CN117546094A - 承载系统、光刻系统和制造承载系统的方法 - Google Patents

承载系统、光刻系统和制造承载系统的方法 Download PDF

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Publication number
CN117546094A
CN117546094A CN202280043996.7A CN202280043996A CN117546094A CN 117546094 A CN117546094 A CN 117546094A CN 202280043996 A CN202280043996 A CN 202280043996A CN 117546094 A CN117546094 A CN 117546094A
Authority
CN
China
Prior art keywords
adhesive
spherical
mounting system
component
spherical portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280043996.7A
Other languages
English (en)
Chinese (zh)
Inventor
R·拉奥
R·格洛里安
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of CN117546094A publication Critical patent/CN117546094A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/025—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using glue
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
CN202280043996.7A 2021-06-24 2022-05-30 承载系统、光刻系统和制造承载系统的方法 Pending CN117546094A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102021206515.5 2021-06-24
DE102021206515.5A DE102021206515B4 (de) 2021-06-24 2021-06-24 Lagerungssystem, lithographieanlage und verfahren zum herstellen eines lagerungssystems
PCT/EP2022/064618 WO2022268445A1 (de) 2021-06-24 2022-05-30 Lagerungssystem, lithographieanlage und verfahren zum herstellen eines lagerungssystems

Publications (1)

Publication Number Publication Date
CN117546094A true CN117546094A (zh) 2024-02-09

Family

ID=82258521

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280043996.7A Pending CN117546094A (zh) 2021-06-24 2022-05-30 承载系统、光刻系统和制造承载系统的方法

Country Status (5)

Country Link
US (1) US20240126184A1 (https=)
JP (1) JP2024524956A (https=)
CN (1) CN117546094A (https=)
DE (1) DE102021206515B4 (https=)
WO (1) WO2022268445A1 (https=)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02304511A (ja) * 1989-05-19 1990-12-18 Olympus Optical Co Ltd レンズの保持装置
DE102004038093A1 (de) * 2004-05-28 2005-12-22 Osram Opto Semiconductors Gmbh Anordnung eines mikrooptischen Bauelements auf einem Substrat, Verfahren zur Justierung der Anordnung und optisches System mit der Anordnung
DE102006038634A1 (de) * 2006-08-17 2008-02-21 Carl Zeiss Smt Ag Halteeinrichtung für ein optisches Element mit Stützkraftausgleich
EP2599171B1 (de) * 2010-07-29 2019-12-04 JENOPTIK Optical Systems GmbH Fixieren eines in zwei raumrichtungen justierbaren optikhalters mit einem schrumpfenden kleber
DE102014215105A1 (de) * 2014-07-31 2016-02-04 Forschungsverbund Berlin E.V. Optische Vorrichtung umfassend eine Mikrooptik und einen Halter und Verfahren zur Herstellung einer optischen Vorrichtung
DE102018218162A1 (de) * 2018-10-24 2018-12-13 Carl Zeiss Smt Gmbh Optische Anordnung, insbesondere für ein EUV-Lithographiesystem
DE102019203838A1 (de) * 2019-03-20 2020-09-24 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem optischen Element mit Sensorreferenz und Verfahren zur Ausrichtung der Sensorreferenz

Also Published As

Publication number Publication date
DE102021206515B4 (de) 2025-08-14
US20240126184A1 (en) 2024-04-18
WO2022268445A1 (de) 2022-12-29
JP2024524956A (ja) 2024-07-09
DE102021206515A1 (de) 2022-12-29

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