JP2022513882A5 - - Google Patents
Info
- Publication number
- JP2022513882A5 JP2022513882A5 JP2021534251A JP2021534251A JP2022513882A5 JP 2022513882 A5 JP2022513882 A5 JP 2022513882A5 JP 2021534251 A JP2021534251 A JP 2021534251A JP 2021534251 A JP2021534251 A JP 2021534251A JP 2022513882 A5 JP2022513882 A5 JP 2022513882A5
- Authority
- JP
- Japan
- Prior art keywords
- target
- actual
- simulation
- layer
- measurement curve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102018133187.8A DE102018133187A1 (de) | 2018-12-20 | 2018-12-20 | Verfahren zum Betreiben einer Beschichtungsanlage zur Herstellung von Schichtsystemen |
| DE102018133187.8 | 2018-12-20 | ||
| PCT/EP2019/085810 WO2020127394A1 (de) | 2018-12-20 | 2019-12-17 | Verfahren zum betreiben einer beschichtungsanlage zur herstellung von schichtsystemen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2022513882A JP2022513882A (ja) | 2022-02-09 |
| JP2022513882A5 true JP2022513882A5 (https=) | 2022-12-02 |
Family
ID=69375310
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021534251A Pending JP2022513882A (ja) | 2018-12-20 | 2019-12-17 | 層システムを製造するためのコーティング設備を動作させる方法 |
Country Status (11)
| Country | Link |
|---|---|
| US (2) | US12234547B2 (https=) |
| EP (2) | EP4451039B1 (https=) |
| JP (1) | JP2022513882A (https=) |
| CN (1) | CN113272622B (https=) |
| CL (1) | CL2021001579A1 (https=) |
| DE (1) | DE102018133187A1 (https=) |
| ES (1) | ES2989589T3 (https=) |
| IL (1) | IL283986B2 (https=) |
| MX (1) | MX2021007133A (https=) |
| PH (1) | PH12021551399A1 (https=) |
| WO (1) | WO2020127394A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115449771B (zh) * | 2022-09-21 | 2025-01-28 | 华中科技大学 | 模具涂层生成方法、装置、设备、存储介质和程序产品 |
| CN116045791B (zh) * | 2023-04-03 | 2023-07-21 | 成都飞机工业(集团)有限责任公司 | 一种金属漆涂层厚度评估方法 |
| CN120745007B (zh) * | 2025-06-23 | 2026-03-27 | 深圳市艾丽斯卡文化创意有限公司 | 多材料混色工艺数字孪生仿真平台 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011053573A (ja) * | 2009-09-04 | 2011-03-17 | Konica Minolta Opto Inc | 薄膜形成方法 |
| EP2826883B1 (en) * | 2013-07-17 | 2018-10-03 | Applied Materials, Inc. | Inline deposition control apparatus and method of inline deposition control |
| DE102015100091A1 (de) | 2015-01-07 | 2016-07-07 | Rodenstock Gmbh | Schichtsystem und optisches Element mit einem Schichtsystem |
| JP6869648B2 (ja) * | 2016-06-07 | 2021-05-12 | 日東電工株式会社 | 多層膜の成膜方法 |
| EP3346023A1 (en) * | 2017-01-05 | 2018-07-11 | Essilor International | Method for layer by layer optimization of a thin film |
-
2018
- 2018-12-20 DE DE102018133187.8A patent/DE102018133187A1/de active Pending
-
2019
- 2019-12-17 MX MX2021007133A patent/MX2021007133A/es unknown
- 2019-12-17 EP EP24192101.4A patent/EP4451039B1/de active Active
- 2019-12-17 PH PH1/2021/551399A patent/PH12021551399A1/en unknown
- 2019-12-17 US US17/414,652 patent/US12234547B2/en active Active
- 2019-12-17 EP EP19845695.6A patent/EP3899422B1/de active Active
- 2019-12-17 WO PCT/EP2019/085810 patent/WO2020127394A1/de not_active Ceased
- 2019-12-17 JP JP2021534251A patent/JP2022513882A/ja active Pending
- 2019-12-17 IL IL283986A patent/IL283986B2/en unknown
- 2019-12-17 ES ES19845695T patent/ES2989589T3/es active Active
- 2019-12-17 CN CN201980086583.5A patent/CN113272622B/zh active Active
-
2021
- 2021-06-16 CL CL2021001579A patent/CL2021001579A1/es unknown
-
2025
- 2025-01-17 US US19/029,478 patent/US20250163567A1/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2022513882A5 (https=) | ||
| EP3549159B1 (en) | Transparent film error correction pattern in wafer geometry system | |
| JP2021003789A5 (https=) | ||
| CN110060342B (zh) | 一种三维曲面拟合方法 | |
| CN104990501B (zh) | 一种三维激光扫描装置的系统参数校准方法 | |
| US20250163567A1 (en) | Method for operating a coating installation for producing layer systems | |
| CN110376290B (zh) | 基于多维核密度估计的声发射源定位方法 | |
| JP2008512730A (ja) | 薄膜干渉フィルタ及び干渉フィルタの堆積工程制御のためのブートストラップ法 | |
| TWI603070B (zh) | 使用於複雜之圖案化結構的量測之方法及系統 | |
| US11066741B2 (en) | Film formation method for multilayer film | |
| JP2006220525A (ja) | 膜厚測定方法および膜厚測定プログラム | |
| JP6216498B2 (ja) | 標本データ用のロバストなピークファインダー | |
| CN120155669B (zh) | 一种全自动激光视觉打码机及打码路径优化方法 | |
| CN120293493A (zh) | 镜片防蓝光膜层的光谱衰减一致性检测方法及系统 | |
| KR101682407B1 (ko) | 측정 데이터를 스무딩하기 위한 최적 기준 데이터 수의 결정 방법 및 측정 데이터의 보정 방법 | |
| KR102538024B1 (ko) | 웨이퍼 측정 설비, 웨이퍼 측정 시스템 및 이를 이용한 반도체 장치의 제조 방법 | |
| CN116086329B (zh) | 一种薄膜参数的获取方法、获取装置及终端设备 | |
| CN110826257A (zh) | 一种真空渐变镀膜膜系工艺设计的优化方法 | |
| CN113932736A (zh) | 一种基于结构光的3d量测方法与系统 | |
| KR20160102274A (ko) | 디스플레이용 반사방지 코팅을 형성하는 방법 | |
| CN118520129B (zh) | 近表面层介质参数与参考图库分辨率的匹配方法及设备 | |
| CN110504176A (zh) | 三维存储器晶圆键合制成中对应晶圆的匹配方法、制备方法及相关产品 | |
| Vignaux et al. | Optimized procedure for in-situ optical monitoring of multilayer structures | |
| CN118779993A (zh) | 一种基于条件数最优化的泽尼克多项式辗转拟合畸变矫正方法 | |
| KR20250046984A (ko) | 박막 두께 측정 방법 |