JP2022530353A - レーザ溶接によるアセンブリの製造方法 - Google Patents
レーザ溶接によるアセンブリの製造方法 Download PDFInfo
- Publication number
- JP2022530353A JP2022530353A JP2021561694A JP2021561694A JP2022530353A JP 2022530353 A JP2022530353 A JP 2022530353A JP 2021561694 A JP2021561694 A JP 2021561694A JP 2021561694 A JP2021561694 A JP 2021561694A JP 2022530353 A JP2022530353 A JP 2022530353A
- Authority
- JP
- Japan
- Prior art keywords
- steel substrate
- nanoparticles
- titanate
- precoat
- precoated steel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003466 welding Methods 0.000 title claims description 31
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000000758 substrate Substances 0.000 claims abstract description 96
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 78
- 239000010959 steel Substances 0.000 claims abstract description 78
- 239000002105 nanoparticle Substances 0.000 claims abstract description 39
- 239000011248 coating agent Substances 0.000 claims abstract description 38
- 238000000576 coating method Methods 0.000 claims abstract description 38
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052751 metal Inorganic materials 0.000 claims description 40
- 239000002184 metal Substances 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 19
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 16
- 239000011230 binding agent Substances 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 15
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 11
- 239000003960 organic solvent Substances 0.000 claims description 11
- 239000010936 titanium Substances 0.000 claims description 11
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 239000011701 zinc Substances 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- 239000011261 inert gas Substances 0.000 claims description 5
- 239000011777 magnesium Substances 0.000 claims description 5
- 229910052749 magnesium Inorganic materials 0.000 claims description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 239000002243 precursor Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 238000003618 dip coating Methods 0.000 claims description 3
- 239000011572 manganese Substances 0.000 claims description 3
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 238000004528 spin coating Methods 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 2
- 238000005260 corrosion Methods 0.000 abstract 1
- 230000035515 penetration Effects 0.000 description 14
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 11
- 239000000047 product Substances 0.000 description 7
- 229910000975 Carbon steel Inorganic materials 0.000 description 6
- 239000010962 carbon steel Substances 0.000 description 5
- 150000004756 silanes Chemical class 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 230000005355 Hall effect Effects 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 238000002835 absorbance Methods 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000004103 aminoalkyl group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 238000004453 electron probe microanalysis Methods 0.000 description 2
