JP2022513882A5 - - Google Patents

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Publication number
JP2022513882A5
JP2022513882A5 JP2021534251A JP2021534251A JP2022513882A5 JP 2022513882 A5 JP2022513882 A5 JP 2022513882A5 JP 2021534251 A JP2021534251 A JP 2021534251A JP 2021534251 A JP2021534251 A JP 2021534251A JP 2022513882 A5 JP2022513882 A5 JP 2022513882A5
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JP
Japan
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target
actual
simulation
layer
measurement curve
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Pending
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JP2021534251A
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English (en)
Japanese (ja)
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JP2022513882A (ja
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Priority claimed from DE102018133187.8A external-priority patent/DE102018133187A1/de
Application filed filed Critical
Publication of JP2022513882A publication Critical patent/JP2022513882A/ja
Publication of JP2022513882A5 publication Critical patent/JP2022513882A5/ja
Pending legal-status Critical Current

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JP2021534251A 2018-12-20 2019-12-17 層システムを製造するためのコーティング設備を動作させる方法 Pending JP2022513882A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102018133187.8A DE102018133187A1 (de) 2018-12-20 2018-12-20 Verfahren zum Betreiben einer Beschichtungsanlage zur Herstellung von Schichtsystemen
DE102018133187.8 2018-12-20
PCT/EP2019/085810 WO2020127394A1 (de) 2018-12-20 2019-12-17 Verfahren zum betreiben einer beschichtungsanlage zur herstellung von schichtsystemen

Publications (2)

Publication Number Publication Date
JP2022513882A JP2022513882A (ja) 2022-02-09
JP2022513882A5 true JP2022513882A5 (https=) 2022-12-02

Family

ID=69375310

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021534251A Pending JP2022513882A (ja) 2018-12-20 2019-12-17 層システムを製造するためのコーティング設備を動作させる方法

Country Status (11)

Country Link
US (2) US12234547B2 (https=)
EP (2) EP4451039B1 (https=)
JP (1) JP2022513882A (https=)
CN (1) CN113272622B (https=)
CL (1) CL2021001579A1 (https=)
DE (1) DE102018133187A1 (https=)
ES (1) ES2989589T3 (https=)
IL (1) IL283986B2 (https=)
MX (1) MX2021007133A (https=)
PH (1) PH12021551399A1 (https=)
WO (1) WO2020127394A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115449771B (zh) * 2022-09-21 2025-01-28 华中科技大学 模具涂层生成方法、装置、设备、存储介质和程序产品
CN116045791B (zh) * 2023-04-03 2023-07-21 成都飞机工业(集团)有限责任公司 一种金属漆涂层厚度评估方法
CN120745007B (zh) * 2025-06-23 2026-03-27 深圳市艾丽斯卡文化创意有限公司 多材料混色工艺数字孪生仿真平台

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011053573A (ja) * 2009-09-04 2011-03-17 Konica Minolta Opto Inc 薄膜形成方法
EP2826883B1 (en) * 2013-07-17 2018-10-03 Applied Materials, Inc. Inline deposition control apparatus and method of inline deposition control
DE102015100091A1 (de) 2015-01-07 2016-07-07 Rodenstock Gmbh Schichtsystem und optisches Element mit einem Schichtsystem
JP6869648B2 (ja) * 2016-06-07 2021-05-12 日東電工株式会社 多層膜の成膜方法
EP3346023A1 (en) * 2017-01-05 2018-07-11 Essilor International Method for layer by layer optimization of a thin film

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