JP2022513448A5 - - Google Patents
Info
- Publication number
- JP2022513448A5 JP2022513448A5 JP2021533310A JP2021533310A JP2022513448A5 JP 2022513448 A5 JP2022513448 A5 JP 2022513448A5 JP 2021533310 A JP2021533310 A JP 2021533310A JP 2021533310 A JP2021533310 A JP 2021533310A JP 2022513448 A5 JP2022513448 A5 JP 2022513448A5
- Authority
- JP
- Japan
- Prior art keywords
- flow
- fin structure
- substrate
- supplied
- angle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025011869A JP2025089297A (ja) | 2018-12-17 | 2025-01-28 | 封入のためのｐｖｄ指向性堆積 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862780793P | 2018-12-17 | 2018-12-17 | |
| US62/780,793 | 2018-12-17 | ||
| PCT/US2019/066710 WO2020131783A1 (en) | 2018-12-17 | 2019-12-17 | Pvd directional deposition for encapsulation |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025011869A Division JP2025089297A (ja) | 2018-12-17 | 2025-01-28 | 封入のためのｐｖｄ指向性堆積 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2022513448A JP2022513448A (ja) | 2022-02-08 |
| JP2022513448A5 true JP2022513448A5 (https=) | 2022-12-22 |
Family
ID=71071372
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021533310A Pending JP2022513448A (ja) | 2018-12-17 | 2019-12-17 | 封入のためのｐｖｄ指向性堆積 |
| JP2025011869A Pending JP2025089297A (ja) | 2018-12-17 | 2025-01-28 | 封入のためのｐｖｄ指向性堆積 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025011869A Pending JP2025089297A (ja) | 2018-12-17 | 2025-01-28 | 封入のためのｐｖｄ指向性堆積 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US11851740B2 (https=) |
| EP (1) | EP3899616A4 (https=) |
| JP (2) | JP2022513448A (https=) |
| KR (2) | KR20250110939A (https=) |
| CN (1) | CN113242990A (https=) |
| TW (2) | TWI835950B (https=) |
| WO (1) | WO2020131783A1 (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10818499B2 (en) * | 2018-02-21 | 2020-10-27 | Varian Semiconductor Equipment Associates, Inc. | Optical component having variable depth gratings and method of formation |
| US11391950B2 (en) * | 2019-06-26 | 2022-07-19 | Meta Platforms Technologies, Llc | Techniques for controlling effective refractive index of gratings |
| FR3101442B1 (fr) * | 2019-09-27 | 2022-04-22 | Commissariat Energie Atomique | Miroir de Bragg et procédé de réalisation d’un miroir de Bragg |
| CN116615680A (zh) | 2020-11-24 | 2023-08-18 | 应用材料公司 | 用于衍射光学装置的平坦化结晶膜 |
| US20220252779A1 (en) * | 2021-02-08 | 2022-08-11 | Applied Materials, Inc. | Method for amorphous, high-refractive-index encapsulation of nanoparticle imprint films for optical devices |
| US20230120539A1 (en) * | 2021-10-15 | 2023-04-20 | Applied Materials, Inc. | Metallized high-index blaze grating incoupler |
| CN114994918A (zh) * | 2022-06-17 | 2022-09-02 | 京东方科技集团股份有限公司 | 一种光波导镜片及其封装方法 |
| US20240111092A1 (en) * | 2022-09-29 | 2024-04-04 | Intel Corporation | Pillar structures on an optical waveguide |
| KR20260022923A (ko) * | 2023-06-30 | 2026-02-20 | 어플라이드 머티어리얼스, 인코포레이티드 | 증강 현실 도파관 결합기들의 이미지 선명도를 향상시키기 위한 필드 식각 |
| CN117661316B (zh) * | 2023-10-20 | 2025-12-30 | 郑州大学 | 一种碳纤维表面狼牙棒状SiOC/C双级界面涂层的制备方法 |
| US20250297356A1 (en) * | 2024-03-22 | 2025-09-25 | Axcelis Technologies, Inc. | Method and apparatus for ion beam directional deposition |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62158863A (ja) * | 1985-12-30 | 1987-07-14 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 被膜形成装置 |
| JPH08269710A (ja) | 1995-03-31 | 1996-10-15 | Tdk Corp | 反応性スパッタ装置および反応性スパッタ方法ならびに反応性蒸着装置および反応性蒸着方法 |
| US5885425A (en) * | 1995-06-06 | 1999-03-23 | International Business Machines Corporation | Method for selective material deposition on one side of raised or recessed features |
| US5985102A (en) * | 1996-01-29 | 1999-11-16 | Micron Technology, Inc. | Kit for electrically isolating collimator of PVD chamber, chamber so modified, and method of using |
| US6511703B2 (en) * | 1997-09-29 | 2003-01-28 | Cymer, Inc. | Protective overcoat for replicated diffraction gratings |
| US20020046945A1 (en) * | 1999-10-28 | 2002-04-25 | Applied Materials, Inc. | High performance magnetron for DC sputtering systems |
| US7008862B2 (en) | 2000-01-25 | 2006-03-07 | Ever 1391 Limited | Regular array of microscopic structures on a substrate and devices incorporating same |
