KR20250110939A - 캡슐화를 위한 pvd 방향성 증착 - Google Patents

캡슐화를 위한 pvd 방향성 증착

Info

Publication number
KR20250110939A
KR20250110939A KR1020257022693A KR20257022693A KR20250110939A KR 20250110939 A KR20250110939 A KR 20250110939A KR 1020257022693 A KR1020257022693 A KR 1020257022693A KR 20257022693 A KR20257022693 A KR 20257022693A KR 20250110939 A KR20250110939 A KR 20250110939A
Authority
KR
South Korea
Prior art keywords
pvd
stream
encapsulating
optical devices
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257022693A
Other languages
English (en)
Korean (ko)
Inventor
루도빅 고데트
벤차르키 메바키
진신 푸
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 어플라이드 머티어리얼스, 인코포레이티드 filed Critical 어플라이드 머티어리얼스, 인코포레이티드
Publication of KR20250110939A publication Critical patent/KR20250110939A/ko
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/046Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225Oblique incidence of vaporised material on substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3464Sputtering using more than one target
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01Head-up displays
    • G02B27/017Head mounted
    • G02B27/0172Head mounted characterised by optical features
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10Beam splitting or combining systems
    • G02B27/1073Beam splitting or combining systems characterized by manufacturing or alignment methods
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1861Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1866Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12004Combinations of two or more optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • G02B6/1226Basic optical elements, e.g. light-guiding paths involving surface plasmon interaction
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • G02B6/124Geodesic lenses or integrated gratings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • G02B6/132Integrated optical circuits characterised by the manufacturing method by deposition of thin films
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/26Optical coupling means
    • G02B6/34Optical coupling means utilising prism or grating
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01Head-up displays
    • G02B27/017Head mounted
    • G02B2027/0178Eyeglass type

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Integrated Circuits (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
KR1020257022693A 2018-12-17 2019-12-17 캡슐화를 위한 pvd 방향성 증착 Pending KR20250110939A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201862780793P 2018-12-17 2018-12-17
US62/780,793 2018-12-17
KR1020217022332A KR102833369B1 (ko) 2018-12-17 2019-12-17 캡슐화를 위한 pvd 방향성 증착
PCT/US2019/066710 WO2020131783A1 (en) 2018-12-17 2019-12-17 Pvd directional deposition for encapsulation

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020217022332A Division KR102833369B1 (ko) 2018-12-17 2019-12-17 캡슐화를 위한 pvd 방향성 증착

Publications (1)

Publication Number Publication Date
KR20250110939A true KR20250110939A (ko) 2025-07-21

Family

ID=71071372

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020257022693A Pending KR20250110939A (ko) 2018-12-17 2019-12-17 캡슐화를 위한 pvd 방향성 증착
KR1020217022332A Active KR102833369B1 (ko) 2018-12-17 2019-12-17 캡슐화를 위한 pvd 방향성 증착

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Country Status (7)

Country Link
US (2) US11851740B2 (https=)
EP (1) EP3899616A4 (https=)
JP (2) JP2022513448A (https=)
KR (2) KR20250110939A (https=)
CN (1) CN113242990A (https=)
TW (2) TWI835950B (https=)
WO (1) WO2020131783A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10818499B2 (en) * 2018-02-21 2020-10-27 Varian Semiconductor Equipment Associates, Inc. Optical component having variable depth gratings and method of formation
US11391950B2 (en) * 2019-06-26 2022-07-19 Meta Platforms Technologies, Llc Techniques for controlling effective refractive index of gratings
FR3101442B1 (fr) * 2019-09-27 2022-04-22 Commissariat Energie Atomique Miroir de Bragg et procédé de réalisation d’un miroir de Bragg
CN116615680A (zh) 2020-11-24 2023-08-18 应用材料公司 用于衍射光学装置的平坦化结晶膜
US20220252779A1 (en) * 2021-02-08 2022-08-11 Applied Materials, Inc. Method for amorphous, high-refractive-index encapsulation of nanoparticle imprint films for optical devices
US20230120539A1 (en) * 2021-10-15 2023-04-20 Applied Materials, Inc. Metallized high-index blaze grating incoupler
CN114994918A (zh) * 2022-06-17 2022-09-02 京东方科技集团股份有限公司 一种光波导镜片及其封装方法
US20240111092A1 (en) * 2022-09-29 2024-04-04 Intel Corporation Pillar structures on an optical waveguide
KR20260022923A (ko) * 2023-06-30 2026-02-20 어플라이드 머티어리얼스, 인코포레이티드 증강 현실 도파관 결합기들의 이미지 선명도를 향상시키기 위한 필드 식각
CN117661316B (zh) * 2023-10-20 2025-12-30 郑州大学 一种碳纤维表面狼牙棒状SiOC/C双级界面涂层的制备方法
US20250297356A1 (en) * 2024-03-22 2025-09-25 Axcelis Technologies, Inc. Method and apparatus for ion beam directional deposition

