JP2022523898A - パッケージング基板及びその製造方法 - Google Patents
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Abstract
Description
1-n:2-n:コアビアの内径面のうち互いに向かい合う二つの位置で測定したコアシード層の第1厚さと第2厚さの比率
30:半導体素子部 32:第1半導体素子
34:第2半導体素子 36:第3半導体素子
20:パッケージング基板 22:コア層
223:コア絶縁層 21、21a:ガラス基板
213:第1面 214:第2面
23:コアビア 233:第1開口部
234:第2開口部 235:最小内径部
24:コア分配層 241:コア分配パターン
241a:第1面分配パターン 241b:コアビア分配パターン
241c:第2面分配パターン 26:上部層
25:上部分配層 251:上部分配パターン
252:ブラインドビア 253:上部絶縁層
27:上面接続層 271:上面接続電極
272:上面連結パターン 29:下部層
291:下部分配層 291a:下部分配パターン
291b:下部絶縁層 292:下面接続層
292a:下面接続電極 292b:下面連結パターン
50:連結部 51:素子連結部
52:ボード連結部 60:カバー層
21b:ガラス欠陥 21c:シード層、プライマー層
21d:コア分配層 21e:コア分配層のエッチング層
23a:絶縁層 23b:絶縁層のエッチング層
23c:電気伝導性層 23d:電気伝導性層のエッチング層
23e:絶縁層 23f:絶縁層のエッチング層
23g:電気伝導性層 23h:電気伝導性層のエッチング層
Claims (10)
- i)互いに向かい合う第1面及び第2面を有するガラス基板;
ii)前記ガラス基板を厚さ方向に貫通する多数のコアビア;及び
iii)前記コアビアの表面上に位置し、電気伝導性層形成のシードになるコアシード層が位置するコア層;を含むものであって、
前記コアビアの内径面のうち互いに向かい合う二つの位置で測定した前記コアシード層の厚さである第1厚さと第2厚さは、その比率(厚さ比率)が1:0.4~4.5である、半導体パッケージング用基板。 - 前記コアシード層の下記の式1で表される厚さ偏差率は90%以下である、請求項1に記載の半導体パッケージング用基板。
[式1]
厚さ偏差率=((コアシード層の最大厚さ-コアシード層の最小厚さ)/コアシード層の平均厚さ)×100% - 前記コアシード層の平均厚さは30nm~200nmである、請求項1に記載の半導体パッケージング用基板。
- 前記コア層上に位置する上部層を含み、
前記コア層は、前記ガラス基板又はコアビアの表面上に位置するコア分配層を含み、
前記コア分配層は、少なくともその一部が前記コアビアを介して前記第1面上の電気伝導性層と前記第2面上の電気伝導性層とを電気的に連結する電気伝導性層を含み、
前記コアビアは、前記第1面と接する開口部及び前記第2面と接する開口部のうち大きい直径を有する開口部において、前記コアビアのうち最小内径を有する部分までを前記コアビアの断面で観察した内径面の角度が、前記第1面に垂直な厚さ方向を基準にして8度以下である、請求項1に記載のパッケージング基板。 - 前記コアビアは、前記第1面と接する第1開口部;前記第2面と接する第2開口部;及び前記第1開口部と前記第2開口部とを連結する全体のコアビアにおいてその内径が最も狭い区域である最小内径部;を含む、請求項1に記載のパッケージング基板。
- 前記最小内径部の直径は、前記第1開口部及び前記第2開口部のうち大きい直径を有するものを基準にして50%~99%の大きさを有する、請求項5に記載のパッケージング基板。
- 前記最小内径部は、前記コアビアの長さ全体を100%としたとき、前記第1開口部を基準にして40%~60%の地点に位置する、請求項5に記載のパッケージング基板。
- 前記最小内径部は、前記コアビアの長さ全体を100%としたとき、前記第1開口部を基準にして40%未満及び60%超過の地点に位置する、請求項5に記載のパッケージング基板。
- 互いに向かい合う第1面及び第2面を有するガラス基板、及び前記ガラス基板を厚さ方向に貫通する多数のコアビアを有する処理前基板を設ける準備ステップ;及び
前記第1面に垂直な基準線に対して所定角度でスパッタリングし、前記コアビアの内径面にコアシード層を形成するスパッタリングステップ;を含み、
前記コアビアは、前記第1面と接する開口部及び前記第2面と接する開口部のうち大きい直径を有する開口部において、前記コアビアのうち最小内径を有する部分までを前記コアビアの断面で観察した内径面の角度が、前記第1面に垂直な厚さ方向を基準にして8度以下であって、
前記コアビアの内径面のうち互いに向かい合う二つの位置で測定した前記コアシード層の厚さである第1厚さと第2厚さは、その比率(厚さ比率)が1:0.4~4.5である、半導体パッケージング用基板の製造方法。 - 半導体素子を含む素子部;及び前記素子部と電気的に連結されるパッケージング基板;を含み、前記パッケージング基板は、請求項1によるパッケージング基板である、半導体装置。
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JP2014139963A (ja) * | 2013-01-21 | 2014-07-31 | Ngk Spark Plug Co Ltd | ガラス基板の製造方法 |
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EP3913662A1 (en) | 2021-11-24 |
KR102537004B1 (ko) | 2023-05-26 |
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JP2023103353A (ja) | 2023-07-26 |
CN113261093B (zh) | 2024-04-16 |
EP3913662A4 (en) | 2022-11-02 |
KR20210071075A (ko) | 2021-06-15 |
KR20230074611A (ko) | 2023-05-30 |
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US20220059421A1 (en) | 2022-02-24 |
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