JP2024019774A5 - - Google Patents

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Publication number
JP2024019774A5
JP2024019774A5 JP2022122440A JP2022122440A JP2024019774A5 JP 2024019774 A5 JP2024019774 A5 JP 2024019774A5 JP 2022122440 A JP2022122440 A JP 2022122440A JP 2022122440 A JP2022122440 A JP 2022122440A JP 2024019774 A5 JP2024019774 A5 JP 2024019774A5
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JP
Japan
Prior art keywords
film
graphene
forming method
plasma
target
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Pending
Application number
JP2022122440A
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English (en)
Japanese (ja)
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JP2024019774A (ja
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Application filed filed Critical
Priority to JP2022122440A priority Critical patent/JP2024019774A/ja
Priority claimed from JP2022122440A external-priority patent/JP2024019774A/ja
Priority to PCT/JP2023/026200 priority patent/WO2024029320A1/ja
Priority to KR1020257005519A priority patent/KR20250040701A/ko
Publication of JP2024019774A publication Critical patent/JP2024019774A/ja
Priority to US19/042,169 priority patent/US20250191907A1/en
Publication of JP2024019774A5 publication Critical patent/JP2024019774A5/ja
Pending legal-status Critical Current

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JP2022122440A 2022-08-01 2022-08-01 成膜方法および成膜装置 Pending JP2024019774A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2022122440A JP2024019774A (ja) 2022-08-01 2022-08-01 成膜方法および成膜装置
PCT/JP2023/026200 WO2024029320A1 (ja) 2022-08-01 2023-07-18 成膜方法および成膜装置
KR1020257005519A KR20250040701A (ko) 2022-08-01 2023-07-18 성막 방법 및 성막 장치
US19/042,169 US20250191907A1 (en) 2022-08-01 2025-01-31 Film forming method and film forming apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022122440A JP2024019774A (ja) 2022-08-01 2022-08-01 成膜方法および成膜装置

Publications (2)

Publication Number Publication Date
JP2024019774A JP2024019774A (ja) 2024-02-14
JP2024019774A5 true JP2024019774A5 (enExample) 2025-05-13

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ID=89848808

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022122440A Pending JP2024019774A (ja) 2022-08-01 2022-08-01 成膜方法および成膜装置

Country Status (4)

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US (1) US20250191907A1 (enExample)
JP (1) JP2024019774A (enExample)
KR (1) KR20250040701A (enExample)
WO (1) WO2024029320A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024163650A (ja) * 2023-05-12 2024-11-22 東京エレクトロン株式会社 基板処理方法および基板処理装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8030212B2 (en) 2007-09-26 2011-10-04 Eastman Kodak Company Process for selective area deposition of inorganic materials
US8293658B2 (en) 2010-02-17 2012-10-23 Asm America, Inc. Reactive site deactivation against vapor deposition
KR102545880B1 (ko) 2017-04-12 2023-06-20 도쿄엘렉트론가부시키가이샤 유전체 기판 상에서의 유전체 물질의 선택적인 수직 성장 방법
US10847363B2 (en) * 2017-11-20 2020-11-24 Tokyo Electron Limited Method of selective deposition for forming fully self-aligned vias
US11081447B2 (en) * 2019-09-17 2021-08-03 Taiwan Semiconductor Manufacturing Co., Ltd. Graphene-assisted low-resistance interconnect structures and methods of formation thereof
JP2023514831A (ja) * 2020-02-19 2023-04-11 ラム リサーチ コーポレーション グラフェン集積化
CN116097419A (zh) * 2020-06-23 2023-05-09 朗姆研究公司 使用石墨烯作为抑制剂的选择性沉积
KR20220028935A (ko) 2020-08-31 2022-03-08 삼성전자주식회사 인터커넥트 구조체의 형성방법

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