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000003709 fluoroalkyl group Chemical group 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 239000011859 microparticle Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 229910018575 Al—Ti Inorganic materials 0.000 description 1
- 229910000677 High-carbon steel Inorganic materials 0.000 description 1
- 229910000922 High-strength low-alloy steel Inorganic materials 0.000 description 1
- 229910008429 Si—Al—Ti Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/365—Selection of non-metallic compositions of coating materials either alone or conjoint with selection of soldering or welding materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/20—Bonding
- B23K26/21—Bonding by welding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/60—Preliminary treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
- C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/02—Iron or ferrous alloys
- B23K2103/04—Steel or steel alloys
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Ceramic Engineering (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Laminated Bodies (AREA)
- Laser Beam Processing (AREA)
Abstract
Description
-任意選択的に、防食コーティングと、
-少なくとも1つのチタネート及び少なくとも1つのナノ粒子を含むプレコーティングと、
でコーティングされ、
-当該裸鋼基材は、6.0~15.0μmの間のすべての波長で60%以上の反射率を有する、プレコート鋼基材に関する。
-プレコーティングは、少なくともNa2Ti3O7、K2TiO3、K2Ti2O5、MgTiO3、SrTiO3、BaTiO3、CaTiO3、FeTiO3及びZnTiO4又はそれらの混合物の中から選択されるチタネートを含むこと、
-プレコーティングは、少なくともTiO2、SiO2、イットリア安定化ジルコニア(YSZ)、Al2O3、MoO3、CrO3、CeO2又はそれらの混合物から選択されるナノ粒子を含むこと、
-プレコーティングは有機溶媒をさらに含むこと、
-コーティングの厚さは10~140μmの間であること、
-ナノ粒子の割合は80重量%以下であること、
-チタネートの割合は45重量%以上であること、
-裸鋼基材は、6.0~15.0μmの間のすべての波長で70%以上の反射率を有すること、
-防食コーティングは、亜鉛、アルミニウム、銅、ケイ素、鉄、マグネシウム、チタン、ニッケル、クロム、マンガン及びそれらの合金を含む群の中から選択される金属を含むこと、
-少なくとも1つのチタネートの直径は1~40μmの間であること、
である任意の特徴を有してよい。
A.本発明による鋼基材を提供するステップ、
B.本発明によるプレコーティングを堆積するステップ、
C.任意選択的に、ステップB)で得られたコーティングされた金属基材を乾燥させるステップ、
を含む。
-ステップB)において、プレコーティングの堆積は、スピンコーティング、スプレーコーティング、ディップコーティング又はブラシコーティングによって実施されること、
-ステップB)において、プレコーティングは1~200g/Lのナノ粒子を含むこと、
-ステップB)において、プレコーティングは100~500g/Lのチタネートを含むこと、
である任意の特徴を有してよい。
I.少なくとも2つの金属基材を提供するステップであって、少なくとも1つの金属基材は、本発明によるプレコート鋼基材である、ステップと、
II.少なくとも2つの金属基材をレーザ溶接によって溶接するステップであって、レーザ溶接機は、6.0~15.0μmの間の波長を有するレーザを有する、ステップと、
を含む。
-ステップII)において、レーザ溶接は、不活性ガス及び/又は活性ガスであるシールドガスを用いて実施されること、
-ステップII)において、レーザの出力は1~20kWの間であること、
である任意の特徴を有してよい。
-任意選択的に防食コーティングでコーティングされた少なくとも1つの裸鋼基材と、
-少なくとも1つのチタネート及び少なくとも1つのナノ粒子を含む溶解及び/又は析出したプレコーティングを含む溶接ゾーンと、
-6.0~15.0μmの間の波長で60%以上の反射率を有する当該裸鋼基材と、
を含む。
-第2の金属基材は、鋼基材又はアルミニウム基材であること、
-第2の金属基材は、本発明によるプレコート鋼基材であること、
-少なくとも2つの金属基材は、溶解及び/又は析出したチタネート及びナノ粒子を含むこと、
である任意の特徴を有してよい。
A.本発明による鋼基材を提供するステップ、
B.本発明によるプレコーティングを堆積するステップ、
C.任意選択的に、ステップB)で得られたコーティングされた金属基材を乾燥させるステップ、
を含む。
I.少なくとも2つの金属基材を提供するステップであって、少なくとも1つの金属基材は、本発明によるプレコート鋼基材である、ステップと、
II.少なくとも2つの金属基材をレーザ溶接によって溶接するステップであって、レーザ溶接機は、6.0~15.0μmの間の波長を有するレーザを有する、ステップと、
