JP2023531704A - リフトオフマスク構造体を形成するための方法 - Google Patents
リフトオフマスク構造体を形成するための方法 Download PDFInfo
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- JP2023531704A JP2023531704A JP2022579746A JP2022579746A JP2023531704A JP 2023531704 A JP2023531704 A JP 2023531704A JP 2022579746 A JP2022579746 A JP 2022579746A JP 2022579746 A JP2022579746 A JP 2022579746A JP 2023531704 A JP2023531704 A JP 2023531704A
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- 238000000034 method Methods 0.000 title claims abstract description 64
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 238000000151 deposition Methods 0.000 claims abstract description 31
- 230000005670 electromagnetic radiation Effects 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims description 23
- 229920002120 photoresistant polymer Polymers 0.000 claims description 13
- 230000001066 destructive effect Effects 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000011368 organic material Substances 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 239000006117 anti-reflective coating Substances 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 95
- 239000013077 target material Substances 0.000 description 21
- 230000000694 effects Effects 0.000 description 13
- 239000013067 intermediate product Substances 0.000 description 12
- 238000011161 development Methods 0.000 description 10
- 230000018109 developmental process Effects 0.000 description 10
- 230000008021 deposition Effects 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 230000005855 radiation Effects 0.000 description 6
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000013459 approach Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- URQUNWYOBNUYJQ-UHFFFAOYSA-N diazonaphthoquinone Chemical compound C1=CC=C2C(=O)C(=[N]=[N])C=CC2=C1 URQUNWYOBNUYJQ-UHFFFAOYSA-N 0.000 description 2
- 229920002313 fluoropolymer Polymers 0.000 description 2
- 239000004811 fluoropolymer Substances 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0272—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers for lift-off processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0331—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers for lift-off processes
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Optics & Photonics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
10 基板本体
11 BARC層
12 レジスト層
11a,12a 側壁形状
13 ターゲット材
20 フォトマスク
21 露光放射線
Claims (15)
- リフトオフマスク構造体(1)を形成するための方法であって、前記方法は、
-基板本体(10)を設けるステップと、
-前記基板本体(10)の表面上に下面反射防止コーティング(BARC)層(11)を堆積させるステップと、
-前記BARC層(11)上に感光性レジスト層(12)を堆積させるステップと、
-フォトマスク(20)を介して前記レジスト層(12)を電磁放射線(21)によって露光するステップと、
-前記BARC層(11)および前記レジスト層(12)の一部を選択的に除去するための現像液を適用することによって、その下の前記基板本体(10)の表面部分を露出させて、前記リフトオフマスク構造体(1)を形成するステップと、
を含む方法。 - 前記BARC層(11)は、前記リフトオフマスク構造体(1)を形成するステップの後に、負の側壁勾配を有するアンダーカット形状(11a)によって特徴付けられる、
請求項1記載の方法。 - 前記レジスト層(12)は、前記リフトオフマスク構造体(1)を形成するステップの後に、正の側壁勾配を有するオーバーカット形状(12a)によって特徴付けられる、
請求項1または2記載の方法。 - 前記BARC層(11)の材料は、感光性ではない、
請求項1から3までのいずれか1項記載の方法。 - 前記BARC層(11)の材料は、前記電磁放射線(21)の波長において吸収性、特に高吸収性である、
