JP2023067802A - 基板処理装置およびそれを用いた基板処理方法 - Google Patents
基板処理装置およびそれを用いた基板処理方法 Download PDFInfo
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- 238000012545 processing Methods 0.000 claims description 51
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J29/00—Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
- B41J29/38—Drives, motors, controls or automatic cut-off devices for the entire printing mechanism
- B41J29/393—Devices for controlling or analysing the entire machine ; Controlling or analysing mechanical parameters involving printing of test patterns
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- H—ELECTRICITY
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- H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
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Abstract
Description
前記基板処理装置は、前記第1離隔距離と前記第2離隔距離をリアルタイムでモニタリングできる制御モジュールをさらに含む。
前記基板処理方法は、前記第1離隔距離、前記第2離隔距離、および前記第3離隔距離の差をモニタリングすることをさらに含む。
前記ステージと前記ノズルユニットの間の高さと、前記ステージと前記変位センサの間の高さは同一である。
150 基板
200 ガントリ
300 ヘッドモジュール
310 本体
320 ノズルユニット
330 変位センサ
400 グリッパ
500 移送レール
600 制御モジュール
Claims (20)
- 第1方向に延びて、基板を前記第1方向に移動させるステージであって、前記ステージはエアーフローティングシステムを備えたステージと、
前記ステージ上に、前記第1方向と交差する第2方向に延びるガントリと、
前記ガントリに設けられ、前記第2方向に移動可能なヘッドモジュールと、
前記ヘッドモジュール内に設けられ、前記基板と前記ステージの間の離隔距離を測定する変位センサを含み、
第1位置で、前記ヘッドモジュールが前記基板にインクを吐出し、前記変位センサは前記基板と前記ステージの間の第1離隔距離を測定し、
前記第1位置と異なる第2位置で、前記ヘッドモジュールが前記基板にインクを吐出し、前記変位センサは前記基板と前記ステージの間の第2離隔距離を測定する、基板処理装置。 - 前記第1離隔距離と前記第2離隔距離の差が既に設定された値を超えると、前記ステージのメンテナンス作業を行う、請求項1に記載の基板処理装置。
- 前記ヘッドモジュールは前記基板に向かって前記インクを吐出するノズルユニットを含み、
前記ステージと前記ノズルユニットの間の高さと、前記ステージと前記変位センサの間の高さは同じである、請求項1に記載の基板処理装置。 - 前記ステージの一側に設けられて前記基板を把持するグリッパをさらに含む、請求項1に記載の基板処理装置。
- 前記変位センサは前記グリッパの平坦度を測定する、請求項4に記載の基板処理装置。
- 前記第1位置と前記第2位置は前記第2方向に離隔した、請求項1に記載の基板処理装置。
- 前記第1離隔距離と前記第2離隔距離をリアルタイムでモニタリングできる制御モジュールをさらに含む、請求項1に記載の基板処理装置。
- 前記ステージは第1領域と前記第1領域の間の第2領域を含み、
前記第1位置と前記第2位置は前記ステージの前記第2領域と重なる、請求項1に記載の基板処理装置。 - 前記第1領域は前記基板に向かってエアーを噴射する領域であり、
前記第2領域は前記基板に向かってエアーを噴射し、前記基板と前記ステージの間のエアーを吸い込む領域である、請求項8に記載の基板処理装置。 - 第1方向に延びて、基板を前記第1方向に移動させるステージであって、前記ステージはエアーフローティングシステムを備えたステージと、
前記ステージの一側に設けられて前記基板を把持するグリッパと、
前記ステージ上に、前記第1方向と交差する第2方向に延びるガントリと、
前記ガントリに設けられ、前記第2方向に移動可能なヘッドモジュールと、
前記ヘッドモジュール内に設けられ、前記基板と前記ステージの間の離隔距離を測定する変位センサを含み、
第1位置で、前記ヘッドモジュールが前記基板にインクを吐出し、前記変位センサは前記基板と前記ステージの間の第1離隔距離を測定し、
前記第1位置と異なる第2位置で、前記ヘッドモジュールが前記基板にインクを吐出し、前記変位センサは前記基板と前記ステージの間の第2離隔距離を測定し、
前記第1および第2位置と異なる第3位置で前記変位センサは前記グリッパの平坦度を測定する、基板処理装置。 - 前記第1位置と前記第2位置は前記第2方向に離隔した、請求項10に記載の基板処理装置。
- 前記第1離隔距離と前記第2離隔距離をリアルタイムでモニタリングできる制御モジュールをさらに含む、請求項10に記載の基板処理装置。
- 前記ステージは第1領域と前記第1領域の間の第2領域を含み、