を含む。
試験品1はコーティングしなかった。
試験品3については、以下の成分を含む水溶液を調製した。363g.L-1のMgTiO3(直径:2μm)、77.8g.L-1のSiO2(直径範囲:12~23nm)、77.8g.L-1のTiO2(直径範囲:36~55nm)及び238g.L-1の3-アミノプロピルトリエトキシシラン(Evonik(R)製のDynasylan(R)AMEO)。溶液を鋼基材に適用し、1)IR及び2)NIRによって乾燥させた。乾燥したコーティングは厚さ40μmであり、62重量%のMgTiO3、13重量%のSiO2、13重量%のTiO2及び3-アミノプロピルトリエトキシシランから得られた12重量%のバインダーを含有していた。
Claims (25)
- プレコート鋼基材であって、
-任意選択的に、防食コーティングと、
-少なくとも1つのチタネート及び少なくとも1つのナノ粒子を含むプレコーティングと、
でコーティングされ、
-当該裸鋼基材が、6.0~15.0μmの間のすべての波長で60%以上の反射率を有する、プレコート鋼基材。 - 少なくとも1つのチタネートが、Na2Ti3O7、NaTiO3、K2TiO3、K2Ti2O5、MgTiO3、SrTiO3、BaTiO3、CaTiO3、FeTiO3及びZnTiO4又はそれらの混合物の中から選択される、請求項1に記載のプレコート鋼基材。
- 少なくとも1つのナノ粒子が、TiO2、SiO2、イットリア安定化ジルコニア(YSZ)、Al2O3、MoO3、CrO3、CeO2又はそれらの混合物から選択される、請求項1又は2のいずれか一項に記載のプレコート鋼基材。
- プレコーティングの厚さが、10~140μmの間である、請求項1~3のいずれか一項に記載のプレコート鋼基材。
- ナノ粒子の割合が、80重量%以下である、請求項1~4のいずれか一項に記載のプレコート鋼基材。
- チタネートの割合が、45重量%以上である、請求項1~5のいずれか一項に記載のプレコート鋼基材。
- プレコーティングが、バインダーをさらに含む、請求項1~6のいずれか一項に記載のプレコート鋼基材。
- プレコーティング中のバインダーの割合が、1~20重量%の間である、請求項7に記載のプレコート鋼基材。
- 裸鋼基材が、6.0~15.0μmの間のすべての波長で70%以上の反射率を有する、請求項1~8のいずれか一項に記載のプレコート鋼基材。
- 防食コーティングが、亜鉛、アルミニウム、銅、ケイ素、鉄、マグネシウム、チタン、ニッケル、クロム、マンガン及びそれらの合金からなる群から選択される金属を含む、請求項1~9のいずれか一項に記載のプレコート鋼基材。
- 少なくとも1つのチタネートの直径が、1~40μmの間である、請求項1~10のいずれか一項に記載のプレコート鋼基材。
- 請求項1~11のいずれか一項に記載のプレコート鋼基材を製造するための方法であって、以下の連続するステップ:
A.6.0~15.0μmの間のすべての波長で60%以上の反射率を有する、任意選択的に防食コーティングでコーティングされた鋼基材を提供するステップ、
B.少なくとも1つのチタネート及び少なくとも1つのナノ粒子を含むプレコーティングを堆積するステップ、
C.任意選択的に、ステップB)で得られたコーティングされた鋼基材を乾燥させるステップ、
を含む、方法。 - ステップB)において、プレコーティングの堆積が、スピンコーティング、スプレーコーティング、ディップコーティング又はブラシコーティングによって実施される、請求項12に記載の方法。
- ステップB)において、プレコーティングが、有機溶媒をさらに含む、請求項12又は13のいずれか一項に記載の方法。
- ステップB)において、プレコーティングが、1~200g/Lの少なくとも1つのナノ粒子を含む、請求項12~14のいずれか一項に記載の方法。
- ステップB)において、プレコーティングが、100~500g/Lのチタネートを含む、請求項12~15のいずれか一項に記載の方法。
- ステップB)において、プレコーティングが、バインダー前駆体をさらに含む、請求項12~16のいずれか一項に記載の方法。
- アセンブリを製造するための方法であって、以下の連続するステップ:
I.少なくとも2つの金属基材を提供するステップであって、少なくとも1つの金属基材が、少なくとも1つのチタネート及び少なくとも1つのナノ粒子を含むプレコーティングでコーティングされたプレコート鋼基材であり、それらの裸鋼基材が、6.0~15.0μmの間のすべての波長で60%以上の反射率を有する、ステップと、
II.少なくとも2つの金属基材をレーザ溶接によって溶接するステップであって、レーザ溶接機が、6.0~15.0μmの間の波長を有するレーザを有する、ステップと、
を含む、方法。 - ステップII)において、レーザ溶接が、不活性ガス及び/又は活性ガスであるシールドガスを用いて実施される、請求項18に記載の方法。
- ステップII)において、レーザの出力が、1~20kWの間である、請求項18又は19のいずれか一項に記載の方法。
- 請求項1~11のいずれか一項に記載のプレコート鋼基材の形態の少なくとも第1の金属基材と、第2の金属基材とのアセンブリであって、当該第1及び第2の金属基材が、レーザ溶接により少なくとも部分的に互いに溶接されており、溶接ゾーンが、少なくとも1つのチタネート及び少なくとも1つのナノ粒子を含む溶解及び/又は析出したプレコーティングを含む、アセンブリ。
- 少なくとも1つのナノ粒子が、TiO2、SiO2、イットリア安定化ジルコニア(YSZ)、Al2O3、MoO3、CrO3、CeO2又はそれらの混合物の中から選択される、請求項21に記載のアセンブリ。
- 第2の金属基材が、鋼基材又はアルミニウム基材である、請求項21又は22のいずれか一項に記載のアセンブリ。
- 第2の金属基材が、請求項1~11のいずれか一項に記載のプレコート鋼基材である、請求項21又は22のいずれか一項に記載のアセンブリ。
- 自動車又は造船部品の製造のための、請求項21~24のいずれか一項に記載のアセンブリの使用。
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Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56160894A (en) * | 1980-05-16 | 1981-12-10 | Matsushita Electric Ind Co Ltd | Coating agent for surface treatment |
JPS6120688A (ja) * | 1984-07-06 | 1986-01-29 | Riken Corp | 銅または銅合金の熔接方法 |
