JP2023523921A5 - - Google Patents

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Publication number
JP2023523921A5
JP2023523921A5 JP2022564144A JP2022564144A JP2023523921A5 JP 2023523921 A5 JP2023523921 A5 JP 2023523921A5 JP 2022564144 A JP2022564144 A JP 2022564144A JP 2022564144 A JP2022564144 A JP 2022564144A JP 2023523921 A5 JP2023523921 A5 JP 2023523921A5
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JP
Japan
Prior art keywords
flow
mode
control valve
valve
lcv
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022564144A
Other languages
English (en)
Japanese (ja)
Other versions
JP7771082B2 (ja
JP2023523921A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2021/027555 external-priority patent/WO2021216352A1/en
Publication of JP2023523921A publication Critical patent/JP2023523921A/ja
Publication of JP2023523921A5 publication Critical patent/JP2023523921A5/ja
Priority to JP2025186007A priority Critical patent/JP2026027337A/ja
Application granted granted Critical
Publication of JP7771082B2 publication Critical patent/JP7771082B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2022564144A 2020-04-24 2021-04-15 分流レスガス投与 Active JP7771082B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025186007A JP2026027337A (ja) 2020-04-24 2025-11-05 分流レスガス投与

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202063015243P 2020-04-24 2020-04-24
US63/015,243 2020-04-24
US202062706328P 2020-08-10 2020-08-10
US62/706,328 2020-08-10
PCT/US2021/027555 WO2021216352A1 (en) 2020-04-24 2021-04-15 Divertless gas-dosing

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025186007A Division JP2026027337A (ja) 2020-04-24 2025-11-05 分流レスガス投与

Publications (3)

Publication Number Publication Date
JP2023523921A JP2023523921A (ja) 2023-06-08
JP2023523921A5 true JP2023523921A5 (https=) 2024-04-23
JP7771082B2 JP7771082B2 (ja) 2025-11-17

Family

ID=78270147

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022564144A Active JP7771082B2 (ja) 2020-04-24 2021-04-15 分流レスガス投与
JP2025186007A Pending JP2026027337A (ja) 2020-04-24 2025-11-05 分流レスガス投与

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025186007A Pending JP2026027337A (ja) 2020-04-24 2025-11-05 分流レスガス投与

Country Status (5)

Country Link
US (1) US12410517B2 (https=)
JP (2) JP7771082B2 (https=)
KR (1) KR20230007427A (https=)
CN (1) CN115443348A (https=)
WO (1) WO2021216352A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12410517B2 (en) 2020-04-24 2025-09-09 Lam Research Corporation Divertless gas-dosing

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4964484A (https=) * 1972-10-20 1974-06-21
US7628860B2 (en) * 2004-04-12 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
WO2007114156A1 (ja) * 2006-03-30 2007-10-11 Mitsui Engineering & Shipbuilding Co., Ltd. 原子層成長装置
JP4964484B2 (ja) 2006-03-31 2012-06-27 ステラケミファ株式会社 微細加工処理方法
JP5750281B2 (ja) 2011-03-07 2015-07-15 株式会社アルバック 真空一貫基板処理装置及び成膜方法
JP2013151720A (ja) * 2012-01-25 2013-08-08 Ulvac Japan Ltd 真空成膜装置
KR101661483B1 (ko) 2012-10-22 2016-09-30 다이요 닛산 가부시키가이샤 셀렌화수소 혼합 가스의 공급 방법 및 공급 장치
JP6413293B2 (ja) 2014-03-27 2018-10-31 東京エレクトロン株式会社 成膜方法及び記憶媒体
JP6359913B2 (ja) * 2014-08-12 2018-07-18 東京エレクトロン株式会社 処理装置
JP6533740B2 (ja) 2015-12-15 2019-06-19 Ckd株式会社 ガス流量監視方法及びガス流量監視装置
US10515783B2 (en) 2016-02-23 2019-12-24 Lam Research Corporation Flow through line charge volume
JP7107648B2 (ja) 2017-07-11 2022-07-27 株式会社堀場エステック 流体制御装置、流体制御システム、流体制御方法、及び、流体制御装置用プログラム
US10947621B2 (en) 2017-10-23 2021-03-16 Applied Materials, Inc. Low vapor pressure chemical delivery
JP7182988B2 (ja) 2018-10-12 2022-12-05 東京エレクトロン株式会社 原料ガス供給装置、成膜装置及び原料ガス供給方法
US12410517B2 (en) 2020-04-24 2025-09-09 Lam Research Corporation Divertless gas-dosing

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