JP2024506276A5 - - Google Patents

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Publication number
JP2024506276A5
JP2024506276A5 JP2023546241A JP2023546241A JP2024506276A5 JP 2024506276 A5 JP2024506276 A5 JP 2024506276A5 JP 2023546241 A JP2023546241 A JP 2023546241A JP 2023546241 A JP2023546241 A JP 2023546241A JP 2024506276 A5 JP2024506276 A5 JP 2024506276A5
Authority
JP
Japan
Prior art keywords
fumed silica
silica powder
siooh
measured
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023546241A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024506276A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2022/051095 external-priority patent/WO2022171406A1/en
Publication of JP2024506276A publication Critical patent/JP2024506276A/ja
Publication of JP2024506276A5 publication Critical patent/JP2024506276A5/ja
Pending legal-status Critical Current

Links

JP2023546241A 2021-02-11 2022-01-19 シラノール基密度が低減されたヒュームドシリカ粉末 Pending JP2024506276A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP21156545.2 2021-02-11
EP21156545 2021-02-11
PCT/EP2022/051095 WO2022171406A1 (en) 2021-02-11 2022-01-19 Fumed silica powder with reduced silanol group density

Publications (2)

Publication Number Publication Date
JP2024506276A JP2024506276A (ja) 2024-02-13
JP2024506276A5 true JP2024506276A5 (https=) 2025-01-15

Family

ID=74591845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023546241A Pending JP2024506276A (ja) 2021-02-11 2022-01-19 シラノール基密度が低減されたヒュームドシリカ粉末

Country Status (7)

Country Link
US (1) US20240116764A1 (https=)
EP (1) EP4291528A1 (https=)
JP (1) JP2024506276A (https=)
KR (1) KR20230142833A (https=)
CN (1) CN116888073A (https=)
TW (1) TW202244002A (https=)
WO (1) WO2022171406A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230016051A (ko) 2020-05-25 2023-01-31 에보니크 오퍼레이션즈 게엠베하 열 처리를 위한 실리카 과립
EP4382575A1 (en) * 2022-12-06 2024-06-12 Evonik Operations GmbH Milled silica and liquid radiation curable compositions comprising same
KR20240159752A (ko) * 2023-04-28 2024-11-06 오씨아이 주식회사 고분산 흄드 실리카 및 이의 제조방법
TW202513640A (zh) * 2023-09-26 2025-04-01 日商納美仕股份有限公司 樹脂組成物、硬化物及光纖陣列

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2866716A (en) 1955-10-18 1958-12-30 Du Pont Process for modifying the surface of a silica substrate having a reactive silanol surface
DE1767226C3 (de) 1968-04-13 1978-11-02 Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt Hochdisperses, absolut trockenes, auf pyrogenem Wege hergestelltes Siliciumdioxid
JPS4912480B1 (https=) * 1969-10-15 1974-03-25
FR2075083A5 (https=) * 1970-01-31 1971-10-08 Degussa
DE2123233C3 (de) 1971-05-11 1977-10-13 Degussa Feinteiliges grossoberflaechiges siliciumdioxid
DE2240014C3 (de) 1972-08-14 1981-04-16 Degussa Ag, 6000 Frankfurt Verfahren zur Hydrophobierung von hochdispersen Oxiden
JPS61136909A (ja) 1984-12-04 1986-06-24 Mitsubishi Chem Ind Ltd 無水ケイ酸の水分散液組成物
PT725037E (pt) 1995-02-04 2001-07-31 Degussa Granulados a base de dioxido de silicio preparado pirogenicamente processo para a sua preparacao e sua utilizacao
DE10260323A1 (de) 2002-12-20 2004-07-08 Wacker-Chemie Gmbh Wasserbenetzbare silylierte Metalloxide
DE10342827A1 (de) 2003-08-20 2005-03-17 Degussa Ag Reinigung feinverteilter, pyrogen hergestellter Metalloxidpartikel
DE102006024590A1 (de) 2006-05-26 2007-11-29 Degussa Gmbh Hydrophile Kieselsäure für Dichtungsmassen
DE102006054156A1 (de) 2006-11-16 2008-05-21 Wacker Chemie Ag Pyrogene Kieselsäure hergestellt in einer Produktions-Anlage mit großer Kapazität
EP2014622B1 (de) 2007-07-06 2017-01-18 Evonik Degussa GmbH Verfahren zur Herstellung eines Kieselglasgranulats
EP2145929B1 (de) * 2008-07-18 2020-06-24 Evonik Operations GmbH Verfahren zur Herstellung redispergierbarer, oberflächenmodifizierter Siliciumdioxidpartikel
KR101431932B1 (ko) 2009-12-26 2014-08-19 에보니크 데구사 게엠베하 수분 함유 분말 조성물
JP2014055072A (ja) 2012-09-11 2014-03-27 Nippon Aerosil Co Ltd 非晶質酸化珪素焼結体の製造方法及びこの方法により製造された非晶質酸化珪素焼結体
JP6278979B2 (ja) 2014-02-10 2018-02-14 株式会社日本触媒 シリカ粒子、その粒子を含む樹脂組成物、ならびに、その用途
KR101723994B1 (ko) 2014-02-21 2017-04-06 주식회사 포스코 분리막, 분리막의 제조 방법, 이를 포함하는 리튬 폴리머 이차 전지, 및 이를 이용한 리튬 폴리머 이차 전지의 제조 방법
JP6393177B2 (ja) * 2014-12-10 2018-09-19 東ソー・シリカ株式会社 疎水性シリカ及びその製造方法

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