JP2023527691A - ガス流特徴部を有する静電チャック、及び関連する方法 - Google Patents
ガス流特徴部を有する静電チャック、及び関連する方法 Download PDFInfo
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- JP2023527691A JP2023527691A JP2022567774A JP2022567774A JP2023527691A JP 2023527691 A JP2023527691 A JP 2023527691A JP 2022567774 A JP2022567774 A JP 2022567774A JP 2022567774 A JP2022567774 A JP 2022567774A JP 2023527691 A JP2023527691 A JP 2023527691A
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- gas flow
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- electrostatic chuck
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- 238000000034 method Methods 0.000 title claims description 29
- 239000000919 ceramic Substances 0.000 claims description 80
- 238000013022 venting Methods 0.000 claims description 17
- 239000011148 porous material Substances 0.000 claims description 16
- 150000002500 ions Chemical class 0.000 claims description 10
- 239000000523 sample Substances 0.000 claims description 7
- 238000004891 communication Methods 0.000 claims description 6
- 239000012530 fluid Substances 0.000 claims description 6
- 238000005259 measurement Methods 0.000 claims description 3
- 239000007943 implant Substances 0.000 claims description 2
- 238000012545 processing Methods 0.000 abstract description 32
- 239000007789 gas Substances 0.000 description 132
- 239000000112 cooling gas Substances 0.000 description 37
- 235000012431 wafers Nutrition 0.000 description 13
- 238000013461 design Methods 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 239000004065 semiconductor Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 230000000712 assembly Effects 0.000 description 4
- 238000000429 assembly Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000004377 microelectronic Methods 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000005273 aeration Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- -1 alumina Chemical compound 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011156 metal matrix composite Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (16)
- ベース層を備える静電チャックアセンブリであって、前記ベース層は、
ベース層上面及びベース層下面、
前記ベース層を通って延在し、前記静電チャックアセンブリの動作を実行するデバイスの一部を含有するように適合されたベース層デバイス開口部、
前記ベース層の領域にわたって水平に延在するガス流導管であって、前記ベース層デバイス開口部と接続する導管セグメントを備える、ガス流導管、並びに
前記ベース層に入り、前記ガス流導管に接続するガス流入口
を含む、静電チャックアセンブリ。 - 前記ガス流導管は、前記ベース層の上面にチャネルを備える、請求項1に記載の静電チャックアセンブリ。
- 前記ベース層の上方に配置されたセラミック層をさらに備え、前記セラミック層は、
セラミック層上面と、
セラミック層下面と、
前記セラミック層下面と前記セラミック層上面との間に延在する複数のガス流通気孔であって、前記ガス流導管と流体連通する、ガス流通気孔と、
前記セラミック層を通って延在し、前記ベース層デバイス開口部に接続され、前記デバイスの一部を含有するように適合されたセラミック層デバイス開口部と
を備える、請求項1に記載の静電チャックアセンブリ。 - セラミック層上面の上方でワークピースを支持し、前記ワークピースの下面と前記セラミック層上面との間にガス流層を形成するように適合されたエンボスを、前記セラミック層上面にさらに備える、請求項1に記載の静電チャックアセンブリ。
- 前記ガス流導管は、円形導管セグメントと、前記円形導管セグメントに接続された複数の半径方向導管セグメントとを備える、請求項1に記載の静電チャックアセンブリ。
- 前記デバイスは、移動を実行し、状態に影響を及ぼし、又は測定を実行するように適合される、請求項1に記載の静電チャックアセンブリ。
- 前記デバイスは測定デバイスである、請求項1に記載の静電チャックアセンブリ。
- 前記デバイスは可動プローブである、請求項1に記載の静電チャックアセンブリ。
- 前記ガス流導管は、円形導管セグメントと、前記円形導管セグメントに接続された複数の半径方向導管セグメントとを備え、
前記ベース層は、前記ベース層を通る少なくとも2つのベース層デバイス開口部を含み、各ベース層デバイス開口部は、可動プローブを含有し、
前記少なくとも2つの半径方向導管セグメントの各々は、前記ベース層デバイス開口部のうちの1つに接続する、
請求項1に記載の静電チャックアセンブリ。 - 前記ガス流導管は、前記ベース層デバイス開口部の周囲に延在するガス流導管セグメントを備える、請求項1に記載の静電チャックアセンブリ。
- 静電チャックアセンブリ上に、ワークピースを支持することであって、前記静電チャックアセンブリは、
ベース層であって、
ベース層上面及びベース層下面、
前記ベース層を通って延在し、前記静電チャックアセンブリの動作を実行するデバイスの一部を含有するように適合されたベース層デバイス開口部、
前記ベースの領域にわたって水平に延在するガス流導管であって、前記ベース層デバイス開口部と接続する導管セグメントを備える、ガス流導管、並びに
前記ベース内に入り、前記ガス流導管に接続されたガス流入口
を備えるベース層と、
前記ベース層の上方に配置されたセラミック層であって、
セラミック層上面、
セラミック層下面、
前記セラミック層下面と前記セラミック層上面との間に延在し、前記ガス流導管と流体連通する複数のガス流通気孔、及び
前記セラミック層を通って延在し、前記ベース層デバイス開口部に接続され、前記デバイスの一部を含有するように適合されたセラミック層デバイス開口部
を備える、セラミック層と
を備え、
前記ワークピースは、前記セラミック層上面で支持される、ワークピースを支持することと、
ガスを前記ガス流入口に流入させ、前記ガス流導管を通過させることと
を含む、ワークピースを処理する方法。 - 前記静電チャックは電極を備え、前記方法は、前記ワークピースを前記静電チャックアセンブリに静電吸着させるために、前記ワークピースに電荷を生成し、前記電極に反対の電荷を生成することを含む、請求項11に記載の方法。
