JP2022518740A - レーザ焼鈍のためのダイオード励起固体レーザ装置 - Google Patents
レーザ焼鈍のためのダイオード励起固体レーザ装置 Download PDFInfo
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- VCZFPTGOQQOZGI-UHFFFAOYSA-N lithium bis(oxoboranyloxy)borinate Chemical compound [Li+].[O-]B(OB=O)OB=O VCZFPTGOQQOZGI-UHFFFAOYSA-N 0.000 description 27
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
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- 230000015572 biosynthetic process Effects 0.000 description 2
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- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- NNAZVIPNYDXXPF-UHFFFAOYSA-N [Li+].[Cs+].OB([O-])[O-] Chemical compound [Li+].[Cs+].OB([O-])[O-] NNAZVIPNYDXXPF-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
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- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
- JDLDTRXYGQMDRV-UHFFFAOYSA-N tricesium;borate Chemical compound [Cs+].[Cs+].[Cs+].[O-]B([O-])[O-] JDLDTRXYGQMDRV-UHFFFAOYSA-N 0.000 description 1
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 1
- HGCGQDMQKGRJNO-UHFFFAOYSA-N xenon monochloride Chemical compound [Xe]Cl HGCGQDMQKGRJNO-UHFFFAOYSA-N 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
本願は、2019年1月22日に出願された米国仮特許出願第62/795,341号、および2019年9月24日に出願された米国仮特許出願第62/905,252号の優先権を主張し、これらの開示は、参照することによってそれらの全体として本明細書に援用される。
本発明は、概して、ラインビームに投射される紫外線レーザ放射を使用したアモルファスシリコン層の焼鈍に関する。本発明は、特に、複数のレーザからのレーザ放射がラインビームに合成されて投射される焼鈍に関する。
Claims (27)
- 基板上の層を焼鈍するための光学装置であって、
複数の周波数変換される繰り返しパルス固体レーザであって、前記複数の周波数変換される繰り返しパルス固体レーザの各々が、電磁スペクトルの紫外線領域内の波長を有する出力ビームを送達し、各出力ビームは、相互に直交する第1の横軸および第2の横軸によって特徴付けられる断面を有し、前記第1の横軸におけるビーム品質係数M2が、約50を上回り、前記第2の横軸におけるビーム品質係数M2が、約20を上回り、レーザパルスが、約100ミリジュールを上回るパルスエネルギーを有し、パルス繰り返し周波数が、約100ヘルツを上回る、複数の周波数変換される繰り返しパルス固体レーザと、
前記出力ビームを受光し、前記出力ビームをラインビームに形成し、前記ラインビームを前記層上に投射するように配列されるラインプロジェクタであって、前記ラインビームは、前記層上に長さと幅とを有する、ラインプロジェクタと
を備える、光学装置。 - 前記第1の横軸における前記ビーム品質係数M2は、約200を上回る、請求項1に記載の装置。
- 各出力ビームは、前記ラインビームの全長に寄与する、請求項1に記載の装置。
- 前記周波数変換される繰り返しパルス固体レーザの各々は、レーザ共振器を含み、前記レーザ共振器は、1つ以上のダイオードレーザアレイによって光学的に励起される利得要素を有し、前記1つ以上のダイオードレーザアレイは、前記第1の横軸における第1の寸法と前記第2の横軸における第2の寸法とを有する利得容積を前記利得要素内に提供するように配列されている、請求項1に記載の装置。
- 前記第1の横軸の寸法は、前記第2の横軸の寸法の3倍以上である、請求項4に記載の装置。
- 前記レーザ共振器は、前記第2の横軸においてのみ光パワーを有する第1の共振器ミラーと第2の共振器ミラーとの間に形成される、請求項5に記載の装置。
- 前記レーザ共振器は、前記利得要素の特性である前記電磁スペクトルの近赤外線領域内の波長を有する基本放射ビームを生み出し、前記レーザ共振器は、番号順に第1の光学非線形結晶および第2の光学非線形結晶に前記基本放射ビームを送達し、前記第1の光学非線形結晶は、前記基本放射ビームから第2高調波放射ビームを発生させるように配列され、前記第2の光学非線形結晶は、前記第2高調波放射ビームの発生の後、前記第2高調波放射ビームを残留基本放射ビームと和周波数混合することによって前記出力ビームを発生させるように配列される、請求項4に記載の装置。
