JP2023504161A - 表面処理銅箔、その製造方法及びこれを含む二次電池用負極 - Google Patents
表面処理銅箔、その製造方法及びこれを含む二次電池用負極 Download PDFInfo
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- JP2023504161A JP2023504161A JP2022532653A JP2022532653A JP2023504161A JP 2023504161 A JP2023504161 A JP 2023504161A JP 2022532653 A JP2022532653 A JP 2022532653A JP 2022532653 A JP2022532653 A JP 2022532653A JP 2023504161 A JP2023504161 A JP 2023504161A
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- copper foil
- treated copper
- negative electrode
- treated
- secondary battery
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 114
- 239000011889 copper foil Substances 0.000 title claims abstract description 85
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 229910052802 copper Inorganic materials 0.000 claims abstract description 29
- 239000010949 copper Substances 0.000 claims abstract description 29
- 239000002245 particle Substances 0.000 claims abstract description 29
- 239000007773 negative electrode material Substances 0.000 claims description 23
- 239000000853 adhesive Substances 0.000 claims description 15
- 230000001070 adhesive effect Effects 0.000 claims description 15
- 238000007747 plating Methods 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
- 150000001879 copper Chemical class 0.000 claims description 7
- 239000003792 electrolyte Substances 0.000 claims description 7
- 239000011651 chromium Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 239000008151 electrolyte solution Substances 0.000 claims description 4
- 150000002815 nickel Chemical class 0.000 claims description 4
- 239000000243 solution Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910000077 silane Inorganic materials 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 8
- 239000011149 active material Substances 0.000 description 6
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 6
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 6
- -1 azole compound Chemical class 0.000 description 5
- 238000009713 electroplating Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 4
- 239000001768 carboxy methyl cellulose Substances 0.000 description 4
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 4
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 4
- 229910000365 copper sulfate Inorganic materials 0.000 description 4
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 229920003048 styrene butadiene rubber Polymers 0.000 description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229910021383 artificial graphite Inorganic materials 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000002174 Styrene-butadiene Substances 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- CMMUKUYEPRGBFB-UHFFFAOYSA-L dichromic acid Chemical compound O[Cr](=O)(=O)O[Cr](O)(=O)=O CMMUKUYEPRGBFB-UHFFFAOYSA-L 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910021382 natural graphite Inorganic materials 0.000 description 1
- 229940078494 nickel acetate Drugs 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- 239000007774 positive electrode material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C22/37—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides containing also hexavalent chromium compounds
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
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Abstract
Description
8μm厚の銅箔(イルジンマテリアル社)を、硫酸ニッケル10g/L及び硫酸銅10g/Lを含む1次電解液に浸漬し、30℃の液温度、2.5のpH及び2A/dm2の電流密度で3秒間1次めっきした後、硫酸銅65g/L及び硫酸120g/Lを含む2次電解液に浸漬し、30℃の液温度及び14A/dm2の電流密度で3秒間2次めっきを行った。その後、電解めっきされた銅箔を、30℃のクロム酸2g/Lを含む水溶液に3秒間浸漬・水洗し、防錆層を形成することによって表面処理銅箔を製造した。
1次めっき時、硫酸ニッケルの含量を11g/Lに変更したことを除いては、実施例1と同一の方法を用いて表面処理銅箔を製造した。
1次めっき時、硫酸ニッケルの含量を12g/Lに変更したことを除いては、実施例1と同一の方法を用いて表面処理銅箔を製造した。
1次めっき時、硫酸ニッケルの含量を13g/Lに変更したことを除いては、実施例1と同一の方法を用いて表面処理銅箔を製造した。
1次及び2次電解めっきを行わないことを除いては、実施例1と同一の方法を用いて表面処理銅箔を製造した。
1次めっき時、硫酸銅の含量を30g/Lに変更したことを除いては、実施例1と同一の方法を用いて表面処理銅箔を製造した。
1次めっき時、硫酸ニッケルを含有していないことを除いては、実施例1と同一の方法を用いて表面処理銅箔を製造した。
(1)銅粒子の平均長径(単位:μm)、銅粒子間の平均間隔(単位:μm)測定:表面処理銅箔の表面を電子走査顕微鏡を用いて5,000倍に拡大しながらイメージを撮影し、100μm×100μmの面積内の50個の銅粒子に対して長径及び銅粒子間の間隔を測定し、これに対する平均値を求めた。
Claims (12)
- 二次電池の負極集電体用表面処理銅箔であり、銅箔の少なくとも一面には、平均長径が約0.6μm乃至約2.0μmである針状形の各銅粒子が約1μm乃至約5μmの間隔で離隔している表面処理銅箔。
- 前記銅粒子のアスペクト比は約1.5乃至約10である、請求項1に記載の表面処理銅箔。
- 前記表面処理銅箔は、約1μm乃至約100μmの厚さを有するものである、請求項1又は請求項2に記載の表面処理銅箔。
- 未処理銅箔に比べて界面抵抗が約10%以上さらに小さい、請求項1乃至請求項3のいずれか1項に記載の表面処理銅箔。
- 界面抵抗が約0.0025ohm/m2乃至約0.0032ohm/m2である、請求項1乃至請求項4のいずれか1項に記載の表面処理銅箔。
- 未処理銅箔に比べて接着強度が約20%以上さらに大きい、請求項1乃至請求項5のいずれか1項に記載の表面処理銅箔。
- 接着強度が約3gf/mm乃至約5gf/mmである、請求項1乃至請求項6のいずれか1項に記載の表面処理銅箔。
- 前記各銅粒子を被覆する無機防錆層、有機防錆層、又はこれらの組み合わせをさらに備えた、請求項1乃至請求項7のいずれか1項に記載の表面処理銅箔。
- 前記無機防錆層は、クロム(Cr)、ニッケル(Ni)、コバルト(Co)、これらの合金又はこれらの組み合わせを含み、
前記有機防錆層は、アゾール系化合物、シラン系化合物、又はこれらの組み合わせを含む、請求項8に記載の表面処理銅箔。 - 銅箔を、ニッケル塩約5g/L乃至約15g/L及び銅塩約5g/L乃至約20g/Lを含む1次電解液に浸漬し、約25℃乃至約45℃の液温度及び約1A/dm2乃至約5A/dm2の電流密度で約1秒乃至約5秒間1次めっきした後、銅塩約40g/L乃至約70g/L及び硫酸約100g/L乃至約150g/Lを含む2次電解液に浸漬し、約25℃乃至約45℃の液温度及び約10A/dm2乃至約20A/dm2の電流密度で約1秒乃至約5秒間2次めっきする段階を含む、請求項1乃至請求項9のいずれか1項の表面処理銅箔の製造方法。
- 請求項1乃至請求項9のいずれか一つの表面処理銅箔上に負極活物質がコーティングされている二次電池用負極。
- 前記負極活物質は、炭素、金属、金属酸化物、金属炭化物又はこれらの組み合わせを含む、請求項11に記載の二次電池用負極。
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