JP2023086715A5 - - Google Patents

Info

Publication number
JP2023086715A5
JP2023086715A5 JP2022197157A JP2022197157A JP2023086715A5 JP 2023086715 A5 JP2023086715 A5 JP 2023086715A5 JP 2022197157 A JP2022197157 A JP 2022197157A JP 2022197157 A JP2022197157 A JP 2022197157A JP 2023086715 A5 JP2023086715 A5 JP 2023086715A5
Authority
JP
Japan
Prior art keywords
group
general formula
photosensitive resin
resin composition
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022197157A
Other languages
English (en)
Japanese (ja)
Other versions
JP2023086715A (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2023086715A publication Critical patent/JP2023086715A/ja
Publication of JP2023086715A5 publication Critical patent/JP2023086715A5/ja
Pending legal-status Critical Current

Links

JP2022197157A 2021-12-10 2022-12-09 感光性樹脂組成物、硬化レリーフパターンの製造方法、および半導体装置 Pending JP2023086715A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021200818 2021-12-10
JP2021200818 2021-12-10

Publications (2)

Publication Number Publication Date
JP2023086715A JP2023086715A (ja) 2023-06-22
JP2023086715A5 true JP2023086715A5 (cg-RX-API-DMAC7.html) 2025-09-24

Family

ID=86678281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022197157A Pending JP2023086715A (ja) 2021-12-10 2022-12-09 感光性樹脂組成物、硬化レリーフパターンの製造方法、および半導体装置

Country Status (3)

Country Link
JP (1) JP2023086715A (cg-RX-API-DMAC7.html)
CN (1) CN116256946A (cg-RX-API-DMAC7.html)
TW (1) TWI852213B (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202540078A (zh) * 2023-11-13 2025-10-16 日商三菱瓦斯化學股份有限公司 半導體製造用組成物
CN118684890B (zh) * 2024-07-19 2025-01-21 波米科技有限公司 一种含氮杂环的聚硅氧烷及其制备方法和应用

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7117316B2 (en) * 2002-08-05 2006-10-03 Micron Technology, Inc. Memory hub and access method having internal row caching
CN113820920B (zh) * 2016-03-31 2023-07-04 旭化成株式会社 感光性树脂组合物、固化浮雕图案的制造方法和半导体装置

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