JP2023066566A - 照明光学系及びレーザ加工装置 - Google Patents

照明光学系及びレーザ加工装置 Download PDF

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Publication number
JP2023066566A
JP2023066566A JP2021177224A JP2021177224A JP2023066566A JP 2023066566 A JP2023066566 A JP 2023066566A JP 2021177224 A JP2021177224 A JP 2021177224A JP 2021177224 A JP2021177224 A JP 2021177224A JP 2023066566 A JP2023066566 A JP 2023066566A
Authority
JP
Japan
Prior art keywords
lens array
optical system
axis
section
illumination optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021177224A
Other languages
English (en)
Japanese (ja)
Inventor
勝 山賀
Masaru Yamaga
裕之 鷲山
Hiroyuki Washiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orc Manufacturing Co Ltd
Original Assignee
Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd
Priority to JP2021177224A priority Critical patent/JP2023066566A/ja
Priority to TW111128738A priority patent/TW202317300A/zh
Priority to KR1020220096672A priority patent/KR20230062357A/ko
Priority to CN202211082532.5A priority patent/CN116060797A/zh
Publication of JP2023066566A publication Critical patent/JP2023066566A/ja
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70—Auxiliary operations or equipment
    • B23K26/702—Auxiliary equipment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0966—Cylindrical lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/12—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having three components only
    • G02B9/14—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having three components only arranged + - +
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
JP2021177224A 2021-10-29 2021-10-29 照明光学系及びレーザ加工装置 Pending JP2023066566A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2021177224A JP2023066566A (ja) 2021-10-29 2021-10-29 照明光学系及びレーザ加工装置
TW111128738A TW202317300A (zh) 2021-10-29 2022-08-01 照明光學系統以及雷射加工裝置
KR1020220096672A KR20230062357A (ko) 2021-10-29 2022-08-03 조명 광학계 및 레이저 가공 장치
CN202211082532.5A CN116060797A (zh) 2021-10-29 2022-09-06 照明光学系统和激光加工装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021177224A JP2023066566A (ja) 2021-10-29 2021-10-29 照明光学系及びレーザ加工装置

Publications (1)

Publication Number Publication Date
JP2023066566A true JP2023066566A (ja) 2023-05-16

Family

ID=86168825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021177224A Pending JP2023066566A (ja) 2021-10-29 2021-10-29 照明光学系及びレーザ加工装置

Country Status (4)

Country Link
JP (1) JP2023066566A (zh)
KR (1) KR20230062357A (zh)
CN (1) CN116060797A (zh)
TW (1) TW202317300A (zh)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3191702B2 (ja) 1996-11-25 2001-07-23 住友重機械工業株式会社 ビームホモジナイザ
JP4859311B2 (ja) 2001-09-17 2012-01-25 株式会社リコー レーザ照明光学系、該光学系を用いた露光装置、レーザ加工機、及び投射装置

Also Published As

Publication number Publication date
TW202317300A (zh) 2023-05-01
CN116060797A (zh) 2023-05-05
KR20230062357A (ko) 2023-05-09

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