JP2023098599A5 - - Google Patents

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Publication number
JP2023098599A5
JP2023098599A5 JP2022163154A JP2022163154A JP2023098599A5 JP 2023098599 A5 JP2023098599 A5 JP 2023098599A5 JP 2022163154 A JP2022163154 A JP 2022163154A JP 2022163154 A JP2022163154 A JP 2022163154A JP 2023098599 A5 JP2023098599 A5 JP 2023098599A5
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JP
Japan
Prior art keywords
plasma processing
width
grooves
ring
processing apparatus
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JP2022163154A
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English (en)
Japanese (ja)
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JP2023098599A (ja
JP7825538B2 (ja
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Publication date
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Priority to KR1020220176455A priority Critical patent/KR20230100629A/ko
Priority to TW111148421A priority patent/TW202341228A/zh
Priority to CN202211639069.XA priority patent/CN116364516A/zh
Priority to US18/085,583 priority patent/US12412735B2/en
Publication of JP2023098599A publication Critical patent/JP2023098599A/ja
Publication of JP2023098599A5 publication Critical patent/JP2023098599A5/ja
Priority to US19/295,726 priority patent/US20250364226A1/en
Application granted granted Critical
Publication of JP7825538B2 publication Critical patent/JP7825538B2/ja
Active legal-status Critical Current
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JP2022163154A 2021-12-28 2022-10-11 プラズマ処理装置 Active JP7825538B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020220176455A KR20230100629A (ko) 2021-12-28 2022-12-16 플라즈마 처리 장치
TW111148421A TW202341228A (zh) 2021-12-28 2022-12-16 電漿處理裝置
CN202211639069.XA CN116364516A (zh) 2021-12-28 2022-12-20 等离子体处理装置
US18/085,583 US12412735B2 (en) 2021-12-28 2022-12-21 Plasma processing apparatus
US19/295,726 US20250364226A1 (en) 2021-12-28 2025-08-11 Plasma processing apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021215091 2021-12-28
JP2021215091 2021-12-28

Publications (3)

Publication Number Publication Date
JP2023098599A JP2023098599A (ja) 2023-07-10
JP2023098599A5 true JP2023098599A5 (enExample) 2025-03-04
JP7825538B2 JP7825538B2 (ja) 2026-03-06

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ID=87072356

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JP2022163154A Active JP7825538B2 (ja) 2021-12-28 2022-10-11 プラズマ処理装置

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JP (1) JP7825538B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202601866A (zh) * 2024-02-29 2026-01-01 日商東京威力科創股份有限公司 基板處理系統及搬運機械臂之教導方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6888007B2 (ja) 2016-01-26 2021-06-16 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated ウェハエッジリングの持ち上げに関する解決
JP6859426B2 (ja) 2018-08-13 2021-04-14 ラム リサーチ コーポレーションLam Research Corporation エッジリングの位置決めおよびセンタリング機構を組み込んだプラズマシース調整のための交換可能および/または折りたたみ式エッジリングアセンブリ
JP7134104B2 (ja) 2019-01-09 2022-09-09 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理装置の載置台
JP7550603B2 (ja) 2020-03-03 2024-09-13 東京エレクトロン株式会社 プラズマ処理システム及びエッジリングの交換方法

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