JP2024019774A - 成膜方法および成膜装置 - Google Patents

成膜方法および成膜装置 Download PDF

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JP2024019774A
JP2024019774A JP2022122440A JP2022122440A JP2024019774A JP 2024019774 A JP2024019774 A JP 2024019774A JP 2022122440 A JP2022122440 A JP 2022122440A JP 2022122440 A JP2022122440 A JP 2022122440A JP 2024019774 A JP2024019774 A JP 2024019774A
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film
graphene
gas
plasma
forming method
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JP2022122440A
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Japanese (ja)
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JP2024019774A5 (enExample
Inventor
歩太 鈴木
Ayuta Suzuki
秀司 東雲
Shuji Shinonome
貴士 松本
Takashi Matsumoto
亮太 井福
Ryota Ifuku
暁志 布瀬
Satoshi Fuse
亨 臼杵
Toru USUKI
正仁 杉浦
Masahito Sugiura
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2022122440A priority Critical patent/JP2024019774A/ja
Priority to PCT/JP2023/026200 priority patent/WO2024029320A1/ja
Priority to KR1020257005519A priority patent/KR20250040701A/ko
Publication of JP2024019774A publication Critical patent/JP2024019774A/ja
Priority to US19/042,169 priority patent/US20250191907A1/en
Publication of JP2024019774A5 publication Critical patent/JP2024019774A5/ja
Pending legal-status Critical Current

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    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
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    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Electromagnetism (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
JP2022122440A 2022-08-01 2022-08-01 成膜方法および成膜装置 Pending JP2024019774A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2022122440A JP2024019774A (ja) 2022-08-01 2022-08-01 成膜方法および成膜装置
PCT/JP2023/026200 WO2024029320A1 (ja) 2022-08-01 2023-07-18 成膜方法および成膜装置
KR1020257005519A KR20250040701A (ko) 2022-08-01 2023-07-18 성막 방법 및 성막 장치
US19/042,169 US20250191907A1 (en) 2022-08-01 2025-01-31 Film forming method and film forming apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022122440A JP2024019774A (ja) 2022-08-01 2022-08-01 成膜方法および成膜装置

Publications (2)

Publication Number Publication Date
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