| US6671208B2 (en) | 2001-07-27 | 2003-12-30 | Sharp Kabushiki Kaisha | Nonvolatile semiconductor storage device with limited consumption current during erasure and erase method therefor |
| JP4061044B2 (ja) | 2001-10-05 | 2008-03-12 | 住友重機械工業株式会社 | 基板移動装置 |
| EP1474710B1 (en) | 2002-02-12 | 2008-12-31 | OC Oerlikon Balzers AG | Optical component comprising submicron hollow spaces |
| US20030224116A1 (en) * | 2002-05-30 | 2003-12-04 | Erli Chen | Non-conformal overcoat for nonometer-sized surface structure |
| US7349612B2 (en) * | 2003-01-28 | 2008-03-25 | Nippon Sheet Glass Company, Limited | Optical element, optical circuit provided with the optical element, and method for producing the optical element |
| JP2006003447A (ja) * | 2004-06-15 | 2006-01-05 | Sony Corp | 偏光分離素子及びその製造方法 |
| US20060054494A1 (en) * | 2004-09-16 | 2006-03-16 | Veeco Instruments Inc. | Physical vapor deposition apparatus for depositing thin multilayer films and methods of depositing such films |
| JP2007033558A (ja) * | 2005-07-22 | 2007-02-08 | Nippon Zeon Co Ltd | グリッド偏光子及びその製法 |
| US8460519B2 (en) * | 2005-10-28 | 2013-06-11 | Applied Materials Inc. | Protective offset sputtering |
| JP4642789B2 (ja) * | 2006-07-14 | 2011-03-02 | セイコーエプソン株式会社 | 成膜装置及び成膜方法 |
| CN101512413B (zh) * | 2006-09-28 | 2012-02-15 | 诺基亚公司 | 利用三维衍射元件的光束扩展 |
| JP5403862B2 (ja) * | 2006-11-28 | 2014-01-29 | チェイル インダストリーズ インコーポレイテッド | 微細金属パターンの製造方法 |
| GB2465528B (en) | 2007-09-18 | 2013-02-27 | Veeco Instr Inc | Method and apparatus for surface processing of a substrate using an energetic particle beam |
| US8968830B2 (en) | 2007-12-06 | 2015-03-03 | Oerlikon Trading Ag, Trubbach | PVD—vacuum coating unit |
| US20100096253A1 (en) | 2008-10-22 | 2010-04-22 | Applied Materials, Inc | Pvd cu seed overhang re-sputtering with enhanced cu ionization |
| US20120075699A1 (en) * | 2008-10-29 | 2012-03-29 | Mark Alan Davis | Segmented film deposition |
| KR20120044050A (ko) | 2010-10-27 | 2012-05-07 | 주식회사 에이스테크놀로지 | Ｒｆ 장비 도금 방법 및 이에 사용되는 스퍼터링 장치 |
| CN103189762A (zh) * | 2010-11-02 | 2013-07-03 | 3M创新有限公司 | 反射制品及其制备方法 |
| KR101949266B1 (ko) | 2011-03-29 | 2019-04-22 | 파나소닉 아이피 매니지먼트 가부시키가이샤 | 막 형성장치 및 막 형성방법 |
| JP6187045B2 (ja) * | 2013-08-30 | 2017-08-30 | セイコーエプソン株式会社 | 光学デバイス及び画像表示装置 |
| WO2015125794A1 (ja) * | 2014-02-21 | 2015-08-27 | 旭硝子株式会社 | 導光素子および映像表示装置 |
| KR102422284B1 (ko) | 2014-07-03 | 2022-07-15 | 어플라이드 머티어리얼스, 인코포레이티드 | 선택적인 증착을 위한 방법 및 장치 |
| KR20150003137A (ko) * | 2014-12-01 | 2015-01-08 | 주식회사 에이스테크놀로지 | Ｒｆ 장비 도금 방법 및 이에 사용되는 스퍼터링 장치 |
| US9372347B1 (en) * | 2015-02-09 | 2016-06-21 | Microsoft Technology Licensing, Llc | Display system |
| HK1215127A2 (zh) | 2015-06-17 | 2016-08-12 | Master Dynamic Limited | 制品涂层的设备、仪器和工艺 |
| KR20170020681A (ko) | 2015-08-14 | 2017-02-23 | 주식회사 오킨스전자 | 통신필터용 스퍼터링장치 및 이를 이용한 통신필터 박막 형성방법 |
| CN106842397B (zh) * | 2017-01-05 | 2020-07-17 | 苏州苏大维格光电科技股份有限公司 | 一种树脂全息波导镜片及其制备方法、及三维显示装置 |
| WO2019177861A1 (en) * | 2018-03-10 | 2019-09-19 | Applied Materials, Inc. | Method and apparatus for asymmetric selective physical vapor deposition |
| TWI864336B (zh) * | 2018-11-07 | 2024-12-01 | 美商應用材料股份有限公司 | 使用灰調微影術及傾斜蝕刻的深度調節傾斜光柵 |
| US11575246B2 (en) * | 2018-11-09 | 2023-02-07 | Meta Platforms Technologies, Llc | Wafer level optic and zoned wafer |
| US10690831B2 (en) * | 2018-11-20 | 2020-06-23 | Facebook Technologies, Llc | Anisotropically formed diffraction grating device |
-
2019
- 2019-12-17 TW TW108146141A patent/TWI835950B/zh active
- 2019-12-17 TW TW113107375A patent/TWI882707B/zh active
- 2019-12-17 KR KR1020257022693A patent/KR20250110939A/ko active Pending
- 2019-12-17 JP JP2021533310A patent/JP2022513448A/ja active Pending
- 2019-12-17 EP EP19900271.8A patent/EP3899616A4/en active Pending
- 2019-12-17 KR KR1020217022332A patent/KR102833369B1/ko active Active
- 2019-12-17 US US16/716,691 patent/US11851740B2/en active Active
- 2019-12-17 CN CN201980083748.3A patent/CN113242990A/zh active Pending
- 2019-12-17 WO PCT/US2019/066710 patent/WO2020131783A1/en not_active Ceased
-
2023
- 2023-11-16 US US18/511,631 patent/US20240084435A1/en active Pending
-
2025
- 2025-01-28 JP JP2025011869A patent/JP2025089297A/ja active Pending
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