JPS63177987A (ja) * | 1987-01-20 | 1988-07-22 | Toyo Seikan Kaisha Ltd | レ−ザ−溶接缶の製造法 |
JPH03165994A (ja) * | 1989-11-22 | 1991-07-17 | Fanuc Ltd | 亜鉛メッキ鋼板のレーザ溶接方法 |
US5368947A (en) * | 1991-08-12 | 1994-11-29 | The Penn State Research Foundation | Method of producing a slip-resistant substrate by depositing raised, bead-like configurations of a compatible material at select locations thereon, and a substrate including same |
JPH07214369A (ja) * | 1994-01-31 | 1995-08-15 | Nippondenso Co Ltd | 接合構造体及びその製造方法 |
JPH0885819A (ja) * | 1994-09-19 | 1996-04-02 | Okayama Pref Gov | レーザ加工における被加工物の前処理方法 |
WO2002081142A1 (fr) * | 2001-04-02 | 2002-10-17 | Taiyo Yuden Co., Ltd. | Procede d'usinage de materiau translucide par faisceau laser et materiau translucide usine |
CN1475325A (zh) * | 2003-07-09 | 2004-02-18 | 中山大学 | 一种激光焊接吸收薄膜 |
US20070036994A1 (en) * | 2003-09-17 | 2007-02-15 | Bernard Andre | Multiple zone structure capable of light radiation annealing and method using said structure |
US20100288397A1 (en) * | 2009-05-14 | 2010-11-18 | Kuang-Hung Tseng | Welding Flux for Stainless Steel |
US20120234814A1 (en) * | 2011-03-18 | 2012-09-20 | Kuang-Hung Tseng | Silver-containing Antiseptic Welding Flux for Stainless Steel |
JP2016135905A (ja) * | 2015-01-23 | 2016-07-28 | 三菱重工業株式会社 | ロケットエンジンの燃焼器の製造方法、ロケットエンジンの燃焼器、および、ロケットエンジン |
US20170145554A1 (en) * | 2014-06-26 | 2017-05-25 | Shell Oil Company | Coating method and coated substrate |
JP2018135585A (ja) * | 2017-02-23 | 2018-08-30 | 公立大学法人大阪府立大学 | 金属部材及びクラッド層の製造方法 |
CN109023354A (zh) * | 2018-09-29 | 2018-12-18 | 西安文理学院 | 一种碳化钨梯度复合涂层及其制备方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5236517A (en) * | 1992-08-28 | 1993-08-17 | Electric Power Research Institute | Flux formulation for underwater wet flux-cored arc welding of nickel-based and austenitic stainless steels |
WO2000016940A2 (en) * | 1998-09-24 | 2000-03-30 | Edison Welding Institute | Penetration flux |
ATE518922T1 (de) * | 2000-10-11 | 2011-08-15 | Chemetall Gmbh | Verfahren zur vorbehandlung oder/und beschichtung von metallischen oberflächen vor der umformung mit einem lackähnlichen überzug und verwendung der derart beschichteten substrate |
JP2002120088A (ja) * | 2000-10-18 | 2002-04-23 | Mitsubishi Heavy Ind Ltd | 深溶け込みアーク溶接用フラックス及びこれを用いた溶接方法 |
FR2840832B1 (fr) * | 2002-06-14 | 2004-07-23 | Air Liquide | Utilisation de melanges gazeux helium/azote en soudage laser de flancs raboutes |
JP2004351498A (ja) * | 2003-05-30 | 2004-12-16 | Kobe Steel Ltd | 溶接方法 |
EP1902158A1 (en) * | 2005-06-20 | 2008-03-26 | Praxair S.T. Technology, Inc. | Laser cladding on low heat resistant substrates |
JP3927987B2 (ja) * | 2005-11-21 | 2007-06-13 | 株式会社神戸製鋼所 | 異材接合方法 |
JP5042555B2 (ja) * | 2006-08-03 | 2012-10-03 | 新日本製鐵株式会社 | 薄膜一次防錆被覆層を有する表面導電性に優れた亜鉛系めっき鋼板とその製造方法 |
JP5560504B2 (ja) * | 2008-06-24 | 2014-07-30 | ナショナル アカデミー オブ サイエンス オブ ウクライナ イー.オー. パトン エレクトリック ウェルディング インスティチュート | 鋼用タングステンイナートガスアーク溶接用活性フラックス |
