JP2023048535A5 - - Google Patents

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Publication number
JP2023048535A5
JP2023048535A5 JP2021157909A JP2021157909A JP2023048535A5 JP 2023048535 A5 JP2023048535 A5 JP 2023048535A5 JP 2021157909 A JP2021157909 A JP 2021157909A JP 2021157909 A JP2021157909 A JP 2021157909A JP 2023048535 A5 JP2023048535 A5 JP 2023048535A5
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JP
Japan
Prior art keywords
substrate
exposure
wavelength
light
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2021157909A
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English (en)
Japanese (ja)
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JP2023048535A (ja
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Application filed filed Critical
Priority to JP2021157909A priority Critical patent/JP2023048535A/ja
Priority claimed from JP2021157909A external-priority patent/JP2023048535A/ja
Priority to TW111134093A priority patent/TW202321827A/zh
Priority to KR1020220116756A priority patent/KR20230045544A/ko
Priority to US17/934,512 priority patent/US12379667B2/en
Publication of JP2023048535A publication Critical patent/JP2023048535A/ja
Publication of JP2023048535A5 publication Critical patent/JP2023048535A5/ja
Withdrawn legal-status Critical Current

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JP2021157909A 2021-09-28 2021-09-28 露光装置、露光方法および半導体装置の製造方法 Withdrawn JP2023048535A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2021157909A JP2023048535A (ja) 2021-09-28 2021-09-28 露光装置、露光方法および半導体装置の製造方法
TW111134093A TW202321827A (zh) 2021-09-28 2022-09-08 曝光設備、曝光方法、及半導體裝置的製造方法
KR1020220116756A KR20230045544A (ko) 2021-09-28 2022-09-16 노광장치, 노광방법 및 반도체장치의 제조방법
US17/934,512 US12379667B2 (en) 2021-09-28 2022-09-22 Exposure apparatus, exposure method, and manufacturing method for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021157909A JP2023048535A (ja) 2021-09-28 2021-09-28 露光装置、露光方法および半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JP2023048535A JP2023048535A (ja) 2023-04-07
JP2023048535A5 true JP2023048535A5 (enExample) 2024-09-25

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JP2021157909A Withdrawn JP2023048535A (ja) 2021-09-28 2021-09-28 露光装置、露光方法および半導体装置の製造方法

Country Status (4)

Country Link
US (1) US12379667B2 (enExample)
JP (1) JP2023048535A (enExample)
KR (1) KR20230045544A (enExample)
TW (1) TW202321827A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102024111453A1 (de) * 2024-04-24 2025-10-30 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2619473B2 (ja) 1987-06-17 1997-06-11 株式会社日立製作所 縮小投影露光方法
JPH07153658A (ja) 1993-11-29 1995-06-16 Sony Corp 投影露光方法およびこれに用いる投影露光装置
JP7222659B2 (ja) 2018-10-29 2023-02-15 キヤノン株式会社 露光装置、および物品製造方法
KR20220029480A (ko) * 2020-09-01 2022-03-08 캐논 가부시끼가이샤 노광 장치, 노광 방법, 및 반도체 장치의 제조방법
EP4050416A1 (en) * 2021-02-25 2022-08-31 ASML Netherlands B.V. Lithographic method

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