JP2024507957A - サーキットボード及び／又は基板製造からのエッチング廃棄溶媒を処理する方法 - Google Patents
サーキットボード及び／又は基板製造からのエッチング廃棄溶媒を処理する方法 Download PDFInfo
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- JP2024507957A JP2024507957A JP2023552070A JP2023552070A JP2024507957A JP 2024507957 A JP2024507957 A JP 2024507957A JP 2023552070 A JP2023552070 A JP 2023552070A JP 2023552070 A JP2023552070 A JP 2023552070A JP 2024507957 A JP2024507957 A JP 2024507957A
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- metal
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- ion exchange
- salt
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/22—Regeneration of process solutions by ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B15/00—Obtaining copper
- C22B15/0063—Hydrometallurgy
- C22B15/0084—Treating solutions
- C22B15/0089—Treating solutions by chemical methods
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
- C22B3/20—Treatment or purification of solutions, e.g. obtained by leaching
- C22B3/42—Treatment or purification of solutions, e.g. obtained by leaching by ion-exchange extraction
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B7/00—Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
- C22B7/006—Wet processes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/20—Regeneration of process solutions of rinse-solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP21160272.7 | 2021-03-02 | ||
| EP21160272.7A EP3875643A3 (en) | 2020-03-04 | 2021-03-02 | A method of processing an etching waste medium from circuit board and/or substrate manufacture |
| PCT/EP2022/055095 WO2022184688A1 (en) | 2021-03-02 | 2022-03-01 | A method of processing an etching waste medium from circuit board and/or substrate manufacture |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2024507957A true JP2024507957A (ja) | 2024-02-21 |
Family
ID=80685034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023552070A Pending JP2024507957A (ja) | 2021-03-02 | 2022-03-01 | サーキットボード及び／又は基板製造からのエッチング廃棄溶媒を処理する方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2024507957A (zh) |
| CN (1) | CN117043395A (zh) |
| TW (1) | TWI823276B (zh) |
| WO (1) | WO2022184688A1 (zh) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51137604A (en) * | 1975-05-24 | 1976-11-27 | Nippon Filter Kk | Process for recovery of heavy metals |
| DE4016732A1 (de) * | 1990-05-24 | 1991-12-05 | Guetling Gmbh | Verfahren und vorrichtung zur abtrennung von kupfer, insbesondere aus cuc1(pfeil abwaerts)2(pfeil abwaerts)-aetzloesungen |
| IT1261515B (it) * | 1993-08-13 | 1996-05-23 | In Tec Italia Int Env Tech Srl | Procedimento per il recupero delle soluzioni di incisione dei metalli spente. |
| DE4435232C2 (de) * | 1994-10-04 | 1997-09-25 | Hahnewald Gmbh Chemisch Physik | Verfahren zur Regenerierung von flußsäurehaltigen Beizlösungen |
| DE19850530A1 (de) * | 1998-11-03 | 2000-05-25 | Eilenburger Elektrolyse & Umwelttechnik Gmbh | Kreislaufverfahren zum Beizen von Kupfer und Kupferlegierungen |
| SI2268852T1 (sl) * | 2008-04-11 | 2019-09-30 | Electrochem Technologies & Materials Inc. | Elektrokemični postopek za pridobivanje vrednosti kovinskega železa in žveplove kisline iz sulfatnega odpada, bogatega z železom, ostankov pri rudarjenju ali dekapirnih raztopin |
| SA112330516B1 (ar) * | 2011-05-19 | 2016-02-22 | كاليرا كوربوريشن | انظمة وطرق هيدروكسيد كهروكيميائية مستخدمة لأكسدة المعدن |
| WO2013080326A1 (ja) * | 2011-11-30 | 2013-06-06 | 不二商事株式会社 | めっき液の再生方法 |
-
2022
- 2022-03-01 TW TW111107427A patent/TWI823276B/zh active
- 2022-03-01 JP JP2023552070A patent/JP2024507957A/ja active Pending
- 2022-03-01 WO PCT/EP2022/055095 patent/WO2022184688A1/en active Application Filing
- 2022-03-01 CN CN202280017930.0A patent/CN117043395A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022184688A1 (en) | 2022-09-09 |
| TW202244009A (zh) | 2022-11-16 |
| TWI823276B (zh) | 2023-11-21 |
| CN117043395A (zh) | 2023-11-10 |
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