JP2024527246A5 - - Google Patents
Info
- Publication number
- JP2024527246A5 JP2024527246A5 JP2023575951A JP2023575951A JP2024527246A5 JP 2024527246 A5 JP2024527246 A5 JP 2024527246A5 JP 2023575951 A JP2023575951 A JP 2023575951A JP 2023575951 A JP2023575951 A JP 2023575951A JP 2024527246 A5 JP2024527246 A5 JP 2024527246A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- organic
- steps include
- depositing
- inorganic transfer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163217776P | 2021-07-02 | 2021-07-02 | |
| US63/217,776 | 2021-07-02 | ||
| PCT/CA2022/051053 WO2023272400A1 (en) | 2021-07-02 | 2022-06-30 | Trilayer photoresist system and method for patterning organic devices |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2024527246A JP2024527246A (ja) | 2024-07-24 |
| JP2024527246A5 true JP2024527246A5 (enExample) | 2025-07-02 |
| JP7790752B2 JP7790752B2 (ja) | 2025-12-23 |
Family
ID=84689780
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023575951A Active JP7790752B2 (ja) | 2021-07-02 | 2022-06-30 | 有機デバイスをパターニングするための三層感光システム及び方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12310165B2 (enExample) |
| JP (1) | JP7790752B2 (enExample) |
| KR (1) | KR102962880B1 (enExample) |
| CN (1) | CN117917209A (enExample) |
| CA (1) | CA3222923A1 (enExample) |
| WO (1) | WO2023272400A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2026072534A1 (en) * | 2024-09-24 | 2026-04-02 | Nani Lithography Inc. | Lithography mask methods and composition |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4732841A (en) | 1986-03-24 | 1988-03-22 | Fairchild Semiconductor Corporation | Tri-level resist process for fine resolution photolithography |
| TW439118B (en) | 2000-02-10 | 2001-06-07 | Winbond Electronics Corp | Multilayer thin photoresist process |
| US7435671B2 (en) | 2006-08-18 | 2008-10-14 | International Business Machines Corporation | Trilayer resist scheme for gate etching applications |
| JP5477547B2 (ja) | 2009-06-22 | 2014-04-23 | ソニー株式会社 | 薄膜トランジスタの製造方法 |
| US9899636B2 (en) | 2014-08-01 | 2018-02-20 | Orthogonal, Inc. | Photolithographic patterning of organic electronic devices |
| JP6712188B2 (ja) | 2015-07-13 | 2020-06-17 | 信越化学工業株式会社 | レジスト下層膜形成用組成物及びこれを用いたパターン形成方法 |
| US10243175B2 (en) | 2016-02-02 | 2019-03-26 | Samsung Display Co., Ltd. | Organic light-emitting apparatus fabricated using a fluoropolymer and method of manufacturing the same |
| KR102490889B1 (ko) | 2016-02-29 | 2023-01-25 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법 |
| KR102602193B1 (ko) | 2016-08-12 | 2023-11-15 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법 |
| KR102775869B1 (ko) * | 2017-01-03 | 2025-03-05 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법 |
| US10049876B1 (en) | 2017-02-13 | 2018-08-14 | International Business Machines Corporation | Removal of trilayer resist without damage to underlying structure |
| KR102278608B1 (ko) * | 2017-03-10 | 2021-07-19 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법 |
| CN107863451B (zh) | 2017-10-30 | 2019-06-25 | 武汉华星光电技术有限公司 | 一种oled阳极的制备方法及oled显示装置的制备方法 |
| KR102421575B1 (ko) | 2017-12-01 | 2022-07-18 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법 |
| KR102614588B1 (ko) * | 2018-08-20 | 2023-12-18 | 삼성디스플레이 주식회사 | 표시 장치의 제조 방법 |
| US20200243791A1 (en) | 2019-01-24 | 2020-07-30 | Avalon Holographics Inc. | Capping layer process with low temperature photoresist patterning |
-
2022
- 2022-06-30 KR KR1020247004118A patent/KR102962880B1/ko active Active
- 2022-06-30 WO PCT/CA2022/051053 patent/WO2023272400A1/en not_active Ceased
- 2022-06-30 CA CA3222923A patent/CA3222923A1/en active Pending
- 2022-06-30 JP JP2023575951A patent/JP7790752B2/ja active Active
- 2022-06-30 CN CN202280047383.0A patent/CN117917209A/zh active Pending
- 2022-06-30 US US17/810,240 patent/US12310165B2/en active Active
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