ES2907521T3 (es) * | 2015-10-09 | 2022-04-25 | Doerken Ewald Ag | Composición de revestimiento anticorrosiva |
-
2019
- 2019-04-17 WO PCT/IB2019/053178 patent/WO2020212736A1/en active Application Filing
-
2020
- 2020-04-16 US US17/603,681 patent/US20220297245A1/en active Pending
- 2020-04-16 EP EP20719755.9A patent/EP3956099A1/en active Pending
- 2020-04-16 CN CN202080022183.0A patent/CN113613830B/zh active Active
- 2020-04-16 KR KR1020217032835A patent/KR102651664B1/ko active IP Right Grant
- 2020-04-16 WO PCT/IB2020/053588 patent/WO2020212889A1/en unknown
- 2020-04-16 JP JP2021561694A patent/JP7362772B2/ja active Active
- 2020-04-16 BR BR112021018762A patent/BR112021018762A2/pt active Search and Examination
- 2020-04-16 CA CA3133405A patent/CA3133405C/en active Active
Patent Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56160894A (en) * | 1980-05-16 | 1981-12-10 | Matsushita Electric Ind Co Ltd | Coating agent for surface treatment |
JPS6120688A (ja) * | 1984-07-06 | 1986-01-29 | Riken Corp | 銅または銅合金の熔接方法 |
JPS63177987A (ja) * | 1987-01-20 | 1988-07-22 | Toyo Seikan Kaisha Ltd | レ−ザ−溶接缶の製造法 |
JPH03165994A (ja) * | 1989-11-22 | 1991-07-17 | Fanuc Ltd | 亜鉛メッキ鋼板のレーザ溶接方法 |
US5368947A (en) * | 1991-08-12 | 1994-11-29 | The Penn State Research Foundation | Method of producing a slip-resistant substrate by depositing raised, bead-like configurations of a compatible material at select locations thereon, and a substrate including same |
JPH07214369A (ja) * | 1994-01-31 | 1995-08-15 | Nippondenso Co Ltd | 接合構造体及びその製造方法 |
JPH0885819A (ja) * | 1994-09-19 | 1996-04-02 | Okayama Pref Gov | レーザ加工における被加工物の前処理方法 |
WO2002081142A1 (fr) * | 2001-04-02 | 2002-10-17 | Taiyo Yuden Co., Ltd. | Procede d'usinage de materiau translucide par faisceau laser et materiau translucide usine |
CN1475325A (zh) * | 2003-07-09 | 2004-02-18 | 中山大学 | 一种激光焊接吸收薄膜 |
US20070036994A1 (en) * | 2003-09-17 | 2007-02-15 | Bernard Andre | Multiple zone structure capable of light radiation annealing and method using said structure |
US20100288397A1 (en) * | 2009-05-14 | 2010-11-18 | Kuang-Hung Tseng | Welding Flux for Stainless Steel |
US20120234814A1 (en) * | 2011-03-18 | 2012-09-20 | Kuang-Hung Tseng | Silver-containing Antiseptic Welding Flux for Stainless Steel |
US20170145554A1 (en) * | 2014-06-26 | 2017-05-25 | Shell Oil Company | Coating method and coated substrate |
JP2016135905A (ja) * | 2015-01-23 | 2016-07-28 | 三菱重工業株式会社 | ロケットエンジンの燃焼器の製造方法、ロケットエンジンの燃焼器、および、ロケットエンジン |
JP2018135585A (ja) * | 2017-02-23 | 2018-08-30 | 公立大学法人大阪府立大学 | 金属部材及びクラッド層の製造方法 |
CN109023354A (zh) * | 2018-09-29 | 2018-12-18 | 西安文理学院 | 一种碳化钨梯度复合涂层及其制备方法 |
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JP7362772B2 (ja) | 2023-10-17 |
CA3133405A1 (en) | 2020-10-22 |
CN113613830A (zh) | 2021-11-05 |
WO2020212889A1 (en) | 2020-10-22 |
CA3133405C (en) | 2023-08-01 |
KR102651664B1 (ko) | 2024-03-26 |
US20220297245A1 (en) | 2022-09-22 |
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