JP2022547945A - 面外方向磁場集中のための磁束コンセントレータ - Google Patents

面外方向磁場集中のための磁束コンセントレータ Download PDF

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Publication number
JP2022547945A
JP2022547945A JP2022515619A JP2022515619A JP2022547945A JP 2022547945 A JP2022547945 A JP 2022547945A JP 2022515619 A JP2022515619 A JP 2022515619A JP 2022515619 A JP2022515619 A JP 2022515619A JP 2022547945 A JP2022547945 A JP 2022547945A
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Prior art keywords
substrate
concentrators
magnetic
horizontal hall
array
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JP2022515619A
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Japanese (ja)
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JP2022547945A5 (https=
Inventor
成 美藤
スタッセン クック ベンジャミン
ウォン リー ドック
ライヤン グリーン キース
健二 大竹
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テキサス インスツルメンツ インコーポレイテッド
日本テキサス・インスツルメンツ合同会社
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Publication of JP2022547945A publication Critical patent/JP2022547945A/ja
Publication of JP2022547945A5 publication Critical patent/JP2022547945A5/ja
Priority to JP2025201601A priority Critical patent/JP2026015580A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/0011—Arrangements or instruments for measuring magnetic variables comprising means, e.g. flux concentrators, flux guides, for guiding or concentrating the magnetic flux, e.g. to the magnetic sensor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P3/00—Measuring linear or angular speed; Measuring differences of linear or angular speeds
    • G01P3/42—Devices characterised by the use of electric or magnetic means
    • G01P3/50—Devices characterised by the use of electric or magnetic means for measuring linear speed
    • G01P3/52—Devices characterised by the use of electric or magnetic means for measuring linear speed by measuring amplitude of generated current or voltage
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/07—Hall effect devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Measuring Magnetic Variables (AREA)
  • Hall/Mr Elements (AREA)
JP2022515619A 2019-09-09 2020-09-08 面外方向磁場集中のための磁束コンセントレータ Pending JP2022547945A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025201601A JP2026015580A (ja) 2019-09-09 2025-11-21 面外方向磁場集中のための磁束コンセントレータ

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/565,130 2019-09-09
US16/565,130 US20210072327A1 (en) 2019-09-09 2019-09-09 Magnetic flux concentrator for out-of-plane direction magnetic field concentration
PCT/US2020/049640 WO2021050406A1 (en) 2019-09-09 2020-09-08 Magnetic flux concentrator for out-of-plane direction magnetic field concentration

Related Child Applications (1)

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JP2025201601A Division JP2026015580A (ja) 2019-09-09 2025-11-21 面外方向磁場集中のための磁束コンセントレータ

Publications (2)

Publication Number Publication Date
JP2022547945A true JP2022547945A (ja) 2022-11-16
JP2022547945A5 JP2022547945A5 (https=) 2023-09-14

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JP2022515619A Pending JP2022547945A (ja) 2019-09-09 2020-09-08 面外方向磁場集中のための磁束コンセントレータ
JP2025201601A Pending JP2026015580A (ja) 2019-09-09 2025-11-21 面外方向磁場集中のための磁束コンセントレータ

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JP2025201601A Pending JP2026015580A (ja) 2019-09-09 2025-11-21 面外方向磁場集中のための磁束コンセントレータ

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Country Link
US (1) US20210072327A1 (https=)
EP (1) EP4028786A4 (https=)
JP (2) JP2022547945A (https=)
CN (1) CN114364999A (https=)
WO (1) WO2021050406A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250218636A1 (en) * 2023-12-28 2025-07-03 Daniel Jones Spherical magnetic flux concentrator

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3992652B1 (en) * 2020-11-03 2026-04-15 Melexis Technologies SA Magnetic sensor device
US12613295B2 (en) * 2024-04-23 2026-04-28 Texas Instruments Incorporated Vertical hall sensor with integrated trace