- 前記第1の横軸および前記第2の横軸における前記第2高調波放射ビームのM2値は、前記基本放射ビームの対応するM2値を上回り、前記第1の横軸および前記第2の横軸における前記出力ビームのM2値は、前記第2高調波放射ビームの対応する値を上回る、請求項7に記載の装置。
- 前記第1の横軸における前記第2高調波放射ビームの前記M2値は、前記第1の横軸における前記基本放射ビームの前記M2値の少なくとも2倍である、請求項8に記載の装置。
- 前記第1の横軸における前記出力ビームの前記M2値は、前記第1の横軸における前記第2高調波放射の前記M2値の1.5倍を上回る、請求項8に記載の装置。
- 前記第1の横軸における前記出力ビームの前記M2値は、前記第1の横軸における前記残留基本放射の前記M2値の1.5倍を上回る、請求項8に記載の装置。
- 前記出力ビームは、340ナノメートル~360ナノメートルの範囲内の波長を有する、請求項7に記載の装置。
- 前記レーザパルスは、約10ナノ秒を上回る半値全幅パルス持続時間を有する、請求項1に記載の装置。
- 前記出力ビームは、直線偏光させられる、請求項1に記載の装置。
- 前記層は、シリコンから作製される、請求項1に記載の装置。
- 固体レーザ装置であって、
2つの共振器ミラーの間に形成される共振器の中に位置する利得要素であって、前記利得要素は、スラブの形態であり、励起放射によってエネルギー付与され、エネルギー付与された共振器は、基本放射の繰り返しパルスビームを生み出し、前記基本放射のビームは、相互に直交する第1の横軸および第2の横軸を有し、前記第1の横軸におけるビーム品質係数M2は、50を上回り、前記第2の横軸におけるビーム品質係数M2は、10を上回る、利得要素と、
第1の非線形結晶であって、前記基本放射のビームは、前記第1の非線形結晶の中へ指向され、前記基本放射のビームの一部が、第2高調波発生によって第2高調波放射のビームに変換され、基本放射の残留ビームを残す、第1の非線形結晶と、
第2の非線形結晶であって、前記第2高調波放射のビームおよび前記基本放射の残留ビームは両方とも、前記第2の非線形結晶の中へ指向され、それによって、和周波数混合によって第3高調波放射のビームを発生させ、残留基本放射および残留第2高調波放射の共に伝搬するビームを残し、前記第3高調波放射のビームは、前記第1の横軸における50を上回るビーム品質係数M2と、前記第2の横軸における20を上回るビーム品質係数M2と、約100ミリジュールを上回るパルスエネルギーとを有する、第2の非線形結晶と
を備える、固体レーザ装置。 - 前記第3高調波放射のビームの前記ビーム品質係数M2は、前記第1の横軸において約200を上回る、請求項16に記載の装置。
- 前記利得要素は、ネオジムドープイットリウムアルミニウムガーネット(Nd3+ドープYAG)結晶である、請求項16に記載の装置。
- 前記第1の非線形結晶は、LBOから作製される、請求項16に記載の装置。
- 前記第1の非線形結晶は、前記基本放射のビームのタイプ1周波数2倍化のために配列される、請求項16に記載の装置。
- 前記第2の非線形結晶は、LBOから作製される、請求項16に記載の装置。
- 前記第2の非線形結晶は、前記第2高調波放射のビームと前記残留基本放射のビームとのタイプ1和周波数混合のために配列される、請求項16に記載の装置。
- 第3の非線形結晶をさらに備え、残留基本放射および残留第2高調波放射の前記共に伝搬するビームは、前記第3の非線形結晶の中へ指向され、それによって、和周波数混合によって第3高調波放射の別のビームを発生させる、請求項16に記載の装置。
- 前記第3高調波放射の2つのビームが、偏光合成される、請求項23に記載の装置。
- 前記第3高調波放射の2つのビームは、空間的に合成される、請求項23に記載の装置。
- Qスイッチ動作のために協働して配列されるポッケルスセルと4分の1波長板とをさらに含む、請求項16に記載の装置。
- 固体レーザ装置であって、
2つの共振器ミラーの間に形成される共振器の中に位置する利得要素であって、前記利得要素は、第1の横軸において、直交する第2の横軸よりも長いスラブの形態であり、前記利得要素は、励起放射によってエネルギー付与され、エネルギー付与された共振器は、基本放射の繰り返しパルスビームを生み出し、前記基本放射のビームは、前記第1の横軸における50を上回るビーム品質係数M2と、前記第2の横軸における10を上回るビーム品質係数M2とを有する、利得要素と、
第1の非線形結晶であって、前記基本放射のビームは、前記第1の非線形結晶の中へ指向され、前記基本放射のビームの一部が、第2高調波発生によって第2高調波放射のビームに変換され、基本放射の残留ビームを残す、第1の非線形結晶と、
第2の非線形結晶であって、前記第2高調波放射のビームおよび前記基本放射の残留ビームは両方とも、前記第2の非線形結晶の中へ指向され、それによって、和周波数混合によって第3高調波放射のビームを発生させ、残留基本放射および残留第2高調波放射の共に伝搬するビームを残す、第2の非線形結晶と、
を備え、前記第1の横軸および前記第2の横軸における前記第2高調波放射ビームのビーム品質係数M2は、前記基本放射ビームの対応するビーム品質係数M2を上回り、前記第1の横軸および前記第2の横軸における前記第3高調波放射ビームのビーム品質係数M2は、前記第2高調波放射ビームの対応するビーム品質係数M2を上回る、固体レーザ装置。
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