2024541191 A5 JP 2024541191A5
Authority
JP
Japan
Prior art keywords
group
negative photoresist
photoresist composition
composition
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024521776A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024541191A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2022/039032 external-priority patent/WO2023064023A1/en
Publication of JP2024541191A publication Critical patent/JP2024541191A/ja
Publication of JP2024541191A5 publication Critical patent/JP2024541191A5/ja
Pending legal-status Critical Current

Links

JP2024521776A 2021-10-15 2022-08-01 高屈折率フォトレジスト組成物 Pending JP2024541191A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163255974P 2021-10-15 2021-10-15
US63/255,974 2021-10-15
PCT/US2022/039032 WO2023064023A1 (en) 2021-10-15 2022-08-01 High refractive index photoresist composition

Publications (2)

Publication Number Publication Date
JP2024541191A JP2024541191A (ja) 2024-11-08
JP2024541191A5 true JP2024541191A5 (enExample) 2025-08-06

Family

ID=83049938

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024521776A Pending JP2024541191A (ja) 2021-10-15 2022-08-01 高屈折率フォトレジスト組成物

Country Status (7)

Country Link
US (1) US20240337943A1 (enExample)
EP (1) EP4416553A1 (enExample)
JP (1) JP2024541191A (enExample)
KR (1) KR20240093557A (enExample)
CN (1) CN118103773A (enExample)
TW (1) TW202334286A (enExample)
WO (1) WO2023064023A1 (enExample)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6858370B2 (en) 2001-02-23 2005-02-22 Fuji Photo Film Co., Ltd. Positive photosensitive composition
US7756384B2 (en) 2004-11-08 2010-07-13 Dow Corning Corporation Method for forming anti-reflective coating
KR101293937B1 (ko) * 2006-06-28 2013-08-09 다우 코닝 코포레이션 전자 유인성 관능 그룹을 갖는 염기 첨가제를 함유한 실세스퀴옥산 수지 시스템
KR102858984B1 (ko) * 2016-02-19 2025-09-12 다우 실리콘즈 코포레이션 에이징된 중합체 실세스퀴옥산
WO2017192345A1 (en) 2016-05-03 2017-11-09 Dow Corning Corporation Silsesquioxane resin and oxaamine composition
KR102395936B1 (ko) * 2016-06-16 2022-05-11 다우 실리콘즈 코포레이션 규소-풍부 실세스퀴옥산 수지
TWI742160B (zh) * 2016-09-30 2021-10-11 美商道康寧公司 橋接聚矽氧樹脂、膜、電子裝置及相關方法
JP7234631B2 (ja) * 2017-03-29 2023-03-08 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び有機ｅｌディスプレイ、並びにその製造方法

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