JP2023551216A - リテーナーリング、これを製造する方法、及びこれを含むcmp装置 - Google Patents

リテーナーリング、これを製造する方法、及びこれを含むcmp装置 Download PDF

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Publication number
JP2023551216A
JP2023551216A JP2023530950A JP2023530950A JP2023551216A JP 2023551216 A JP2023551216 A JP 2023551216A JP 2023530950 A JP2023530950 A JP 2023530950A JP 2023530950 A JP2023530950 A JP 2023530950A JP 2023551216 A JP2023551216 A JP 2023551216A
Authority
JP
Japan
Prior art keywords
resin layer
synthetic resin
retainer ring
layer
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023530950A
Other languages
English (en)
Japanese (ja)
Inventor
ヒョン ソク チェ
サン ヒョ ハン
ビョン ヒ ハン
Original Assignee
エスエムティー コーポレイション
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by エスエムティー コーポレイション filed Critical エスエムティー コーポレイション
Publication of JP2023551216A publication Critical patent/JP2023551216A/ja
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/27Work carriers
    • B24B37/30Work carriers for single side lapping of plane surfaces
    • B24B37/32Retaining rings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/14Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/17Component parts, details or accessories; Auxiliary operations
    • B29C45/40Removing or ejecting moulded articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D12/00Producing frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2101/00Use of unspecified macromolecular compounds as moulding material
    • B29K2101/10Thermosetting resins

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Injection Moulding Of Plastics Or The Like (AREA)
JP2023530950A 2020-12-24 2021-11-17 リテーナーリング、これを製造する方法、及びこれを含むcmp装置 Pending JP2023551216A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020200183515A KR102518222B1 (ko) 2020-12-24 2020-12-24 리테이너 링, 이를 제조하는 방법 및 이를 포함하는 cmp 장치
KR10-2020-0183515 2020-12-24
PCT/KR2021/016908 WO2022139185A1 (ko) 2020-12-24 2021-11-17 리테이너 링, 이를 제조하는 방법 및 이를 포함하는 cmp 장치

Publications (1)

Publication Number Publication Date
JP2023551216A true JP2023551216A (ja) 2023-12-07

Family

ID=82158151

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023530950A Pending JP2023551216A (ja) 2020-12-24 2021-11-17 リテーナーリング、これを製造する方法、及びこれを含むcmp装置

Country Status (5)

Country Link
JP (1) JP2023551216A (ko)
KR (1) KR102518222B1 (ko)
CN (1) CN116457929A (ko)
TW (1) TW202224854A (ko)
WO (1) WO2022139185A1 (ko)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5921855A (en) * 1997-05-15 1999-07-13 Applied Materials, Inc. Polishing pad having a grooved pattern for use in a chemical mechanical polishing system
KR101224539B1 (ko) * 2011-09-30 2013-01-21 한상효 웨이퍼 연마용 리테이너 링
KR101392401B1 (ko) * 2012-11-30 2014-05-07 이화다이아몬드공업 주식회사 컨디셔너 겸용 웨이퍼 리테이너링 및 상기 리테이너링 제조방법
KR101455310B1 (ko) * 2013-02-18 2014-10-27 주식회사 윌비에스엔티 화학적 기계 연마 장치의 리테이너 링
US9238294B2 (en) * 2014-06-18 2016-01-19 Nexplanar Corporation Polishing pad having porogens with liquid filler
KR102088512B1 (ko) * 2018-07-13 2020-03-12 주식회사 에스엠티 Cmp 리테이너 링, 이를 제조하는 방법, 및 리테이너 링을 포함하는 cmp 장치
KR102708235B1 (ko) * 2019-06-03 2024-09-23 주식회사 케이씨텍 기판의 연마 장치용 캐리어 헤드의 리테이너 링

Also Published As

Publication number Publication date
KR102518222B1 (ko) 2023-04-05
CN116457929A (zh) 2023-07-18
TW202224854A (zh) 2022-07-01
KR20220092099A (ko) 2022-07-01
WO2022139185A1 (ko) 2022-06-30

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