請求項1から4までのいずれか1項記載の方法。 - 前記BARC層(11)の材料は、有機材料である、
請求項1から5までのいずれか1項記載の方法。 - 前記BARC層(11)の材料および前記感光性レジスト層(12)の材料は、前記電磁放射線(21)の波長において、互いに10%未満、特に5%未満異なる屈折率によって特徴付けられる、
請求項1から6までのいずれか1項記載の方法。 - 前記BARC層(11)の材料は、前記電磁放射線(21)による露光中に、前記レジスト層(12)内で相殺的干渉を引き起こす屈折率によって特徴付けられる、
請求項1から7までのいずれか1項記載の方法。 - 前記BARC層(11)を堆積させるステップは、前記基板本体(10)の前記表面上に、500nm未満、特に200nm未満の厚さでBARC材料を堆積させるステップを含む、
請求項1から8までのいずれか1項記載の方法。 - 前記感光性レジスト層(12)を堆積させるステップは、ポジ型フォトレジストを堆積させるステップを含む、
請求項1から9までのいずれか1項記載の方法。 - 前記方法は、前記レジスト層(12)を堆積させるステップの前に、前記BARC層(11)を焼き付けるステップをさらに含む、
請求項1から10までのいずれか1項記載の方法。 - 前記BARC層(11)の材料は、前記現像液に対して、特に等方的に可溶性である、
請求項1から11までのいずれか1項記載の方法。 - 請求項1から12までのいずれか1項記載のリフトオフマスク構造体(1)を形成するステップを含むプロセスに従って製造される、装置。
- 前記装置を製造するために、請求項1から12までのいずれか1項記載の方法が繰り返し適用される、
請求項13記載の装置。 - 前記方法は、多層干渉フィルタを製造するために適用される、
請求項13または14記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20192165.7A EP3958291A1 (en) | 2020-08-21 | 2020-08-21 | Method for forming a lift-off mask structure |
EP20192165.7 | 2020-08-21 | ||
PCT/EP2021/072499 WO2022038041A1 (en) | 2020-08-21 | 2021-08-12 | Method for forming a lift-off mask structure |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2023531704A true JP2023531704A (ja) | 2023-07-25 |
Family
ID=72193339
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022579746A Pending JP2023531704A (ja) | 2020-08-21 | 2021-08-12 | リフトオフマスク構造体を形成するための方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20240012327A1 (ja) |
EP (2) | EP3958291A1 (ja) |
JP (1) | JP2023531704A (ja) |
KR (1) | KR20230011420A (ja) |
CN (1) | CN115668452A (ja) |
WO (1) | WO2022038041A1 (ja) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE516194C2 (sv) * | 2000-04-18 | 2001-12-03 | Obducat Ab | Substrat för samt process vid tillverkning av strukturer |
JP2002367877A (ja) * | 2001-06-04 | 2002-12-20 | Murata Mfg Co Ltd | レジストパターンの形成方法、配線形成方法、及び電子部品 |
US7070914B2 (en) * | 2002-01-09 | 2006-07-04 | Az Electronic Materials Usa Corp. | Process for producing an image using a first minimum bottom antireflective coating composition |
KR101835293B1 (ko) * | 2010-09-03 | 2018-03-06 | 테트라썬, 아이엔씨. | 광학코팅의 부분적 리프트-오프에 의한 광기전력 장치의 미세라인 금속화 |
JP5815254B2 (ja) * | 2011-03-14 | 2015-11-17 | 昭和電工株式会社 | 厚膜金属電極の形成方法、及び厚膜レジストの形成方法 |
-
2020
- 2020-08-21 EP EP20192165.7A patent/EP3958291A1/en not_active Withdrawn
-
2021
- 2021-08-12 US US18/041,708 patent/US20240012327A1/en active Pending
- 2021-08-12 JP JP2022579746A patent/JP2023531704A/ja active Pending
- 2021-08-12 CN CN202180038617.0A patent/CN115668452A/zh active Pending
- 2021-08-12 KR KR1020227044555A patent/KR20230011420A/ko unknown
- 2021-08-12 EP EP21758387.1A patent/EP4200894A1/en active Pending
- 2021-08-12 WO PCT/EP2021/072499 patent/WO2022038041A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
EP4200894A1 (en) | 2023-06-28 |
CN115668452A (zh) | 2023-01-31 |
EP3958291A1 (en) | 2022-02-23 |
US20240012327A1 (en) | 2024-01-11 |
WO2022038041A1 (en) | 2022-02-24 |
KR20230011420A (ko) | 2023-01-20 |
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