JP2023542236A - ゲルマニウムシード層のための組成物およびそれを使用する方法 - Google Patents

ゲルマニウムシード層のための組成物およびそれを使用する方法 Download PDF

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JP2023542236A
JP2023542236A JP2023519394A JP2023519394A JP2023542236A JP 2023542236 A JP2023542236 A JP 2023542236A JP 2023519394 A JP2023519394 A JP 2023519394A JP 2023519394 A JP2023519394 A JP 2023519394A JP 2023542236 A JP2023542236 A JP 2023542236A
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bis
group
butylamino
tris
methyldiallylsilane
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JP2023542236A5 (enExample
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アール．マクドナルド マシュー
シアオ マンチャオ
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バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー
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    • H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]
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