JP2023081830A - スーパーストレート及びその使用方法 - Google Patents

スーパーストレート及びその使用方法 Download PDF

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Publication number
JP2023081830A
JP2023081830A JP2022141506A JP2022141506A JP2023081830A JP 2023081830 A JP2023081830 A JP 2023081830A JP 2022141506 A JP2022141506 A JP 2022141506A JP 2022141506 A JP2022141506 A JP 2022141506A JP 2023081830 A JP2023081830 A JP 2023081830A
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JP
Japan
Prior art keywords
superstrate
substrate
chamfered edge
layer
moldable material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2022141506A
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English (en)
Japanese (ja)
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JP2023081830A5 (https=
Inventor
シー シャックレトン スティーブン
C Shackleton Steven
ニャーズ クスナトディノフ
Khusnatdinov Niyaz
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Canon Inc
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Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of JP2023081830A publication Critical patent/JP2023081830A/ja
Publication of JP2023081830A5 publication Critical patent/JP2023081830A5/ja
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/74—UV-absorbing coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/355—Temporary coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Measurement Of Radiation (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Light Receiving Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2022141506A 2021-12-01 2022-09-06 スーパーストレート及びその使用方法 Withdrawn JP2023081830A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17/457,146 US12195382B2 (en) 2021-12-01 2021-12-01 Superstrate and a method of using the same
US17/457,146 2021-12-01

Publications (2)

Publication Number Publication Date
JP2023081830A true JP2023081830A (ja) 2023-06-13
JP2023081830A5 JP2023081830A5 (https=) 2025-07-29

Family

ID=86500816

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022141506A Withdrawn JP2023081830A (ja) 2021-12-01 2022-09-06 スーパーストレート及びその使用方法

Country Status (4)

Country Link
US (1) US12195382B2 (https=)
JP (1) JP2023081830A (https=)
KR (1) KR20230082569A (https=)
TW (1) TW202333930A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20260015096A (ko) 2024-07-24 2026-02-02 신에쓰 가가꾸 고교 가부시끼가이샤 규소 함유막 형성용 조성물, 막 형성 방법, 및 슈퍼 스트레이트