前記第1位置と前記第2位置は前記ステージの前記第2領域と重なる、請求項10に記載の基板処理装置。 - 前記第1領域は前記基板に向かってエアーを噴射する領域であり、
前記第2領域は前記基板に向かってエアーを噴射し、前記基板と前記ステージの間のエアーを吸い込む領域である、請求項13に記載の基板処理装置。 - 前記ヘッドモジュールは前記基板に向かって前記インクを吐出するノズルユニットを含み、
前記ステージと前記ノズルユニットの間の高さと、前記ステージと前記変位センサの間の高さは同じである、請求項10に記載の基板処理装置。 - 第1方向に延びて、基板を前記第1方向に移動させるステージを提供し、
前記ステージ上に、前記第1方向と交差する第2方向に移動可能なヘッドモジュールを提供し、
第1位置で、前記ヘッドモジュール内に設けられた変位センサにより前記基板と前記ステージの間の第1離隔距離を測定し、
前記第1位置と異なる第2位置で前記変位センサにより前記基板と前記ステージの間の第2離隔距離を測定し、
前記第1離隔距離と前記第2離隔距離の差をモニタリングすることを含む、基板処理方法。 - 前記第1離隔距離と前記第2離隔距離の差が既に設定された値を超えると、前記ステージのメンテナンス作業を行うことをさらに含む、請求項16に記載の基板処理方法。
- 前記第1位置および前記第2位置と異なる第3位置で、前記変位センサにより前記基板と前記ステージの間の第3離隔距離を測定することをさらに含む、請求項16に記載の基板処理方法。
- 前記第1離隔距離、前記第2離隔距離、および前記第3離隔距離の差をモニタリングすることをさらに含む、請求項18に記載の基板処理方法。
- 前記ヘッドモジュールは前記基板に向かってインクを吐出するノズルユニットを含み、
前記ステージと前記ノズルユニットの間の高さと、前記ステージと前記変位センサの間の高さは同じである、請求項16に記載の基板処理方法。
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JP2006210393A (ja) * | 2005-01-25 | 2006-08-10 | Dainippon Printing Co Ltd | 基板加工装置、基板搬送装置、基板制御方法 |
JP2010232472A (ja) * | 2009-03-27 | 2010-10-14 | Dainippon Screen Mfg Co Ltd | 基板搬送装置および基板処理装置 |
JP2014183243A (ja) * | 2013-03-21 | 2014-09-29 | Hitachi High-Tech Instruments Co Ltd | 電子部品装着装置における装着ヘッドの高さ検出方法及び電子部品装着装置 |
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JP4673180B2 (ja) | 2005-10-13 | 2011-04-20 | 東京エレクトロン株式会社 | 塗布装置及び塗布方法 |
ITVI20120278A1 (it) | 2012-10-22 | 2014-04-23 | New System Srl | Gruppo di stampa del tipo perfezionato e dispositivo di stampa a getto d'inchiostro comprendente il suddetto gruppo di stampa |
JP6312959B2 (ja) | 2013-07-17 | 2018-04-18 | セーレン株式会社 | インクジェット記録装置 |
JP6890438B2 (ja) | 2017-03-03 | 2021-06-18 | 株式会社Screenホールディングス | 浮上量算出装置、塗布装置および塗布方法 |
JP6738373B2 (ja) | 2018-05-31 | 2020-08-12 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
KR20230062138A (ko) * | 2021-10-29 | 2023-05-09 | 세메스 주식회사 | 기판 처리 장치 및 이를 이용한 기판 처리 방법 |
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JP2006210393A (ja) * | 2005-01-25 | 2006-08-10 | Dainippon Printing Co Ltd | 基板加工装置、基板搬送装置、基板制御方法 |
JP2010232472A (ja) * | 2009-03-27 | 2010-10-14 | Dainippon Screen Mfg Co Ltd | 基板搬送装置および基板処理装置 |
JP2014183243A (ja) * | 2013-03-21 | 2014-09-29 | Hitachi High-Tech Instruments Co Ltd | 電子部品装着装置における装着ヘッドの高さ検出方法及び電子部品装着装置 |
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US11964471B2 (en) | 2024-04-23 |
JP7454027B2 (ja) | 2024-03-21 |
US20230133599A1 (en) | 2023-05-04 |
KR20230062138A (ko) | 2023-05-09 |
CN116061575A (zh) | 2023-05-05 |
US20230137402A1 (en) | 2023-05-04 |
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