JP2024524956A - マウント装置、リソグラフィ装置、及びマウント装置を製造する方法 - Google Patents

マウント装置、リソグラフィ装置、及びマウント装置を製造する方法 Download PDF

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Publication number
JP2024524956A
JP2024524956A JP2023578118A JP2023578118A JP2024524956A JP 2024524956 A JP2024524956 A JP 2024524956A JP 2023578118 A JP2023578118 A JP 2023578118A JP 2023578118 A JP2023578118 A JP 2023578118A JP 2024524956 A JP2024524956 A JP 2024524956A
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JP
Japan
Prior art keywords
component
adhesive
spherical portion
groove
adhesive surface
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Pending
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JP2023578118A
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English (en)
Japanese (ja)
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JP2024524956A5 (https=
Inventor
ラドハクリシュナ ラオ
グロリアン ロビン
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2024524956A publication Critical patent/JP2024524956A/ja
Publication of JP2024524956A5 publication Critical patent/JP2024524956A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/025—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using glue
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2023578118A 2021-06-24 2022-05-30 マウント装置、リソグラフィ装置、及びマウント装置を製造する方法 Pending JP2024524956A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102021206515.5 2021-06-24
DE102021206515.5A DE102021206515B4 (de) 2021-06-24 2021-06-24 Lagerungssystem, lithographieanlage und verfahren zum herstellen eines lagerungssystems
PCT/EP2022/064618 WO2022268445A1 (de) 2021-06-24 2022-05-30 Lagerungssystem, lithographieanlage und verfahren zum herstellen eines lagerungssystems

Publications (2)

Publication Number Publication Date
JP2024524956A true JP2024524956A (ja) 2024-07-09
JP2024524956A5 JP2024524956A5 (https=) 2025-06-06

Family

ID=82258521

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023578118A Pending JP2024524956A (ja) 2021-06-24 2022-05-30 マウント装置、リソグラフィ装置、及びマウント装置を製造する方法

Country Status (5)

Country Link
US (1) US20240126184A1 (https=)
JP (1) JP2024524956A (https=)
CN (1) CN117546094A (https=)
DE (1) DE102021206515B4 (https=)
WO (1) WO2022268445A1 (https=)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02304511A (ja) * 1989-05-19 1990-12-18 Olympus Optical Co Ltd レンズの保持装置
DE102004038093A1 (de) * 2004-05-28 2005-12-22 Osram Opto Semiconductors Gmbh Anordnung eines mikrooptischen Bauelements auf einem Substrat, Verfahren zur Justierung der Anordnung und optisches System mit der Anordnung
DE102006038634A1 (de) * 2006-08-17 2008-02-21 Carl Zeiss Smt Ag Halteeinrichtung für ein optisches Element mit Stützkraftausgleich
EP2599171B1 (de) * 2010-07-29 2019-12-04 JENOPTIK Optical Systems GmbH Fixieren eines in zwei raumrichtungen justierbaren optikhalters mit einem schrumpfenden kleber
DE102014215105A1 (de) * 2014-07-31 2016-02-04 Forschungsverbund Berlin E.V. Optische Vorrichtung umfassend eine Mikrooptik und einen Halter und Verfahren zur Herstellung einer optischen Vorrichtung
DE102018218162A1 (de) * 2018-10-24 2018-12-13 Carl Zeiss Smt Gmbh Optische Anordnung, insbesondere für ein EUV-Lithographiesystem
DE102019203838A1 (de) * 2019-03-20 2020-09-24 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem optischen Element mit Sensorreferenz und Verfahren zur Ausrichtung der Sensorreferenz

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Publication number Publication date
DE102021206515B4 (de) 2025-08-14
US20240126184A1 (en) 2024-04-18
WO2022268445A1 (de) 2022-12-29
CN117546094A (zh) 2024-02-09
DE102021206515A1 (de) 2022-12-29

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