Family Cites Families (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2738700A (en) 1949-06-20 1956-03-20 Northrop Aircraft Inc Glare-stopped optical system
US2632270A (en) 1952-07-07 1953-03-24 Moss Bros Ltd Character blocks for illuminated signs
GB770643A (en) 1953-08-12 1957-03-20 Pearce Signs Ltd Improvements in signs
US4106856A (en) 1976-07-06 1978-08-15 The Perkin-Elmer Corporation Stray light control in an optical system
JPS5913900U (ja) 1982-07-20 1984-01-27 東海火工株式会社 怪獣花火
US5736424A (en) 1987-02-27 1998-04-07 Lucent Technologies Inc. Device fabrication involving planarization
US4910380A (en) 1987-07-21 1990-03-20 Flachglass Aktiengesellschaft Vehicle window with black obscuration band incorporating a black electrically conductive coating-deposited heating element
US6309755B1 (en) 1999-06-22 2001-10-30 Exatec, Llc. Process and panel for providing fixed glazing for an automotive vehicle
US6589889B2 (en) 1999-09-09 2003-07-08 Alliedsignal Inc. Contact planarization using nanoporous silica materials
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US7241395B2 (en) 2004-09-21 2007-07-10 Molecular Imprints, Inc. Reverse tone patterning on surfaces having planarity perturbations
US20060266916A1 (en) * 2005-05-25 2006-11-30 Molecular Imprints, Inc. Imprint lithography template having a coating to reflect and/or absorb actinic energy
US8011916B2 (en) * 2005-09-06 2011-09-06 Canon Kabushiki Kaisha Mold, imprint apparatus, and process for producing structure
JP5182470B2 (ja) * 2007-07-17 2013-04-17 大日本印刷株式会社 インプリントモールド
TWI352690B (en) 2007-09-28 2011-11-21 Ether Precision Inc The molding die of molding glasses and its recycli
KR101298609B1 (ko) 2008-02-19 2013-08-26 엘지디스플레이 주식회사 멀티패널 표시장치
WO2009151560A2 (en) 2008-06-09 2009-12-17 Board Of Regents, The University Of Texas System Adaptive nanotopography sculpting
TW201022017A (en) 2008-09-30 2010-06-16 Molecular Imprints Inc Particle mitigation for imprint lithography
US8470188B2 (en) 2008-10-02 2013-06-25 Molecular Imprints, Inc. Nano-imprint lithography templates
US20100104852A1 (en) 2008-10-23 2010-04-29 Molecular Imprints, Inc. Fabrication of High-Throughput Nano-Imprint Lithography Templates
US20100109201A1 (en) 2008-10-31 2010-05-06 Molecular Imprints, Inc. Nano-Imprint Lithography Template with Ordered Pore Structure
US20100109195A1 (en) 2008-11-05 2010-05-06 Molecular Imprints, Inc. Release agent partition control in imprint lithography
JP2009149097A (ja) 2009-02-04 2009-07-09 Toshiba Corp インプリント加工用スタンパーおよびその製造方法
EP2470956B1 (en) 2009-08-26 2018-02-14 Molecular Imprints, Inc. Functional nanoparticles
JP5769734B2 (ja) 2010-02-05 2015-08-26 モレキュラー・インプリンツ・インコーポレーテッド 高コントラスト位置合わせマークを有するテンプレート
US8541053B2 (en) 2010-07-08 2013-09-24 Molecular Imprints, Inc. Enhanced densification of silicon oxide layers
KR101861644B1 (ko) 2010-09-24 2018-05-28 캐논 나노테크놀로지즈 인코퍼레이티드 다단계 임프린팅을 통한 고콘트라스트 정렬 마크
WO2013027366A1 (ja) * 2011-08-25 2013-02-28 パナソニック株式会社 プラスチックレンズ
KR102292465B1 (ko) 2013-08-19 2021-08-20 보드 오브 레젼츠, 더 유니버시티 오브 텍사스 시스템 나노미터 스케일 정확도를 갖는 사용자 정의 프로파일의 프로그램 가능한 박막 적층 방법
JP2015144193A (ja) * 2014-01-31 2015-08-06 株式会社東芝 インプリント方法、テンプレートおよびインプリント装置
CN121551242A (zh) 2015-10-15 2026-02-24 德克萨斯大学系统董事会 用于精密纳米尺度制造的通用过程
KR102336560B1 (ko) * 2016-05-25 2021-12-08 다이니폰 인사츠 가부시키가이샤 템플릿 및 템플릿 블랭크, 그리고 임프린트용 템플릿 기판의 제조 방법, 임프린트용 템플릿의 제조 방법 및 템플릿
US10935883B2 (en) * 2017-09-29 2021-03-02 Canon Kabushiki Kaisha Nanoimprint template with light blocking material and method of fabrication
US11126083B2 (en) 2018-01-24 2021-09-21 Canon Kabushiki Kaisha Superstrate and a method of using the same
US10606171B2 (en) 2018-02-14 2020-03-31 Canon Kabushiki Kaisha Superstrate and a method of using the same
US10921706B2 (en) * 2018-06-07 2021-02-16 Canon Kabushiki Kaisha Systems and methods for modifying mesa sidewalls
US10990004B2 (en) * 2018-07-18 2021-04-27 Canon Kabushiki Kaisha Photodissociation frame window, systems including a photodissociation frame window, and methods of using a photodissociation frame window
US11281095B2 (en) * 2018-12-05 2022-03-22 Canon Kabushiki Kaisha Frame curing template and system and method of using the frame curing template
US10892167B2 (en) * 2019-03-05 2021-01-12 Canon Kabushiki Kaisha Gas permeable superstrate and methods of using the same
JP2021027257A (ja) * 2019-08-07 2021-02-22 キオクシア株式会社 テンプレート、テンプレートの製造方法、パターン形成方法、及び半導体装置の製造方法
JP2021057361A (ja) * 2019-09-26 2021-04-08 キオクシア株式会社 欠陥修正方法およびテンプレートの製造方法
US11776840B2 (en) * 2019-10-29 2023-10-03 Canon Kabushiki Kaisha Superstrate chuck, method of use, and method of manufacturing an article
JP7346268B2 (ja) * 2019-12-05 2023-09-19 キヤノン株式会社 インプリント用のテンプレート、テンプレートを用いたインプリント方法
US20210181621A1 (en) * 2019-12-12 2021-06-17 Canon Kabushiki Kaisha Systems and Methods for Curing an Imprinted Film
US11422460B2 (en) * 2019-12-12 2022-08-23 Canon Kabushiki Kaisha Alignment control in nanoimprint lithography using feedback and feedforward control
US11541577B2 (en) * 2019-12-18 2023-01-03 Canon Kabushiki Kaisha Template apparatus and methods of using the same
US11562924B2 (en) * 2020-01-31 2023-01-24 Canon Kabushiki Kaisha Planarization apparatus, planarization process, and method of manufacturing an article
US12130549B2 (en) * 2021-09-27 2024-10-29 Canon Kabushiki Kaisha Method of manufacturing a template

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20260015096A (ko) 2024-07-24 2026-02-02 신에쓰 가가꾸 고교 가부시끼가이샤 규소 함유막 형성용 조성물, 막 형성 방법, 및 슈퍼 스트레이트
EP4700067A1 (en) 2024-07-24 2026-02-25 Shin-Etsu Chemical Co., Ltd. Composition for forming silicon-containing film, method for forming film, and superstrate

Also Published As

Publication number Publication date
KR20230082569A (ko) 2023-06-08
US20230167017A1 (en) 2023-06-01
US12195382B2 (en) 2025-01-14
TW202333930A (zh) 2023-09-01

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