JP2024506276A - シラノール基密度が低減されたヒュームドシリカ粉末 - Google Patents

シラノール基密度が低減されたヒュームドシリカ粉末 Download PDF

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Publication number
JP2024506276A
JP2024506276A JP2023546241A JP2023546241A JP2024506276A JP 2024506276 A JP2024506276 A JP 2024506276A JP 2023546241 A JP2023546241 A JP 2023546241A JP 2023546241 A JP2023546241 A JP 2023546241A JP 2024506276 A JP2024506276 A JP 2024506276A
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JP
Japan
Prior art keywords
fumed silica
silica powder
less
silica
sioh
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023546241A
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English (en)
Japanese (ja)
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JP2024506276A5 (https=
Inventor
ギエッセラー マレイケ
マンゼル フランク
ライジン アレクサンダー
ゴルチェルト ライネル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Evonik Operations GmbH
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Filing date
Publication date
Application filed by Evonik Operations GmbH filed Critical Evonik Operations GmbH
Publication of JP2024506276A publication Critical patent/JP2024506276A/ja
Publication of JP2024506276A5 publication Critical patent/JP2024506276A5/ja
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3009—Physical treatment, e.g. grinding; treatment with ultrasonic vibrations
    • C09C1/3027—Drying, calcination
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3081—Treatment with organo-silicon compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/309—Combinations of treatments provided for in groups C09C1/3009 - C09C1/3081
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/12—Treatment with organosilicon compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/51—Particles with a specific particle size distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/11—Powder tap density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • C01P2006/82—Compositional purity water content
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
JP2023546241A 2021-02-11 2022-01-19 シラノール基密度が低減されたヒュームドシリカ粉末 Pending JP2024506276A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP21156545.2 2021-02-11
EP21156545 2021-02-11
PCT/EP2022/051095 WO2022171406A1 (en) 2021-02-11 2022-01-19 Fumed silica powder with reduced silanol group density

Publications (2)

Publication Number Publication Date
JP2024506276A true JP2024506276A (ja) 2024-02-13
JP2024506276A5 JP2024506276A5 (https=) 2025-01-15

Family

ID=74591845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023546241A Pending JP2024506276A (ja) 2021-02-11 2022-01-19 シラノール基密度が低減されたヒュームドシリカ粉末

Country Status (7)

Country Link
US (1) US20240116764A1 (https=)
EP (1) EP4291528A1 (https=)
JP (1) JP2024506276A (https=)
KR (1) KR20230142833A (https=)
CN (1) CN116888073A (https=)
TW (1) TW202244002A (https=)
WO (1) WO2022171406A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025070440A1 (ja) * 2023-09-26 2025-04-03 ナミックス株式会社 樹脂組成物、硬化物及び光ファイバアレイ

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230016051A (ko) 2020-05-25 2023-01-31 에보니크 오퍼레이션즈 게엠베하 열 처리를 위한 실리카 과립
EP4382575A1 (en) * 2022-12-06 2024-06-12 Evonik Operations GmbH Milled silica and liquid radiation curable compositions comprising same
KR20240159752A (ko) * 2023-04-28 2024-11-06 오씨아이 주식회사 고분산 흄드 실리카 및 이의 제조방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4912480B1 (https=) * 1969-10-15 1974-03-25
JP2007502766A (ja) * 2003-08-20 2007-02-15 デグサ　アクチエンゲゼルシャフト 微細に分散された熱分解により製造された金属酸化物粒子の精製
JP2010510151A (ja) * 2006-11-16 2010-04-02 ワッカー ケミー アクチエンゲゼルシャフト 大量生産設備でのヒュームドシリカの製造

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2866716A (en) 1955-10-18 1958-12-30 Du Pont Process for modifying the surface of a silica substrate having a reactive silanol surface
DE1767226C3 (de) 1968-04-13 1978-11-02 Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt Hochdisperses, absolut trockenes, auf pyrogenem Wege hergestelltes Siliciumdioxid
FR2075083A5 (https=) * 1970-01-31 1971-10-08 Degussa
DE2123233C3 (de) 1971-05-11 1977-10-13 Degussa Feinteiliges grossoberflaechiges siliciumdioxid
DE2240014C3 (de) 1972-08-14 1981-04-16 Degussa Ag, 6000 Frankfurt Verfahren zur Hydrophobierung von hochdispersen Oxiden
JPS61136909A (ja) 1984-12-04 1986-06-24 Mitsubishi Chem Ind Ltd 無水ケイ酸の水分散液組成物
PT725037E (pt) 1995-02-04 2001-07-31 Degussa Granulados a base de dioxido de silicio preparado pirogenicamente processo para a sua preparacao e sua utilizacao
DE10260323A1 (de) 2002-12-20 2004-07-08 Wacker-Chemie Gmbh Wasserbenetzbare silylierte Metalloxide
DE102006024590A1 (de) 2006-05-26 2007-11-29 Degussa Gmbh Hydrophile Kieselsäure für Dichtungsmassen
EP2014622B1 (de) 2007-07-06 2017-01-18 Evonik Degussa GmbH Verfahren zur Herstellung eines Kieselglasgranulats
EP2145929B1 (de) * 2008-07-18 2020-06-24 Evonik Operations GmbH Verfahren zur Herstellung redispergierbarer, oberflächenmodifizierter Siliciumdioxidpartikel
KR101431932B1 (ko) 2009-12-26 2014-08-19 에보니크 데구사 게엠베하 수분 함유 분말 조성물
JP2014055072A (ja) 2012-09-11 2014-03-27 Nippon Aerosil Co Ltd 非晶質酸化珪素焼結体の製造方法及びこの方法により製造された非晶質酸化珪素焼結体
JP6278979B2 (ja) 2014-02-10 2018-02-14 株式会社日本触媒 シリカ粒子、その粒子を含む樹脂組成物、ならびに、その用途
KR101723994B1 (ko) 2014-02-21 2017-04-06 주식회사 포스코 분리막, 분리막의 제조 방법, 이를 포함하는 리튬 폴리머 이차 전지, 및 이를 이용한 리튬 폴리머 이차 전지의 제조 방법
JP6393177B2 (ja) * 2014-12-10 2018-09-19 東ソー・シリカ株式会社 疎水性シリカ及びその製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4912480B1 (https=) * 1969-10-15 1974-03-25
JP2007502766A (ja) * 2003-08-20 2007-02-15 デグサ　アクチエンゲゼルシャフト 微細に分散された熱分解により製造された金属酸化物粒子の精製
JP2010510151A (ja) * 2006-11-16 2010-04-02 ワッカー ケミー アクチエンゲゼルシャフト 大量生産設備でのヒュームドシリカの製造

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025070440A1 (ja) * 2023-09-26 2025-04-03 ナミックス株式会社 樹脂組成物、硬化物及び光ファイバアレイ

Also Published As

Publication number Publication date
KR20230142833A (ko) 2023-10-11
TW202244002A (zh) 2022-11-16
WO2022171406A1 (en) 2022-08-18
EP4291528A1 (en) 2023-12-20
US20240116764A1 (en) 2024-04-11
CN116888073A (zh) 2023-10-13

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