- 前記ワークピースの表面に前記イオンを注入するために、前記ワークピースに向かってイオンを加速させることをさらに含む、請求項11に記載の方法。
- 前記ワークピースの温度を摂氏-30~100度の範囲に維持することをさらに含む、請求項11に記載の方法。
- 前記ガス流入口に入る前記ガス流を停止することと、
前記ガス流導管内の残留ガスを前記ガス流導管から通気期間にわたって通気させることと、
前記通気期間の後に、前記セラミック層上面から前記ワークピースを取り外すことと
をさらに含む、請求項11に記載の方法。 - 前記通気期間が2秒未満である、請求項15に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US202063022836P | 2020-05-11 | 2020-05-11 | |
US63/022,836 | 2020-05-11 | ||
PCT/US2021/031831 WO2021231469A1 (en) | 2020-05-11 | 2021-05-11 | Electrostatic chuck having a gas flow feature, and related methods |
Publications (1)
Publication Number | Publication Date |
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JP2023527691A true JP2023527691A (ja) | 2023-06-30 |
Family
ID=78413119
Family Applications (1)
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JP2022567774A Pending JP2023527691A (ja) | 2020-05-11 | 2021-05-11 | ガス流特徴部を有する静電チャック、及び関連する方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US11837492B2 (ja) |
EP (1) | EP4150665A1 (ja) |
JP (1) | JP2023527691A (ja) |
KR (1) | KR20230006574A (ja) |
CN (1) | CN115668478A (ja) |
TW (1) | TW202209530A (ja) |
WO (1) | WO2021231469A1 (ja) |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6108189A (en) * | 1996-04-26 | 2000-08-22 | Applied Materials, Inc. | Electrostatic chuck having improved gas conduits |
KR19990040901U (ko) | 1998-05-11 | 1999-12-06 | 김영환 | 반도체 식각공정용 정전척의 냉각가스홀에퇴적된 폴리머 제거장치 |
KR101132632B1 (ko) | 2004-12-07 | 2012-04-02 | 주성엔지니어링(주) | 정전척 |
TWI286812B (en) | 2005-03-25 | 2007-09-11 | Adaptive Plasma Tech Corp | Electrostatic chuck and chuck base having cooling path for cooling wafer |
US20070077354A1 (en) * | 2005-09-30 | 2007-04-05 | Applied Materials, Inc. | Thermal conditioning plate with gas gap leak |
DE102005049598B4 (de) * | 2005-10-17 | 2017-10-19 | Att Advanced Temperature Test Systems Gmbh | Hybrid Chuck |
WO2010019430A2 (en) | 2008-08-12 | 2010-02-18 | Applied Materials, Inc. | Electrostatic chuck assembly |
US20100084117A1 (en) * | 2008-10-02 | 2010-04-08 | Fish Roger B | Platen cooling mechanism for cryogenic ion implanting |
KR101439277B1 (ko) | 2012-05-23 | 2014-09-11 | 주식회사 레인테크 | 세정장치 및 세정방법 |
KR101991799B1 (ko) | 2012-08-29 | 2019-06-24 | 세메스 주식회사 | 지지유닛 및 이를 가지는 기판처리장치 |
US10832931B2 (en) | 2014-05-30 | 2020-11-10 | Applied Materials, Inc. | Electrostatic chuck with embossed top plate and cooling channels |
US9613839B2 (en) * | 2014-11-19 | 2017-04-04 | Varian Semiconductor Equipment Associates, Inc. | Control of workpiece temperature via backside gas flow |
WO2017069238A1 (ja) | 2015-10-21 | 2017-04-27 | 住友大阪セメント株式会社 | 静電チャック装置 |
JP2017216346A (ja) | 2016-05-31 | 2017-12-07 | 東京エレクトロン株式会社 | プラズマ処理装置、プラズマ処理方法及び記憶媒体 |
WO2020055968A1 (en) | 2018-09-11 | 2020-03-19 | Amari.Ai Incorporated | Secure communications gateway for trusted execution and secure communications |
-
2021
- 2021-05-11 KR KR1020227042560A patent/KR20230006574A/ko not_active Application Discontinuation
- 2021-05-11 WO PCT/US2021/031831 patent/WO2021231469A1/en unknown
- 2021-05-11 US US17/317,585 patent/US11837492B2/en active Active
- 2021-05-11 JP JP2022567774A patent/JP2023527691A/ja active Pending
- 2021-05-11 CN CN202180038174.5A patent/CN115668478A/zh active Pending
- 2021-05-11 EP EP21803350.4A patent/EP4150665A1/en active Pending
- 2021-05-11 TW TW110116998A patent/TW202209530A/zh unknown
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Publication number | Publication date |
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EP4150665A1 (en) | 2023-03-22 |
US11837492B2 (en) | 2023-12-05 |
KR20230006574A (ko) | 2023-01-10 |
WO2021231469A1 (en) | 2021-11-18 |
US20210351061A1 (en) | 2021-11-11 |
TW202209530A (zh) | 2022-03-01 |
CN115668478A (zh) | 2023-01-31 |
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