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62158863A (ja) * 1985-12-30 1987-07-14 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション 被膜形成装置
JPH08269710A (ja) 1995-03-31 1996-10-15 Tdk Corp 反応性スパッタ装置および反応性スパッタ方法ならびに反応性蒸着装置および反応性蒸着方法
US5885425A (en) * 1995-06-06 1999-03-23 International Business Machines Corporation Method for selective material deposition on one side of raised or recessed features
US5985102A (en) * 1996-01-29 1999-11-16 Micron Technology, Inc. Kit for electrically isolating collimator of PVD chamber, chamber so modified, and method of using
US6511703B2 (en) * 1997-09-29 2003-01-28 Cymer, Inc. Protective overcoat for replicated diffraction gratings
US20020046945A1 (en) * 1999-10-28 2002-04-25 Applied Materials, Inc. High performance magnetron for DC sputtering systems
US7008862B2 (en) 2000-01-25 2006-03-07 Ever 1391 Limited Regular array of microscopic structures on a substrate and devices incorporating same
US6671208B2 (en) 2001-07-27 2003-12-30 Sharp Kabushiki Kaisha Nonvolatile semiconductor storage device with limited consumption current during erasure and erase method therefor
JP4061044B2 (ja) 2001-10-05 2008-03-12 住友重機械工業株式会社 基板移動装置
EP1474710B1 (en) 2002-02-12 2008-12-31 OC Oerlikon Balzers AG Optical component comprising submicron hollow spaces
US20030224116A1 (en) * 2002-05-30 2003-12-04 Erli Chen Non-conformal overcoat for nonometer-sized surface structure
US7349612B2 (en) * 2003-01-28 2008-03-25 Nippon Sheet Glass Company, Limited Optical element, optical circuit provided with the optical element, and method for producing the optical element
JP2006003447A (ja) * 2004-06-15 2006-01-05 Sony Corp 偏光分離素子及びその製造方法
US20060054494A1 (en) * 2004-09-16 2006-03-16 Veeco Instruments Inc. Physical vapor deposition apparatus for depositing thin multilayer films and methods of depositing such films
JP2007033558A (ja) * 2005-07-22 2007-02-08 Nippon Zeon Co Ltd グリッド偏光子及びその製法
US8460519B2 (en) * 2005-10-28 2013-06-11 Applied Materials Inc. Protective offset sputtering
JP4642789B2 (ja) * 2006-07-14 2011-03-02 セイコーエプソン株式会社 成膜装置及び成膜方法
CN101512413B (zh) * 2006-09-28 2012-02-15 诺基亚公司 利用三维衍射元件的光束扩展
JP5403862B2 (ja) * 2006-11-28 2014-01-29 チェイル インダストリーズ インコーポレイテッド 微細金属パターンの製造方法
GB2465528B (en) 2007-09-18 2013-02-27 Veeco Instr Inc Method and apparatus for surface processing of a substrate using an energetic particle beam
US8968830B2 (en) 2007-12-06 2015-03-03 Oerlikon Trading Ag, Trubbach PVD—vacuum coating unit
US20100096253A1 (en) 2008-10-22 2010-04-22 Applied Materials, Inc Pvd cu seed overhang re-sputtering with enhanced cu ionization
US20120075699A1 (en) * 2008-10-29 2012-03-29 Mark Alan Davis Segmented film deposition
KR20120044050A (ko) 2010-10-27 2012-05-07 주식회사 에이스테크놀로지 Rf 장비 도금 방법 및 이에 사용되는 스퍼터링 장치
CN103189762A (zh) * 2010-11-02 2013-07-03 3M创新有限公司 反射制品及其制备方法
KR101949266B1 (ko) 2011-03-29 2019-04-22 파나소닉 아이피 매니지먼트 가부시키가이샤 막 형성장치 및 막 형성방법
JP6187045B2 (ja) * 2013-08-30 2017-08-30 セイコーエプソン株式会社 光学デバイス及び画像表示装置
WO2015125794A1 (ja) * 2014-02-21 2015-08-27 旭硝子株式会社 導光素子および映像表示装置
KR102422284B1 (ko) 2014-07-03 2022-07-15 어플라이드 머티어리얼스, 인코포레이티드 선택적인 증착을 위한 방법 및 장치
KR20150003137A (ko) * 2014-12-01 2015-01-08 주식회사 에이스테크놀로지 Rf 장비 도금 방법 및 이에 사용되는 스퍼터링 장치
US9372347B1 (en) * 2015-02-09 2016-06-21 Microsoft Technology Licensing, Llc Display system
HK1215127A2 (zh) 2015-06-17 2016-08-12 Master Dynamic Limited 制品涂层的设备、仪器和工艺
KR20170020681A (ko) 2015-08-14 2017-02-23 주식회사 오킨스전자 통신필터용 스퍼터링장치 및 이를 이용한 통신필터 박막 형성방법
CN106842397B (zh) * 2017-01-05 2020-07-17 苏州苏大维格光电科技股份有限公司 一种树脂全息波导镜片及其制备方法、及三维显示装置
WO2019177861A1 (en) * 2018-03-10 2019-09-19 Applied Materials, Inc. Method and apparatus for asymmetric selective physical vapor deposition
TWI864336B (zh) * 2018-11-07 2024-12-01 美商應用材料股份有限公司 使用灰調微影術及傾斜蝕刻的深度調節傾斜光柵
US11575246B2 (en) * 2018-11-09 2023-02-07 Meta Platforms Technologies, Llc Wafer level optic and zoned wafer
US10690831B2 (en) * 2018-11-20 2020-06-23 Facebook Technologies, Llc Anisotropically formed diffraction grating device

Also Published As

Publication number Publication date
JP2022513448A (ja) 2022-02-08
TW202429543A (zh) 2024-07-16
WO2020131783A1 (en) 2020-06-25
US20240084435A1 (en) 2024-03-14
KR20210094111A (ko) 2021-07-28
US20200192108A1 (en) 2020-06-18
TW202032629A (zh) 2020-09-01
TWI882707B (zh) 2025-05-01
US11851740B2 (en) 2023-12-26
EP3899616A4 (en) 2022-08-17
CN113242990A (zh) 2021-08-10
KR102833369B1 (ko) 2025-07-10
TWI835950B (zh) 2024-03-21
JP2025089297A (ja) 2025-06-12
EP3899616A1 (en) 2021-10-27

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