JP2024157135A5 - - Google Patents
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- JP2024157135A5 JP2024157135A5 JP2023071288A JP2023071288A JP2024157135A5 JP 2024157135 A5 JP2024157135 A5 JP 2024157135A5 JP 2023071288 A JP2023071288 A JP 2023071288A JP 2023071288 A JP2023071288 A JP 2023071288A JP 2024157135 A5 JP2024157135 A5 JP 2024157135A5
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- hydrogen atom
- acetate
- contrast
- heteroatom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000203 mixture Substances 0.000 claims description 5
- 229920002120 photoresistant polymer Polymers 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 125000005842 heteroatom Chemical group 0.000 claims 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 150000001768 cations Chemical class 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 125000003709 fluoroalkyl group Chemical group 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 claims 1
- 238000004090 dissolution Methods 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- NMJJFJNHVMGPGM-UHFFFAOYSA-N butyl formate Chemical compound CCCCOC=O NMJJFJNHVMGPGM-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 2
- RYNQKSJRFHJZTK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) acetate Chemical compound COC(C)(C)CCOC(C)=O RYNQKSJRFHJZTK-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- ILVGAIQLOCKNQA-UHFFFAOYSA-N propyl 2-hydroxypropanoate Chemical compound CCCOC(=O)C(C)O ILVGAIQLOCKNQA-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023071288A JP2024157135A (ja) | 2023-04-25 | 2023-04-25 | 化学増幅ネガ型レジスト組成物及びパターン形成方法 |
| US18/637,749 US20240377737A1 (en) | 2023-04-25 | 2024-04-17 | Chemically amplified negative resist composition and patterning process |
| KR1020240053161A KR102944887B1 (ko) | 2023-04-25 | 2024-04-22 | 화학 증폭 네거티브형 레지스트 조성물 및 패턴 형성 방법 |
| TW113115200A TW202448988A (zh) | 2023-04-25 | 2024-04-24 | 化學增幅負型阻劑組成物及圖案形成方法 |
| CN202410502699.5A CN118838116A (zh) | 2023-04-25 | 2024-04-25 | 化学增幅负型抗蚀剂组合物和图案形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023071288A JP2024157135A (ja) | 2023-04-25 | 2023-04-25 | 化学増幅ネガ型レジスト組成物及びパターン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024157135A JP2024157135A (ja) | 2024-11-07 |
| JP2024157135A5 true JP2024157135A5 (https=) | 2024-12-20 |
Family
ID=93143160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023071288A Pending JP2024157135A (ja) | 2023-04-25 | 2023-04-25 | 化学増幅ネガ型レジスト組成物及びパターン形成方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240377737A1 (https=) |
| JP (1) | JP2024157135A (https=) |
| KR (1) | KR102944887B1 (https=) |
| CN (1) | CN118838116A (https=) |
| TW (1) | TW202448988A (https=) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4425776B2 (ja) | 2004-12-24 | 2010-03-03 | 信越化学工業株式会社 | レジスト材料及びこれを用いたパターン形成方法 |
| JP7310724B2 (ja) * | 2020-06-04 | 2023-07-19 | 信越化学工業株式会社 | オニウム塩、化学増幅ネガ型レジスト組成物及びレジストパターン形成方法 |
| JP7647655B2 (ja) | 2021-05-07 | 2025-03-18 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JP7826834B2 (ja) * | 2021-06-15 | 2026-03-10 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料及びパターン形成方法 |
| JP7679335B2 (ja) | 2021-06-22 | 2025-05-19 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JP7492492B2 (ja) | 2021-06-25 | 2024-05-29 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JPWO2023002869A1 (https=) | 2021-07-21 | 2023-01-26 | ||
| JP7757915B2 (ja) | 2021-10-20 | 2025-10-22 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
-
2023
- 2023-04-25 JP JP2023071288A patent/JP2024157135A/ja active Pending
-
2024
- 2024-04-17 US US18/637,749 patent/US20240377737A1/en active Pending
- 2024-04-22 KR KR1020240053161A patent/KR102944887B1/ko active Active
- 2024-04-24 TW TW113115200A patent/TW202448988A/zh unknown
- 2024-04-25 CN CN202410502699.5A patent/CN118838116A/zh active Pending
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