JP2022547945A5 - - Google Patents

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Publication number
JP2022547945A5
JP2022547945A5 JP2022515619A JP2022515619A JP2022547945A5 JP 2022547945 A5 JP2022547945 A5 JP 2022547945A5 JP 2022515619 A JP2022515619 A JP 2022515619A JP 2022515619 A JP2022515619 A JP 2022515619A JP 2022547945 A5 JP2022547945 A5 JP 2022547945A5
Authority
JP
Japan
Prior art keywords
substrate
array
horizontal hall
overcoat layer
protective overcoat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022515619A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022547945A (ja
Filing date
Publication date
Priority claimed from US16/565,130 external-priority patent/US20210072327A1/en
Application filed filed Critical
Publication of JP2022547945A publication Critical patent/JP2022547945A/ja
Publication of JP2022547945A5 publication Critical patent/JP2022547945A5/ja
Priority to JP2025201601A priority Critical patent/JP2026015580A/ja
Pending legal-status Critical Current

Links

JP2022515619A 2019-09-09 2020-09-08 面外方向磁場集中のための磁束コンセントレータ Pending JP2022547945A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025201601A JP2026015580A (ja) 2019-09-09 2025-11-21 面外方向磁場集中のための磁束コンセントレータ

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/565,130 2019-09-09
US16/565,130 US20210072327A1 (en) 2019-09-09 2019-09-09 Magnetic flux concentrator for out-of-plane direction magnetic field concentration
PCT/US2020/049640 WO2021050406A1 (en) 2019-09-09 2020-09-08 Magnetic flux concentrator for out-of-plane direction magnetic field concentration

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025201601A Division JP2026015580A (ja) 2019-09-09 2025-11-21 面外方向磁場集中のための磁束コンセントレータ

Publications (2)

Publication Number Publication Date
JP2022547945A JP2022547945A (ja) 2022-11-16
JP2022547945A5 true JP2022547945A5 (https=) 2023-09-14

Family

ID=74850867

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022515619A Pending JP2022547945A (ja) 2019-09-09 2020-09-08 面外方向磁場集中のための磁束コンセントレータ
JP2025201601A Pending JP2026015580A (ja) 2019-09-09 2025-11-21 面外方向磁場集中のための磁束コンセントレータ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025201601A Pending JP2026015580A (ja) 2019-09-09 2025-11-21 面外方向磁場集中のための磁束コンセントレータ

Country Status (5)

Country Link
US (1) US20210072327A1 (https=)
EP (1) EP4028786A4 (https=)
JP (2) JP2022547945A (https=)
CN (1) CN114364999A (https=)
WO (1) WO2021050406A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3992652B1 (en) * 2020-11-03 2026-04-15 Melexis Technologies SA Magnetic sensor device
US20250218636A1 (en) * 2023-12-28 2025-07-03 Daniel Jones Spherical magnetic flux concentrator
US12613295B2 (en) * 2024-04-23 2026-04-28 Texas Instruments Incorporated Vertical hall sensor with integrated trace

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3223686B2 (ja) * 1994-01-28 2001-10-29 松下電器産業株式会社 磁気センサー装置
DE59609089D1 (de) * 1995-10-30 2002-05-23 Sentron Ag Zug Magnetfeldsensor und Strom- oder Energiesensor
JPH09129944A (ja) * 1995-10-31 1997-05-16 Hitachi Ltd 磁電変換素子
US7358724B2 (en) * 2005-05-16 2008-04-15 Allegro Microsystems, Inc. Integrated magnetic flux concentrator
EP2960667A1 (en) * 2006-04-13 2015-12-30 Asahi Kasei EMD Corporation Magnetic sensor and method for fabricating the same
JP5434542B2 (ja) * 2009-12-07 2014-03-05 パナソニック株式会社 入力装置
IT1397983B1 (it) * 2010-02-05 2013-02-04 St Microelectronics Srl Sensore magnetico integrato di rilevamento di campi magnetici verticali e relativo procedimento di fabbricazione
US9000763B2 (en) * 2011-02-28 2015-04-07 Infineon Technologies Ag 3-D magnetic sensor
DE102011114773B4 (de) * 2011-09-30 2017-09-21 Infineon Technologies Ag Vorrichtung mit einem Backbias-Magneten und einem Halbleiterchipelement und zugehöriges Herstellungsverfahren
US20140028305A1 (en) * 2012-07-27 2014-01-30 International Business Machines Corporation Hall measurement system with rotary magnet
KR20140077590A (ko) * 2012-12-14 2014-06-24 삼성전기주식회사 홀 센서 및 그 제조 방법
KR101876587B1 (ko) * 2013-03-08 2018-08-03 매그나칩 반도체 유한회사 자기 센서 및 그 제조 방법
KR101768254B1 (ko) * 2013-06-12 2017-08-16 매그나칩 반도체 유한회사 반도체 기반의 자기 센서 및 그 제조 방법
US9523745B2 (en) * 2015-02-19 2016-12-20 Sii Semiconductor Corporation Magnetic sensor and method of manufacturing the same
US9741924B2 (en) * 2015-02-26 2017-08-22 Sii Semiconductor Corporation Magnetic sensor having a recessed die pad
CN104834021B (zh) * 2015-05-11 2018-06-22 上海集成电路研发中心有限公司 一种地磁传感器灵敏度的计算方法
JP2017166927A (ja) * 2016-03-15 2017-09-21 エスアイアイ・セミコンダクタ株式会社 磁気センサおよびその製造方法
RU2656237C2 (ru) * 2016-07-14 2018-06-04 Роберт Дмитриевич Тихонов Магнитный датчик тока с пленочным концентратором
EP3276365B1 (en) * 2016-07-26 2020-02-12 Melexis Technologies SA A sensor device with a soft magnetic alloy having reduced coercivity, and method for making same
US11237223B2 (en) * 2019-07-24 2022-02-01 Texas Instruments Incorporated Magnetic flux concentrator for in-plane direction magnetic field concentration

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