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JPH07221362A (ja) * 1994-01-28 1995-08-18 Matsushita Electron Corp 磁気センサー装置、その製造方法およびそれに用いる磁性体の製造方法
JPH09129944A (ja) * 1995-10-31 1997-05-16 Hitachi Ltd 磁電変換素子
US20060255797A1 (en) * 2005-05-16 2006-11-16 Allegro Microsystems, Inc. Integrated magnetic flux concentrator
JP2011118796A (ja) * 2009-12-07 2011-06-16 Panasonic Corp 入力装置
US20120217960A1 (en) * 2011-02-28 2012-08-30 Infineon Technologies Ag 3-d magnetic sensor

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DE59609089D1 (de) * 1995-10-30 2002-05-23 Sentron Ag Zug Magnetfeldsensor und Strom- oder Energiesensor
EP2960667A1 (en) * 2006-04-13 2015-12-30 Asahi Kasei EMD Corporation Magnetic sensor and method for fabricating the same
IT1397983B1 (it) * 2010-02-05 2013-02-04 St Microelectronics Srl Sensore magnetico integrato di rilevamento di campi magnetici verticali e relativo procedimento di fabbricazione
DE102011114773B4 (de) * 2011-09-30 2017-09-21 Infineon Technologies Ag Vorrichtung mit einem Backbias-Magneten und einem Halbleiterchipelement und zugehöriges Herstellungsverfahren
US20140028305A1 (en) * 2012-07-27 2014-01-30 International Business Machines Corporation Hall measurement system with rotary magnet
KR20140077590A (ko) * 2012-12-14 2014-06-24 삼성전기주식회사 홀 센서 및 그 제조 방법
KR101876587B1 (ko) * 2013-03-08 2018-08-03 매그나칩 반도체 유한회사 자기 센서 및 그 제조 방법
KR101768254B1 (ko) * 2013-06-12 2017-08-16 매그나칩 반도체 유한회사 반도체 기반의 자기 센서 및 그 제조 방법
US9523745B2 (en) * 2015-02-19 2016-12-20 Sii Semiconductor Corporation Magnetic sensor and method of manufacturing the same
US9741924B2 (en) * 2015-02-26 2017-08-22 Sii Semiconductor Corporation Magnetic sensor having a recessed die pad
CN104834021B (zh) * 2015-05-11 2018-06-22 上海集成电路研发中心有限公司 一种地磁传感器灵敏度的计算方法
JP2017166927A (ja) * 2016-03-15 2017-09-21 エスアイアイ・セミコンダクタ株式会社 磁気センサおよびその製造方法
RU2656237C2 (ru) * 2016-07-14 2018-06-04 Роберт Дмитриевич Тихонов Магнитный датчик тока с пленочным концентратором
EP3276365B1 (en) * 2016-07-26 2020-02-12 Melexis Technologies SA A sensor device with a soft magnetic alloy having reduced coercivity, and method for making same
US11237223B2 (en) * 2019-07-24 2022-02-01 Texas Instruments Incorporated Magnetic flux concentrator for in-plane direction magnetic field concentration

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07221362A (ja) * 1994-01-28 1995-08-18 Matsushita Electron Corp 磁気センサー装置、その製造方法およびそれに用いる磁性体の製造方法
JPH09129944A (ja) * 1995-10-31 1997-05-16 Hitachi Ltd 磁電変換素子
US20060255797A1 (en) * 2005-05-16 2006-11-16 Allegro Microsystems, Inc. Integrated magnetic flux concentrator
JP2011118796A (ja) * 2009-12-07 2011-06-16 Panasonic Corp 入力装置
US20120217960A1 (en) * 2011-02-28 2012-08-30 Infineon Technologies Ag 3-d magnetic sensor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250218636A1 (en) * 2023-12-28 2025-07-03 Daniel Jones Spherical magnetic flux concentrator

Also Published As

Publication number Publication date
WO2021050406A1 (en) 2021-03-18
CN114364999A (zh) 2022-04-15
US20210072327A1 (en) 2021-03-11
EP4028786A4 (en) 2022-11-09
EP4028786A1 (en) 2022-07-20
JP2026015580A (ja) 2026-01-29

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