JP2024116282A5 - - Google Patents

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Publication number
JP2024116282A5
JP2024116282A5 JP2024093431A JP2024093431A JP2024116282A5 JP 2024116282 A5 JP2024116282 A5 JP 2024116282A5 JP 2024093431 A JP2024093431 A JP 2024093431A JP 2024093431 A JP2024093431 A JP 2024093431A JP 2024116282 A5 JP2024116282 A5 JP 2024116282A5
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JP
Japan
Prior art keywords
metal
precursor
layer
contacting
rare earth
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Pending
Application number
JP2024093431A
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English (en)
Japanese (ja)
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JP2024116282A (ja
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Publication date
Priority claimed from US16/204,655 external-priority patent/US20200024735A1/en
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Publication of JP2024116282A publication Critical patent/JP2024116282A/ja
Publication of JP2024116282A5 publication Critical patent/JP2024116282A5/ja
Pending legal-status Critical Current

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JP2024093431A 2018-07-18 2024-06-10 原子層堆積法で堆積させた耐浸食性金属フッ化物コーティング Pending JP2024116282A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201862700063P 2018-07-18 2018-07-18
US62/700,063 2018-07-18
US16/204,655 US20200024735A1 (en) 2018-07-18 2018-11-29 Erosion resistant metal fluoride coatings deposited by atomic layer deposition
US16/204,655 2018-11-29
JP2019131878A JP2020012199A (ja) 2018-07-18 2019-07-17 原子層堆積法で堆積させた耐浸食性金属フッ化物コーティング

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2019131878A Division JP2020012199A (ja) 2018-07-18 2019-07-17 原子層堆積法で堆積させた耐浸食性金属フッ化物コーティング

Publications (2)

Publication Number Publication Date
JP2024116282A JP2024116282A (ja) 2024-08-27
JP2024116282A5 true JP2024116282A5 (enExample) 2025-06-26

Family

ID=68610997

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2019003453U Active JP3224084U (ja) 2018-07-18 2019-09-12 原子層堆積法で堆積させた耐浸食性金属フッ化物コーティング
JP2024093431A Pending JP2024116282A (ja) 2018-07-18 2024-06-10 原子層堆積法で堆積させた耐浸食性金属フッ化物コーティング

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2019003453U Active JP3224084U (ja) 2018-07-18 2019-09-12 原子層堆積法で堆積させた耐浸食性金属フッ化物コーティング

Country Status (5)

Country Link
US (1) US20240401197A1 (enExample)
JP (2) JP3224084U (enExample)
KR (1) KR20250020574A (enExample)
CN (1) CN117026202A (enExample)
TW (1) TWI902284B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7460771B2 (ja) 2019-12-30 2024-04-02 インテグリス・インコーポレーテッド フッ化マグネシウム領域が形成させる金属体
TWI767244B (zh) * 2020-05-29 2022-06-11 朗曦科技股份有限公司 半導體製程腔體之氣體噴頭
US20220351960A1 (en) * 2021-05-03 2022-11-03 Applied Materials, Inc. Atomic Layer Deposition Of Metal Fluoride Films
JP7154517B1 (ja) * 2022-02-18 2022-10-18 Ａｇｃ株式会社 イットリウム質保護膜およびその製造方法ならびに部材

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7491431B2 (en) * 2004-12-20 2009-02-17 Nanogram Corporation Dense coating formation by reactive deposition
JP2007115973A (ja) * 2005-10-21 2007-05-10 Shin Etsu Chem Co Ltd 耐食性部材
US20070237697A1 (en) * 2006-03-31 2007-10-11 Tokyo Electron Limited Method of forming mixed rare earth oxide and aluminate films by atomic layer deposition
US10242888B2 (en) * 2007-04-27 2019-03-26 Applied Materials, Inc. Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance
US20120127629A1 (en) * 2009-04-16 2012-05-24 Advanced Technology Materials, Inc. DOPED ZrO2 CAPACITOR MATERIALS AND STRUCTURES
TWI576999B (zh) * 2009-05-28 2017-04-01 薄膜電子Ａｓａ公司 包含覆有擴散阻障層的基板之電性元件及其製作方法
EP2337064B1 (en) * 2009-12-18 2014-08-06 Imec Dielectric layer for flash memory device and method for manufacturing thereof
US11326253B2 (en) * 2016-04-27 2022-05-10 Applied Materials, Inc. Atomic layer deposition of protective coatings for semiconductor process chamber components
US9850573B1 (en) * 2016-06-23 2017-12-26 Applied Materials, Inc. Non-line of sight deposition of erbium based plasma resistant ceramic coating
US20180016678A1 (en) * 2016-07-15 2018-01-18 Applied Materials, Inc. Multi-layer coating with diffusion barrier layer and erosion resistant layer
US20200024735A1 (en) * 2018-07-18 2020-01-23 Applied Materials, Inc. Erosion resistant metal fluoride coatings deposited by atomic layer deposition

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